CN100554698C - 真空泵吸系统 - Google Patents
真空泵吸系统 Download PDFInfo
- Publication number
- CN100554698C CN100554698C CNB2004800275687A CN200480027568A CN100554698C CN 100554698 C CN100554698 C CN 100554698C CN B2004800275687 A CNB2004800275687 A CN B2004800275687A CN 200480027568 A CN200480027568 A CN 200480027568A CN 100554698 C CN100554698 C CN 100554698C
- Authority
- CN
- China
- Prior art keywords
- gas
- pump
- flushing
- flushing gas
- air
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04D—NON-POSITIVE-DISPLACEMENT PUMPS
- F04D19/00—Axial-flow pumps
- F04D19/02—Multi-stage pumps
- F04D19/04—Multi-stage pumps specially adapted to the production of a high vacuum, e.g. molecular pumps
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04D—NON-POSITIVE-DISPLACEMENT PUMPS
- F04D17/00—Radial-flow pumps, e.g. centrifugal pumps; Helico-centrifugal pumps
- F04D17/08—Centrifugal pumps
- F04D17/16—Centrifugal pumps for displacing without appreciable compression
- F04D17/168—Pumps specially adapted to produce a vacuum
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J3/00—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification
- F25J3/06—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by partial condensation
- F25J3/063—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by partial condensation characterised by the separated product stream
- F25J3/0685—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by partial condensation characterised by the separated product stream separation of noble gases
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J2205/00—Processes or apparatus using other separation and/or other processing means
- F25J2205/20—Processes or apparatus using other separation and/or other processing means using solidification of components
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J2215/00—Processes characterised by the type or other details of the product stream
- F25J2215/36—Xenon
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Thermal Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Computer Hardware Design (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Compressors, Vaccum Pumps And Other Relevant Systems (AREA)
- Separation By Low-Temperature Treatments (AREA)
- Drying Of Semiconductors (AREA)
Abstract
Description
Xe | Ar | He | N<sub>2</sub> | |
原子序 | 54 | 18 | 2 | 7 |
原子量,amu | 131.29 | 39.948 | 4.003 | 14.01 |
原子半径,pm | 131 | 88 | 49 | 75 |
气体密度(液体密度),kg/m<sup>3</sup> | 5.54,(3057) | 1.784,(1394) | 0.1785,(122) | 1.251,(806.5) |
克分子热容比(γ) | 1.667 | 1.667 | 1.667 | 1.4 |
T<sub>临界</sub>,℃@原子 | 16.6,(8℃@50bar) | (-122℃@50bar) | -267.96 | (-146.9℃@50bar) |
T<sub>沸</sub>,℃ | -108 | -186 | -268.785 | -195.8 |
T<sub>熔</sub>,℃ | -111.7 | -189.3 | -272.05 | -210.1 |
热导率,W/mK | 0.00565 | 0.01772 | 0.14 | 0.02583 |
Claims (34)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/669,775 | 2003-09-24 | ||
US10/669,775 US7094036B2 (en) | 2003-09-24 | 2003-09-24 | Vacuum pumping system |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1856652A CN1856652A (zh) | 2006-11-01 |
CN100554698C true CN100554698C (zh) | 2009-10-28 |
Family
ID=32298507
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB2004800275687A Expired - Fee Related CN100554698C (zh) | 2003-09-24 | 2004-09-16 | 真空泵吸系统 |
Country Status (8)
Country | Link |
---|---|
US (1) | US7094036B2 (zh) |
EP (1) | EP1664544A1 (zh) |
JP (1) | JP5242916B2 (zh) |
KR (1) | KR20070020177A (zh) |
CN (1) | CN100554698C (zh) |
GB (1) | GB0407081D0 (zh) |
TW (1) | TWI367992B (zh) |
WO (1) | WO2005031168A1 (zh) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4633370B2 (ja) * | 2004-02-17 | 2011-02-16 | 財団法人国際科学振興財団 | 真空装置 |
FR2897434B1 (fr) * | 2006-02-15 | 2014-07-11 | Commissariat Energie Atomique | Procede et dispositif de mesure de permeation |
US7616142B1 (en) * | 2006-04-27 | 2009-11-10 | Marvell International Ltd. | Sigma-delta modulated analog-to-digital converter having a changeable coefficient |
US7874141B2 (en) * | 2007-11-16 | 2011-01-25 | General Electric Company | Auxiliary fluid source for an EGR purge system |
US20110179667A1 (en) * | 2009-09-17 | 2011-07-28 | Lee Ron C | Freeze drying system |
WO2013171856A1 (ja) * | 2012-05-16 | 2013-11-21 | 石油資源開発株式会社 | 天然ガスの処理方法及び処理装置 |
JP7011384B2 (ja) * | 2016-11-08 | 2022-02-10 | 株式会社アルバック | 真空処理装置及び希ガス回収装置 |
US10959318B2 (en) * | 2018-01-10 | 2021-03-23 | Kla-Tencor Corporation | X-ray metrology system with broadband laser produced plasma illuminator |
JP7198676B2 (ja) * | 2019-01-21 | 2023-01-04 | 株式会社荏原製作所 | 希ガス回収システムおよび希ガス回収方法 |
WO2024023968A1 (ja) * | 2022-07-27 | 2024-02-01 | ギガフォトン株式会社 | レーザ装置、レーザシステム、及び電子デバイスの製造方法 |
Family Cites Families (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4750925A (en) * | 1986-02-24 | 1988-06-14 | The Boc Group, Inc. | Argon recovery from hydrogen depleted ammonia plant purge gas utilizing a combination of cryogenic and non-cryogenic separating means |
GB8809621D0 (en) * | 1988-04-22 | 1988-05-25 | Boc Group Plc | Dry pump with closed loop filter |
JP2938118B2 (ja) * | 1990-03-20 | 1999-08-23 | 株式会社東芝 | 真空容器内の水素の排気方法とその装置 |
DE4009850C1 (zh) * | 1990-03-27 | 1991-11-07 | Lambda Physik Gesellschaft Zur Herstellung Von Lasern Mbh, 3400 Goettingen, De | |
US5501583A (en) * | 1992-08-19 | 1996-03-26 | Hitachi, Ltd. | Turbo vacuum pump |
JPH08100779A (ja) * | 1994-10-04 | 1996-04-16 | Matsushita Electric Ind Co Ltd | 真空ポンプ |
DE19508566A1 (de) | 1995-03-10 | 1996-09-12 | Balzers Pfeiffer Gmbh | Molekularvakuumpumpe mit Kühlgaseinrichtung und Verfahren zu deren Betrieb |
ES2183091T3 (es) * | 1996-08-27 | 2003-03-16 | Boc Group Inc | Recuperacion de gases nobles. |
JP3553310B2 (ja) * | 1997-03-11 | 2004-08-11 | 株式会社荏原製作所 | 真空排気システム |
JP3794775B2 (ja) | 1997-03-19 | 2006-07-12 | 株式会社大阪真空機器製作所 | 分子ポンプ |
JP3227105B2 (ja) * | 1997-03-24 | 2001-11-12 | 株式会社荏原製作所 | 真空排気システム |
US6815700B2 (en) * | 1997-05-12 | 2004-11-09 | Cymer, Inc. | Plasma focus light source with improved pulse power system |
US6541786B1 (en) * | 1997-05-12 | 2003-04-01 | Cymer, Inc. | Plasma pinch high energy with debris collector |
US6179900B1 (en) * | 1997-10-09 | 2001-01-30 | Gkss Forschungszentrum Geesthacht Gmbh | Process for the separation/recovery of gases |
JP2000081857A (ja) | 1998-09-04 | 2000-03-21 | Canon Inc | 電子源の駆動方法及び装置及び前記電子源を用いた画像形成装置 |
JP2000170680A (ja) * | 1998-09-30 | 2000-06-20 | Aisin Seiki Co Ltd | 真空ポンプ |
JP4303811B2 (ja) * | 1998-11-11 | 2009-07-29 | 大陽日酸株式会社 | 減圧設備における不活性ガスの循環供給方法及び装置 |
JP4769350B2 (ja) * | 2000-09-22 | 2011-09-07 | 大陽日酸株式会社 | 希ガスの回収方法及び装置 |
FR2822200B1 (fr) * | 2001-03-19 | 2003-09-26 | Cit Alcatel | Systeme de pompage pour gaz a faible conductivite thermique |
JP2003062419A (ja) * | 2001-08-28 | 2003-03-04 | Nippon Sanso Corp | ガス混合物の分離方法及びその装置 |
US6770895B2 (en) * | 2002-11-21 | 2004-08-03 | Asml Holding N.V. | Method and apparatus for isolating light source gas from main chamber gas in a lithography tool |
-
2003
- 2003-09-24 US US10/669,775 patent/US7094036B2/en not_active Expired - Fee Related
-
2004
- 2004-03-29 GB GBGB0407081.9A patent/GB0407081D0/en not_active Ceased
- 2004-09-16 KR KR1020067005803A patent/KR20070020177A/ko not_active Application Discontinuation
- 2004-09-16 CN CNB2004800275687A patent/CN100554698C/zh not_active Expired - Fee Related
- 2004-09-16 WO PCT/GB2004/003975 patent/WO2005031168A1/en active Application Filing
- 2004-09-16 JP JP2006527459A patent/JP5242916B2/ja not_active Expired - Fee Related
- 2004-09-16 EP EP04768521A patent/EP1664544A1/en not_active Withdrawn
- 2004-09-24 TW TW093129061A patent/TWI367992B/zh not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
US7094036B2 (en) | 2006-08-22 |
US20050063830A1 (en) | 2005-03-24 |
WO2005031168A1 (en) | 2005-04-07 |
EP1664544A1 (en) | 2006-06-07 |
GB0407081D0 (en) | 2004-05-05 |
TW200525087A (en) | 2005-08-01 |
JP2007507635A (ja) | 2007-03-29 |
KR20070020177A (ko) | 2007-02-20 |
CN1856652A (zh) | 2006-11-01 |
JP5242916B2 (ja) | 2013-07-24 |
TWI367992B (en) | 2012-07-11 |
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Legal Events
Date | Code | Title | Description |
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C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
ASS | Succession or assignment of patent right |
Owner name: BOC GROUP PLC Free format text: FORMER OWNER: THE BOC GROUP PLC Effective date: 20101025 |
|
C41 | Transfer of patent application or patent right or utility model | ||
COR | Change of bibliographic data |
Free format text: CORRECT: ADDRESS; FROM: ENGLAND, UK TO: WEST SUSSEX, UK |
|
TR01 | Transfer of patent right |
Effective date of registration: 20101025 Address after: West Sussex Patentee after: Boc Group PLC Address before: England Patentee before: The Boc Group PlC |
|
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20091028 Termination date: 20160916 |
|
CF01 | Termination of patent right due to non-payment of annual fee |