CN100547755C - Measure the device of wafer film thickness - Google Patents
Measure the device of wafer film thickness Download PDFInfo
- Publication number
- CN100547755C CN100547755C CNB2007100371529A CN200710037152A CN100547755C CN 100547755 C CN100547755 C CN 100547755C CN B2007100371529 A CNB2007100371529 A CN B2007100371529A CN 200710037152 A CN200710037152 A CN 200710037152A CN 100547755 C CN100547755 C CN 100547755C
- Authority
- CN
- China
- Prior art keywords
- filter
- box
- optical element
- light source
- film thickness
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Abstract
Description
Claims (5)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CNB2007100371529A CN100547755C (en) | 2007-02-06 | 2007-02-06 | Measure the device of wafer film thickness |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CNB2007100371529A CN100547755C (en) | 2007-02-06 | 2007-02-06 | Measure the device of wafer film thickness |
Publications (2)
Publication Number | Publication Date |
---|---|
CN101241870A CN101241870A (en) | 2008-08-13 |
CN100547755C true CN100547755C (en) | 2009-10-07 |
Family
ID=39933252
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB2007100371529A Expired - Fee Related CN100547755C (en) | 2007-02-06 | 2007-02-06 | Measure the device of wafer film thickness |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN100547755C (en) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101876528B (en) * | 2010-07-02 | 2012-06-27 | 天津大学 | Electromagnetic sensor-based metal film thickness measuring device and method |
US8830486B2 (en) * | 2011-07-04 | 2014-09-09 | Kla-Tencor Corporation | Atmospheric molecular contamination control with local purging |
CN103424078B (en) * | 2012-05-15 | 2016-03-23 | 无锡华润上华科技有限公司 | Film thickness gauge |
CN103017670B (en) * | 2012-12-13 | 2016-02-17 | 北京航空航天大学 | A kind of coating film on glass quality detecting system based on frustrated total reflection |
CN108572368A (en) * | 2017-03-07 | 2018-09-25 | 台濠科技股份有限公司 | The method for measuring wafer thickness with infrared ray |
CN112535911B (en) * | 2020-08-28 | 2022-10-18 | 深圳中科飞测科技股份有限公司 | Optical device and method for operating the same |
-
2007
- 2007-02-06 CN CNB2007100371529A patent/CN100547755C/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
CN101241870A (en) | 2008-08-13 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN100547755C (en) | Measure the device of wafer film thickness | |
KR101309973B1 (en) | Apparatus and method for environmental monitoring | |
JP6126217B2 (en) | Sensor and method for measuring particles in a medium | |
CN202869961U (en) | Mobile reference light path device for water quality analysis meter | |
George et al. | Measurements of uptake coefficients for heterogeneous loss of HO 2 onto submicron inorganic salt aerosols | |
CN104637234B (en) | Smoke detector certification device and calibration method based on laser light scattering measurement principle | |
JP2012522249A5 (en) | ||
WO2004104552A3 (en) | Apparatus and method for process monitoring | |
KR101026236B1 (en) | A reactor coolant leakage detection system and the method for the same by using the laser induced plasma spectra | |
KR20060039415A (en) | Particle counter | |
CN106092895A (en) | A kind of water body chlorophyll concentration in situ detection device and detection method thereof | |
CN111208043A (en) | System and method for synchronously measuring moisture absorption growth factors of multiple optical parameters of aerosol | |
CN206627433U (en) | A kind of cell rack of ultraviolet specrophotometer | |
CN101726337B (en) | Iodine flow measuring device and application thereof | |
CN109975222A (en) | Full spectral water quality detection is calibrated automatically and window cleaning reminder system | |
CN114324166A (en) | Self-cleaning fine spectrum water body parameter measuring device and method based on turbidity correction | |
KR20140125167A (en) | monitoring device for clean room | |
CN105021779A (en) | Small-sized air quality monitoring device and method for detecting air quality through small-sized air quality monitoring device | |
CN207601001U (en) | A kind of intelligence reverse-flow type oil smoke concentration on-line monitoring instrument | |
CN202757591U (en) | Measurement system of layer thickness of polybase photoelectric cathodic coating | |
JP5181299B2 (en) | Material evaluation method | |
JP2012173022A (en) | Gas cell | |
CN207096045U (en) | A kind of band makes the laser dust apparatus for measuring concentration of device for mark by oneself | |
JP2010019607A (en) | Method and apparatus for forming calibrating standard sample, laser induced plasma spectral analyzing method and laser induced plasma spectral analyzer | |
JP4566032B2 (en) | measuring device |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
ASS | Succession or assignment of patent right |
Owner name: SEMICONDUCTOR MANUFACTURING INTERNATIONAL (BEIJING |
|
C41 | Transfer of patent application or patent right or utility model | ||
TR01 | Transfer of patent right |
Effective date of registration: 20111117 Address after: 201203 No. 18 Zhangjiang Road, Shanghai Co-patentee after: Semiconductor Manufacturing International (Beijing) Corporation Patentee after: Semiconductor Manufacturing International (Shanghai) Corporation Address before: 201203 No. 18 Zhangjiang Road, Shanghai Patentee before: Semiconductor Manufacturing International (Shanghai) Corporation |
|
CF01 | Termination of patent right due to non-payment of annual fee | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20091007 Termination date: 20190206 |