CN101339924A - 半导体器件 - Google Patents
半导体器件 Download PDFInfo
- Publication number
- CN101339924A CN101339924A CNA200810097711XA CN200810097711A CN101339924A CN 101339924 A CN101339924 A CN 101339924A CN A200810097711X A CNA200810097711X A CN A200810097711XA CN 200810097711 A CN200810097711 A CN 200810097711A CN 101339924 A CN101339924 A CN 101339924A
- Authority
- CN
- China
- Prior art keywords
- mentioned
- wiring
- semiconductor device
- sealing
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 title claims abstract description 57
- 239000010949 copper Substances 0.000 claims description 26
- 239000002184 metal Substances 0.000 claims description 15
- 229910052751 metal Inorganic materials 0.000 claims description 15
- 229910052802 copper Inorganic materials 0.000 claims description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 2
- 239000007769 metal material Substances 0.000 claims 1
- 238000007789 sealing Methods 0.000 description 142
- 239000011229 interlayer Substances 0.000 description 63
- 238000000034 method Methods 0.000 description 33
- 239000010410 layer Substances 0.000 description 31
- 230000004888 barrier function Effects 0.000 description 23
- 238000009792 diffusion process Methods 0.000 description 18
- 230000015572 biosynthetic process Effects 0.000 description 14
- 238000005755 formation reaction Methods 0.000 description 14
- 230000008569 process Effects 0.000 description 11
- 230000009977 dual effect Effects 0.000 description 8
- 239000000463 material Substances 0.000 description 8
- 150000002739 metals Chemical class 0.000 description 8
- 238000000227 grinding Methods 0.000 description 7
- 238000005229 chemical vapour deposition Methods 0.000 description 6
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 5
- 238000005530 etching Methods 0.000 description 5
- 238000005516 engineering process Methods 0.000 description 4
- 230000006870 function Effects 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 4
- 238000000137 annealing Methods 0.000 description 3
- 238000011049 filling Methods 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 239000012528 membrane Substances 0.000 description 3
- 229920003209 poly(hydridosilsesquioxane) Polymers 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 3
- 229910052721 tungsten Inorganic materials 0.000 description 3
- 239000010937 tungsten Substances 0.000 description 3
- 239000004642 Polyimide Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 229910008482 TiSiN Inorganic materials 0.000 description 2
- 239000003990 capacitor Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- QRXWMOHMRWLFEY-UHFFFAOYSA-N isoniazide Chemical compound NNC(=O)C1=CC=NC=C1 QRXWMOHMRWLFEY-UHFFFAOYSA-N 0.000 description 2
- 229920000052 poly(p-xylylene) Polymers 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 238000004528 spin coating Methods 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 206010016275 Fear Diseases 0.000 description 1
- 208000037656 Respiratory Sounds Diseases 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 230000003321 amplification Effects 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 239000005380 borophosphosilicate glass Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 210000000170 cell membrane Anatomy 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 230000008595 infiltration Effects 0.000 description 1
- 238000001764 infiltration Methods 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 238000003199 nucleic acid amplification method Methods 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229910021426 porous silicon Inorganic materials 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- 230000000644 propagated effect Effects 0.000 description 1
- 230000001902 propagating effect Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000004043 responsiveness Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 230000007480 spreading Effects 0.000 description 1
- 238000003892 spreading Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/58—Structural electrical arrangements for semiconductor devices not otherwise provided for, e.g. in combination with batteries
- H01L23/585—Structural electrical arrangements for semiconductor devices not otherwise provided for, e.g. in combination with batteries comprising conductive layers or plates or strips or rods or rings
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3205—Deposition of non-insulating-, e.g. conductive- or resistive-, layers on insulating layers; After-treatment of these layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/562—Protection against mechanical damage
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Semiconductor Integrated Circuits (AREA)
Abstract
Description
Claims (8)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007176204 | 2007-07-04 | ||
JP2007176204A JP5106933B2 (ja) | 2007-07-04 | 2007-07-04 | 半導体装置 |
JP2007-176204 | 2007-07-04 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN101339924A true CN101339924A (zh) | 2009-01-07 |
CN101339924B CN101339924B (zh) | 2012-04-04 |
Family
ID=40213949
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN200810097711XA Expired - Fee Related CN101339924B (zh) | 2007-07-04 | 2008-05-20 | 半导体器件 |
Country Status (4)
Country | Link |
---|---|
US (1) | US20090008750A1 (zh) |
JP (1) | JP5106933B2 (zh) |
KR (1) | KR20090004469A (zh) |
CN (1) | CN101339924B (zh) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101826489A (zh) * | 2009-03-03 | 2010-09-08 | 台湾积体电路制造股份有限公司 | 用于半导体芯片的应力阻挡结构 |
CN104701271A (zh) * | 2013-12-05 | 2015-06-10 | 中芯国际集成电路制造(上海)有限公司 | 半导体结构及其形成方法 |
CN105990313A (zh) * | 2015-02-17 | 2016-10-05 | 中芯国际集成电路制造(上海)有限公司 | 一种芯片的密封环 |
TWI636555B (zh) * | 2016-09-06 | 2018-09-21 | 日商日立國際電氣股份有限公司 | Semiconductor device manufacturing method, substrate processing device, and program |
WO2019019658A1 (zh) * | 2017-07-28 | 2019-01-31 | 京东方科技集团股份有限公司 | 薄膜晶体管结构及其制造方法、显示面板、显示装置 |
CN112292757A (zh) * | 2018-08-24 | 2021-01-29 | 铠侠股份有限公司 | 半导体装置及其制造方法 |
CN113053828A (zh) * | 2021-03-12 | 2021-06-29 | 长鑫存储技术有限公司 | 密封环及其形成方法 |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5423029B2 (ja) * | 2009-02-12 | 2014-02-19 | 富士通セミコンダクター株式会社 | 半導体装置の製造方法 |
KR101581431B1 (ko) | 2009-09-04 | 2015-12-30 | 삼성전자주식회사 | 가드링들을 갖는 반도체 칩들 및 그 제조방법들 |
US8624348B2 (en) | 2011-11-11 | 2014-01-07 | Invensas Corporation | Chips with high fracture toughness through a metal ring |
US20150111005A1 (en) * | 2012-05-08 | 2015-04-23 | Asahi Kasei E-Materials Corporation | Transfer method and thermal nanoimprinting apparatus |
JP6093556B2 (ja) * | 2012-11-13 | 2017-03-08 | 富士通株式会社 | 半導体装置および半導体集積回路装置、電子装置 |
WO2018020713A1 (ja) * | 2016-07-28 | 2018-02-01 | パナソニックIpマネジメント株式会社 | 半導体装置およびその製造方法 |
US9728474B1 (en) | 2016-09-28 | 2017-08-08 | Globalfoundries Singapore Pte. Ltd. | Semiconductor chips with seal rings and electronic test structures, semiconductor wafers including the semiconductor chips, and methods for fabricating the same |
JP6230676B2 (ja) * | 2016-10-11 | 2017-11-15 | ルネサスエレクトロニクス株式会社 | 半導体装置 |
US10790240B2 (en) * | 2017-03-17 | 2020-09-29 | Taiwan Semiconductor Manufacturing Co., Ltd. | Metal line design for hybrid-bonding application |
US10804140B2 (en) * | 2018-03-29 | 2020-10-13 | Taiwan Semiconductor Manufacturing Co., Ltd. | Interconnect formation and structure |
US10381403B1 (en) * | 2018-06-21 | 2019-08-13 | Globalfoundries Singapore Pte. Ltd. | MRAM device with improved seal ring and method for producing the same |
CN111564411B (zh) * | 2020-06-08 | 2022-12-23 | 深圳铨力半导体有限公司 | 一种半导体装置及其形成方法 |
US11373962B2 (en) * | 2020-08-14 | 2022-06-28 | Taiwan Semiconductor Manufacturing Co., Ltd. | Advanced seal ring structure and method of making the same |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3813562B2 (ja) * | 2002-03-15 | 2006-08-23 | 富士通株式会社 | 半導体装置及びその製造方法 |
JP4502173B2 (ja) * | 2003-02-03 | 2010-07-14 | ルネサスエレクトロニクス株式会社 | 半導体装置及びその製造方法 |
JP4519411B2 (ja) * | 2003-04-01 | 2010-08-04 | ルネサスエレクトロニクス株式会社 | 半導体装置 |
US20050035455A1 (en) * | 2003-08-14 | 2005-02-17 | Chenming Hu | Device with low-k dielectric in close proximity thereto and its method of fabrication |
JP2005129717A (ja) * | 2003-10-23 | 2005-05-19 | Renesas Technology Corp | 半導体装置 |
JP4280204B2 (ja) * | 2004-06-15 | 2009-06-17 | Okiセミコンダクタ株式会社 | 半導体装置 |
JP2006190839A (ja) * | 2005-01-06 | 2006-07-20 | Matsushita Electric Ind Co Ltd | 半導体装置及びその製造方法 |
JP2006351878A (ja) * | 2005-06-16 | 2006-12-28 | Matsushita Electric Ind Co Ltd | 半導体装置 |
US7622364B2 (en) * | 2006-08-18 | 2009-11-24 | International Business Machines Corporation | Bond pad for wafer and package for CMOS imager |
US8643147B2 (en) * | 2007-11-01 | 2014-02-04 | Taiwan Semiconductor Manufacturing Company, Ltd. | Seal ring structure with improved cracking protection and reduced problems |
-
2007
- 2007-07-04 JP JP2007176204A patent/JP5106933B2/ja not_active Expired - Fee Related
-
2008
- 2008-05-20 KR KR1020080046625A patent/KR20090004469A/ko not_active Application Discontinuation
- 2008-05-20 CN CN200810097711XA patent/CN101339924B/zh not_active Expired - Fee Related
- 2008-06-20 US US12/142,875 patent/US20090008750A1/en not_active Abandoned
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101826489A (zh) * | 2009-03-03 | 2010-09-08 | 台湾积体电路制造股份有限公司 | 用于半导体芯片的应力阻挡结构 |
CN101826489B (zh) * | 2009-03-03 | 2013-06-12 | 台湾积体电路制造股份有限公司 | 用于半导体芯片的应力阻挡结构 |
CN104701271A (zh) * | 2013-12-05 | 2015-06-10 | 中芯国际集成电路制造(上海)有限公司 | 半导体结构及其形成方法 |
CN105990313A (zh) * | 2015-02-17 | 2016-10-05 | 中芯国际集成电路制造(上海)有限公司 | 一种芯片的密封环 |
TWI636555B (zh) * | 2016-09-06 | 2018-09-21 | 日商日立國際電氣股份有限公司 | Semiconductor device manufacturing method, substrate processing device, and program |
WO2019019658A1 (zh) * | 2017-07-28 | 2019-01-31 | 京东方科技集团股份有限公司 | 薄膜晶体管结构及其制造方法、显示面板、显示装置 |
US10553621B2 (en) | 2017-07-28 | 2020-02-04 | Boe Technology Group Co., Ltd. | Thin-film transistor structure and manufacturing method thereof, display panel and display device |
CN112292757A (zh) * | 2018-08-24 | 2021-01-29 | 铠侠股份有限公司 | 半导体装置及其制造方法 |
CN112292757B (zh) * | 2018-08-24 | 2024-03-05 | 铠侠股份有限公司 | 半导体装置及其制造方法 |
CN113053828A (zh) * | 2021-03-12 | 2021-06-29 | 长鑫存储技术有限公司 | 密封环及其形成方法 |
CN113053828B (zh) * | 2021-03-12 | 2022-05-27 | 长鑫存储技术有限公司 | 密封环及其形成方法 |
Also Published As
Publication number | Publication date |
---|---|
JP2009016542A (ja) | 2009-01-22 |
US20090008750A1 (en) | 2009-01-08 |
JP5106933B2 (ja) | 2012-12-26 |
CN101339924B (zh) | 2012-04-04 |
KR20090004469A (ko) | 2009-01-12 |
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Legal Events
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Owner name: OKI SEMICONDUCTOR CO., LTD. Free format text: FORMER OWNER: OKI ELECTRIC INDUSTRY CO., LTD. Effective date: 20131108 |
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Address after: Kanagawa Patentee after: LAPIS SEMICONDUCTOR Co.,Ltd. Address before: Kanagawa Patentee before: Oki Semiconductor Co.,Ltd. |
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Effective date of registration: 20131108 Address after: Kanagawa Patentee after: Oki Semiconductor Co.,Ltd. Address before: Tokyo, Japan Patentee before: Oki Electric Industry Co.,Ltd. |
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