CN101276148A - Apparatus for processing substrate - Google Patents

Apparatus for processing substrate Download PDF

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Publication number
CN101276148A
CN101276148A CN 200810091385 CN200810091385A CN101276148A CN 101276148 A CN101276148 A CN 101276148A CN 200810091385 CN200810091385 CN 200810091385 CN 200810091385 A CN200810091385 A CN 200810091385A CN 101276148 A CN101276148 A CN 101276148A
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China
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direction
slit nozzle
substrate
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CN 200810091385
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Chinese (zh)
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CN101276148B (en
Inventor
冈田广司
川口靖弘
高木善则
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大日本网目版制造株式会社
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Priority to JP2004291306A priority Critical patent/JP4324538B2/en
Priority to JP2004-291306 priority
Priority to JP2004302533A priority patent/JP4727203B2/en
Priority to JP2004-302533 priority
Application filed by 大日本网目版制造株式会社 filed Critical 大日本网目版制造株式会社
Priority to CN200510107679.52005.09.29 priority
Priority to CN200510107679.5 priority
Publication of CN101276148A publication Critical patent/CN101276148A/en
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Publication of CN101276148B publication Critical patent/CN101276148B/en

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Abstract

The purpose of the invention is to inhibit application unevenness by optimizing the state of a slit nozzle. In a slit nozzle 41, the first lip side 410a of a first lip 410 is arranged in the position where only a level difference D is lower than the second lip side 411a of a second lip 411. Preliminary application processing is performed by applying resist liquid to a roller 71 of a spare applying member while making the slit nozzle 41 scan in the direction ((-X) direction) opposite to the scanning direction ((+X) direction) of the slit nozzle 41 in this application processing. The application processing is performed by applying the resist liquid to a substrate 90 while making the slit nozzle 41 scan in the direction (+X) which is normalized by the preliminary application processing.

Description

基板处理装置本申请是申请号为200510107679.5、申请日为2005年9月29日、发明名称为"基板处理装置以及基板处理方法"的专利申请的分案申请。 The substrate processing apparatus according to the present application is a continuation Application No. 200510107679.5, filed divisional applications September 29, 2005, entitled Patent "substrate processing apparatus and a substrate processing method" of the application. 技术领域本发明涉及一种向液晶用玻璃方形基板、半导体晶片、薄膜液晶用柔性基板、光掩膜用基板、滤色器用基板等基板(以下,仅称为"基板")的表面涂覆光致抗蚀剂等处理液的技术。 Technical Field The present invention relates to a surface-coated with a liquid crystal light of one square glass substrate, a semiconductor wafer, the flexible substrate of the liquid crystal film, a substrate for a photomask, a color filter substrate or the like (hereinafter simply referred to as "substrate") of photoresist solution processing techniques and the like. 更详细的说,是涉及一种使喷嘴的状态正常化以提高涂覆精度的技术。 In more detail, the nozzle is directed to a state of normalization to improve the accuracy of the coating technique. 背景技术一直以来,公知有向基板的表面涂覆光致抗蚀剂等处理液的基板处理装置。 BACKGROUND ART Conventionally, there is known a substrate processing apparatus processing a photoresist coating liquid to a surface of the substrate. 作为这种基板处理装置,公知的有使用具有狭缝状喷出部的狭缝喷嘴进行形成涂层的涂覆处理(狭缝涂覆)的狭缝式涂覆机。 As such a substrate processing apparatus, there is known a slit nozzle having a slit-shaped discharge portion of coating treatment of forming a coating (slot coating) a slit coater. 在涂覆后不进行用于使涂层厚度均匀的旋转处理的狭缝式涂覆机中,涂覆层厚波动(以下称为"涂覆不均")会导致其产品的配线宽度等的不良(不良原因)。 Without performing rotation processing for uniform coating thickness after coating the slot coater, the coating layer thickness fluctuation (hereinafter referred to as "uneven coating") which leads to the wiring width and the like products bad (bad reasons). 为了不产生此涂覆不均,让狭缝喷嘴处于适合涂覆处理的规定状态是比较理想的。 To this coating unevenness does not occur, so that the slit nozzle is in the predetermined state suitable for the coating process is ideal. 更具体的说,如图11以及图12的侧视图所示,狭缝喷嘴341的前端部在整个其长度方向都处于在狭缝喷嘴341下端面不存在处理液B的状态(图11)、或是、处于在狭缝喷嘴341的下端面薄且均匀地形成有处理液B的积液的状态(图12)是理想的。 More specifically, as shown, the distal end portion 341 of the slit nozzle in its entire longitudinal direction are 11 and 12 a side view of the nozzle 341 in FIG end surface state of the processing liquid B does not exist (FIG. 11) in the slit, or, at the lower end of the slit nozzle 341 are formed and uniformly Mianbao fluid treating liquid B in a state (FIG. 12) is desirable. 就是说,狭缝喷嘴341的前端部,无论是纵向还是横向都处于均匀的状态才是理想的。 That is, the slit nozzle tip end portion 341, whether vertical or horizontal are in a uniform state is desirable. 但是,如果反复进行涂覆处理的话,如图13所示,就会在狭缝喷嘴341 的前端部的侧面等处附着处理液Ba。 However, if the coating process is repeated, then, as shown in FIG. 13, the treatment liquid will be adhered to the side surface etc. Ba distal portion 341 of the slit nozzle. 这样附着的处理液Ba,会干涉从喷出口341a排出的处理液B,而使涂覆处理的精度降低,成为涂覆不均的原因。 Such processing liquid adhering Ba, may interfere with the treatment liquid B discharged from the discharge port 341a, the accuracy of the coating process is reduced, which causes uneven coating. 在为了消除此状况的狭缝式涂覆机中,进行了使用清洗液清洗狭缝喷嘴的前端部的清洗处理。 In order to eliminate this condition in a slit coater, a distal end portion of the cleaning process using the cleaning fluid slit nozzle. 但是,即使进行这样的清洗处理,如图14所示,清洗液R(或是空气)也会进入到喷出口341a内,所以,单单通过清洗处理想把狭缝喷嘴的前端部调整到均匀的规定状态是很难的。 However, even such a cleaning process, shown in Figure 14, the cleaning liquid R (or air) will enter into the discharge port 341a, so that only the distal end portion is adjusted to a wanted uniform slit nozzle cleaning process by the provisions of the state is very difficult. 为此,公知有从前的恢复狭缝喷嘴状态的各种技术,例如专利文献1中的方案。 For this purpose, various techniques have been known to restore the previous state of the slit nozzle, for example, in Patent Document 1 in Scheme. 专利文献1中,记载了在狭缝喷嘴的侧面等部位涂覆憎水性材料,使不需要的处理液不能附着那样的加工技术。 Patent Document 1 describes a hydrophobic material is coated on the side parts of the slit nozzle or the like, the unnecessary processing liquid processing techniques such as not adhere. 但是,因为只对lm、或其以上的狭缝喷嘴的前端实施涂覆,就会产生增大成本,狭缝喷嘴价格高这样的问题。 However, since only the distal LM, or more embodiments of the slit nozzle coating, it will have increased costs and high price is a problem slit nozzle. 此外, 因为涂覆处理要伴随着热处理,恐怕会导致狭缝喷嘴的歪斜。 Further, since the coating process to be accompanied by heat treatment, probably will lead to skewed slit nozzle. 此外,在狭缝式涂覆机中,在狭缝喷嘴接近旋转的略呈圆筒状的辊的外表面的状态,喷出一定量的处理液,由此,实现将狭缝喷嘴的前端部调整到如图11,图12所示的均匀的规定状态(例如参照专利文献2、 3)。 Further, a slit coater, a slit nozzle in a state close to the outer surface of the rotating cylindrical rollers slightly, the discharge amount of the treatment liquid, thereby to achieve the slit nozzle tip end portion adjusted to a predetermined uniform state, as shown in FIG. 12 in Figure 11 (e.g., refer to Patent Document 2, 3). 此处理因为是在对原来的基板进行涂覆处理(正式涂覆处理)之前做,所以被称为"预备涂覆处理(预排出)"。 This is because the original processing of the substrate coating process (coating process formal) before doing, it is called "preliminary coating treatment (preliminary ejection)." 【专利文献1】JP特开2002-282760公报【专利文献2】JP特开2001-310147号公报【专利文献3】JP特开2004-167476号公报但是,只做上述预备涂覆处理很难让狭缝喷嘴的状态完全达到最佳化。 [Patent Document 1] JP Laid-Open Publication No. 2002-282760 [Patent Document 2] JP Laid-Open Publication No. 2001-310147 [Patent Document 3] JP Laid-Open Patent Publication No. 2004-167476, however, only the preliminary coating treatment is difficult for state slit nozzle fully optimally. 因此,例如,每进行了规定次数的处理、或是每经过了规定的时间,就需要进行狭缝喷嘴的清洗处理等。 Thus, for example, every predetermined number of times of processing performed, or every elapse of a predetermined time, it needs to be slit nozzle cleaning treatment. 并且在进行狭缝喷嘴的清洗处理时因为要中断涂覆处理,所以会降低生产率。 And the slit nozzle during the cleaning process since the coating process to be interrupted, so that productivity decreases. 因此,关于使喷嘴的状态正常化的技术还需要作进一步的改善。 Therefore, regarding the normalization of the state of the nozzle technology also needs further improvements. 另外,通过预备涂覆处理附着在辊外表面的处理液,在与规定的清洗液混合后,由与旋转的辊的外圆周面接触的长尺状刮板,从辊的外圆周面刮离除去。 Further, the coating process by preliminary treatment solution adhering to the outer surface of the roller, after mixing with a predetermined cleaning liquid, by a surface contact with the outer circumference of the rotating rolls of the long-sized blade, from the outer circumferential surface of the roller is scraped off removed. 一般地,此刮板由杨氏模量为610MPa〜6530MPa的聚乙烯、聚縮醛、聚酯等塑料构成。 Generally, the Young's modulus of the blade 610MPa~6530MPa polyethylene, polyacetal, polyester and other plastics. 近年来,伴随着基板尺寸的大型化,对狭缝式涂覆机的狭缝喷嘴的尺寸要求也趋于长大化,由此,辊的长度方向的尺寸也趋于长大化。 In recent years, along with the large size of the substrate, the slit nozzle size requirements slit coater tends to grow, thereby, the longitudinal dimension of the roller tends to grow. 但是,辊变长变大后,在辊的加工或是安装过程中会发生偏心,或是由于安装的辊的自重在辊的长度方向发生微小的挠曲。 However, the longer the roll becomes larger, machining or installation will roll eccentricity, or due to the weight of the roller mounted in the longitudinal direction of the roller minute deflections. 由此,在严密的级别(um 级别)中,将辊的外圆周面在长度方向进行的直线的安装就变得很困难。 Thus, in a strict level (um level), the outer circumference of the mounting surface of the roller line is performed in the longitudinal direction becomes difficult. 另一方面,用于除去辊上的附着物的上述刮板,沿着辊的长度方向大致直线地安装着。 On the other hand, the scraper for removing deposits on the rolls, along the longitudinal direction of the roller mounted substantially linearly. 因此,如果辊的外圆周面在长度方向不是直线,在外周面面的一部分就会产生刮板向辊的按压力变弱的地方或是刮板和辊接触不到的地方。 Thus, if the outer circumferential surface of the roller is not a straight line in the longitudinal direction, the outer peripheral part of all things will produce local or roller blade and the reach of the blade to the roller pressing force becomes weak. 其结果是,在辊的外圆周面,产生无法由刮板除去的部分残留物,而这些残留物会阻碍狭缝喷嘴向规定状态的调整。 As a result, the outer circumferential surface of the roller, produced by the blade portion can not remove residue, these residues can hinder the adjustment of the slit nozzle to a predetermined state. 发明内容本发明是鉴于上述课题而提出的,以让狭缝喷嘴的状态最佳化,抑制涂覆不均为第一个目的。 The present invention has been made in view of the above problem, and to allow the best state of the slit nozzle, the coating does not inhibit the first object are. 此外,本发明是以在整个辊的长度方向,除去辊上的附着物为第二目的。 Further, the present invention is in the longitudinal direction of the entire roller, the roller is removed deposit on the second object. 为了解决上述课题,实施方案1所述的发明是给基板涂覆处理液的基板处理装置,其特征在于,具有保持基板的保持机构,在沿第一方向扫描保持在上述保持机构的基板的同时,从喷出口向上述基板喷出处理液的狭缝喷嘴,由上述狭缝喷嘴涂覆处理液的预备涂覆构件,以使上述狭缝喷嘴沿与上述第一方向大致反向的第二方向扫描上述预备涂覆构件的表面的方式,使上述狭缝喷嘴和上述预备涂覆构件的表面相对移动的移动机构;上述狭缝喷嘴具有位于上述喷出口的上述第一方向侧的第一突出面和位于上述喷出口的上述第二方向侧的第二突出面;上述第一突出面比上述第二突平面更向处理液的喷出方向突出。 To solve the above problems, according to an embodiment of the invention is a substrate processing apparatus for processing a substrate a coating liquid comprising a holding mechanism for holding the substrate, held by the holding means scanning a substrate in a first direction while , the treatment liquid discharged from the discharge port toward the substrate slit nozzle by the preliminary slit nozzle coating a coating liquid handling member, so that the nozzle slit along the first direction is substantially opposite the second direction the preliminary scan mode of the coated surface of the member, the slit nozzle and the surface of the preliminary coated member of the relative movement of the moving mechanism; projecting the slit nozzle having a first surface of the first side of the direction of the ejection port and the second surface of the protruding side of the second direction of the ejection port; a first protruding surface protrudes above the processing liquid discharge direction than the second projection plane. 此外,实施方案2的发明是实施方案1所述的基板处理装置,其特征在于, 上述预备涂覆构件是大致圆筒状的构件,上述移动机构以使上述狭缝喷嘴沿上述第二方向扫描上述预备涂覆构件的表面的方式,使上述预备涂覆构件在轴心周围旋转。 Further, embodiments of the invention is a substrate processing apparatus 2 according to embodiment 1, wherein the preliminary coating member is a substantially cylindrical member, the moving mechanism so that the nozzle slit along the second scanning direction embodiment the preliminary coated surface member, so that the coated member is rotated about a preliminary axis. 此外,实施方案3的发明是实施方案2所述的基板处理装置,其特征在于, 还具有使第一突出面比第二突出面更突出的调整机构。 Further, embodiments of the invention is a substrate processing apparatus 3 according to embodiment 2, wherein the protrusion further has a first protruding surface protrudes than the surface of the second adjustment mechanism. 此外,实施方案4的发明是实施方案1〜3中的任意一项所述的基板处理装置,其特征在于,第一突出面比第二突出面突出30ym或其以上。 Further, embodiments of the invention, a substrate processing apparatus 4 is any of the embodiments 1 ~ 3 in the preceding claim, characterized in that the first projection face projecting more than 30ym or a second protrusion surface. 此外,实施方案5的发明是实施方案2所述的基板处理装置,其特征在于, 还具有通过与上述预备涂覆构件的表面接触,除去该表面上的附着物的长尺状刮板,上述刮板由杨氏模量在lMPa〜20MPa范围内的弹性体构成。 Further, embodiments of the invention, 5 is a substrate processing apparatus according to embodiment 2, characterized by further comprising the preliminary contact with the surface of the coating member, a long-sized blade removed deposit on the surface of the Young's modulus of the blade is constituted by an elastic member in lMPa~20MPa range. 此外,实施方案6的发明是实施方案2所述的基板处理装置,其特征在于, 还具有通过与上述预备涂覆构件的表面接触,除去该表面上的附着物的长尺状刮板,上述刮板由橡胶构成。 Further, the embodiment of the invention is a substrate processing apparatus 6 of the embodiment 2, characterized by further comprising the preliminary contact with the surface of the coating member, a long-sized blade removed deposit on the surface of the made of a rubber blade. 此外,实施方案7的发明是从设在狭缝喷嘴的喷出口喷出处理液,来给基板涂覆处理液的基板处理方法,其特征在于,具有保持基板的保持工序,上述狭缝喷嘴沿第一方向扫描在上述保持工序中被保持的上述基板的同时,给上述基板涂覆处理液的正式涂覆工序,以及,以使上述狭缝喷嘴沿着与上述第一方向大致反向的第二方向扫描的方式,使上述狭缝喷嘴与预备涂覆构件的表面相对移动,同时向上述预备涂覆构件涂覆处理液的预备涂覆工序;在上述正式涂覆工序以及上述预备涂覆工序中,将设在上述喷出口的上述第一方向侧的第一突出面,配置在比设在上述喷出口的上述第二方向侧的第二突出面更低的位置。 Further, embodiments of the invention, the treatment liquid 7 is discharged from the discharge outlet provided in the slit nozzle to a substrate processing method for applying a treatment liquid substrate, comprising a holding step of holding the substrate, along the slit nozzle a first scanning direction of the substrate in the holding step is maintained while the substrate to a coating step of coating a formal solution treatment, as well, so that the slit nozzle is substantially reverse to the first direction along a first a scanning manner in two directions, so that the coated surface of the preliminary slit nozzle member of the relative movement, while the coating member to the preparatory preliminary treatment solution coating the coating process; in the above coating step and the preliminary formal coating step , a projection provided on a first surface of the first direction of the discharge side of the outlet, arranged at the lower surface than the second projection provided on the second direction side of the ejection port position. 此外,实施方案8的发明是实施方案2所述的基板处理方法,其特征在于, 上述预备涂覆工序在上述正式涂覆工序之前执行,上述正式涂覆工序在上述预备涂覆工序之后立刻执行。 Further, embodiments of the invention 8 is a substrate processing method of the embodiment 2, wherein the preliminary coating step performed before said step of coating the official said formal performed immediately after the coating step the preliminary coating step . 此外,实施方案9的发明是给基板涂覆处理液的基板处理装置,该装置具有,沿着大致水平的第一方向延伸,在与第一方向垂直的大致水平的第二方向, 相对上述基板进行相对移动,同时能够向上述基板喷出上述处理液的狭缝喷嘴,以及沿着上述第一方向延伸,通过从上述狭缝喷嘴向外圆周面喷出上述处理液,将上述狭缝喷嘴的前端部调整到规定状态的大致圆筒状的辊,以及沿着上述第一方向延伸,通过与上述辊的上述外圆周面接触,除去上述外圆周面上的附着物的长尺状刮板,上述刮板由杨氏模量在lMPa〜20MPa范围内的弹性体构成。 Further, embodiments of the invention are 9 to the substrate processing apparatus applying a treatment liquid to a substrate, the device has, extending along a first substantially horizontal direction, in a second direction perpendicular to the first direction is substantially horizontal, relative to the substrate relative movement, while the slit nozzle can eject the treatment solution to the substrate, and extending in the first direction, by ejecting the treatment liquid from the outer circumferential surface of the slit nozzle, the nozzle of the slit the distal end portion is adjusted to a predetermined state, a substantially cylindrical roller, and extending in the first direction by the outer circumferential surface in contact with the roller to remove deposit said outer circumferential surface of the long-sized blade, the scraper is constituted by a Young's modulus elastomeric lMPa~20MPa within range. 此外,实施方案10的发明是给基板涂覆处理液的基板处理装置,该装置具有,沿着大致水平的第一方向延伸,在与第一方向垂直的大致水平的第二方向,相对上述基板进行相对移动,同时能够向上述基板喷出上述处理液的狭缝喷嘴,以及沿着上述第一方向延伸,通过从上述狭缝喷嘴向外圆周面喷出上述处理液,将上述狭缝喷嘴的前端部调整到规定状态的大致圆筒状的辊,以及沿着上述第一方向延伸,通过与上述辊的上述外圆周面接触,除去上述外圆周面上的附着物的长尺状刮板,上述刮板由橡胶构成。 Further, embodiments of the invention, 10 to the substrate processing apparatus is a liquid substrate coating process, the device has, extending along a first substantially horizontal direction, in a second direction perpendicular to the first direction is substantially horizontal, relative to the substrate relative movement, while the slit nozzle can eject the treatment solution to the substrate, and extending in the first direction, by ejecting the treatment liquid from the outer circumferential surface of the slit nozzle, the nozzle of the slit the distal end portion is adjusted to a predetermined state, a substantially cylindrical roller, and extending in the first direction by the outer circumferential surface in contact with the roller to remove deposit said outer circumferential surface of the long-sized blade, the scraper is made of rubber. 此外,实施方案11的发明是实施方案9或IO所述的基板处理装置,上述刮板的厚度在0.5mm〜10mm的范围内。 Further, embodiments of the invention are embodiments 11 or 9 IO substrate processing apparatus according to the thickness of the blade is in the range of 0.5mm~10mm. 此外,实施方案12的发明是实施方案9或10所述的基板处理装置,还具有可以在上述第一方向部分调整上述刮板对上述辊的按压力的调整机构。 Further, embodiments of the invention, the substrate processing apparatus 12 is 9 or embodiment 10, further comprising pressing force adjusting means may be part of the roller adjusting the blade in the first direction. 此外,实施方案13的发明是实施方案12所述的基板处理装置中,上述调整机构通过在上述第一方向部分变更相对于上述辊的上述刮板的角度,来调整上述按压力。 Further, the embodiment of the invention is a substrate processing apparatus 13 according to embodiment 12, the adjustment mechanism by partially changing the angle of the blade relative to the roller, and by adjusting the pressing force in the first direction. 在实施方案1〜8所述的发明中,沿第一方向扫描被保持的基板,同时从喷出口向基板喷出处理液的狭缝喷嘴的第一突出面,比第二突出面更向处理液的喷出方向突出,通过使上述狭缝喷嘴和预备涂覆构件的表面相对移动,使得沿与上述第一方向大致反向的第二方向扫描预备涂覆构件的表面,从而可以抑制涂覆不均。 In the invention of claim 1~8 embodiment, the substrate is held scanning along a first direction while the first discharge slit nozzle protrusion surface treatment liquid from the discharge port toward the substrate, the second projection surface is more than the processing the discharge direction of the liquid protrudes through the slit nozzle and the surface of the coated preparation of the relative movement member, such that the first direction is substantially along a second direction reverse surface scanning preparation coated member, the coating can be suppressed uneven. 在实施方案2所述的发明中,预备涂覆构件是大致圆筒状的构件,移动机构使上述预备涂覆构件在轴心周围旋转,使得上述狭缝喷嘴沿上述第二方向扫描上述预备涂覆构件的表面,由此,可以谋求装置的小型化。 2 embodiment of the invention, in the embodiment, the preliminary coated member is a substantially cylindrical member, the moving mechanism so that the preliminary coated member is rotated around the axis, such that the slit nozzle coating the preliminary scanning in the second direction surface covering member, whereby the device can be downsized. 在实施方案3所述的发明中,由于还具备使第一突出面比第二突出面更突出的调整机构,例如可以对应于所使用的处理液的种类进行位置调整。 In the invention according to the third embodiment, since the projection surface further includes a first protrusion protrudes than the surface of the second adjustment mechanism, for example, the type of the treatment liquid may be used corresponding to the position adjustment. 在实施方案8所述的发明中,预备涂覆工序在正式涂覆工序之前执行,正式涂覆工序在预备涂覆工序之后立刻执行,由此,因为在将狭缝喷嘴的状态调整到最佳化之后立刻执行对基板的正式涂覆处理,可以高精度地涂覆处理液。 In the invention of claim 8 embodiment, the preliminary step of coating the coating step performed prior to the formal, formally performed immediately after the coating step of coating a preliminary step, thereby adjusting the state as slit nozzle to the best official coating process performed immediately after of the substrate, the treatment liquid can be accurately applied. 根据实施方案5、 6、以及9〜13所述的发明,因为刮板可以沿辊的外圆周面形状变形,即使辊发生了自重挠曲或是偏心,也可以在整个第一方向,刮板与辊的外圆周面接触。 According to Embodiment 5, and 6 9~13 according to the invention, since the shape of the outer circumferential surface of the roller along the blade may be deformed, even if the roller or deflection occurs eccentric weight, may be the entire first direction, the blade contact with the outer peripheral surface of the roller. 因此,可以在整个第一方向除去辊上的附着物。 Thus, it is possible to remove deposit on rollers throughout the first direction. 此外,特别的根据实施方案ll所述的发明,可以取得刮板的耐久性和变形性能之间的平衡。 Furthermore, the particular embodiment of the invention according to claim ll, can strike a balance between the durability and deformability blade. 此外,特别的根据实施方案12以及13所述的发明,因为可以在第一方向上部分调整上述刮板对上述辊的按压力,所以即使在第一方向的某个地方刮板的按压力比较弱,也可以对此进行调整,在整个第一方向,除去辊上的附着物。 Further, in particular according to the invention 12 and the embodiment 13, since the blade may be partially adjusting the pressing force of the roller in the first direction, even if somewhere in a first direction of the pressing force of the blade Comparison weak, this may be adjusted, throughout the first direction, to remove the deposit roller. 此外,特别的,根据实施方案13所述的发明,可容易地变更此按压力。 Further, in particular, according to the embodiment of the invention according to embodiment 13, this can be easily changed pressing force. 附图说明图1是表示本发明的实施方式涉及的基板处理装置的概略的立体图。 BRIEF DESCRIPTION OF DRAWINGS FIG. 1 is a perspective view schematically showing a substrate processing apparatus according to an embodiment of the present invention is directed. 图2是主要表示开口部内的预备涂覆机构的结构的侧视图。 FIG 2 is a side view showing the main structure of a preliminary coating mechanism in the opening portion. 图3是表示安装在预备涂覆位置的狭缝喷嘴的图。 FIG 3 shows a slit nozzle installed in the position of the coated preparation. 图4是表示基板处理装置动作的流程图。 FIG 4 is a flowchart showing operation processing apparatus of the substrate. 图5是表示执行正式涂覆处理时发生涂覆不均的结果的图。 FIG 5 is a graph showing a result of uneven coating occurs while executing a formal coating process. 图6是表示狭缝式涂覆机的概略结构的立体图。 FIG 6 is a perspective view showing a schematic configuration of a slot coater. 图7是表示喷嘴调整部结构的侧视图。 FIG. 7 is a side view of the nozzle structure of the adjustment portion. 图8是表示清洗液的供给系统以及排出系统的图。 FIG 8 is a diagram illustrating a cleaning liquid supply system and a discharge system. 图9是详细表示附着物除去部的结构的图。 9 is a detailed diagram illustrating a configuration of removing the portion of the deposit. 图IO是表示上方螺栓的安装的图。 FIG IO shows a mounting bolt above. 图11是表示狭缝喷嘴的前端部的正常状态的一个例子的图。 FIG. 11 shows an example of a normal state of the distal end portion of the slit nozzle of FIG. 图12是表示狭缝喷嘴的前端部的正常状态的一个例子的图。 FIG. 12 shows an example of a normal state of the distal end portion of the slit nozzle of FIG. 图13是表示狭缝喷嘴的前端部的不良状态的一个例子的图。 FIG 13 shows an example of the distal end portion of the bad condition of the slit nozzle of FIG. 图14是表示狭缝喷嘴的前端部的不良状态的一个例子的图。 FIG 14 shows an example of the distal end portion of the bad condition of the slit nozzle of FIG. 具体实施方式下面,参照附图详细地说明本发明适用的实施方法。 DETAILED DESCRIPTION Hereinafter, embodiments of the present invention is applicable to the method described in detail with reference to the drawings. <1.第一实施方式><1-1.基板处理装置的结构>图1是表示本发明的第一实施方式涉及的基板处理装置即狭缝式涂覆机1 的概略的立体图。 <1. First Embodiment> <1-1. The structure of the substrate processing apparatus> FIG 1 shows a first embodiment of a substrate processing apparatus according to the present invention that is a schematic perspective view of a slot coater. 另外,在图1中,为了图示以及说明的方便,定义Z轴方向表示铅垂方向,XY平面表示水平面,但是这只是为了方便把握位置关系而定义的,并不限定下面说明的各个方向。 Further, in FIG. 1, for convenience of explanation and illustration, the definition of Z-axis direction represents a vertical direction, XY represents a horizontal plane, this is merely for convenience and to grasp the positional relationship defined, is not limited to the respective directions described below. 对以下的图也是同样。 The same applies to the following chart. 狭缝式涂覆机1可以大致分为涂覆处理部2和控制部8,并把用于制造液晶显示装置的画面面板的方形玻璃基板作为被处理基板(以下仅称为"基板") 90,狭缝式涂覆机1是在有选择性的蚀刻在基板90表面所形成的电极层等的工艺过程中,在基板90的表面上涂覆作为处理液的抗蚀液的涂覆处理装置。 A slit coater coating process can be roughly divided into the control section 8 and the unit 2, and for manufacturing the liquid crystal display screen of a square glass substrate panel of the device as a substrate to be processed (hereinafter simply referred to as "substrate") 90 , a slit coater process is the selective etching of the electrode layer on the surface of the substrate 90 or the like formed on the surface of substrate 90 is coated as a resist liquid coating process liquid processing apparatus . 因此,在此实施方式中,狭缝喷嘴41喷出抗蚀液。 Thus, in this embodiment, the slit nozzle 41 discharging the resist solution. 另外,狭缝式涂覆机l不仅可用于液晶显示装置用的玻璃基板, 一般地,还可以作为用于在纯平显示器用的各种基板上涂覆处理液的装置来变形利用。 Further, a slit coater l not only a glass substrate for a liquid crystal display device is, in general, may also be used as means for applying a treatment liquid on the substrate by a variety of flat panel display is deformed use. 涂覆处理部2具有载物台3,其具有作为载置并保持基板90的保持台的功能的同时,还发挥作为附属的各机构的基座的功能。 Coating unit 2 includes a stage 3, while having a function of mounting and holding the substrate holding table 90 also functions as a base mechanism for each subsidiary functions. 载物台3是长方体形状的如一个整体石块制成的,其上面(保持面30)以及侧面被加工为平坦的表面。 The stage 3 is integrally formed a rectangular parallelepiped shape stones, thereon (retaining surface 30) and a side surface is processed into a flat surface. 载物台3的上表面是水平面,是基板90的保持面30。 The upper surface of the stage 3 is a horizontal plane, a holding surface 30 of the substrate 90. 保持面30上分布形成了未图示的多个真空吸附口,在狭缝式涂覆机1处理基板90的过程中, 通过吸着基板90,将基板90保持在规定的水平位置上。 Distribution is formed on the holding surface 30 a plurality of vacuum suction ports (not shown), a slit coater in the course of processing a substrate 90, the substrate 90 by suction, the substrate 90 is maintained at a predetermined horizontal position. 此外,在保持面30 上以适宜的间隔设置有通过未图示的驱动机构在上下自由升降的多个升降销LP。 Further, the holding surface 30 are provided at appropriate intervals by a plurality of lift pins LP unillustrated drive means vertically movable in the vertical. 升降销LP用于在取下基板90时推升基板90。 LP lift pins 90 for pushing up the substrate when removing the substrate 90. 在保持面30中,在夹持基板卯的保持区域(保持基板90的区域)的两端部,固定设置了大致平行于水平方向而伸展的一对移动轨道31。 In the holding surface 30, the clamping area of ​​the substrate holding both end portions of the sockets (holding area of ​​the substrate 90) is fixedly provided a pair of movable rail 31 is substantially parallel to the horizontal direction extending. 移动轨道31,与在架桥构造4的两端部的最下方固定设置的未图示的支承块一起,构成了引导(将移动方向规定为规定方向)架桥构造4移动并将架桥构造4支承在保持面30的上方的线性导轨。 Moving rail 31, the support block (not shown) at the bottom of both end portions of the fixed bridge structure 4 together form a guide (defined as the moving direction of the predetermined direction) and move the crosslinked structure crosslinked structure 4 4 is supported above the holding surface 30 of the linear guide. 在载物台3的上方,设置了从此载物台3的两侧部分开始略水平架设的架桥构造4。 Above the stage 3 is provided from the loading station 3 side portions substantially at the level of the erection of the bridge structure 4. 架桥构造4主要由如以碳素纤维加强树脂为骨架材料的喷嘴支承部40、支承其两端的升降机构43、 44构成。 4 as a crosslinked structure mainly composed of carbon fiber-reinforced resin matrix material is a nozzle support portion 40 of the lifting mechanism supporting both ends 43, 44 form. 在喷嘴支承部40安装了狭缝喷嘴41。 The nozzle support portion 40 of the slit nozzle 41 is mounted. 在图1的Y轴方向上有长度方向的狭缝喷嘴41上,连接着向狭缝喷嘴41供给抗蚀液的配管和含有抗蚀液用泵等的抗蚀液供给机构(未图示)。 In the Y-axis direction in FIG. 1 has a longitudinal direction of the slit nozzle 41 is connected with supplying the resist liquid to the slit nozzle 41 and the resist solution supply pipe means containing the resist solution by a pump (not shown) . 狭缝喷嘴41一面扫描基板90的表面, 一面向基板90表面的规定区域(以下称为"抗蚀液涂覆区域")喷出通过抗蚀液用泵供给的抗蚀液,由此向基板卯涂覆抗蚀液。 Side of the slit nozzle 41 scans the surface of the substrate 90, a region 90 facing the predetermined surface of the substrate (hereinafter referred to as "resist was coated area") by discharging the resist solution supply pump via a resist solution, whereby the substrate d coating the resist solution. 另外,所谓抗蚀液涂覆区域是在基板90的表面上要涂覆抗蚀液的区域,通常是从基板90的全部面积中除去了沿着边缘的规定宽度的区域的区域。 Further, a so-called resist solution is coated on a surface of the substrate region 90 of the resist liquid to be coated areas, the area width is typically removed along the edge of the predetermined region from the entire area of ​​the substrate 90. 此外,狭缝喷嘴41,不光涂覆基板90,其也一面扫描预备涂覆辊71 (图2)的表面, 一面涂覆抗蚀液。 Further, the slit nozzle 41, not only the coated substrate 90, which is also coated with a preliminary scan surface side roller 71 (FIG. 2), the resist was coated on one side. 在后面会详细说明狭缝式涂覆机1的这些动作。 These will be described in detail later in the operation of a slot coater. 升降机构43、 44,分在狭缝喷嘴41的两侧,通过喷嘴支承部40与狭缝喷嘴41相连接。 Lift mechanism 43, 44, 41 on both sides of the sub-nozzle slit, connected by the slit nozzle support portion 40 and the nozzle 41. 升降机构43、 44主要由AC伺服电动机43a、 44a以及未图示的滚珠螺杆构成,基于从控制部8得到的控制信号产生架桥构造4的升降驱动力。 Lift mechanism 43, 44 is mainly composed of AC servomotor 43a, 44a and a ball screw (not shown), and generates driving force of the lifter bridge 4 based on the control signal obtained from the control unit 8. 由此,升降机构43、 44,可以让狭缝喷嘴41并进的升降。 Thus, the lift mechanism 43, 44, 41 and thus allow the slit nozzle lift. 此外,升降机构43、 44也可以用于调整狭缝喷嘴41在YZ平面内的姿势。 In addition, the lift mechanism 43, 44 may also be used to adjust the posture of the slit nozzle 41 in the YZ plane. 在架桥构造4的两端部,沿着载物台3的两侧的边缘,分别固定安装着各具有固定元件(定子)50a和移动元件50b以及固定元件51a和移动元件51b 的一对AC无芯线性电动机(以下仅简称为"线性电动机")50、 51。 A pair of AC bridge configuration of both end portions 4 along both edges of the loading station 3, are fixedly attached to the moving member 50a and 50b and the fixed member 51a and the moving member 51b each having a fixed element (the stator) of coreless linear motor (hereinafter, simply referred to as "linear motor") 50, 51. 此外, 在架桥构造4的两端部,分别固定安装了各具备刻度部和检测件的线性编码器52、 53。 Further, at both ends of the bridge structure 4, are respectively fixed to each of the scale portions and the detecting member includes a linear encoder 52, 53 is installed. 线性编码器52、 53算出线性电动机50、 51的位置。 52, position 53 calculates the linear motor 50, a linear encoder 51. 以这些线性电动机50、 51和线性编码器52、 53为主,构成用于架桥构造4向行走轨道31 被引导,同时在载物台3上移动的行走机构。 In these linear motors 50, 51 and the linear encoder 52, 53 mainly constitute a bridge structure 431 is guided to the running rail, while traveling in the loading mechanism for moving the table 3. 控制部8,基于来自线性编码器52、 53的检测结果,控制线性电动机50、 51的动作,控制架桥构造4在载物台3上的移动,就是说控制狭缝喷嘴41对基板90的扫描。 A control unit 8, based on the detection result from the linear encoder 52, 53, controls the operation of the linear motor 50, 51, the bridge is configured to control movement of the object 4 in the table 3, that the control slot 90 of the nozzle 41 to the substrate scanning. 在涂覆处理部2的保持面30上,在保持区域的(一X)方向一侧,设置有开口32。 On the holding surface 30 of the coating unit 2, the holding side (an X) direction of the region, an opening 32 is provided. 开口32跟狭缝喷嘴41相同,以Y轴方向为长度方向,并且,该长度方向的长度与狭缝喷嘴41的长度方向的长度大致相同。 32 with the same opening the slit nozzle 41, the Y-axis direction is the longitudinal direction, and the longitudinal direction of the longitudinal length of the longitudinal direction of the slit nozzle 41 is substantially the same. 图2是主要表示开口32内的预备涂覆机构7的结构的侧视图。 FIG 2 is a side view showing a configuration of the main opening 32 of the preliminary coating mechanism 7. 在图1中虽然省略图示,但是在开口32的下方的涂覆处理部2的内部设置了预备涂覆机构7。 In Figure 1, although not shown, in the interior of the coating processing unit 2 below the opening 32 of the preliminary coating is provided means 7. 预备涂覆机构7,在向基板90涂覆抗蚀液的涂覆(正式涂覆处理)之前执行的预备涂覆处理(后述)中使用。 Preliminary coating mechanism 7, to be used in coating a resist solution is coated substrate 90 (official coating process) performed before the preliminary coating process (described later). 预备涂覆机构7,具有筐体70、预备涂覆辊(以下仅称为"辊")71、旋转机构72、以及附着物除去部74。 Preliminary coating mechanism 7, with 70, the preliminary coating roll housing (hereinafter simply referred to as "roller") 71, 72, and a deposit removal mechanism portion 74 to rotate. 附着物除去部74具有清除液体用的刮板73。 Deposit removal scavenge portion 74 of the blade 73 with the liquid. 如图2所示,筐体70是以从上面露出辊71的一部分的方式安装的大致呈箱状的构件。 2, the housing 70 is exposed to a substantially box-shaped member is a part of the roller 71 is mounted from above. 在筐体70的内部,存积有用于浸入辊71的涂覆面的一部分的一定量的清洗液。 In the interior of the housing body 70, for accumulating a quantity of a dip roll coating surface portion 71 of the cleaning liquid. 另外,虽然没有详细的图示,但是存积的清洗液,由清洗液供给部供给,通过溢出或是排泄向筐体70外排出。 Although not illustrated in detail, but the cleaning liquid reservoir is supplied from the cleaning liquid supply section, the drain 70 is discharged to the outside through the overflow or the housing. 此外,虽然清洗液是含有抗蚀液的溶剂成分的挥发性液体是比较理想的,但是当然不仅限于此。 Further, while the cleaning liquid is a solvent containing a volatile liquid component of the resist solution is ideal, but certainly not limited thereto. 圆筒状辊71 ,其圆筒面在预备涂覆处理过程中通过狭缝喷嘴41进行扫描, 构成涂覆了抗蚀液的涂覆面。 Cylindrical roller 71, which cylindrical surface is scanned by the slit nozzle 41 in preliminary coating process, the coating constituting the surface coating of the resist solution. 即辊71相当于本发明中的预备涂覆构件。 I.e. roller 71 corresponds to the preliminary coated member of the present invention. 辊71 的圆筒中心是轴心P,辊71以轴心P沿Y轴方向的方式配置。 Center roller 71 is a cylindrical axis P, roller 71 is disposed in the axis P direction of the Y-axis manner. 由旋转机构72 向辊71的轴心P传递旋转驱动力。 72 P transmitting rotational driving force to the axis of roller 71 by the rotation mechanism. 旋转机构72,虽没有详细的图示,但其是由生成旋转驱动力的旋转电动机以及传递该旋转驱动力的连接构件等构成的机构。 The rotation mechanism 72, although not illustrated in detail, but it is generated by the rotation of the motor and the rotational drive force mechanism including a member connected to the other rotational driving force is transmitted. 通过该旋转电动机生成的旋转驱动力经由连接构件传递给辊71,使辊71在图2按顺时针旋转。 Generated by the rotation of the motor rotation drive force to the roller 71 via a connecting member, the roller 71 is rotated clockwise in FIG. 2. 由此, 辊71的涂覆面和狭缝喷嘴41相对地移动。 Accordingly, the slit nozzle and coating surface 41 of the roller 71 is relatively moved. 此外,旋转机构72通过使辊71旋转,使辊71的涂覆面浸入存积的清洗液中。 Further, the rotation mechanism 72 by the roller 71 is rotated, the coated surface of the roller 71 is immersed in the cleaning liquid in the reservoir. 此外,在涂覆面中浸入到清洗液中的部分,通过辊71的旋转从清洗液中捞起。 Further, the coating was immersed in the surface portion of the washing liquid, the washing liquid picked up by the rotation of the roller 71. 这样,在预备涂覆机构7中,通过将辊71的涂覆面浸入清洗液中,清洗并除去在预备涂覆处理过程中涂覆到涂覆面上的抗蚀液。 Thus, in the preparation coating mechanism 7, by coating the surface of the roller 71 is immersed in the cleaning liquid, the cleaning and removing the coating applied to the surface of the preliminary resist liquid coating process. 另外,作为清洗涂覆面的机构,并不限于这样的浸渍清洗机构,例如,也可以在筐体70内设置向涂覆面喷出清洗液的喷嘴。 Further, the cleaning means as the coating surface, not limited to such immersion washing means, for example, may be discharged to the cleaning liquid nozzle 70 is provided in the coated surface of the housing. 在筐体70的内部,固定安装了具有清除液体用的刮板73的附着物除去部74。 In the interior of the housing body 70, a fixed portion having a clear liquid with a deposit removal blade 73 is mounted 74. 刮板73在向辊71的涂覆面轻微按压的状态,在Y轴方向均匀的接触辊。 In the blade 73 to the surface of the coating roller 71 slightly pressed state, even in the Y-axis direction of the contact roller. 在此状态,如果辊71旋转,刮板73与涂覆面相对移动,刮板73将涂覆面的附着物拨离除去。 In this state, if the roller 71 rotates, blade coating surface 73 and moved relative to the blade attachments 73 removed from the coated surface of the dial. 预备涂覆机构7在进行预备涂覆处理时,通过走行机构以及升降机构43、 44,将狭缝喷嘴41配置在图2所示的位置(以下称为"预备涂覆位置")。 When carrying out the preliminary coating mechanism 7 preliminary coating process, by traveling mechanism and a lifting mechanism 43, 44, the slit nozzle 41 is arranged at the position shown in FIG. 2 (hereinafter referred to as "pre-coating position"). 即,在预备涂覆处理过程中,狭缝喷嘴41几乎处于静止状态。 That is, the preliminary coating process, the slit nozzle 41 is almost at a standstill. 图3是表示安装在预备涂覆位置的狭缝喷嘴41的图。 FIG 3 shows a slit nozzle installed in the FIG. 41 position of the coated preparation. 狭缝喷嘴41被安装在喷嘴支承部40的下方,具有第一突出部410、第二突出部411以及薄垫板412。 The slit nozzle 41 is mounted below the nozzle support portion 40 having a first projecting portion 410, second projecting portion 411 and a thin plate 412. 如图3所示,第一突出部410和第二突出部411是形状大致相同的构件, 并且它们以几乎对置的方式配合,从而构成了狭缝喷嘴41。 3, the first protrusion 410 and second protrusion portion 411 is a member substantially the same shape, and they fit almost opposite manner, thereby constituting the slit nozzle 41. 第一突出部410 的下端是在大致水平方向上配置的第一突出面410a。 The first lower projecting portion 410 is a first projection surface disposed in a substantially horizontal direction 410a. 同样地,第二突出部411 的下端是在大致水平方向上配置的第二突出面411a。 Similarly, the second lower projecting portion 411 is a second protrusion surface disposed in a substantially horizontal direction 411a. 此外,第一突出面410a 以及第二突出面411a,都是在狭缝喷嘴41涂覆抗蚀液时,与涂覆对象物(基板90或是辊71)的表面对置的面。 In addition, the first projection surface 410a and a second protrusion surface 411 a, the slit nozzle 41 is at a resist coating liquid, coating the surface of the object surface (the substrate 90 or roller 71) is opposed. 狭缝式涂覆机1中,在第一突出部410和第二突出部411之间形成的空间成为狭缝喷嘴41内的抗蚀液的流路(未图示),该流路的(一Z)方向的开口部形成喷出口(狭缝)41a。 A slot coater, in the space formed between the second protruding portions 410 and the projecting portion 411 of the first flow passage becomes a resist solution in the slit nozzle 41 (not shown), the passage ( an opening portion Z) direction of the discharge port is formed (slit) 41a. 通过这样的结构,第一突出面410a配置在喷出口41a的(+X)方向侧,第二突出面411a配置在喷出口41a的(一X)方向如图3所示,第一突出部410隔着薄垫板412安装在喷嘴支承部40。 With such a configuration, the first protrusion 410a disposed on the discharge side of the outlet 41a (+ X) direction side of the second protrusion surface 411a disposed at the discharge port 41a in FIG. 3 (A X) direction, the first protrusion 410 via a thin nozzle plate 412 mounted on the support portion 40. 因此,第一突出面410a在(一Z)方向上仅比第二突出面411a突出薄垫板412 的Z轴方向的厚度部分(高度差D)。 Thus, a first projection 410a on the surface (a Z) than the thickness direction is only partially Z-axis direction of the second protrusion protruding surface 411a of the thin plate 412 (height difference D). 这样通过使用厚度不同的薄垫板412, 薄垫板412就可以具有调整第一突出面410a和第二突出面411a间高度差的调整机构的功能。 Thus by using different thickness pad may have a function to adjust a first projection surface 410a and the second protruding surface 411a of the difference between the height adjustment mechanism 412, a thin plate 412. 另外,在本实施方式的狭缝式涂覆机1中,因为Z轴方向表示垂直方向,所以第一突出面410a配置在比第二突出面411a低的位置。 Further, in this embodiment, a slit coater, because the Z-axis direction represents a vertical direction, the first projection surface 410a disposed at a position lower than the second protrusion surface 411a. 狭缝式涂覆机l中,从未图示的供给口向狭缝喷嘴41供给抗蚀液,此抗蚀液流过狭缝喷嘴41内的流路,从喷出口41a向(一Z)方向喷出。 L slit coater, the supply port (not shown) is supplied to the slit nozzle 41 a liquid resist, the resist to flow through this flow path in the slit nozzle 41, the outlet 41a to discharge from (a Z) ejection direction. 即,第一突出面410a比第二突出面411a仅在(一Z)方向突出高度差D,在狭缝式涂覆机l中抗蚀液的喷出方向是(一Z)方向,所以第一突出面410a在喷出方向比第二突出面411a突出。 That is, the first projection surface 410a than the second protrusion surface 411a protrudes only difference D in height (a Z) direction, a slit coater l in the direction of the resist solution is discharged (a Z) direction, so the first a protruding surface 410a of the second protrusion surface 411a protrudes in the ejection direction. 换言之,这意味着在涂覆处理中(正式涂覆处理以及预备涂覆处理),狭缝喷嘴41的第一突出面410a比第二突出面411a 更接近涂覆对象物。 In other words, this means that (formal preliminary coating process and the coating process), the slit nozzle coating process in the first protrusion surface 41 than the second protrusion surface 410a is closer to the coating object 411a. 回到图1,控制部8内部具备按照程序处理各种数据的运算部80、存储程序和各种数据的存储部81。 Returning to Figure 1, the internal control unit 8 includes a process 80 according to a program, a storage unit 81 stores programs and various data, various data arithmetic unit. 此外,在其前表面还具备用于操作人员对狭缝式涂覆机1输入必要的指示的操作部82、以及显示各种数据的显示部83。 Further, the front surface further includes an operation unit 82 for the operator to enter the necessary slit coater 1 is indicated, and a display unit 83 various data. 控制部8通过图1中未图示的电缆与附属于涂覆处理部2的各机构电连接。 The control unit 8 in FIG. 1 by a cable (not shown) and means electrically connected to each affiliated coating processing section 2. 控制部8,基于来自操作部82的输入信号或是来自未图示的各种传感器等的信号,来控制升降机构43、 44的升降动作、行走机构的狭缝喷嘴41的扫描动作,甚至旋转机构72的狭缝喷嘴41的扫描动作。 A control unit 8, based on a signal input from the operation unit 82 of the signal from various sensors or the like (not shown) to control the operation of the lift mechanism 43 lifting, 44, slit nozzle scan operation running gear 41, rotation or even slit mechanism 72 of the nozzle 41 scan operation. 作为存储部81的具体的例子,有暂时存储数据的RAM、只读的ROM以及磁盘装置等。 As a specific example of the storage unit 81, there are RAM that temporarily stores data, and a read-only ROM disk device or the like. 但是,用便携式光盘或是存储卡等记录介质、以及读取它们的装置来代替存储部81也是可以的。 However, a portable recording medium such as an optical disk or a memory card, as well as their means for reading the storage unit 81 in place are also possible. 此外,操作部82中应该有按钮以及开关类等(包含键盘或鼠标等)部分,另外也可以具备兼有触控式显示屏那样的显示部83的功能。 Further, the operation unit 82 and a switch button should have the like (including a keyboard or a mouse, etc.) portion, it may additionally be provided with a display unit 83 of both the touch screen as a function. 显示部83中应该具有液晶显示屏或是各种指示灯等。 A display unit 83 or the LCD should have various lights. <1-2.基板处理装置的动作>接下来,概述狭缝喷嘴41涂覆抗蚀液的动作。 <1-2. Operation of the substrate processing apparatus> Next, an overview of the operation of the slits 41 resist liquid coating nozzle. 另外, 一般情况下,以下的动作都是根据来自控制部8的控制信号进行控制的。 Further, generally, the following operation is controlled according to a control signal from the control section 8. 图4是表示狭缝式涂覆机1动作的流程图。 FIG 4 is a flowchart showing a slit coater operation. 狭缝式涂覆机1中,通过操作人员或是未图示的搬运机构,将基板90交付给升降销LP。 A slit coater, or by an operator handling mechanism, not shown, the substrate 90 is delivered to the lifter pins LP. 升降销LP, 一接收到基板90就开始下降,并埋没到载物台3中,从而将接收到的基板90装载到保持面30。 The LP lift pins, a receiving substrate 90 starts to decrease, and buried into the loading station 3, so that the received substrate 90 is loaded into the holding surface 30. 由此,基板90被装载到载物台3的保持面30的规定位置,进而被吸附保持(步骤S1)。 Accordingly, the substrate 90 is loaded into a predetermined loading position of the stage 30 of the holding surface 3, and further is sucked and held (Step S1). 与这样的基板90的搬入处理不同,狭缝式涂覆机l中,在正式涂覆处理之前,先执行使狭缝喷嘴41的前端部的状态恢复的最佳化处理,即预备涂覆处理(步骤S2)。 And a substrate 90 carrying such a process different, l slit coater, the coating process before the formal, perform optimization processing state of the tip portion of the slit nozzle 41 is recovered, i.e., the preliminary coating process (step S2). 在预备涂覆处理中,首先,线性电动机50、 51使狭缝喷嘴41沿X轴方向移动,并配置于预备涂覆机构7的辊71的上方。 In the preliminary coating process, first, the linear motor 50, the slit 51 of the nozzle 41 is moved in the X-axis direction, and arranged above the roller 71 a preliminary coating mechanism 7. 接下来,升降机构43、 44 一面调整狭缝喷嘴41在YZ平面内的姿势, 一面使狭缝喷嘴41接近辊71的涂覆面。 Next, the lifting mechanism 43, 44 while adjusting the posture of the slit nozzle 41 in the YZ plane, the slit nozzle 41 close to the side surface of the coating roller 71. 由此,狭缝喷嘴41移动到预备涂覆位置(图2以及图3)。 Accordingly, the slit nozzle 41 is moved to the backup application position (FIG. 2 and FIG. 3). 狭缝喷嘴41向预备涂覆位置的移动结束后,按照从控制部8来的控制信号,抗蚀液供给机构对狭缝喷嘴41供给抗蚀液,据此,抗蚀液从狭缝喷嘴41 的喷出口41a喷出。 After the end of the slit nozzle 41 moves to a position ready coated, according to a control signal supplied to the control unit 8 to the resist solution, the resist solution supply means from the slit nozzle 41, whereby the resist liquid from the slit nozzle 41 the discharge port 41a is ejected. 并且,与喷出抗蚀液同步,通过旋转机构72旋转辊71, 执行向涂覆面涂覆抗蚀液,即执行预备涂覆处理。 And, in synchronization with the discharge liquid resist, roller 72 is rotated by the rotation mechanism 71, to perform resist coating surface a coating liquid, i.e., performs the preliminary coating process. 此时,虽然狭缝喷嘴41几乎呈静止状态,但是通过旋转机构72旋转辊71,狭缝喷嘴41与涂覆面做相对的移动。 At this time, the slit nozzle 41 was almost stationary state, but 71, 41 and the slit nozzle coating surface for relative movement of the roller 72 is rotated by the rotation mechanism. 即狭缝式涂覆机l中,通过旋转机构72旋转涂覆面,实现在预备涂覆处理中狭缝喷嘴41的扫描。 I.e., a slit coater l, the rotation of the rotary mechanism 72 through the coating surface, the coating process implemented in the preliminary scanning slit nozzle 41. 在预备涂覆处理中涂覆面的旋转方向是图2以及图3中的顺时针方向。 Preliminary coating process in the rotational direction of the coating surface is 2 and the clockwise direction in FIG. 3 FIG. 因此,在预备涂覆处理中狭缝喷嘴41与涂覆面的相对移动方向是曲线。 Thus, the preliminary coating process the slit nozzle 41 and the relative movement direction of the coating surface is curved. 但是, 辊71中被涂覆抗蚀液的部分(在涂覆瞬间进行扫描的部分)是,辊71的最高到达点(Z轴方向的坐标最大值)。 However, the roller 71 (portion at the scanning instant coating) is coated with the resist solution, the highest reaching point of the roller 71 (Z-axis direction coordinate maximum value). 因此,即使在例如涂覆面做旋转运动时, 涂覆瞬间的狭缝喷嘴41的扫描方向是旋转方向的切线方向,即(一X)方向。 Accordingly, even when the surface of the rotational movement such as coating, slit nozzle coating instantaneous scanning direction 41 is the tangential direction of rotation, i.e., (a X) direction. 虽然后面有说明,但是狭缝式涂覆机1中的正式涂覆处理过程中,狭缝喷嘴41沿(+X)方向扫描基板90。 Although there are described later, but the coating process formally slit coater process 1, the slit nozzle 41 in the (+ X) direction of scanning of the substrate 90. 因此,在预备涂覆处理过程中,狭缝喷嘴41的扫描方向与正式涂覆处理中扫描方向几乎反方向。 Thus, the preliminary coating process, slit scanning direction of the nozzle 41 and the coating process formal scanning direction is almost the opposite direction. 即在本实施方式的狭缝式涂覆机l的预备涂覆处理中,第一突出部410配置于扫描方向的后方,第二突出部411配置于扫描方向的前方。 I.e., the preliminary coating process slit coater l present embodiment, the first protrusion 410 disposed in the rearward scan direction, the second projecting portions 411 disposed in front of the scanning direction. 涂覆面中涂覆了抗蚀液的区域,由辊71的旋转依次浸入存积于筐体70 下部的清洗液中。 The coating surface coated areas of the resist solution, by the rotating roller 71 are sequentially immersed in the cleaning liquid pooled in the lower portion of the housing 70. 即涂覆于涂覆面上的抗蚀液通过清洗液直接被清洗除去。 I.e., the coating applied to the surface of the resist solution is removed by washing the cleaning solution directly. 进而,通过辊71的旋转,从清洗液中捞出浸入到清洗液中的涂覆面,涂覆面的清洗处理完成。 Further, by the rotation of roller 71, the cleaning liquid to remove the coating surface is immersed in the cleaning liquid, the cleaning process is completed coating surface. 涂覆面中清洗处理完成了的区域,通过辊71的旋转,由刮板73刮掉附着物(主要是清洗液或是抗蚀液的残留物等)。 Coating a surface region of the cleaning process is completed, by the rotation of roller 71, scraped off by the blade attachment 73 (mainly cleaning fluid or residue of the resist solution and the like). 这样一来,通过刮板73进行除去处理。 Thus, the blade 73 by eliminating process. 辊71的涂覆面中,通过预备涂覆处理涂覆了抗蚀液的区域,就这样除去被涂覆的抗蚀液,再返回涂覆抗蚀液的位置(最高到达点)。 Coated surface of the roller 71, by the preliminary coated areas of the resist coating treatment solution, thus removing the resist liquid to be coated, then coating the resist solution return position (maximum peak point). 由此,通过辊71的涂覆面使狭缝喷嘴41处于未被污染的状态。 Accordingly, by coating the surface of the roller 71 of the slit nozzle 41 is in an uncontaminated state. 从狭缝喷嘴41喷出规定量的抗蚀液, 一旦完成预备涂覆处理,在线性电动机50、 51将狭缝喷嘴41移动到涂覆开始位置的同时,升降机构43、 44将狭缝喷嘴41的高度调节到规定的高度。 41 from the resist solution discharge a predetermined amount of a slit nozzle, upon completion of the preparatory coating treatment, the linear motor 50, 51 to the slit nozzle 41 is moved while the coating start position, the lifting mechanism 43, the slit nozzle 44 height adjustment 41 to a predetermined height. 涂覆开始位置就是狭缝喷嘴41几乎沿着基板90的抗蚀液涂覆区域的(_X)侧端边的位置。 Coating start position is the position 41 along almost the resist solution is coated area of ​​the substrate 90 (_X) side end edge of the slit nozzle. 这些位置调整一完成,在抗蚀液供给机构向狭缝喷嘴41供给抗蚀液的同时,线性电动机50、 51将架桥构造4以规定的速度向(+X)方向移动,从而向基板90涂覆抗蚀液即进行正式涂覆处理(步骤S3)。 The position adjustment is completed, while supplying a resist liquid to the slit nozzle 41 in the resist solution supply mechanism, the linear motor 50, 51 is configured to bridge 4 is moved to a predetermined speed (+ X) direction, so that the substrate 90 i.e. coating a resist liquid coating process official (step S3). 这样,在本实施方式的狭缝式涂覆机l中,在正式涂覆处理中,狭缝喷嘴41的扫描方向是(+X) 方向,和预备涂覆方向的扫描方向即(一X)方向为反方向。 Thus, in the slot coater l embodiment according to the present embodiment, the coating process formally, the slit nozzle 41 is the scanning direction (+ X) direction, and the scanning direction, i.e. the direction of the coated preparation (a X) direction is in the opposite direction. 另外,在本实施方式的狭缝式涂覆机l中,狭缝喷嘴41在从预备涂覆位置向涂覆开始位置移动的过程中,从抗蚀液供给机构排出少量的抗蚀液,使得在狭缝喷嘴41的前端部形成抗蚀液的积液。 Further, in the slot coater l present embodiment, the slit nozzle 41 during movement from the preliminary position to the coating the coating start position, the discharge amount of the resist solution from the resist solution supply means, such that the distal end portion of the slit nozzle 41 is formed of a liquid resist fluid. 由此,在狭缝喷嘴41接近基板90的时候,在Y轴方向上形成均匀的弯月面,进而提高涂覆精度。 Accordingly, the slit nozzle 41 close to the substrate 90 when the formation of a uniform meniscus in the Y-axis direction, thereby improving the accuracy of the coating. 在这里,与其他的方法比较说明执行本实施方式的狭缝式涂覆机1那样的预备涂覆处理(步骤S2)以及正式涂覆处理(步骤S3)时的效果。 Here, comparison with other methods described effect of the present embodiment performs a slit coater such as a coating preparation process (step S2) and the formal coating process (step S3). 图5是表示执行正式涂覆处理时发生涂覆不均的结果的图。 FIG 5 is a graph showing a result of uneven coating occurs while executing a formal coating process. 另外,在预备涂覆处理中,使狭缝喷嘴的前端对准预备涂覆构件即辊的最高到达点和该辊与狭缝喷嘴的距离,在任意的情况下都为相同的条件。 Further, in the preliminary coating process, the front end of the slit nozzle alignment and a coating prepared from the highest point of arrival i.e. the roller member with the roller slit nozzle, in any case the same conditions. 此外,在辊旋转方向中, "顺方向"就是表示预备涂覆处理的扫描方向与正式涂覆处理的扫描方向几乎一致的情况,"反方向"就是表示预备涂覆处理的扫描方向与正式涂覆处理的扫描方向几乎相反的情况。 Further, in the roll rotation direction, "forward direction" is represented by an almost uniform direction scanning direction preparatory coating treatment with formal coating process, the "reverse direction" indicates that the scanning direction of the preliminary coating process and coated formal almost opposite to the scanning direction of the case where coating process. 此外,"突出部高度差"就是本实施方式中的高度差D的值,即表示在正式涂覆处理中配置在扫描方向前方的前突出部(相当于第一突出部410)相对于配置在后方的后突出部(相当于第二突出部411)向喷出方向突出多少的值。 Further, "protrusion height difference" is the value of the present embodiment, the height difference D, i.e., shows an arrangement in a coating process prior to the formal portion projecting forward in the scanning direction (corresponding to a first projection 410) disposed with respect to how much the value of a rear portion of the rear projection (corresponding to the second protrusion portion 411) projecting to the discharge direction. 进而,图5的涂覆不均发生状况,用记号表示以下结果。 Further, FIG. 5 coating unevenness occurs, the result represented by the following symbols. X :从第一张基板开始即发生不均条纹。 X: stripe unevenness i.e. beginning from the first occurrence of substrates. 涂覆若干张后发生不均条纹。 Uneven coating streaks occur after a number of sheets. 〇:在做了100张连续处理的情况下很少发生不均条纹。 ○: stripe unevenness rarely occurs in the case 100 made of a continuous process. 即使做了100 张连续处理也没有发生不均条纹。 Even with a 100 continuous treatment stripe unevenness did not happen. 在这里,100张连续处理的意思是在途中没有进行狭缝喷嘴的清洗处理的连续处理,而不是只连续地执行正式涂覆处理。 Here, continuous processing is 100 meaning there is no continuous treatment process of cleaning a slit nozzle on the way, and not just a formal coating process is continuously performed. 在突出部高度差为"0"的时候(图5中1、 6号),不依赖于预备涂覆处理的扫描方向,在涂覆若干张后发生了不均条纹。 Projecting height difference is "0" when (1, No. 6 in FIG. 5), the scanning direction is not dependent on the preliminary coating process, the occurrence of streak unevenness in a number of sheets after coating. 因为这是狭缝喷嘴的突出部都不突出情况,所以跟以往装置的处理大致相同。 This is because the projecting portion projecting slit nozzle is not the case, so the processing with substantially the same as the conventional apparatus. 从图5表示的结果可知,在以往的装置中,每处理了规定张数,就需要进行狭缝喷嘴的清洗处理。 The results are shown in FIG 5 that, in the conventional apparatus, each of a predetermined number of sheets processed, it is necessary for the slit nozzle cleaning process. 造成这样结果的理由可以认为是因为依赖于狭缝喷嘴的突出部的干燥状态,抗蚀液附着于狭缝喷嘴前端部侧面,或是在预备涂覆构件即辊的积液控干后或在狭缝喷嘴与基板接近前后,在狭缝喷嘴的前端部没有形成均匀的积液等理由,导致基板与抗蚀液的接触形状不稳定。 The reasons that caused this result may be because the dry state is dependent on the protruding portion of the slit nozzle, the resist solution attached to the slit nozzle tip side, or fluid control member dryness i.e. preliminary roller coating or longitudinal slit nozzle closest to the substrate, the slit nozzle tip end portion is not formed in a uniform fluid other reasons, resulting in an unstable shape of the contact substrate and the resist solution.突出部高度差为"负"并为"顺方向"的时候(图5中2、 3号),涂覆若干张后发生不均条纹。可以认为这是因为后突出部侧的抗蚀液变得不均匀结果导致发生不均条纹。即在前突出部比后突出部退出的情况下(前突出部位置较高的情况下),让预备涂覆处理的扫描方向与正式涂覆处理的扫描方向一致之后,通过每进行规定张数后的清洗处理,可以进行与以往装置相同程度的处理。但是,突出部高度差为"负"并为"反方向"的时候(图5中7、 8号), 从第一张开始即发生不均条纹,比以往的装置的涂覆精度还低。可以认为这是因为经预备涂覆处理抗蚀液在后突出部侧面不均匀地被推高,反而促进了不均条纹的发生。突出部高度差为"正"并为"顺方向"的时候(图5中4、 5号),从第一张开始即发生不均条纹,比以往的装置的涂覆精度还低。可以认为这是因为经预备涂覆处理在后突出部侧的抗蚀液不均匀,结果反而促进了不均条纹的发生。另一方面,与本实施方式的狭缝式涂覆机l相同,突出部高度差为"正" 并预备涂覆处理中的扫描方向是"反方向"的时候(图5中9、 10号),与以往的装置相比较,可以让涂覆不均的发生锐减。具体来说,如果突出部高度差为"30"m",可以将涂覆不均的发生抑制在做IOO张连续处理时很少发生不均条纹的程度。特别的,当突出部高度差为"70um"时,即使进行100张连续处理也不会发生不均条纹。以上,如用图5说明那样,只是突出部高度差为"正"的话,并不会提高涂覆精度,在如图5所示4、 5号的等情况下,有可能变坏。为了抑制涂覆不均,除了让突出部高度差为"正",还需要让预备涂覆处理中狭缝喷嘴的扫描方向与正式涂覆处理中狭缝喷嘴的扫描方向相反。在本实施方式的狭缝式涂覆机l,因为满足此条件,与以往的装置相比可以抑制涂覆不均的发生。另外,在狭缝喷嘴设置突出部高度差不会使装置结构徒然的复杂化。此外,即使变更了在预备涂覆处理中狭缝喷嘴的扫描方向也几乎不会由此导致成本上升。g卩,狭缝式涂覆机1是在抑制成本增加的同 可以实现的装置。此外,根据图5,狭缝式涂覆机l,虽然通过使突出部高度差为"30ixm、 或其以上"时与以往的装置相比就可以抑制涂覆不均,但是如果是"70um、 或其以上"的话就更理想了。另外,虽然图5中没有表示,但是作为突出部高度差的上限值,突出部高度差为"200um、或其以下"时,是有抑制涂覆不均的效果的,"100ym、或其以下"是比较理想的。回到图4,狭缝喷嘴41沿(+X)方向移动,当到达抗蚀液涂覆区域的(+X) 侧端边时,步骤S3的正式涂覆处理完成。此外,当正式涂覆处理完成时,通过线性电动机50、 51使架桥构造4移动,将狭缝喷嘴41复位到待机位置。另外,待机位置是狭缝喷嘴41未进行处理时的待机的位置,即运入搬出基板90 的时候,基板90与狭缝喷嘴41不发生干涉的位置。当狭缝喷嘴41移动到待机位置时,载物台3的保持面30就停止吸附基板90,基板90被搬出到装置外(步骤S4)。进而,狭缝式涂覆机l,进行要继续处理的其他基板90存在与否的判定(步骤S5),当其他的基板卯存在时, 返回步骤Sl重复进行处理。相反,如果需要处理的其他基板90不存在,就结束处理。如上,在本实施方式的狭缝式涂覆机l中,狭缝喷嘴41的第一突出面410a 比第二突出面411a在抗蚀液的喷出方向((_Z)方向)更突出,在正式涂覆处理中, 一边在基板90沿(+X)方向扫描, 一边从喷出口41a向基板90 喷出处理液的同时,通过旋转机构72使狭缝喷嘴41与辊71做相对的移动, 以便在预备涂覆处理中,狭缝喷嘴41沿与(+X)方向几乎相反的(_X)方向扫描辊71的涂覆面,从而不需要花费什么成本,就可以抑制涂覆不均。此外,辊71是略呈圆筒状的构件,旋转机构72以辊71为轴心旋转,使得狭缝喷嘴41沿(一X)方向扫描辊71的涂覆面,从而与例如在板状预备涂覆构件上进行预备涂覆的情况相比,可以谋求装置的小型化。此外,作为使第一突出面410a比第二突出面411a更突出的调整机构,通过具有薄垫板412就可以例如根据所使用的抗蚀液的种类来调整位置(调整高度位置)。此外,通过在正式涂覆处理开始之前进行预备涂覆处理,通过预备涂覆处理将狭缝喷嘴41调整到最佳状态,因为可以在此状态开始正式涂覆处理,所以可以比较高精度地进行正式涂覆处理。 <1-3.变形例>以上,虽然说明的是本发明的第一实施方式,但是本发明并不限定于上述第一实施方式,而可以作各种各样的变形。例如,预备涂覆构件并不限于辊71那样的圆筒形状构件。例如,也可以是配置在大致水平方向的板状构件。使用这样的板状构件作为预备涂覆构件时,在预备涂覆处理中,线性电动机50、 51也是可以使狭缝喷嘴41和预备涂覆构件相对移动的。此外,图4所示的处理次序,并不限定于此。例如步骤Sl保持基板90 的处理,也可以在步骤S2的预备涂覆处理之后进行,这两个处理还可以同时进行。即只要是能得到同样效果的次序,无论按什么样的顺序执行处理都可以。此外,作为用于使第一突出面410a比第二突出面411a在喷出方向上更突出的方法,也不限定于上述实施方式所示的使用薄垫板412的方式。例如可以预先将第一突出部410制造成比第二突出部411在(一Z)方向长的构件,还可以设置调整弹簧那样的机构,用于使第一突出面410在(一Z)方向上突出。 <2.第二实施方式〉<2-1.基板处理装置的概要>图6是表示本发明的第二实施方式涉及的基板处理装置即狭缝式涂覆机210的概略结构的立体图。狭缝式涂覆机210是进行向基板290的表面涂覆作为处理液的抗蚀液的、被称为狭缝式涂覆的涂覆处理的涂覆处理装置,利用于有选择的蚀刻在基板290表面所形成的电极层等的工艺过程等。成为狭缝式涂覆机210的涂覆对象的基板290,代表性的是用于制造液晶显示装置的画面面板的方形玻璃基板,还可以是半导体基板、薄膜液晶用柔性基板、光掩膜用基板、滤色器用基板等其他的基板。如图6所示,狭缝式涂覆机210,可大致分为控制装置全体的控制部201 和实施涂覆处理的涂覆处理部202。控制部201,与涂覆处理部202的各个部分电连接,统括地控制涂覆处理部202的各部分的动作。控制部201具备由CPU、 RAM以及ROM等构成的微型计算机。控制部201的各种控制功能是通过CPU遵循规定的程序和数据,利用RAM进行运算处理而实现的。此外, 在控制部201,设置有接收操作人员的输入操作的操作部211和显示各种数据的显示部212,这些具有用户界面的功能。涂覆处理部202主要由以下部分构成:载物台203,其用于保持基板290; 喷出机构204,其用于向被保持在载物台203的基板290喷出抗蚀液;移动机构205,其用于使喷出机构204沿规定方向移动。另外,以下为了便于说明,将X轴方向作为深度方向(+X侧是正面侧、 一X侧是背面侧),Y轴方向作为左右方向(从正面侧看+Y侧是右侧、_Y 侧是左侧)。载物台203是由略呈长方体状的花岗岩等石材构成的,其上表面加工成大致水平面的平坦面,作为基板290的保持面230发挥功能。在保持面230上分散形成了多个真空吸附口,通过这些真空吸附口吸附基板290,在涂覆处理过程中将基板290以水平状态保持在规定的位置。喷出机构204主要由以下部分构成:狭缝喷嘴241,其用于喷出抗蚀液; 喷嘴支承部242,其用于支承狭缝喷嘴241; 2个升降机构243,其用于支承喷嘴支承部242的两端并使其升降。狭缝喷嘴241,从狭缝状的喷出口向基板290的上表面排出从图外的供给机构供给的抗蚀液。此狭缝喷嘴241,其喷出口在与保持面230大致平行的Y 轴方向上延伸,并且可向垂直下方(一Z侧)喷出抗蚀液,由喷嘴支承部242 支承着。喷嘴支承部242由以Y轴方向为长度方向的碳素纤维加强树脂等板状构件构成。 2个升降机构243,连接在喷嘴支承部242的左右两端部。这些升降机构243分别具有AC伺服电动机以及滚珠螺杆等,使喷嘴支承部242以及被其支承的狭缝喷嘴241在垂直方向(Z轴方向)上可以升降。通过这2个升降机构243,可以调整狭缝喷嘴241和基板290之间的间隔(间隙)或狭缝喷嘴241 对基板290的姿势等。如图6所示,通过包含这些狭缝喷嘴241、喷嘴支承部242以及2个升降机构243的喷出机构204整体,形成沿Y轴方向架设在载物台203左右两端部的架桥构造。移动机构205,使具有这样的架桥构造的喷出机构204的整体沿X轴方向移动。如图所示的移动机构205,是左右对称(+Y侧和一Y侧的对称)结构, 在左右两端分别有在X轴方向引导喷出机构204移动的移动轨道251,产生用于移动喷出机构204的移动力的线性电动机252和用于检测喷出机构204位置的线性编码器253。2个行走轨道251分别在载物台203的Y轴方向的端部(左右端部)沿X 轴方向延伸设置。通过2个升降机构243的下端部分别沿着2个行走轨道251 被引导,喷出机构204的移动方向被规定为X轴方向。 2个线性电动机252分别由具有固定元件252a和移动元件252b的AC无芯线性电动机构成。固定元件252a沿X轴方向设置在载物台203的Y轴方向的侧面(左右侧面)。另一方面,移动元件252b固定设置在升降机构243的外侧。线性电动机252,通过在这些固定元件252a和移动元件252b之间产生的磁力移动喷出机构204。此外,2个线性编码器253分别具有刻度部253a和检测部253b。在固定安装在载物台203的线性电动机252的固定元件252a的下部沿X轴方向设置有刻度部253a。另一方面,检测部253b固定安装在比固定安装在升降机构243 的线性电动机252的移动元件252b更外侧的位置,与刻度部253a对置地配置。线性编码器253,基于刻度部253a和检测部253b的相对位置关系,检测出X 轴方向的喷出机构204的位置(具体来说,狭缝喷嘴241的喷出口的位置)。根据以上的结构,狭缝喷嘴241,可以在保持基板290的保持面230的上部空间,沿与保持面230平行的X轴方向,相对保持面230移动。此狭缝喷嘴241,在进行涂覆处理之前,为了可以使基板290搬入,避让在比应该保持基板290的规定位置更背面侧(一X侧)的规定的待机位置231 (如图6所示状态)。在涂覆处理中,首先,基板290被搬入并保持在载物台203的保持面230。接着,在狭缝喷嘴241移动到基板290的背面侧(一X侧)的端部的正上方位置的同时,开始从狭缝喷嘴241的喷出口喷出抗蚀液。并且,保持着这个喷出抗蚀液的状态,以规定的速度向正面侧(+X侧)移动狭缝喷嘴241。由此, 实现狭缝喷嘴241对基板290的扫描(喷出扫描)。并且,当狭缝喷嘴241移动到基板290的正面侧(+X侧)的端部的正上方位置时,喷出扫描结束,停止从狭缝喷嘴241喷出抗蚀液。通过这样的处理, 在基板290的大致全表面均匀地涂覆了抗蚀液,在基板290的表面上形成了规定层厚的抗蚀液层。其后,狭缝喷嘴241再次避让到待机位置231,从载物台203搬出处理后的基板290。由此,完成了对一个基板290的一系列涂覆处理。有关这样的涂覆处理的控制是通过控制部201实现的。 <2-2.喷嘴调整部>此外,狭缝式涂覆机210,具备喷嘴调整部206,其在进行上述一系列涂覆处理(正式涂覆处理)之前,进行将狭缝喷嘴241的前端部调整到均匀的正常状态的处理即喷嘴调整处理。喷嘴调整部206,配置在避让位置231的下方(一Z侦ij),以便可以在待机位置231对避让中的狭缝喷嘴241进行处理。此喷嘴调整部206也与控制部201电连接,通过控制部201控制。图7是表示从一Y侧看喷嘴调整部206结构的侧视图。喷嘴调整处理,通过用清洗液清洗狭缝喷嘴241的清洗处理和让狭缝喷嘴241排出一定量的抗蚀液的预备涂覆处理这2个阶段进行。因此,喷嘴调整部206,如图所示,具备进行清洗处理的清洗处理部261和进行预备涂覆处理的预备涂覆机构262。清洗处理部261具有与狭缝喷嘴241的前端部形状相配合的清洗空间261a, 在该清洗空间261a的对面配置了多个喷出清洗液的喷出口。此外,预备涂覆机构262主要由下述部分构成:预备涂覆辊263 (以下仅称为"辊"),其是从狭缝喷嘴241来的抗蚀液的喷出对象;筐体264,其包围在该辊263周围。辊263是直径为如100mm〜120mm,长度方向的尺寸比狭缝喷嘴241的Y轴方向的尺寸大一些的略呈圆筒状构件,其长度方向(轴心263a的延伸方向)以沿Y轴方向的方式配置。辊263的材料是铁,包含其外圆周面的表面上被实施了硬质黑镀。辊263,可通过图外的驱动机构以轴心263a为中心旋转,其旋转方向是图中箭头Ar表示的方向(图7中顺时针)。筐体264是箱状的构件,在其上部形成了开口部。辊263配置在筐体264 内,使得其上部从筐体264的开口部向外侧露出。此外,辊263的外圆周面的最上部263b,与安装在载物台203的基板290的高度大体相同。在进行预备涂覆处理的时候,从狭缝喷嘴241向此最上部263b喷出抗蚀液。另一方面, 在筐体264内部存积有规定量的清洗液281,辊263的下部浸溃于清洗液281 中。此外,预备涂覆机构262,具备用于除去附着在辊263外圆周面的附着物的附着物除去部207。附着物除去部207,具有沿Y轴方向延伸的长尺状刮板(刮刀刀片)271,该刮板271处于与辊263的外圆周面接触的状态。此刮板271,通过辊263的旋转扫描辊263的外圆周面,由此刮离辊263外圆周面的附着物。关于此附着物除去部207在后面会有详细的说明。通过具有这样结构的喷嘴调整部206实施的喷嘴调整处理也通过控制部201的控制而实现。喷嘴调整处理中,首先,为了进行清洗处理,将狭缝喷嘴241移动到其前端部进入清洗处理部261的清洗空间261a的位置(图7的虚线所示的位置)。然后,从清洗处理部261的多个喷出口向狭缝喷嘴241的前端部喷出清洗液。由此,除去附着在狭缝喷嘴241前端部的侧面等处的抗蚀液。清洗处理完成后,接着,为了进行预备涂覆处理,狭缝喷嘴241被移动到辊263的外圆周面的最上部263b的正上方的位置(图7的实线所示的位置), 与辊263的外圆周面间隔规定的间隙配置。接下来,辊263开始旋转,从狭缝喷嘴241向该旋转中的辊263的外圆周面以一定时间喷出一定量的抗蚀液。由此,执行预备涂覆处理,如图11或是图12所示那样将狭缝喷嘴241的前端部调整成规定的均匀状态。由此完成喷嘴调整处理。在预备涂覆处理中,辊263的外圆周面中被排有抗蚀液的部分(以下称为"注目面"),通过辊263的旋转,依次浸渍到存积于筐体264的下部的清洗液281中。由此,附着在注目面的抗蚀液与清洗液281混合,大体除去注目面上的抗蚀液。进而,辊263旋转时,浸渍到清洗液281的注目面,从清洗液281中捞出后,由刮板271扫描。由此,注目面上的附着物(主要是清洗液或是抗蚀液的残留物等)由刮板271刮离,从注目面上除去附着物。通过这样的处理,作为抗蚀液喷出对象的辊263的外圆周面的最上部263b,就总是处于没有附着物存在的状态。这样通过刮板271被刮下来的刮离物蓄积在辊263与刮板271形成的空间265中。如果对此蓄积的刮离物放置不管,就会影响刮板271的刮离性能,因此在筐体264的内部的合适位置设置有清洗喷嘴266,用于对蓄积刮离物的空间265喷出清洗液282,使刮离物向下方落下。此清洗喷嘴266,如图8所示那样沿Y轴方向配置,可以在空间265的整个Y轴方向喷出清洗液282。通过控制部201经由可控制开关的控制阀284 从清洗液供给部283向清洗喷嘴266供给清洗液。由此,实现通过控制部201 控制经由清洗喷嘴266的清洗液282的喷出。此外,重复预备涂覆处理的话,筐体264内存积的清洗液281会因抗蚀液逐渐被污染,从而导致清洗液281的清洗能力降低。为此,狭缝式涂覆机210, 应定期交换筐体264内存积的清洗液281 。即如图8所示,在筐体264的Y轴方向的两侧面设置有用于供给清洗液281的供给口264a,另一方面,在筐体264的下部配置有用于排出清洗液281 的排出口264b。供给口264a,经由控制阀285与清洗液供给部283连接,排出口264b经由控制阀286引导到狭缝式涂覆机210的外部。控制阀285以及控制阀286两者,可以通过控制部201控制开关,并通过这些控制阀285以及控制阀286的开关实现筐体264内存积的清洗液281的交换。另外,清洗液281的液面高度,通过在筐体264下面形成的溢流管264c,总是保持在一定的高度。从清洗喷嘴266喷出清洗液282的时刻,或是交换筐体264内存积的清洗液281的时刻,虽然没有特别的限定,但是,在比如每次起动时、停止时、动作中断时、处理了规定张数的基板等,在各狭缝式涂覆机210的动作中规定的事件时执行是比较好的。 <2-3.附着物除去部>接下来,进一步详细说明附着物除去部207。图9是详细表示附着物除去部207的结构的图。如图所示,附着物除去部207由弹性体刮板271和保持刮板271的金属制的刮板保持构件272构成。弹性体刮板271的具体原材料优选采用硅橡胶(硅树脂)、EPDM(Ethylene Propylene Diene Methylene Linkage/乙烯丙烯二烯烃共聚物/三元乙丙橡胶)、 丁基橡胶、氟化橡胶、帕弗洛(A—7口)(注册商标)、以及、卡卢列茨(力》^:y、;0 (注册商标)等合成橡胶。此刮板271的原材料的杨氏模量的理想范围是lMPa〜20MPa (即lMPa、 或其以上且20MPa、或其以下),更理想的范围是6MPa〜20MPa。此外特别在采用硅橡胶作为刮板271时,其杨氏模量的理想范围是6MPa〜9.5MPa。通过采用不是塑料,而是硬度较小的弹性原材料作为刮板271,刮板271 成为了比较容易变形的构件。为此,如图9所示,刮板271通过接触在XZ平面内变形,由此可以不与辊263的外圆周面进行线接触,而可以与辊263的外圆周面进行面接触,从而大幅度地提高刮离辊263的外表面附着物的性能。进而,刮板271在其Y轴方向也 较容易变形。为此,由于偏心或是自重的原因,在辊263的外表面有"起伏"或是"挠曲",即使辊263的外圆周面没有在沿Y轴方向的直线上配置,刮板271会与接触的辊263的外表面的Y轴方向的形状("起伏"或是"挠曲")相配合,发生变形。其结果是,在Y轴方向上,没有刮板271与辊263的外表面不接触的地方,刮板271在辊263的外圆周面的整个Y轴方向都是接触的。就是说,辊263的外圆周面的Y 轴方向所有的附着物,都会被刮板271除去。此刮板271的厚度(图9中的符号271t所表示的长度)从0.5mm到10mm (艮P0.5mm、或其以上且10mm、或其以下)的范围内是比较理想的。如果使刮板271的厚度变小,刮板271的耐久性就会降低,需要频繁地更换刮板271。 另一方面,如果使刮板271的厚度变大,虽然刮板271的耐久性会提高,但是其在Y轴方向的变形性能就会下降。刮板271的厚度在上述范围内,就可以保持这样的刮板271的耐久性和变形性能之间的平衡。另外,刮板271对辊263的外圆周面的按压力,可以通过变更刮板271 相对于筐体264的角度(以下称为"配置角度")来调整。就是说,因为筐体264与辊263的相对的配置关系是固定的,所以刮板271的配置角度规定了刮板271相对于辊263的角度,进而,规定了刮板271对辊263的按压力。这个刮板271的配置角度,可以通过保持刮板271的刮板保持构件272变更。如图9所示,刮板保持构件272主要由通过2个卡爪273a、 273b直接保持刮板271的第一保持部273,支承第一保持部273的第二保持部274和固定设置在筐体264上的第三保持部275构成。第二保持部274和第三保持部275经由角度调整螺钉276而固定,以便可以调整相互间的角度。因此,通过调整角度调整螺钉276,可以调整第二保持部274和其保持的第一保持部273,进而可以调整被该第一保持部273保持的刮板271对筐体264的相对角度(即"配置角度")。此外,此刮板271的配置角度,可以在Y轴方向部分地变更。如图所示, 第一保持部273通过上下2个螺栓277、 279以及弹簧278被第二保持部274 支承着。下方螺栓277以非结合的方式贯通第一保持部273,其前端部固定在第二保持部274上。并且,在此下方螺栓277的头部与第一保持部273的下面之间配置了弹簧278,由此对第一保持部273施加了向第二保持部274靠近方向的弹性力。另一方面,上方螺栓279与在第二保持部274形成的螺纹结合的同时,贯通第二保持部274,其前端部接触到第一保持部273的上部。就是说,上方螺栓279,以与弹簧278的弹性力相反的方式接触第一保持部273。此外,此上方螺栓279接触的第一保持部273的上部侧的卡爪273a,是由如2mm左右较薄的不锈钢板构成,可以根据上方螺栓279的按压力发生弹性形变。因此,拧上上方螺栓279后,与其接触部分的卡爪273a变形,进而被该变形的卡爪273a保持的一部分刮板271也向下发生变形。就是说,通过调整上方螺栓279的松紧程度,可以在Y轴方向上调整只与该上方螺栓279 的接触部位相关的刮板271的配置角度。如图10的刮板271的后视图所示,此上方螺栓279,在Y轴方向的多个地方按照规定的间隔配置。因此,在每个配置了此上方螺栓279的位置,都可以局部的调整刮板271的配置角度。就是说,关于整个Y轴方向的刮板271 的配置角度可以通过角度调整螺钉276变更,从而关于Y轴方向局部的刮板271的配置角度可以通过上方螺栓279变更。这样,因为刮板271的配置角度可以在Y轴方向局部地变更,所以可以在Y轴方向局部地变更刮板271对辊263的按压力。刮板271即使采用上述的弹性材料,因年久老化等,刮板271对辊263的外圆周面的按压力在Y轴方向没有保持一定,局部地方的按压力可能变弱。因此对于这样的地方,如果以刮板271对辊263的按压力增大的方式进行调整的话,可以可靠地除去此处的附着物。因此,可以在整个Y轴方向更可靠地除去辊263上的附着物。 <3.其他的实施方式>此外,在第一实施方式中,图2所示的附着物除去部74可以采用与图9 所示的第二实施方式的附着物除去部207相同的结构。此时,第一实施方式的刮板73,采用与第二实施方式的刮板271相同的材料。通过采用这种结构, 即使第一实施方式中作为预备涂覆构件的辊71上有"起伏"或是"挠曲", 也可以可靠地除去辊71表面上的附着物。

Claims (5)

1. 一种基板处理装置,其给基板涂覆处理液,其特征在于,具有: 狭缝喷嘴,其沿着大致水平的第一方向延伸,在与上述第一方向垂直的大致水平的第二方向,相对上述基板进行相对移动,同时能够向上述基板喷出上述处理液; 大致圆筒状的辊,其沿着上述第一方向延伸,通过使上述狭缝喷嘴向外周面喷出上述处理液,将上述狭缝喷嘴的前端部调整到规定状态; 长尺状刮板,其沿着上述第一方向延伸,通过与上述辊的上述外周面接触,除去上述外周面上的附着物; 上述刮板由杨氏模量在1MPa~20MPa范围内的弹性体构成。 1. A substrate processing apparatus to which the substrate coating process fluid, comprising: a slit nozzle extending along a first substantially horizontal direction, substantially perpendicular to the first horizontal direction of the second direction, relative movement with respect to the substrate, while the above-described processing liquid can be discharged to the substrate; a substantially cylindrical roller which extends in the first direction, ejecting the processing liquid so that the outer circumferential surface of the slit nozzle by , the distal end portion of the slit nozzle is adjusted to a predetermined state; long-sized blade which extends along the first direction, by contacting the outer peripheral surface of the roller, the outer circumferential surface of the deposit removal; and said blade Young's modulus of the plate is constituted by an elastic member in the range of 1MPa ~ 20MPa.
2. —种基板处理装置,其给基板涂覆处理液,其特征在于,具有-狭缝喷嘴,其沿着大致水平的第一方向延伸,在与上述第一方向垂直的大致水平的第二方向,相对上述基板进行相对移动,同时能够向上述基板喷出上述处理液;大致圆筒状的辊,其沿着上述第一方向延伸,通过使上述狭缝喷嘴向外周面喷出上述处理液,将上述狭缝喷嘴的前端部调整到规定状态;长尺状刮板,其沿着上述第一方向延伸,通过与上述辊的上述外周面接触, 除去上述外周面上的附着物;上述刮板由橡胶构成。 2. - substrate processing apparatus to which the substrate coating process liquid, characterized in that with - a slit nozzle extending along a first substantially horizontal direction, a second substantially perpendicular to the first horizontal direction, direction, relative movement with respect to the substrate, while the above-described processing liquid can be discharged to the substrate; a substantially cylindrical roller which extends in the first direction, ejecting the processing liquid so that the outer circumferential surface of the slit nozzle by , the distal end portion of the slit nozzle is adjusted to a predetermined state; long-sized blade which extends along the first direction, by contacting the outer peripheral surface of the roller, the outer circumferential surface of the deposit removal; and said blade made of a rubber plate.
3. 如权利要求1或2所述的基板处理装置,其特征在于,上述刮板的厚度在0.5mm〜10mm的范围内。 The substrate processing apparatus according to claim 12, characterized in that the thickness of the blade is in the range of 0.5mm~10mm.
4. 如权利要求1或2所述的基板处理装置,其特征在于,进一步具有能够在上述第一方向部分地调整上述刮板对上述辊的按压力的调整机构。 The substrate processing apparatus of claim 12 or as claimed in claim, characterized in that the blade is further capable of adjusting the pressing force adjusting mechanism to the roller in the first direction partially.
5. 如权利要求4所述的基板处理装置,其特征在于,上述调整机构通过在上述第一方向部分地变更相对于上述辊的上述刮板的角度,来调整上述按压力。 5. The substrate processing apparatus according to claim 4, wherein the adjustment means by changing the angle of the blade relative to the roller, and by adjusting the pressing force in the first direction partially.
CN 200810091385 2004-10-04 2005-09-29 Apparatus for processing substrate CN101276148B (en)

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JP4727203B2 (en) * 2004-10-18 2011-07-20 大日本スクリーン製造株式会社 Substrate processing equipment
TW200815933A (en) * 2006-05-23 2008-04-01 Nikon Corp Maintenance method, exposure method and apparatus, and device manufacturing method
KR100828665B1 (en) 2006-12-28 2008-05-09 주식회사 디엠에스 Nozzle for jetting fluid
CN101303530B (en) 2007-05-07 2011-06-15 K.C.科技股份有限公司 Preparation exhaust device for slit coating machine
JP5028195B2 (en) * 2007-09-10 2012-09-19 大日本スクリーン製造株式会社 Substrate processing apparatus and substrate processing method
JP2010240550A (en) * 2009-04-03 2010-10-28 Dainippon Screen Mfg Co Ltd Apparatus for treating substrate
JP2011082230A (en) * 2009-10-05 2011-04-21 Dainippon Screen Mfg Co Ltd Substrate coating device
JP2011230112A (en) * 2010-04-06 2011-11-17 Dainippon Screen Mfg Co Ltd Coating apparatus
JP6049560B2 (en) * 2013-07-09 2016-12-21 東京エレクトロン株式会社 Coating device and slit nozzle
KR101578368B1 (en) * 2014-12-04 2015-12-18 주식회사 디엠에스 Apparatus for cleaning nozzle lip and Slit coater using the same
CN105880115A (en) * 2016-04-27 2016-08-24 安庆市鸿裕工业产品设计有限公司 Control assembly for smoothness of anilox roller through operating scraper of dry lamination machine

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