CN100530674C - Organic electroluminescent display, and prepartion method - Google Patents

Organic electroluminescent display, and prepartion method Download PDF

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CN100530674C
CN100530674C CNB2006100412295A CN200610041229A CN100530674C CN 100530674 C CN100530674 C CN 100530674C CN B2006100412295 A CNB2006100412295 A CN B2006100412295A CN 200610041229 A CN200610041229 A CN 200610041229A CN 100530674 C CN100530674 C CN 100530674C
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electrode
resistance
display
organic electroluminescence
layer
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CN1917227A (en
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邱勇
徐粤
吴延德
段练
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Kunshan Visionox Display Co Ltd
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Kunshan Visionox Display Co Ltd
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Abstract

The display includes transparent substrate, first electrode, organic functional layer, second electrode, and auxiliary electrode setup on first electrode. The auxiliary electrode includes the covering metal layer in low resistance on column lead wire and row lead wire of transparent electrode outside zone of luminosity. Characters are that the auxiliary electrode further includes the covering metal layer in low resistance inside gap area of luminescence pixels on first electrode inside zone of luminosity. Resistance of the metal in low resistance is smaller than resistance of first electrode. The first electrode is a transparent electrode. Reducing difference of resistance between resistance of column lead wire and resistance of different area inside zone of luminosity effectively, the disclosed display of organic electroluminescence improves display brightness and display evenness.

Description

Display of organic electroluminescence and preparation method thereof
Technical field
The present invention relates to the ORGANIC ELECTROLUMINESCENCE DISPLAYS field, particularly relate to auxiliary electrode, display of organic electroluminescence of display of organic electroluminescence and preparation method thereof.
Background technology
Organic electroluminescence device (Organic Electroluminescent Devices, hereinafter to be referred as OLED) be by going up the evaporation electroluminescent organic material at first electrode (anode), cover the luminous element that second electrode (negative electrode) constitutes then, first electrode is a transparency electrode, mainly by metal oxide or the higher metal formations of work content such as tin indium oxide (ITO), zinc tin oxide.Usually anode is as the row lead-in wire in passive OLED is made, and negative electrode is connected to outside lead as line lead, and the signal that provides by chip for driving shows.
ITO is a transparency electrode relatively more commonly used, resistance is lower, be widely used in the flat panel display field, but with low resistive metal, Au for example, Ag, Cu, Al, Cr or Mo etc. compare, it is high a lot of that resistance is still wanted, therefore generally, in the preparation process of anode electrode earlier on glass substrate sputter one deck ITO again sputter one deck low resistive metal as auxiliary electrode, by figure transfer and etch process, make that low resistance metal layer all etches away in the luminous zone, the ITO wire surface covers low resistance metal layer outside the luminous zone, thereby the reduction lead resistance increases display brightness.
But owing in the luminous zone, very big difference is arranged away from the resistance in the ITO lead-in wire zone luminous zone outside and the regional resistance that goes between near the outer ITO in luminous zone, promptly the regional resistance away from the ITO lead-in wire is bigger, regional resistance near the ITO lead-in wire is less, the current value of zones of different of causing flowing through has big difference, current value influences the luminosity of organic electroluminescence device, resistance is big when causing image to show, the zone that electric current is little is littler than resistance, the zone that electric current is big is dark, thereby cause the display lighting brightness irregularities, the display quality that is difficult to reach higher (the ITO lead finger is positioned at and is used for lead-in wire that the luminous zone internal electrode is connected with the external drive chip beyond the luminous zone).
Summary of the invention
In order to address the above problem, the present invention has done improvement to the auxiliary electrode of first electrode (anode) in the prior art, and purpose is to provide a kind of can better reduce resistance, improves the display of organic electroluminescence of viewing area brightness and show uniformity.
Another object of the present invention provides the preparation method of above-mentioned display of organic electroluminescence
Another purpose of the present invention provides a kind of auxiliary electrode of above-mentioned display of organic electroluminescence.
Above-mentioned purpose of the present invention is achieved by following technical solution:
A kind of display of organic electroluminescence, comprise transparent substrate, first electrode, organic function layer, second electrode and the auxiliary electrode that is located on first electrode, auxiliary electrode is included on first electrodes series lead-in wire outside the luminous zone and the line lead and covers low resistance metal layer, it is characterized in that auxiliary electrode further is included in the luminous zone covers low resistance metal layer in the light-emitting pixels gap area on first electrode, wherein the resistance of low resistive metal is less than the resistance of first electrode.
In above-mentioned display of organic electroluminescence, first electrode is a transparency electrode, be selected from a kind of of tin indium oxide (ITO), zinc oxide, zinc tin oxide, gold, copper or silver, wherein the most frequently used preferably ito transparent electrode, second electrode is a metal electrode, comprises the alloy of metal that work functions such as lithium, magnesium, calcium, strontium, aluminium are lower or they and copper, gold, silver.
In above-mentioned display of organic electroluminescence, low resistive metal can be a kind of in aluminium, chromium, molybdenum, gold, silver or the copper, and the resistance of wherein preferable alloy chromium, and low resistive metal is less than the resistance of first electrode.
In above-mentioned display of organic electroluminescence, organic function layer can be the single layer structure that only comprises luminescent layer, also can be the sandwich construction that comprises hole blocking layer, electron transfer layer and luminescent layer.
The preparation method of above-mentioned display of organic electroluminescence comprises the steps:
On transparent substrate, form first electrode layer, and on first electrode layer sputter one deck low resistance metal layer;
Make the required mask plate of auxiliary electrode, and make the required figure of auxiliary electrode by lithography by mask plate, promptly figure comprises in the luminous zone on first electrode first contact conductor figure outside the light-emitting pixels gap area figure and luminous zone;
Make the required mask plate of first electrode, and make the figure of first electrode by mask plate by lithography;
Evaporation organic function layer on first electrode, evaporation the second electrode lay afterwards.
In the above-mentioned preparation method that display of organic electroluminescence arranged, first electrode is a transparency electrode, be selected from a kind of of tin indium oxide (ITO), zinc oxide, zinc tin oxide, gold, copper or silver, wherein the most frequently used preferably ito transparent electrode, second electrode is a metal electrode, comprises the alloy of metal that work functions such as lithium, magnesium, calcium, strontium, aluminium are lower or they and copper, gold, silver.
In the preparation method of above-mentioned display of organic electroluminescence, low resistive metal can be a kind of in aluminium, chromium, molybdenum, gold, silver or the copper, and the resistance of wherein preferable alloy chromium, and low resistive metal is less than the resistance of first electrode.
In the preparation method of above-mentioned display of organic electroluminescence, organic function layer can be the single layer structure that only comprises luminescent layer, also can be the sandwich construction that comprises hole blocking layer, electron transfer layer and luminescent layer.
A kind of auxiliary electrode of display of organic electroluminescence, be located on first electrode, be included on first electrodes series lead-in wire outside the luminous zone and the line lead and cover low resistance metal layer, it is characterized in that further being included in the luminous zone and to cover low resistance metal layer on first electrode in the light-emitting pixels gap area, wherein the resistance of low resistive metal is less than the resistance of first electrode.
In above-mentioned auxiliary electrode, first electrode is a transparency electrode, is selected from a kind of of tin indium oxide (ITO), zinc oxide, zinc tin oxide, gold, copper or silver, wherein the most frequently used preferably ito transparent electrode.
In above-mentioned auxiliary electrode, low resistive metal can be a kind of in aluminium, chromium, molybdenum, gold, silver or the copper, and the resistance of wherein preferable alloy chromium, and low resistive metal is less than the resistance of transparency electrode.
The present invention has covered low resistance metal layer in the light-emitting pixels gap area on first electrode in the luminous zone of display of organic electroluminescence, because the resistance of low resistive metal is less than the resistance of first electrode, thereby effectively reduce the row lead resistance, also reduced simultaneously in the luminous zone away from the difference of first contact conductor zone with close first contact conductor zone resistance, make the display brightness and the show uniformity of organic electroluminescent device viewing area all obtain good improvement, so the present invention have wide application prospect.
Description of drawings
Passive OLED auxiliary electrode figure in Fig. 1 prior art
1 luminous zone, 2 first electrodes, 3 light-emitting pixels, 4 light-emitting pixels gaps, 5 first electrodes series lead-in wire, 6 first rows of electrodes lead-in wire
First embodiment of passive OLED auxiliary electrode figure among Fig. 2 the present invention
1 luminous zone, 2 first electrodes, 3 light-emitting pixels, 4 light-emitting pixels gaps, 5 first electrodes series lead-in wire, 6 first rows of electrodes lead-in wire
Second embodiment of Fig. 3 passive OLED auxiliary electrode of the present invention figure
1 luminous zone, 2 first electrodes, 3 light-emitting pixels, 4 light-emitting pixels gaps, 5 first electrodes series lead-in wire, 6 first rows of electrodes lead-in wire
Fig. 4 display of organic electroluminescence of the present invention section of structure
7 glass substrates, 2 first electrodes, 9 auxiliary electrodes, 10 insulating barriers, 11 insulated columns, 12 organic function layers, 13 cathode layers
The section of structure of organic function layer among Fig. 5 Fig. 4
14 hole transmission layers, 15 luminescent layers, 16 electron transfer layers
Embodiment
The present invention is described in further detail below in conjunction with the drawings and specific embodiments.
Fig. 1 has described the auxiliary electrode figure of passive OLED in the prior art, as can be seen from Figure 1, first contact conductor 5 outside the luminous zone on first electrode layer 2 in the prior art, covered one deck low resistance metal layer on 6 as auxiliary electrode, the low resistance metal layer in the luminous zone 1 then all etches away.Because the resistance of low resistive metal is lower than first electrode 2, so the auxiliary electrode shown in employing Fig. 1 can reduce lead resistance, improve display brightness, but owing to have than big difference away from the zone of first electrodes series lead-in wire 5 luminous zone outside with near the go between resistance in 5 zone of first electrodes series in the luminous zone 1, be that luminous zone 1 internal upper part zone resistance is big among Fig. 1, lower area resistance is relatively little, therefore causes display luminosity when actual displayed inhomogeneous easily.
Fig. 2 is a preferred implementation of passive OLED auxiliary electrode figure among the present invention, as can be seen from the figure whole gap areas of first electrode 2 have covered low resistance metal layer in luminous zone 1, auxiliary electrode 1 has formed lattice-shaped in the luminous zone, also cover low resistance metal layer on first electrode, 2 lead-in wires 5,6 outside the luminous zone.Because the resistance of low resistance metal layer is less than first electrode, 2 resistance, the auxiliary electrode that luminous zone 1 forms can reduce the resistance value in the luminous zone 1, increase display brightness, also can make simultaneously in the luminous zone 1 away from the zone of first electrodes series lead-in wire 5 luminous zone outside with near go between corresponding the reducing of difference of resistance value in 5 zone of first electrodes series, thereby the difference of these regional current values of flowing through also can reduce, the current value influence shows luminosity, therefore compare with prior art, the present invention makes show uniformity also obtain very big improvement when increasing the display display brightness.
Fig. 3 is the another one execution mode of passive OLED auxiliary electrode figure among the present invention, be to have covered low resistance metal layer in the gap area (4) of first electrode 2 in luminous zone 1 at interval as shown in Figure 3, equally also can reduce the resistance value in the luminous zone 1, playing increases the effect that display brightness improves show uniformity, because the resistance of row first electrode 2 that has covered low resistance metal layer is less than the resistance of adjacent with it another row first electrode 2 that does not cover low resistance metal layer, so this execution mode is particularly useful for that resistance is had the different multicolor displaying that require.
Fig. 4 is the section of structure of organic light emitting display of the present invention, adopted the auxiliary electrode of describing among the present invention, its structure comprises glass substrate 7 successively from bottom to up as shown in the figure, first electrode 2, auxiliary electrode 9, insulating barrier 10, insulated column 11, organic function layer 12, cathode layer 13, organic function layer can be made up of luminescent layer 15, hole blocking layer 14 and electron transfer layer 16 as shown in Figure 5.
Below further specify the preparation method of Fig. 2~auxiliary electrode shown in Figure 5 and display of organic electroluminescence by specific embodiment.
Embodiment 1
The preparation process of auxiliary electrode shown in Figure 2.(preparation process is carried out in the cleaning shop) cleaned glass substrate with UV irradiation and the washing lotion that contains surfactant successively, sputter one deck ITO forms transparency electrode on the glass substrate after the cleaning, the resistance of transparency electrode is 15 Ω, the ITO thickness is 170nm, the chromium of sputter layer of metal again on the ito substrate after the cleaning, thickness is 100-200nm.Make mask plate, make mask plate through the figure that overexposure obtains comprises luminous zone 1 on first electrode 2 except that light-emitting pixels 3 transparency electrode 5,6 figures that go between outside whole gap area 4 figures and the luminous zone.Photoresists are evenly coated on the chromium metal level of glass baseplate surface, the baking oven that the glass substrate that coats photoresists is put into the high temperature cleaning toasts, temperature is controlled at about 95 ℃, about 20min of time, after taking out substrate afterwards and treating substrate cooling, utilize on exposure machine that ready-made mask plate selectively exposes to the chromium metal level in the abovementioned steps, the part that needs is kept metal level is carried out hot setting, temperature is selected in about 115 ℃, afterwards glass substrate is put into developing apparatus and is removed the part that does not need to keep metal level with 2.38% tetramethyl aqua ammonia (TMAHO) developer solution.Spend glue and remove photoresist, and substrate is cleaned up with cleaning fluid.Substrate is immersed the chromium etching solution, will be exposed to photoresists chromium in addition and remove, utilize cleaning fluid to remove the photoresists that are cured, obtain the chromium metallic pattern of needs, as shown in Figure 2.
Embodiment 2
The preparation process of auxiliary electrode shown in Figure 3, specific operation process is with embodiment 1, the difference part is the making of mask plate and selects aluminium as low resistive metal, the mask plate of making among Fig. 3, make mask plate through overexposure to figure comprise in the luminous zone 1 on the transparency electrode 2 that transparency electrode goes between 5 outside at interval light-emitting pixels gap area 4 figures and the luminous zone, 6 figures, the auxiliary electrode figure that makes at last as shown in Figure 3.
Embodiment 3
The preparation process of display of organic electroluminescence shown in Figure 4, on the basis of the auxiliary electrode that embodiment 1 obtains, carry out the figure transfer and the etching of ITO electrode, making one group by lithography is parallel to each other and separated vertical element, spin coating one deck photosensitive organic insulating material on above-mentioned electrode pattern, can be Photosensitive PI, eurymeric novolac photoresist, minus thermoprene etc., select Photosensitive PI in the present embodiment for use, preceding baking post-exposure, exposure figure is network structure (only exposing the light-emitting zone and the lead-in wire bonding pad of device pixel) or list structure (a group with perpendicular being parallel to each other and separated vertical element of transparency electrode figure), the width of lines is that interval between the pixel is determined that live width is 10-50um by display resolution.Above-mentioned organic insulator through overexposure is carried out wet development, the back insulating base that develops cross section form up big and down small shape, high-temperature baking makes its curing, baking temperature is 150-350 ℃.On above-mentioned figure with insulated column 11 and first electrode 2, continue deposit organic function layer 12 afterwards, organic function layer 12 is sandwich constructions in the present embodiment, comprise luminescent layer 15, hole blocking layer 14 and electron transfer layer 16, as shown in Figure 5, wherein luminescent layer 15 materials are made up of electroluminescent organic material, can be metal complex or conjugatd polymers etc., select metal complex Alq in the present embodiment for use 3, the material of hole transmission layer mainly is the triphenylamine compounds, as NPB, TPD, MTDATA etc., selects NPB in the present embodiment for use, the electric transmission layer material is a metal complex, selects Alq for use 3On above-mentioned organic function layer 12, continue evaporated metal layer as negative electrode 13, metal level is generally the alloy of the lower metal of work functions such as lithium, magnesium, calcium, strontium, aluminium or they and copper, gold, silver, present embodiment is selected magnesium metal for use, with do not adopt auxiliary electrode and compare, the display brightness of the display of organic electroluminescence that is obtained by present embodiment has improved 5%, and show uniformity has improved 10%.(whole process of preparation is all implemented in the cleaning shop)

Claims (16)

1, a kind of passive drive display of organic electroluminescence, comprise transparent substrate (7), first electrode (2), organic function layer (12), second electrode (13) and be located at auxiliary electrode (9) on first electrode (2), first electrodes series lead-in wire (5) and line lead (6) that auxiliary electrode (9) is included in outside the luminous zone are gone up the covering low resistance metal layer, it is characterized in that auxiliary electrode (9) further is included in interior first electrode (2) in luminous zone (1) and goes up covering low resistance metal layer in the light-emitting pixels gap area (4), wherein the resistance of low resistive metal is less than the resistance of first electrode (2).
2, according to the display of organic electroluminescence of claim 1, it is characterized in that described first electrode (2) is a transparency electrode, be selected from a kind of of tin indium oxide (ITO), zinc oxide, zinc tin oxide, gold, copper or silver, described second electrode (13) is a metal electrode.
3,, it is characterized in that described first electrode (2) is tin indium oxide (ITO) electrode according to the display of organic electroluminescence of claim 2.
4,, it is characterized in that described low resistive metal is selected from a kind of in aluminium, chromium, molybdenum, gold, silver or the copper according to the display of organic electroluminescence of claim 1.
5,, it is characterized in that described low resistive metal is a chromium according to the display of organic electroluminescence of claim 4.
6, according to any one display of organic electroluminescence of claim 1-5, it is characterized in that described organic function layer (12) comprises luminescent layer (15), hole blocking layer (14) and electron transfer layer (16).
7, any one the preparation method of display of organic electroluminescence of a kind of claim 1-5 is characterized in that comprising the steps:
1) goes up formation first electrode (2) at transparent substrate (7), and go up sputter one deck low resistance metal layer at first electrode (2);
2) make the required mask plate of auxiliary electrode (9), and make the required figure of auxiliary electrode (9) by lithography by mask plate, be that figure comprises that first electrode (2) is gone up first contact conductor (5,6) figure outside light-emitting pixels gap area (4) figure and the luminous zone in the luminous zone (1);
3) make the required mask plate of first electrode (2), and make the figure of first electrode (2) by mask plate by lithography;
4) go up evaporation organic function layer (12), evaporation second electrode (13) afterwards at first electrode (2).
8, according to the preparation method of claim 7, it is characterized in that described first electrode (2) is a transparency electrode, be selected from a kind of of tin indium oxide (ITO), zinc oxide, zinc tin oxide, gold, copper or silver, described second electrode is a metal electrode.
9, preparation method according to Claim 8 is characterized in that described first electrode (2) is tin indium oxide (ITO) electrode.
10,, it is characterized in that described low resistive metal is selected from a kind of in aluminium, chromium, molybdenum, gold, silver or the copper according to the preparation method of claim 7.
11,, it is characterized in that described low resistive metal is a chromium according to the preparation method of claim 10.
12, a kind of auxiliary electrode of passive drive display of organic electroluminescence (9), be located on first electrode (2), the transparency electrode row lead-in wires (5) and the line lead (6) that are included in outside the luminous zone are gone up the covering low resistance metal layer, it is characterized in that further being included in interior first electrode (2) in luminous zone (1) and go up covering low resistance metal layer in the light-emitting pixels gap area (4), wherein the resistance of low resistive metal is less than the resistance of first electrode (2).
13, according to the auxiliary electrode (9) of claim 12, it is characterized in that described first electrode (2) is a transparency electrode, be selected from a kind of of tin indium oxide (ITO), zinc oxide, zinc tin oxide, gold, copper or silver.
14,, it is characterized in that described first electrode (2) is tin indium oxide (ITO) electrode according to the auxiliary electrode (9) of claim 13.
15,, it is characterized in that described low resistive metal is selected from a kind of in aluminium, chromium, molybdenum, gold, silver or the copper according to the auxiliary electrode (9) of claim 12.
16,, it is characterized in that described low resistive metal is a chromium according to the auxiliary electrode (9) of claim 15.
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CN101777577B (en) * 2010-03-10 2012-01-04 彩虹集团公司 Color organic light emitting display panel and manufacturing method thereof
CN101866945B (en) * 2010-06-30 2012-03-21 彩虹集团公司 Colored organic light-emitting display panel and preparation method thereof
CN102237497B (en) * 2011-06-30 2013-07-31 彩虹(佛山)平板显示有限公司 Method for simultaneously forming metal lead pattern and anode pattern of organic light-emitting device
CN105655293B (en) * 2016-01-12 2019-06-21 重庆京东方光电科技有限公司 Array substrate and preparation method thereof and display device
KR20170124070A (en) * 2016-04-29 2017-11-09 엘지디스플레이 주식회사 Organic Light Emitting Display Device and Method for Manufacturing the Same
EP3240036A1 (en) 2016-04-29 2017-11-01 LG Display Co., Ltd. Organic light-emitting display device and method of manufacturing the same
TWI674662B (en) * 2018-06-19 2019-10-11 友達光電股份有限公司 Manufacturing method of array substrate

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Assignee: Beijing Visionox Photoelectric Technology Co.,Ltd.

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Denomination of invention: Organic electroluminescent display, and prepartion method

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