CN100541326C - The impression manufacture method and the device thereof of Nano grade figure - Google Patents
The impression manufacture method and the device thereof of Nano grade figure Download PDFInfo
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- CN100541326C CN100541326C CNB2004101039024A CN200410103902A CN100541326C CN 100541326 C CN100541326 C CN 100541326C CN B2004101039024 A CNB2004101039024 A CN B2004101039024A CN 200410103902 A CN200410103902 A CN 200410103902A CN 100541326 C CN100541326 C CN 100541326C
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Abstract
A kind of impression manufacture method of Nano grade figure is characterized in that utilizing the mode of sucker absorption to improve masterplate and waits to impress the hardness of thing, and pressure distribution is even when utilizing the precompressed of sucker to make impression simultaneously.Being installed masterplate and when waiting to impress thing, can utilize optical sensor that masterplate and thing to be impressed are aimed at.The device of using the inventive method comprises assurance vacuum cup surface opposing parallel and single direction controlled motion up and down, makes masterplate impress the relative controlled motion of thing with waiting, guarantees that its pressure evenly prevents the motion assurance controllable components of figure dislocation distortion; Rotary torque can be become the mutual pressure of absorbent module, but and the pressure control assembly of constant voltage; May command heating-up temperature and adiabatic temperature-controlling module; Adsorbable masterplate and thing to be impressed, and can change the absorbent module of suitable shape as required.The present invention can make equipment cost reduce, and is reliable and practical, and easy to operate.
Description
Technical field
The present invention relates to a kind of impression manufacture method and device thereof, particularly preparation has figure impression manufacture method and the device thereof that ultrahigh resolution and characteristic dimension are Nano grade.
Background technology
Since the sixties in 20th century, integrated circuit is brought in constant renewal in by the mole law always and is regenerated, and transistor size integrated in the promptly single chip doubled in per 18 months.Along with constantly diminishing of device size in the circuit, the conventional optical lithography technology will be near physics limit.Used ultraviolet wavelength is about 250nm in the popular now photoetching process, wants to make half the much smaller graphic structure than this yardstick, and diffraction effect will make the each several part feature of figure mix and be smudgy.Be used for making the optical lithographic tools of live width less than 100nm, every cost up to tens million of to multi-billion dollar.Live width is that the complicated microelectronic structure of 70nm creates, but this manufacture method expense is very expensive.
The nanoimprinting technology that United States Patent (USP) 5772905 proposes i.e. " nano impression manufacture method " (Nano-imprint Lithography, be NIL), have simple to operate, resolution is high, good reproducibility, time-consuming less, cost is extremely low, the advantage that can repeat to prepare the nano graph structure in enormous quantities.This method is by the masterplate of the microtexture with nanoscale on-chip photoresist (being also referred to as resist layer) to be exerted pressure, thereby on this photoresist fine pattern is set.Have fine pattern masterplate preparation normally on the substrate spin coating one deck utilize the e-beam direct-writing exposure technology at the required figure of its surface etch again to the polymkeric substance (as PMMA) of electron beam sensitive, its present highest resolution can reach 1～5nm.The nano impression manufacture method requires that to the base material of masterplate enough hardness is arranged, and makes it at pressing mold with remove in the process of mould and be not easy distortion and impaired.
The hot padding course of work is shown in Fig. 4 a in the existing nano impression manufacture method, before impression, with masterplate 1, (material is Si, SiO usually to wait to impress thing photoresist 2 and substrate 3
2, metal etc.) horizontal positioned, vertical up and down.There is the microtexture of Nano grade characteristic dimension on masterplate 1 surface.Photoresist 2 is conventional lithography glue PMMA (polymethyl methacrylate) in the hot padding, evenly is spin-coated on the substrate 3 before the impression.Shown in Fig. 4 b, during heating and pressurizing, masterplate 1, wait to impress thing photoresist 2 and substrate 3 will be heated and pressurization up and down, detailed process is for being heated to photoresist 2 more than the glass transformation temperature (Tg) earlier, the transfer graphic that pressurizeed again under its state that is softened, transfer printing finish the back cooling curing.Shown in Fig. 4 c, when the demoulding separates, be covered on the photoresist layer 2 on the substrate 3 and formed convex and concave patterns, and corresponding mutually with the pattern of masterplate; Masterplate with wait that impressing thing separates at relative up and down single direction, and can not take place about both when separating and the figure that causes that rotatablely moves damages.The bottom surface that the pattern of photoresist layer 2 is recessed and substrate 3 also has the film of the thickness of 40～50nm, also can adopt oxidation reaction ion etching (Reactive Ion Etching) to wait this film removal usually.
The pressure of above-mentioned method for stamping generally can be at 40～100bar, and pressure distribution is broad in the middle, and then force of impression is little near masterplate edge; When stencil area is big more, guarantee that pressure is evenly just difficult more.Thereby easily because the inhomogeneous reticle deformation that causes of pressure makes the imprinted pattern distortion, the pattern distribution lack of homogeneity; When masterplate is hard brittle material (for example silicon wafer, glass), when the inhomogeneous of pressure is easy to make its generation to break.The following way of main at present employing solves this type of problem:
1, reticle substrate is selected the material of high rigidity or the surface is handled to strengthen skin hardness.Situation is easy to take place but hard brittle material breaks when pressure is uneven, and way can be turned over the electroforming of silicon wafer masterplate and be made the nickel mould usually, utilizes nickel masterplate coining pattern again.But the electroforming process is an electrochemical reaction, needs a lot of each heavy metal species electroforming acid solution, various additives (for example stress remover, washing agent, wetting agent etc.), and these chemical solutions use the back to be difficult for handling, not only expensive the but also easy contaminated environment of expense.The defective of electroforming own is many, and is evenly poor etc. as duplicating efficiency, pin hole, warpage, surface accuracy, thickness.
2, improve the homogeneity of pressure by improvement to pressuring method.Roller bearing type nano impression mode shown in Fig. 5 a manufactures the roller bearing shape with masterplate 101 exactly, and fine pattern is distributed on the roller bearing.By roll extrusion, on the photoresist on the substrate 32, impress out figure.But to contact with photoresist 2 be a line to masterplate 101 in the roll extrusion, although improved line evenly bring the impression of whole face restive.Be installed respectively masterplate 1 and wait to impress thing photoresist 2 and substrate 3 of cushion pad method shown in Fig. 5 b, last impression dish 102 and following impression dish 103.Employing is pad last layer cushion pad 104 (being generally silica gel plate (Silicone Rubber)) in the middle of masterplate 1 and last impression dish 102, make masterplate 1 and wait to impress that thing relaxes and the influence of equalized pressure in impression, reach uniform moulding.Yet silica gel plate is upheld distortion easily, and is subject to the extension characteristic of solid-state material itself, and force of impression can't reach desirable equally distributed state.Especially at the cooling packing stage, it is uneven that the pressure inequality then can cause silica gel to shrink, and has a strong impact on size after the transcription of finished product microstructure.
Fig. 5 c is the Chinese patent application number 02131969.3 gas subfebrile temperature in pression shaping method that proposes, employing is covered one deck and is had elastic sealing film 105 (as plastics) on masterplate 1, compress a metal cap 107 and diaphragm seal up and constitute densification chamber of holding one's breath, pressurize inwards by high-pressure air source 106, because the isobaric distribution character of gas molecule, diaphragm seal promote masterplate and evenly press down.But the masterplate 1 in this method can't be fixed in impression, thereby masterplate 1 and wait to impress the influence that location between the thing substrate 3 is easy to be subjected to diaphragm seal, also needs additive method auxiliary.
The overlay alignment of multi-layer graphical (alignment) is exactly to carry out multi-impression on substrate in the nanometer embossing, this just require substrate and masterplate when each impression up and down parallel and relative position all can control.Adopt at present usually optical alignment, the be up to the standard alignment precision 100nm rank of direction of high energy.The material deformation that caused by temperature variation, pressure inequality and size variation, graphics area influences, and also can influence alignment precision, and for example current 4 inches masterplate alignment precisions reach 1 micron level.And adopt different impression modes also can influence bigger to the precision of overlay alignment, three kinds of modes as shown in Figure 5, be easy to during roller bearing type nano impression mode impresses to cause masterplate move unbalance stress influence alignment precision, gas subfebrile temperature in pression shaping method at the middle and upper levels the diaphragm seal that covers of masterplate influence the optical lens observation, cause equipment complicated and alignment precision is not high, the silica gel plate material deformation will influence alignment precision in the cushion pad method.
Summary of the invention
The purpose of this invention is to provide a kind of nano-imprinting method and imprinting apparatus that makes impression pressure evenly distribute, can be used for overlay alignment, equipment cost is reduced, reliable and practical, and easy to operate.
The present invention is by the following technical solutions:
The present invention adopts the sucker suction type with masterplate with wait to impress thing and be installed on up and down two sucker absorption surfaces respectively, makes masterplate and last sucker, waits to impress thing and following sucker forms one respectively.Pressure evenly distributes when promptly strengthening masterplate and waiting to impress thing hardness helping impressing by the hardness of sucker.Sucker adopts high rigidity materials such as stainless steel, and absorption surface is smooth, has annular groove, makes adsorbable masterplate of sucker and thing to be impressed by extracting the groove vacuum.Before impression, elder generation's precompressed is vacuum cup up and down, and pressure reaches impression pressure 40～100bar mutually up and down, and its absorption surface is contacted fully, because up and down vacuum cup is high hardness material and surface of contact and be subjected to force direction vertical, show that at this moment absorption surface is parallel and pressure distribution is even.Then, it is locked to descend vacuum cup and stand to tighten by circumferential four the uniform bolts hole of following vacuum cup with bolt, will go up vacuum cup and tighten locked with the spline guide pole that its sleeve is nested with bolt by four bolts hole that last vacuum cup circular sleeve is circumferentially uniform.Guarantee that by motion controllable components guarantees spline guide pole unidirectional motion up and down, and go up the locked spline guide pole lower tip that is fixed on of vacuum cup, following vacuum cup is fixed on the stand and does not move.Thereby the spline guide pole drive to go up vacuum cup unidirectional motion up and down, finally makes up and down vacuum cup unidirectional motion relatively up and down.At last, vacuum cup is lifted descend relatively vacuum cup to separate certain distance, is generally 1～2cm, be installed masterplate and wait to impress thing after begin impression.
Vacuum cup can change suitable shape as required up and down, thereby can impress the material of difformity and size.Owing to can adjust before the impression and guarantee that pressure evenly distributes, therefore can directly impress silicon wafer, need not again silicon wafer to be turned over to make metal matrix, can simplify job operation and reduce cost.
After the sucker precompressed finishes up and down, lift be installed behind sucker 1～2cm masterplate and thing to be impressed, just can aim at masterplate and thing to be impressed by optical sensor this moment.Concrete grammar is as follows: can pass through fixedly masterplate of absorption earlier, manual again or aid moves thing to be impressed, and observes by optical sensor and aims at, and just adsorbable thing fixedly to be impressed after aligning finishes begins impression at last.Alignment methods also can be adsorbed thing fixedly to be impressed earlier, aims at by mobile masterplate, or passes through the aligning of replacer self, realizes masterplate and the aligning of waiting to impress thing.
Use the device of Nano grade figure impression manufacture method of the present invention, guarantee that by pressure control assembly, motion controllable components, temperature-controlling module and absorbent module constitute.Pressure control assembly is positioned at the middle and upper part of the pressure guide cylinder that is installed on the stand back up pad, and motion guarantees that Control Component is installed in pressure guide cylinder bottom by the spline guide cylinder.Vacuum cup guarantees that with motion the spline guide pole of controllable components is connected on the absorbent module, and following vacuum cup is connected with stand base upper backup pad.Temperature-controlling module is positioned at the below of the following vacuum cup part of absorbent module, and wherein the heating arrangement upper surface closely contacts with following vacuum cup lower surface.
Pressure control assembly comprises organization of stres and pressure response agency.Organization of stres is by pressure threaded rod, pressure guide cylinder, the pressure threaded rod is installed in pressure guide cylinder top, employing is threaded, thereby the rotary torque that utilizes the feed screw nut principle will act on the pressure threaded rod becomes downward pressure, and can make constant pressure.The pressure response agency mainly comprises pressure spring, and pressure spring is enclosed between the spring washer and spline guide cylinder that reaches between spline guide pole and the pressure guide cylinder below the pressure threaded rod; Utilize the restoring force of pressure spring, produce bigger withdrawing pattern power and vacuum cup is moved upward.The present invention is applied to by measurement that torque calculates the pressure size that is delivered on the spring washer on the pressure threaded rod, deducts spring then from the elastic force in compression process, just can obtain true force of impression, promptly is applied to the pressure on the masterplate.When impressing usually, the force of impression pressure on the control masterplate is controlled at 40～100bar, and its reduction formula is as follows:
Fb (true force of impression)=Fn (goes through torque conversion pressure)-Ft (spring force)
Ft (spring force)=k (spring constant) * L (length of spring compressed length)
Pb (masterplate force of impression pressure)=Fb (true force of impression)/S (stencil area)
Motion guarantees that controllable components is to guarantee unidirectional motion controllable device up and down, comprising: be installed in the spline guide cylinder of pressure guide cylinder bottom, spline guide pole and its composition single direction controlled motion mechanism that spline connects.Because the spline guide pole is subjected to the dual restriction of spline guide cylinder and upper end spring stop piece, as take modes such as interference fit, can finally guarantee sucker (or single direction) controlled motion relatively vertically, especially prevent in the knockout course about and the figure that causes of rotatablely moving damage; Last vacuum cup top is a circular sleeve that certain altitude is arranged, the bottom of this sleeve and its top spline guide pole is nested, circumferentially be evenly equipped with four bolts hole at circular sleeve, by circumferential four uniform bolts hole at an upper portion thereof, with four bolts it is connected with spline guide pole bottom, can adjust the orientation that is installed in spline guide pole bottom as required, form sucker levelling mechanism, can guarantee vacuum cup surface opposing parallel and single direction controlled motion up and down.
Temperature-controlling module comprises heating arrangement, temperature control equipment and heat-proof device.Heating arrangement is positioned at down vacuum cup bottom, adopt the hot plate heating make temperature evenly, heating rapidly.Temperature control equipment adopts electron temperature-control to make heating thing temperature be controlled at required scope, and precision reaches requirement.The effect of heat-proof device is too high for preventing the local temperature that stand etc. need not to heat in heating process.The employing air is heat insulation when vacuum cup is connected with other devices up and down, thermal insulation material is heat insulation, prevents that peripheral temperature is overheated in the present invention.
Absorbent module comprises vacuum cup and following vacuum cup.Last vacuum cup is looked squarely the shape as " ⊥ ", top be a circular sleeve that certain altitude arranged and circular sleeve circumferentially be evenly equipped with four bolts hole, the bottom is for there being certain thickness flat board; Following vacuum cup is one certain thickness flat board to be arranged, and it is uniform four bolts hole circumferentially.The manufacturing materials of sucker is high rigidity materials such as stainless steel, and absorption surface is smooth, has the groove in order to vacuumize.Common 1 millimeters deep of groove 1 mm wide, a plurality of annular grooves distribute with concentric manner, size according to required absorption affinity decides annular groove quantity, and then with the groove of direction in length and breadth annular groove is communicated, like this groove and masterplate or wait to impress thing and constitute confined space.Open an air-breathing circular hole in the sucker side and communicate with confined space, but the air that extracts confined space from this air-breathing circular hole just adsorbed close live masterplate or thing to be impressed.Masterplate with wait to impress thing contacting and detachment process in moulding process, to guarantee that all it closely is connected with chuck surface up and down.
Because the client need impress the materials of different sizes, for guaranteeing impression respond well (as problems such as pressure are even), can change the size of vacuum cup self and can change suitable shape as required, thereby can impress the material of difformity and size.
In the moulding process, key is a masterplate and wait to impress the thing surface and want opposing parallel and single direction controlled motion up and down, and then show as up and down the vacuum cup surface and want opposing parallel and single direction controlled motion up and down, but because process conditions such as machine work assembling are limit, be difficult to guarantee its opposing parallel, the present invention adopts motion to guarantee that controllable components guarantees its opposing parallel of moulding process.Motion guarantees that controllable components adopts the mechanical arm wage adjustment flat.Before the impression, last vacuum cup and spline guide pole adopt and flexibly connect, and promptly coupling bolt unclamps, and vacuum cup closely contacted about pressurization made then; Use four circumferential uniform screws of sleeve that the vacuum cup adsorption plane is connected with the spline guide pole this moment with it and the spline guide pole is locked is rigidly connected.Cancel pressure then and lift vacuum cup, on vacuum cup up and down, be installed and treat impression formboard and thing to be impressed, this moment just can by control temperature-controlling module carry out heating and pressurizing begin the impression, and masterplate with wait to impress the parallel and single direction controlled motion of thing.
Description of drawings
Fig. 1 a, b, c, d are the impression manufacture method principle schematic of Nano grade figure of the present invention.Picture in picture 1a is vacuum cup precompressed leveling up and down, and Fig. 1 b is masterplate and the thing to be impressed of being installed, and Fig. 1 c is a heating and pressurizing, and Fig. 1 d is that the demoulding separates.Among the figure: 1 masterplate, 2 photoresists, 3 substrates, vacuum cup on 17,18 times vacuum cups;
Fig. 2 is the cross-sectional view of the imprinting apparatus of Nano grade figure of the present invention.Among the figure: 4 times vacuum cup heat-barrier materials, 5 stand support columns, 6 stand back up pads, 7 is stand pressure guide cylinder, 8 is the pressure threaded rod, and 9 is torque arm, 10 stand base upper backup pads, 11 spring stop pieces, 12 pressure springs, 13 spline guide cylinder, 14 spline guide poles, 15 stand base support plates, vacuum cup on 17,18 times vacuum cups, 19 heating arrangements, 20 stand base lower supporting plates;
Fig. 3 is vacuum cup top and spline guide pole connected mode synoptic diagram in the present invention.Among the figure: 14 spline guide poles, vacuum cup heat-barrier material on 16, vacuum cup on 17,301 bolts hole, 302 air-breathing circular holes, 303 grooves;
Fig. 4 a, b, c are existing nano imprint lithography principle schematic.Picture in picture 4a masterplate and wait to impress the mutual alignment relation of thing when not impressing, Fig. 4 b masterplate and wait to impress the mutual alignment relation of thing during for impression, masterplate and wait to impress the mutual alignment relation of thing when Fig. 4 c finishes for impression.Among the figure: 1 masterplate, 2 photoresists, 3 substrates;
Fig. 5 a, b, c are different method for stamping figure.Picture in picture 5a is a roller bearing type nano impression mode, and Fig. 5 b is the cushion pad method, and Fig. 5 c is the gas subfebrile temperature in pression shaping method.Among the figure: 1 masterplate, 2 photoresists, 3 substrates, 101 masterplates, impression dish on 102,103 times impression dishes, 104 cushion pads, 105 elastic sealing film, 106 high-pressure air source, 107 metal caps.
Embodiment
The present invention is described in detail below in conjunction with the drawings and specific embodiments.
The impression manufacture method principle schematic of Fig. 1 a, b, c, d Nano grade figure of the present invention.As shown in Figure 1a, before impression, carry out up and down vacuum cup precompressed earlier, its absorption surface is contacted fully, because vacuum cup is high hardness material and surface of contact and be subjected to force direction vertical up and down, show that this moment absorption surface is parallel and pressure distribution is even, locked then relevant connection mechanism.It is locked to descend vacuum cup 18 and stand base upper backup pad 10 to tighten by four circumferentially uniform bolts hole of following vacuum cup 18 with bolt, will go up vacuum cup 17 and tighten locked with the spline guide pole 14 that its sleeve is nested by circumferential uniform four bolts hole, the 301 usefulness bolts of last vacuum cup 17 upper circular sleeves.
Shown in Fig. 1 b, the masterplate 1 that is installed, thing to be impressed---photoresist 2 and substrate 3 utilize optical sensor to masterplate 1 with wait to impress thing 2,3 and aim at.Adopt the mode of sucker absorption, can increase masterplate 1 and wait to impress thing hardness, improve impression pressure distribution homogeneity.Guarantee that by motion controllable components guarantees spline guide pole unidirectional motion 14 about, and on vacuum cup 17 locked spline guide pole 14 lower tip that are fixed on, following vacuum cup 18 is fixed on the stand and does not move.Thereby spline guide pole 14 drives and goes up the unidirectional motion of vacuum cup 17 about, finally make up and down vacuum cup can be relatively about unidirectional motion.At last, vacuum cup 17 is lifted descend vacuum cup 18 to separate certain distance relatively, be generally 1～2cm, masterplate and thing to be impressed are installed.
Shown in Fig. 1 c, during heating and pressurizing, masterplate 1, thing to be impressed: photoresist 2 and substrate 3 will be heated and pressurization up and down, and wherein temperature and pressure will be controlled as required, for example to guarantee the temperature homogeneous heating and can be constant, pressure is big and can be constant.
Shown in Fig. 1 d, when the demoulding separated, masterplate 1 and thing to be impressed: the relative up and down single direction with substrate 3 of photoresist 2 separated.And the figure damage that can not take place about both when separating and rotatablely move and cause.
Be illustrated in figure 2 as the cross-sectional view of the imprinting apparatus of Nano grade figure of the present invention.In Fig. 2, stand base lower supporting plate 20 is square iron plate, is positioned at bottom of device, by about two settings stand base support plate 15 support stand base upper backup pads 10 thereon.Stand base upper backup pad 10 is shaped as square, and the center is a circular hole.Three stand support columns 5 circumferentially are distributed on around stand base upper backup pad 10 centers, and the porose stand back up pad 6 of circular central is installed on three stand support columns 5.Stand back up pad 6, stand support column 5, stand base upper backup pad 10, stand base lower supporting plate 20, stand base support plate 15 connect by bolt, constitute the nanometer stamping and photoetching machine stand, play fastening.Stand pressure guide cylinder 7 is mounted in the circular hole of stand back up pad 6 centres by bolt, and vacuum cup 18 is mounted in stand base upper backup pad 10 center holes by bolt down.
As shown in Figure 2, pressure control assembly is positioned at device top, comprises pressure threaded rod 8, torque arm 9, pressure spring 12.Pressure threaded rod 8 is installed in the top of stand pressure guide cylinder 7, adopts with pressure guide cylinder 7 to be threaded.Torque arm 9 passes the circular hole on stand pressure guide cylinder 7 tops, utilizes the feed screw nut principle to rotate torque arm 9 and drives pressure threaded rod 8, makes rotary torque become downward pressure.Pressure spring 12 is enclosed between spline guide pole 14 and the pressure guide cylinder 7 and reaches between the spring washer 11 and spline guide cylinder 13 on pressure threaded rod 8 tops.When pressure spring 12 pressurizeds are replied, promote spring washer 11 and move upward, drive spline guide pole 14 then and move upward and produce bigger withdrawing pattern power, thus the decomposition pressure response agency.But by measuring torque calculating pressure size on the torque arm 9.
Motion guarantees that controllable components is that single above-below direction motion guarantees controllable device, is positioned at the pressure control assembly bottom, comprises spline guide cylinder 13.Spline guide cylinder 13 is mounted on pressure guide cylinder 7 positive bottoms by bolt, and the spline guide pole 14 that is connected with its spline can only move up and down in spline guide cylinder 13, thereby forms single direction controlled motion mechanism.Can finally guarantee sucker (or single direction) controlled motion relatively vertically, especially can prevent in the knockout course about and the figure that causes of rotatablely moving damage.Last vacuum cup 17 is looked squarely the shape as " ⊥ ", top is a circular sleeve that certain altitude is arranged, the bottom of this sleeve and its top spline guide pole 14 is nested, circumferentially be evenly equipped with four bolts hole at circular sleeve, be furnished with four clamping screws, four bolts are connected it with spline guide pole 14 bottoms.Can adjust the orientation that is installed in spline guide pole 14 bottoms as required, thereby form sucker levelling mechanism, can guarantee the opposing parallel and the single direction controlled motion on vacuum cup surface up and down.
Temperature-controlling module comprises heating arrangement 19 between stand base upper backup pad 10 and stand base lower supporting plate 20, last vacuum cup heat-barrier material 16 and following vacuum cup heat-barrier material 4.Heating arrangement 19 be positioned at following vacuum cup 18 under, closely contact with vacuum cup 18 surfaces, adopt the hot plate heating make temperature evenly, heat rapid.Following vacuum cup heat-barrier material 4 is a metallic gasket, is placed on down between the bolt of vacuum cup 18 and stand, and vacuum cup 18 and stand base upper backup pad 10 are isolated, and can prevent that heat is diffused into the stand bottom from following vacuum cup 18.Between last vacuum cup 17 and spline guide pole 14, be placed with heat-barrier material 16, anti-to thermal diffusion to spline guide pole 17 top stands.
Absorbent module comprises between spline guide pole 14 and stand base upper backup pad 10: with spline guide pole 14 bottoms by bolted go up vacuum cup 17, with stand base upper backup pad 10 bolted vacuum cups 18 down.Masterplate with wait to impress thing contact separation process in moulding process, must guarantee that itself and vacuum cup up and down are surperficial closely to be connected.The present invention adopts vacuum suction.Vacuum cup also can change suitable shape as required, so that the material of impression difformity and size.
Hand rotation torque arm 9 makes 8 rotations of pressure threaded rod, according to the feed screw nut principle, by stand pressure guide cylinder 7 rotary torque is become downward pressure.Spring stop piece 11 is subjected to downward pressure, and compression pressure spring 12 drives spline guide pole 14 by spline guide cylinder 13 motion together downwards.Spline guide pole 14 adopts active the connection with last vacuum cup 17 by last vacuum cup heat-barrier material 16, locked bolt, descends vacuum cup 18 also to be connected by following vacuum cup heat-barrier material 4 with stand equally.When impression, last vacuum cup 17, following vacuum cup 18 adsorb masterplate and thing to be impressed respectively.Heating arrangement 19 can be monitored masterplate and impression materials temperature in real time according to impression condition demand.So last vacuum cup 17 just can interact with following vacuum cup 18 and push masterplate and impression materials under the pressure effect of spline guide pole 14.When impression finishes,, the downward pressure that is added in spring stop piece 11 is withdrawn from 8 rotations of pressure threaded rod by hand rotation torque arm 9.Under the spring restoring force effect of pressure spring 12, drive spline guide pole 14 by spring stop piece 11 and move upward simultaneously, vacuum cup 17, following vacuum cup 18 are moved up and down relatively, masterplate is separated with thing to be impressed.
The present invention adopts manual mode, and utilization feed screw nut principle is downward pressure with torque conversion, and the position is automatically locked can utilize this principle to make impression the time, thereby it is constant to keep-up pressure.And when cancelling pressure, can make vacuum cup 17 reply original position, and in the bigger withdrawing pattern power of demoulding moment generation by the restoring force of pressure spring 12.
The present invention is according to nanometer hot padding principle, guarantee masterplate and wait that impressing thing wants keeping parallelism and relative motion to want strict guarantee relative vertically (or single direction) controlled motion at moulding process, especially prevent in knockout course about and the figure damage that rotatablely moves and cause.Concrete measure is connected with the spline of spline guide cylinder 13 by the spline guide pole 14 on last vacuum cup 17 tops, thereby guarantees that spline guide pole 14 has only the single direction controlled motion, about preventing and rotatablely move.
Fig. 3 is vacuum cup top and spline guide pole connected mode synoptic diagram in the present invention.Last vacuum cup 17 is looked squarely the shape as " ⊥ ", top be a circular sleeve that certain altitude arranged and circular sleeve circumferentially be evenly equipped with four bolts hole 301, the bottom is for there being certain thickness flat board.Absorption surface is smooth, has the groove 303 in order to vacuumize, and the sucker side is left an air-breathing circular hole 302 and communicated with groove 303.As shown in Figure 3, before the impression, last vacuum cup 17 flexibly connects with spline guide pole 14, and vacuum cup closely contacted about pressurization made then; Use locked bolt on the vacuum cup 17 this moment by equally distributed four bolts hole 301 around its top, with itself and spline guide pole 14 locked being rigidly connected.Cancel pressure then and lift vacuum cup 17, be installed masterplate 1 with wait to impress thing 2,3, just can heating and pressurizing begin impression this moment, and the parallel and single direction controlled motion of vacuum cup up and down.Last vacuum cup heat-barrier material 16 is materials such as organism, can prevent that heat is diffused into stand top from last vacuum 17 suckers, because last vacuum cup heat-barrier material 16 itself has certain elasticity, can play elasticity connection effect when levelling, the levelling of being more convenient for simultaneously.
In the present invention, the impression mode is from top to bottom, and the pressure mechanism of generation pressure can be used for impression mode from bottom to top fully, and these need get final product device inversion installation.Manual pressure also can be changed into mechanical electronic pressurization.
In the present invention, for guaranteeing masterplate 1 and waiting that impressing thing 2,3 wants keeping parallelism and relative motion to want strict guarantee relative vertically (or single direction) controlled motion at moulding process, used spline guide pole 14 to be connected with the spline of spline guide cylinder 13, on this basis, can guarantee the precision that leads by the quantity that changes spline, perhaps guiding accuracy is controlled in the gap of regulating between spline guide pole 14 and the spline guide cylinder 13 by bolt.
In the present invention, vacuum cup 17,18 up and down, adopt the vacuum suction mode to adsorb masterplate and thing to be impressed, and heating simultaneously also is to pass through vacuum cup 17,18 up and down indirectly.And the function of vacuum cup 17,18 also can be expanded on this basis up and down, and for example it can change suitable shape as required, thereby can impress the material of difformity and size.
Using the method for stamping and the device of Nano grade figure of the present invention tests.This experiment has improved masterplate 1 by area vacuum sucker suction type and has waited to impress the hardness of thing substrate 2, photoresist 3, and pressure distribution is even when utilizing the precompressed of sucker to make impression simultaneously.Be installed masterplate 1 and waited to impress thing at 2,3 o'clock, with optical sensor masterplate 1 and thing to be impressed waited to impress thing 2,3 and aim at.By heating photoresist 2 is heated to more than the glass transformation temperature (Tg) at last, under its state that is softened, is pressurizeed again.Adding the pressure handle fine pattern by the masterplate 1 to micro concavo-convex pattern with Nano grade is transferred on the photoresist 2 on the substrate 3.Concrete operation method is as follows:
At first will go up vacuum cup 17 and 14 flexible connections of spline guide pole, vacuum cup and 10 flexible connections of stand base upper backup pad down, and promptly earlier not tighten coupling bolt, vacuum cup 17,18 still can be slightly mobile up and down about making.During the beginning precompressed, manual rotary torsion bar 9, thus rotation pressure threaded rod 8 makes rotary torque become downward pressure.Promoting spline guide pole 14 by spring stop piece 11 again moves downward.Finally make up and down vacuum cup 17,18 absorption surfaces contact, the pressure limit 40～100bar when pressure rises to actual impression mutually, this pressure can come out by the torque arithmetic that is applied on the pressure threaded rod 8.This moment is because absorption surface contacts fully, and vacuum cup is high hardness material and surface of contact and be subjected to force direction vertical up and down, shows that at this moment absorption surface is parallel and pressure distribution is even.Locked then relevant connection mechanism, tighten down vacuum cup 18 circumferential four uniform bolts, to descend vacuum cup 18 and stand locked, tighten vacuum cup 17 upper circular sleeves circumferentially four uniform bolts will to go up vacuum cup locked with the spline guide pole 14 that is nested with its sleeve.At last, rotate torque arm 9, promote spring washer 11 when pressure spring 12 pressurizeds are replied and move upward, go up vacuum cup and lift and descend vacuum cup separation certain distance relatively, be generally 1～2cm thereby drive.
With masterplate 1 and wait to impress thing photoresist 2, substrate 3 is installed on two vacuum cup 17,18 absorption surfaces up and down respectively, make vacuum cup 17 absorption masterplates 1, following vacuum cup 18 absorption wait to impress thing photoresist 2, substrate 3, last vacuum cup 17 and absorption masterplate 1, following vacuum cup 18 forms one respectively with seal thing photoresist 2, substrate 3.
Be installed masterplate 1 and when waiting to impress thing photoresist 2, substrate 3, by optical sensor to masterplate 1 with wait to impress thing 2,3 and aim at.Concrete grammar is as follows: use fixedly masterplate 1 of vacuum cup 17 absorption earlier, manual again or aid moves waits to impress thing 1,3, observes by optical sensor and aims at, and its highest level alignment precision is at 100nm.At last thing to be impressed is absorbed and fixed at down on the vacuum cup 18.
During heating and pressurizing, masterplate 1 is displaced downwardly to contact earlier and is convenient to conduct heat with photoresist 2, but this moment between the two pressure be zero.Heating arrangement 19 usefulness hot plates heating vacuum cup 18 down then, thus make masterplate 1, photoresist 2, substrate 3 heating rapidly, temperature-controlling module adopts electron temperature-control to make heating thing temperature be controlled at required scope, and precision reaches 1 ℃ of requirement.The most at last photoresist PMMA be heated to its glass transition temperature more than 105 ℃ at 190～200 ℃, make photoresist have good flowability.Begin pressurization then, make masterplate and the pressure waiting to impress between thing reaches between 40～100bar.Can make constant pressure by organization of stres, making material is in the microtexture of the photoresist 2 of the polymer P MMA glue nanoscale that is penetrated into masterplate 1.
Transfer graphic is reduced to 80 ℃ with the temperature of masterplate 1, photoresist 2, substrate 3 after finishing.Eliminate pressure then gradually, making masterplate 1 and photoresist 2 pressure is zero.Because the return action of pressure spring 12, and masterplate 1 and substrate 3 adsorbs respectively up and down on the vacuum cup 17,18, produce bigger withdrawing pattern power under the return action of pressure spring, thus separation masterplate 1, photoresist 2.
In this experiment, masterplate 1 is the quartz glass plate of length and width 2.5 inch thickness 3mm, plating thickness in its surface is the 140nm Metal Cr, and with electron beam lithography required pattern, this pattern is that height 140nm, minimum feature are that the glass surface protrusion of 200nm is the fine pattern of Cr on the Cr layer.The material of substrate 2 is chosen as the circular silicon chip of thick 1mm, 2 inches diameter, and spin coating photoresist 2 is the conventional lithography glue of PMMA in its surface, and photoresist 2 thickness are 2 μ m.
Utilize method of the present invention, the hard brittle material situation of breaking when pressure is uneven will reduce in a large number.
Adopt the imprinting apparatus of Nano grade figure of the present invention can realize the figure transfer that characteristic dimension 10nm is following, can form fine pattern and a large amount of production, also can satisfy the scientific research personnel's of research nanostructured and device demand.Apparatus of the present invention are cheap for manufacturing cost, only are one of percentage of the logical electron beam litho machine price of a Daepori.The present invention can be used for preparing various nano electron devices, optical device, storer, nanometer fluid passage, biochip etc.
Claims (6)
1, a kind of impression manufacture method of Nano grade figure, it is characterized in that: adopt area vacuum sucker suction type that masterplate [1] and thing to be impressed [2,3] are installed on two vacuum cups [17,18] absorption surface up and down respectively, upward vacuum cup [17], following vacuum cup [18] adsorb masterplate [1] and thing to be impressed [2,3] respectively when making impression, last vacuum cup [17] and masterplate [1], following vacuum cup [18] forms one respectively with thing to be impressed [2,3]; Before the impression, vacuum cup [17 up and down at first pressurizes, 18], its absorption surface is contacted fully, use four circumferential uniform bolts of circular sleeve upper groove that vacuum cup [17] top is connected with spline guide pole [14] this moment with itself and locked being rigidly connected of spline guide pole [14], to descend vacuum cup [18] and locked being rigidly connected of stand base upper backup pad [10] with circumferential four the uniform bolts of following vacuum cup [18], sucker can only be made unidirectional motion relatively up and down about making, cancel pressure then and lift vacuum cup [17], masterplate [1] and thing [2 to be impressed are installed on vacuum cup absorption surface up and down, 3], just can carry out heating and pressurizing and begin impression this moment by the control temperature-controlling module; In masterplate that is installed [1] and thing to be impressed [2,3], can utilize optical sensor that masterplate [1] and thing to be impressed [2,3] are aimed at, by adsorbing fixedly masterplate [1] earlier, move thing to be impressed [2,3] again and aim at; Also can adsorb thing fixedly to be impressed [2,3] earlier, mobile again masterplate [1] is aimed at.
2, the impression manufacture method of Nano grade figure according to claim 1, it is characterized in that: utilize feed screw nut principle and spline guiding principle, by the combination control impression pressure of pressure threaded rod [8], stand pressure guide cylinder [7], spline guide pole [14], spline guide cylinder [13], spring washer [11] and pressure spring [12] and the size and Orientation of withdrawing pattern power; The spline guide pole [14] on last vacuum cup [17] top is connected with the spline of spline guide cylinder [13], makes spline guide pole [14] and last vacuum cup [17] have only the controlled motion of single direction; Pressure threaded rod [8] rotary torque becomes downward pressure during impression, promotes spline guide pole [14] and moves downward, and impresses; During the demoulding, remove pressure, utilize the restoring force of pressure spring, produce bigger withdrawing pattern power vacuum cup [17] is moved upward.
3, application rights requires the device of the impression manufacture method of 1 described Nano grade figure, it is characterized in that: device comprises that pressure control assembly, motion guarantee controllable components, temperature-controlling module and absorbent module; Pressure control assembly is positioned at the middle and upper part of the stand pressure guide cylinder that is installed on the stand back up pad [6], motion guarantees that Control Component is installed in stand pressure guide cylinder [7] bottom by spline guide cylinder [13], absorbent module is positioned between spline guide pole [14] and the stand base upper backup pad [10], last vacuum cup [17] guarantees that with motion the spline guide pole [14] of controllable components is connected, following vacuum cup [18] is connected with stand base upper backup pad [10], temperature-controlling module is positioned between stand base upper backup pad [10] and the stand base lower supporting plate [20], the below of the following vacuum cup [18] of absorbent module, wherein heating arrangement [19] upper surface closely contacts with following vacuum cup [18] lower surface.
4, device according to claim 3 is characterized in that: pressure control assembly comprises pressure threaded rod [8], torque arm [9], stand pressure guide cylinder [7], spring washer [11] and pressure spring [12]; Pressure threaded rod [8] is installed in the top of stand pressure guide cylinder [7], adopts with stand pressure guide cylinder [7] to be threaded; Torque arm [9] passes the circular hole on pressure threaded rod [8] top; Pressure spring [12] is enclosed between the spring washer [11] and spline guide cylinder [13] between spline guide pole [14] and the stand pressure guide cylinder [7], below pressure threaded rod [8]; Described motion guarantees that controllable components comprises the spline guide cylinder [13] that is installed in stand pressure guide cylinder [7] bottom, with the spline guide pole [14] that spline guide cylinder [13] spline is connected, spline guide cylinder [13] and spline guide pole [14] are formed single direction controlled motion mechanism; Absorbent module comprises vacuum cup [17] and following vacuum cup [18], the bottom of the circular sleeve on last vacuum cup [17] top and its top spline guide pole [14] is nested, on circular sleeve, circumferentially be evenly equipped with four bolts hole [301], with four bolts it is connected with spline guide pole [14] bottom, can adjusts the orientation that is installed in spline guide pole [14] bottom as required; Temperature-controlling module comprises heating arrangement [19], last vacuum cup heat-barrier material [16] and following vacuum cup heat-barrier material [4], heating arrangement [19] be positioned at following vacuum cup [18] under, closely contact with following vacuum cup [18] surface, adopt hot plate to heat; Following vacuum cup heat-barrier material [4] is a metallic gasket, is placed on down between the bolt of vacuum cup [18] and stand, and vacuum cup [18] and stand base upper backup pad [10] are isolated; Between last vacuum cup [17] and spline guide pole [14], be placed with vacuum cup heat-barrier material [16]; Absorbent module comprise with spline guide pole [14] bottom by bolted go up vacuum cup [17], with the bolted vacuum cup [18] down of stand base upper backup pad [10].
5, according to claim 3 or 4 described devices, it is characterized in that: vacuum cup [17,18] is the area vacuum sucker up and down, absorption surface has in order to the annular groove that vacuumizes [303], and a plurality of annular grooves distribute with concentric manner, and the groove of direction is connected annular groove [303] in length and breadth; Last vacuum cup [17] is looked squarely the shape as ⊥, and the bottom is for there being certain thickness flat board, and top is the circular sleeve that is positioned at dull and stereotyped central authorities; Vacuum cup [17,18] adopts high hardness material up and down, and absorption surface has very high flatness; Vacuum cup [17,18] can change suitable shape according to the needs of impression difformity and big or small material up and down.
6, according to claim 3 or 4 described devices, it is characterized in that: pressure control assembly becomes pressure threaded rod [8] rotary torque into downward pressure by stand pressure guide cylinder [7], promotes spline guide pole [14] and moves downward; When removing pressure, be contained in pressure spring [12] on the spline guide pole [14] can be replied spline guide pole [14] under the effect of spring washer [11] reference position.
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| CN101393391B (en) * | 2008-11-06 | 2011-02-16 | 上海交通大学 | Nanometer stamping device |
| KR20110122321A (en) * | 2010-05-04 | 2011-11-10 | 엘지디스플레이 주식회사 | Apparatus and method of fabricating thin film pattern |
| JP5686779B2 (en) | 2011-10-14 | 2015-03-18 | キヤノン株式会社 | Imprint apparatus and article manufacturing method using the same |
| IN2014MN02313A (en) * | 2012-05-08 | 2015-08-07 | Asahi Kasei E Materials Corp | |
| CN104401140A (en) * | 2014-12-05 | 2015-03-11 | 重庆隆发皮革制品有限责任公司 | Voltage mark device |
| CN104898371A (en) * | 2015-06-25 | 2015-09-09 | 河海大学常州校区 | Nano-imprinting easy demoulding method |
| CN105404098B (en) * | 2015-12-04 | 2017-12-05 | 广州兴森快捷电路科技有限公司 | A kind of LDI exposure machine alignments accuracy checking method |
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|---|---|---|---|---|
| US5772905A (en) * | 1995-11-15 | 1998-06-30 | Regents Of The University Of Minnesota | Nanoimprint lithography |
| CN1434930A (en) * | 2000-05-24 | 2003-08-06 | 奥布杜卡特公司 | Method in connection with the production of template and the template thus produced |
| CN1435728A (en) * | 2002-01-31 | 2003-08-13 | 惠普公司 | Nanosize making die using spacer technique |
| CN1518070A (en) * | 2003-01-07 | 2004-08-04 | ������������ʽ���� | Press manufacturing method, its manufacturing device, manufacturing method of magnetic recording medium and its manufacturing device |
| US20040219249A1 (en) * | 2003-05-02 | 2004-11-04 | Yong-Chen Chung | Uniform pressing apparatus |
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Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5772905A (en) * | 1995-11-15 | 1998-06-30 | Regents Of The University Of Minnesota | Nanoimprint lithography |
| CN1434930A (en) * | 2000-05-24 | 2003-08-06 | 奥布杜卡特公司 | Method in connection with the production of template and the template thus produced |
| CN1435728A (en) * | 2002-01-31 | 2003-08-13 | 惠普公司 | Nanosize making die using spacer technique |
| CN1518070A (en) * | 2003-01-07 | 2004-08-04 | ������������ʽ���� | Press manufacturing method, its manufacturing device, manufacturing method of magnetic recording medium and its manufacturing device |
| US20040219249A1 (en) * | 2003-05-02 | 2004-11-04 | Yong-Chen Chung | Uniform pressing apparatus |
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