CN101378605B - 超声波换能器及其制造方法、超声波诊断装置及超声波显微镜 - Google Patents
超声波换能器及其制造方法、超声波诊断装置及超声波显微镜 Download PDFInfo
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- CN101378605B CN101378605B CN200810134673.0A CN200810134673A CN101378605B CN 101378605 B CN101378605 B CN 101378605B CN 200810134673 A CN200810134673 A CN 200810134673A CN 101378605 B CN101378605 B CN 101378605B
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Abstract
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Claims (17)
Applications Claiming Priority (9)
Application Number | Priority Date | Filing Date | Title |
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JP2007-221691 | 2007-08-28 | ||
JP2007-221690 | 2007-08-28 | ||
JP2007221690A JP4774394B2 (ja) | 2007-08-28 | 2007-08-28 | 超音波トランスデューサ、超音波トランスデューサの製造方法、超音波診断装置及び超音波顕微鏡 |
JP2007221691 | 2007-08-28 | ||
JP2007221688 | 2007-08-28 | ||
JP2007-221688 | 2007-08-28 | ||
JP2007221691A JP4891182B2 (ja) | 2007-08-28 | 2007-08-28 | 超音波トランスデューサ、超音波診断装置及び超音波顕微鏡 |
JP2007221690 | 2007-08-28 | ||
JP2007221688A JP4774393B2 (ja) | 2007-08-28 | 2007-08-28 | 超音波トランスデューサ、超音波診断装置及び超音波顕微鏡 |
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CN101378605A CN101378605A (zh) | 2009-03-04 |
CN101378605B true CN101378605B (zh) | 2013-06-26 |
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CN200810134673.0A Active CN101378605B (zh) | 2007-08-28 | 2008-08-15 | 超声波换能器及其制造方法、超声波诊断装置及超声波显微镜 |
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JP (1) | JP4774393B2 (zh) |
CN (1) | CN101378605B (zh) |
Families Citing this family (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4594995B2 (ja) * | 2008-04-16 | 2010-12-08 | オリンパスメディカルシステムズ株式会社 | 超音波トランスデューサ及び電子機器 |
JP5611645B2 (ja) * | 2010-04-13 | 2014-10-22 | 株式会社東芝 | 超音波トランスデューサおよび超音波プローブ |
JP5875244B2 (ja) * | 2011-04-06 | 2016-03-02 | キヤノン株式会社 | 電気機械変換装置及びその作製方法 |
JP5780857B2 (ja) * | 2011-07-04 | 2015-09-16 | オリンパス株式会社 | 超音波ユニットおよび超音波内視鏡 |
JP5855374B2 (ja) * | 2011-07-11 | 2016-02-09 | オリンパス株式会社 | 超音波エレメントおよび超音波内視鏡 |
JP5855373B2 (ja) * | 2011-07-11 | 2016-02-09 | オリンパス株式会社 | 超音波エレメントおよび超音波内視鏡 |
EP2671515A4 (en) * | 2012-01-30 | 2015-11-11 | Olympus Corp | ULTRASONIC TRANSMITTER GROUP, METHOD FOR PRODUCING THE ULTRASONIC TRANSMITTER GROUP AND ULTRASOUND DOSCOPE |
JP5990929B2 (ja) * | 2012-02-24 | 2016-09-14 | セイコーエプソン株式会社 | 超音波トランスデューサー装置およびプローブ並びに電子機器および超音波診断装置 |
JP5988786B2 (ja) * | 2012-09-07 | 2016-09-07 | オリンパス株式会社 | 超音波ユニット及び超音波内視鏡 |
JP6252279B2 (ja) * | 2013-03-29 | 2017-12-27 | セイコーエプソン株式会社 | 超音波トランスデューサー装置およびプローブ並びに電子機器および超音波画像装置 |
WO2015053044A1 (ja) * | 2013-10-10 | 2015-04-16 | オリンパスメディカルシステムズ株式会社 | 超音波内視鏡先端部 |
KR102155695B1 (ko) * | 2014-02-12 | 2020-09-21 | 삼성전자주식회사 | 전기 음향 변환기 |
JP6312938B2 (ja) * | 2014-12-11 | 2018-04-18 | コーニンクレッカ フィリップス エヌ ヴェKoninklijke Philips N.V. | マイクロマシン超音波トランスデューサの互い違いの列を有するカテーテルトランスデューサ |
JP2016122759A (ja) * | 2014-12-25 | 2016-07-07 | キヤノン株式会社 | 貫通配線を有する電子デバイスの作製方法 |
JP6064098B1 (ja) * | 2015-04-30 | 2017-01-18 | オリンパス株式会社 | 超音波振動子および超音波プローブ |
CN106841396B (zh) * | 2015-12-03 | 2019-05-28 | 中国科学院上海微系统与信息技术研究所 | 硅基电容式声发射传感器及其制备方法 |
JP6309034B2 (ja) * | 2016-01-18 | 2018-04-11 | キヤノン株式会社 | 電気機械変換装置及びその作製方法 |
US10413272B2 (en) * | 2016-03-08 | 2019-09-17 | Covidien Lp | Surgical tool with flex circuit ultrasound sensor |
CN109475350B (zh) * | 2016-07-19 | 2021-10-01 | 奥林巴斯株式会社 | 超声波探头和超声波内窥镜 |
JP6606034B2 (ja) * | 2016-08-24 | 2019-11-13 | 株式会社日立製作所 | 容量検出型超音波トランスデューサおよびそれを備えた超音波撮像装置 |
CN110178385B (zh) * | 2016-11-18 | 2021-12-31 | 罗伯特·博世有限公司 | 具有电极组装件的mems传声器系统 |
CN110114000A (zh) * | 2016-12-19 | 2019-08-09 | 皇家飞利浦有限公司 | 可致动医学工具的超声引导 |
JP7056146B2 (ja) * | 2017-12-27 | 2022-04-19 | セイコーエプソン株式会社 | 超音波測定装置、及び測定方法 |
CN109068245A (zh) * | 2018-08-01 | 2018-12-21 | 京东方科技集团股份有限公司 | 屏幕发声装置、发声显示屏及其制造方法和屏幕发声系统 |
CN114636266B (zh) * | 2020-12-16 | 2023-12-01 | 合肥美的电冰箱有限公司 | 制冷设备、制冷设备的控制方法和存储介质 |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2003035281A2 (en) * | 2001-10-23 | 2003-05-01 | Schindel David W | Ultrasonic printed circuit board transducer |
CN1761364A (zh) * | 2004-10-12 | 2006-04-19 | 星精密株式会社 | 驻极体电容式传声器 |
CN1771757A (zh) * | 2004-04-27 | 2006-05-10 | 星电株式会社 | 驻极体电容传声器 |
CN2826881Y (zh) * | 2005-09-16 | 2006-10-11 | 潍坊共达电讯有限公司 | 驻极体电容传声器 |
CN1909747A (zh) * | 2005-08-03 | 2007-02-07 | 精工爱普生株式会社 | 静电型超声波换能器、其电极的制造方法、超声波扬声器 |
CN1965609A (zh) * | 2004-06-11 | 2007-05-16 | 精工爱普生株式会社 | 超声换能器和使用其的超声扬声器 |
-
2007
- 2007-08-28 JP JP2007221688A patent/JP4774393B2/ja active Active
-
2008
- 2008-08-15 CN CN200810134673.0A patent/CN101378605B/zh active Active
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2003035281A2 (en) * | 2001-10-23 | 2003-05-01 | Schindel David W | Ultrasonic printed circuit board transducer |
CN1771757A (zh) * | 2004-04-27 | 2006-05-10 | 星电株式会社 | 驻极体电容传声器 |
CN1965609A (zh) * | 2004-06-11 | 2007-05-16 | 精工爱普生株式会社 | 超声换能器和使用其的超声扬声器 |
CN1761364A (zh) * | 2004-10-12 | 2006-04-19 | 星精密株式会社 | 驻极体电容式传声器 |
CN1909747A (zh) * | 2005-08-03 | 2007-02-07 | 精工爱普生株式会社 | 静电型超声波换能器、其电极的制造方法、超声波扬声器 |
CN2826881Y (zh) * | 2005-09-16 | 2006-10-11 | 潍坊共达电讯有限公司 | 驻极体电容传声器 |
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JP4774393B2 (ja) | 2011-09-14 |
JP2009055473A (ja) | 2009-03-12 |
CN101378605A (zh) | 2009-03-04 |
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