CN100575536C - 用于蒸发锂的混合物 - Google Patents

用于蒸发锂的混合物 Download PDF

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Publication number
CN100575536C
CN100575536C CN200580021281A CN200580021281A CN100575536C CN 100575536 C CN100575536 C CN 100575536C CN 200580021281 A CN200580021281 A CN 200580021281A CN 200580021281 A CN200580021281 A CN 200580021281A CN 100575536 C CN100575536 C CN 100575536C
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CN
China
Prior art keywords
lithium
mixture
dispenser
evaporation
powder
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
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CN200580021281A
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English (en)
Chinese (zh)
Other versions
CN1981066A (zh
Inventor
L·卡塔尼奥
S·皮罗拉
C·梅达
A·伯纳希
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SAES Getters SpA
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SAES Getters SpA
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Publication of CN1981066A publication Critical patent/CN1981066A/zh
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/18—Metallic material, boron or silicon on other inorganic substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/30—Doping active layers, e.g. electron transporting layers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/60—Forming conductive regions or layers, e.g. electrodes
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/12—All metal or with adjacent metals
    • Y10T428/12014—All metal or with adjacent metals having metal particles
    • Y10T428/12028—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, etc.]
    • Y10T428/12063—Nonparticulate metal component
    • Y10T428/12104—Particles discontinuous
    • Y10T428/12111—Separated by nonmetal matrix or binder [e.g., welding electrode, etc.]

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Battery Electrode And Active Subsutance (AREA)
  • Physical Vapour Deposition (AREA)
  • Electroluminescent Light Sources (AREA)
CN200580021281A 2004-09-10 2005-09-06 用于蒸发锂的混合物 Expired - Lifetime CN100575536C (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
IT001736A ITMI20041736A1 (it) 2004-09-10 2004-09-10 Miscele per l'evaporazione del litio e dispensatori di litio
ITMI2004A001736 2004-09-10

Publications (2)

Publication Number Publication Date
CN1981066A CN1981066A (zh) 2007-06-13
CN100575536C true CN100575536C (zh) 2009-12-30

Family

ID=35448266

Family Applications (1)

Application Number Title Priority Date Filing Date
CN200580021281A Expired - Lifetime CN100575536C (zh) 2004-09-10 2005-09-06 用于蒸发锂的混合物

Country Status (8)

Country Link
US (2) US7625505B2 (https=)
EP (1) EP1786946B1 (https=)
JP (1) JP4804469B2 (https=)
KR (1) KR101195634B1 (https=)
CN (1) CN100575536C (https=)
IT (1) ITMI20041736A1 (https=)
TW (1) TWI388501B (https=)
WO (1) WO2006027814A2 (https=)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ITMI20042279A1 (it) 2004-11-24 2005-02-24 Getters Spa Sistema dispensatore di metalli alcalini in grado di dispensare quantita' elevate di metalli
ITMI20070301A1 (it) 2007-02-16 2008-08-17 Getters Spa Supporti comprendenti materiali getter e sorgenti di metalli alcalini o alcalino-terrosi per sistemi di termoregolazione basati su effetto tunnel
AU2008310584A1 (en) 2007-10-12 2009-04-16 University Of Delaware Thermal evaporation sources for wide-area deposition
WO2013072910A1 (en) 2011-10-26 2013-05-23 Konstantin Chuntonov Apparatus and method for droplet casting of reactive alloys and applications
ITMI20112051A1 (it) * 2011-11-11 2013-05-12 Getters Spa Composizione organico-inorganica per il rilascio in fase vapore di metalli alcalini ed alcalino-terrosi
ITMI20131171A1 (it) 2013-07-11 2015-01-11 Getters Spa Erogatore migliorato di vapori metallici
KR102094142B1 (ko) * 2013-08-30 2020-03-27 엘지디스플레이 주식회사 유기전계 발광소자 제조방법
WO2015097894A1 (ja) * 2013-12-27 2015-07-02 パイオニア株式会社 発光素子及び発光素子の製造方法
WO2015133275A1 (ja) 2014-03-06 2015-09-11 シャープ株式会社 混合材料、その製造方法、及びそれを用いた有機素子
KR102231490B1 (ko) * 2014-09-02 2021-03-25 삼성디스플레이 주식회사 유기 전계 발광 소자
WO2017118740A1 (en) * 2016-01-08 2017-07-13 Photonis Netherlands B.V. Image intensifier for night vision device
US10685750B2 (en) 2016-03-08 2020-06-16 TerraPower, LLC. Fission product getter
CN207038182U (zh) 2017-03-29 2018-02-23 泰拉能源有限责任公司 铯收集器
CN107523793B (zh) * 2017-08-23 2019-06-07 京东方科技集团股份有限公司 一种金属锂蒸发装置、蒸镀设备及金属锂蒸发方法
US11626213B2 (en) * 2019-08-23 2023-04-11 Terrapower, Llc Sodium vaporizer and methods
US11185915B2 (en) 2019-08-30 2021-11-30 Applied Materials, Inc. Deposition of reactive metals with protection layer for high volume manufacturing
CN115125491A (zh) * 2022-06-15 2022-09-30 北方夜视技术股份有限公司 一种多碱光电阴极制备用碱源的蒸发特性测量的方法
WO2024015129A1 (en) 2022-07-13 2024-01-18 Terrapower, Llc Oxidation of cesium as method for removing cesium vapor from cover gas in nuclear reactors

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3578834A (en) * 1966-12-13 1971-05-18 Getters Spa Generation of alkali metals
CN1516249A (zh) * 2003-01-09 2004-07-28 友达光电股份有限公司 一种薄膜晶体管的制作方法

Family Cites Families (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2117735A (en) * 1936-10-01 1938-05-17 Rca Corp Getter
US2424512A (en) * 1944-08-08 1947-07-22 Nat Res Corp Production of alkali metals and their oxides
US2948635A (en) * 1959-01-12 1960-08-09 Gen Electric Phosphor evaporation method and apparatus
US3096211A (en) * 1959-03-31 1963-07-02 Emi Ltd Alkali metal generators
DE1945508B2 (de) 1968-09-13 1971-06-09 Vorrichtung zum freisetzen von metalldaempfen
US3658713A (en) * 1968-11-12 1972-04-25 Tokyo Shibaura Electric Co Alkali metal generating agents
US3663121A (en) 1969-05-24 1972-05-16 Getters Spa Generation of metal vapors
GB1384890A (en) * 1970-09-04 1975-02-26 Rockwell International Corp Protective coatings for ferrous metals
US3742185A (en) * 1971-05-07 1973-06-26 Lincoln Electric Co Lithium containing welding electrode
NL7802116A (nl) * 1977-03-14 1978-09-18 Getters Spa Alkalimetaaldampgenerator.
IT1115156B (it) * 1979-04-06 1986-02-03 Getters Spa Leghe zr-fe per l'assorbimento di idrogeno a basse temperature
US4233936A (en) 1979-05-08 1980-11-18 Rca Corporation Alkali metal dispenser
CA1306614C (en) * 1987-06-08 1992-08-25 Ralph Harris Producing volatile metals
US5543021A (en) * 1994-09-01 1996-08-06 Le Carbone Lorraine Negative electrode based on pre-lithiated carbonaceous material for a rechargeable electrochemical lithium generator
JPH0978058A (ja) 1995-09-08 1997-03-25 Pioneer Electron Corp 有機エレクトロルミネッセンス素子
US5636302A (en) 1995-10-18 1997-06-03 General Electric Company Injection chamber for high power optical fiber transmission
ATE247372T1 (de) 1996-09-04 2003-08-15 Cambridge Display Tech Ltd Lichtemittierende organische vorrichtungen mit verbesserter kathode
EP0845924B1 (en) 1996-11-29 2003-07-16 Idemitsu Kosan Company Limited Organic electroluminescent device
JPH10270171A (ja) 1997-01-27 1998-10-09 Junji Kido 有機エレクトロルミネッセント素子
JP3266573B2 (ja) 1998-04-08 2002-03-18 出光興産株式会社 有機エレクトロルミネッセンス素子
US6312565B1 (en) * 2000-03-23 2001-11-06 Agere Systems Guardian Corp. Thin film deposition of mixed metal oxides
ATE497028T1 (de) * 2000-06-22 2011-02-15 Panasonic Elec Works Co Ltd Vorrichtung und verfahren zum vakuum-ausdampfen
ITMI20010995A1 (it) 2001-05-15 2002-11-15 Getters Spa Dispensatori di cesio e processo per il loro uso
US6787122B2 (en) * 2001-06-18 2004-09-07 The University Of North Carolina At Chapel Hill Method of making nanotube-based material with enhanced electron field emission properties
US6706445B2 (en) * 2001-10-02 2004-03-16 Valence Technology, Inc. Synthesis of lithiated transition metal titanates for lithium cells
JP2004164992A (ja) 2002-11-13 2004-06-10 Canon Inc 電子注入性電極の製造方法、及び有機エレクトロルミネッセンス素子の製造方法
DE602004029235D1 (de) 2003-01-17 2010-11-04 Hamamatsu Photonics Kk Alkalimetall erzeugendes mittel und dessen verwendung zur herstellung einer photokathode und einer sekundärelektronen emittierenden oberfläche
WO2004066338A1 (ja) 2003-01-17 2004-08-05 Hamamatsu Photonics K.K. アルカリ金属発生剤、アルカリ金属発生器、光電面、二次電子放出面、電子管、光電面の製造方法、二次電子放出面の製造方法及び電子管の製造方法
JPWO2004066337A1 (ja) 2003-01-17 2006-05-18 浜松ホトニクス株式会社 アルカリ金属発生剤、アルカリ金属発生器、光電面、二次電子放出面、電子管、光電面の製造方法、二次電子放出面の製造方法及び電子管の製造方法
JP3938147B2 (ja) * 2003-04-08 2007-06-27 住友金属鉱山株式会社 タンタル酸リチウム基板およびその製造方法
US20060032558A1 (en) * 2004-08-12 2006-02-16 Scott Holloway Titanium aluminide intermetallic composites
ITMI20042279A1 (it) 2004-11-24 2005-02-24 Getters Spa Sistema dispensatore di metalli alcalini in grado di dispensare quantita' elevate di metalli

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3578834A (en) * 1966-12-13 1971-05-18 Getters Spa Generation of alkali metals
CN1516249A (zh) * 2003-01-09 2004-07-28 友达光电股份有限公司 一种薄膜晶体管的制作方法

Also Published As

Publication number Publication date
US20100021623A1 (en) 2010-01-28
WO2006027814A2 (en) 2006-03-16
EP1786946A2 (en) 2007-05-23
WO2006027814A3 (en) 2006-05-18
CN1981066A (zh) 2007-06-13
JP2008512570A (ja) 2008-04-24
KR20070050920A (ko) 2007-05-16
KR101195634B1 (ko) 2012-10-30
HK1105538A1 (zh) 2008-02-15
US7625505B2 (en) 2009-12-01
TW200621638A (en) 2006-07-01
JP4804469B2 (ja) 2011-11-02
EP1786946B1 (en) 2014-02-26
TWI388501B (zh) 2013-03-11
US20080042102A1 (en) 2008-02-21
US7794630B2 (en) 2010-09-14
ITMI20041736A1 (it) 2004-12-10

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