CN100504617C - Double platform system for rotary exchange - Google Patents

Double platform system for rotary exchange Download PDF

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CN100504617C
CN100504617C CN 200710041769 CN200710041769A CN100504617C CN 100504617 C CN100504617 C CN 100504617C CN 200710041769 CN200710041769 CN 200710041769 CN 200710041769 A CN200710041769 A CN 200710041769A CN 100504617 C CN100504617 C CN 100504617C
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base
rotation
dual stage
dual
system
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CN101071275A (en
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严天宏
王天明
袁志扬
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上海微电子装备有限公司
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Abstract

本发明提供了一种旋转交换的双台系统。 The present invention provides a dual system for a rotary table exchange. 现有技术中的双台系统存在结构复杂、成本过高以及双台交换时存有安全隐患的问题。 There is a complex structure, high cost, and there are security risks when dual-stage exchange problems of the prior art two-stage system. 本发明的旋转交换的双台系统,用于一具有主框架且具有两作业位的电子设备中,其包括设置在主框架上的基台、对应该两作业位且对称设置在该基台上的第一及第二作业台、用于驱动基台沿该基台中心转动的基台驱动装置以及用于控制基台驱动装置驱动基台转动以实现第一作业台与第二作业台换位的控制模块。 Rotation of the exchange of the present invention is a dual stage system for a main frame and having a work position with two of the electronic device, which includes a base provided on the main frame of the two should work position and symmetrically disposed in the submount first and second work station, for driving the base along the base of the base drive means for controlling the rotation center of the base drive means to effect rotation of a first base station and the second work station working transposition the control module. 采用本发明的旋转交换的双台系统可提高电子设备的效率并降低成本。 Dual rotary stage system is the exchange of the present invention can improve the efficiency and reduce the cost of the electronic device.

Description

一种旋转交换的双台系统 A rotating dual switching stage system

技术领域 FIELD

本发明涉及半导体制造设备领域,特别涉及一种旋转交换的双台系统。 The present invention relates to the field of semiconductor manufacturing equipment, and particularly relates to a system for dual stage switching rotation. 背景技术 Background technique

光刻是将掩模版上的芯片图形通过光刻机转印到硅片上,其是半导体制造中的重要工序,故光刻的效率和质量对半导体芯片的制造效率和质量有着重要 Photolithography is a chip pattern on the reticle onto the wafer by lithography, which is an important step in semiconductor manufacturing, photolithography so that the efficiency and quality of the manufacturing efficiency and quality of the semiconductor chip has an important

早期的光刻机通常采用单作业台,光刻中的对准测量以及后续的曝光均是在该单作业台上进行的,该具有单作业台的光刻机一次只能光刻一片硅片,该珪片在扫描曝光区域完成对准测量后才能进行曝光工序,故该具有单作业台的光刻机生产效率低下,其成为制约光刻效率进一步提高的瓶颈。 Early lithography machines typically use a single stage operation, alignment measurement and the subsequent photolithography exposure are performed in the single-stage operation, the work table having a single lithography machines that only one wafer lithography the sheet Gui scanning exposure area is completed before the exposure step alignment measurement, so the work table having a single lithography machine production efficiency is low, which become the bottleneck to further improve the efficiency of photolithography.

为克服单作业台的效率低下的问题,设置有双作业台的光刻机是光刻机冲支术的发展趋势,硅片的对准测量工序及曝光工序分设在两个作业台上并行进行, To overcome the inefficiency of a single work station, is provided with a double work stage lithography machine is a trend lithography machine plunger branched surgery, wafer alignment measurement step and the exposure step is divided in two parallel workbench ,

序,故可大大提高光刻效率。 Sequence, it can greatly improve the efficiency of photolithography.

现业界通常使用的双作业台系统如以下专利所示: Dual stage operating systems commonly used in the industry is now as shown in the following patents:

专利号为WO98/40791的欧洲专利-提出了一种双作业台系统,该双作业台系统中每一作业台均通过一耦合连接座固定。 Patent No. WO98 / 40791 European Patent - proposes a two-stage operating system, the dual bed system for every job operating units are coupled via a fixed connecting base. 具有该双作业台系统的光刻机在工作时, 一作业台承载的硅片可以在对准测量作业位上进行曝光前的对准和测量 Lithography system having the dual work table at work, a work table carried by the wafer alignment can be measured before the exposure and alignment measurement on the job site

工序,另一作业台承载的硅片则在曝光位上进行曝光工序。 Step, the other wafer stage operation is carried exposure position on the exposure step. 当两作业台上的操作都完成后,耦合连接座与作业台分离,两作业台将分别运动到交换位置,然后进行耦合连接座的交换,从而实现两作业台的交换。 When the two operations are complete the job table, coupled to the connecting base separation work table, the two units are moved to the work replacement position, then the exchange coupling socket in order to achieve two switching work station. 该专利中的双作业台系统可以缩短曝光系统中硅片的循环曝光的平均时间,在不提高作业台运动速度前提下,能大幅地提高系统的产率。 Dual-stage system operating in this patent can be shortened average time wafer exposure system of the exposure cycle, without increasing the speed of movement of the work table premise, can dramatically increase the yield of the system.

然而该专利号为WO98/40791的欧洲专利也存在一些问题:由于每个作业台与驱动单元间釆用的是耦合连接方式,在交换过程中,耦合连接座与作业台需 However, the European Patent No. WO98 / 40791 there are also some problems: since the work table between each drive unit and preclude the use of the coupling connection, in the exchange process, the coupling connection base station with the job needs

短暂分离,在两者分离后,虽通过定位装置(专利号为W098/28665的欧洲专利和专利号为US6498350的美国专利均详细描述了该定位装置)的钳制来保证其分离位置的固定不动,但两者的分离仍会对系统的定位精度造成影响。 Briefly separated, after separation of the two, although the positioning means (and European Patent No. No. W098 / 28665 US Patent US6498350 are described in detail, the positioning device) to ensure its clamped position separated immobilized , but the separation between the two will affect the positioning accuracy of the system. 如此就需相应地增加防护装置和检测装置,故会造成系统结构的复杂化。 Thus it should be increased protection means and the detection means, it will result in a complex system structure. 另外两作业台存在运动范围重叠区域,双台运动过程中有发生碰撞的可能性。 Also the presence of two work table motion range overlapping area, dual-stage during movement of the possibility of collision.

专利号为US6654100的美国专利和专利号为WO01/40875的欧洲专利提出了一种类似的双作业台系统,两专利所提出的双作业台系统的显著特点是每个作业台都独立拥有一套上片和下片模块和一套对准测量模块, 一公用的曝光模i丸设置在两对准测量模块间,曝光位设置在两作业台间。 Patent No. US patents and patent number US6654100 as WO01 / 40875 European patent proposes a similar two-stage operating system, a distinctive feature dual operating table system of two patents it is proposed that each set of work stations are independently owned upper and lower pieces and a module alignment measurement module, a common-mode exposure i pellets disposed between two alignment measurement module, the exposure position is provided between the two work stations. 当一作业台在曝光位#1 行曝光工序时,另一作业台可同时进行上片工序、下片工序或对准测量工序, 当两作业台的操作全部完成后,处在曝光位的作业台直线移出曝光位,同时对准和测量完毕的作业台将移到曝光位,而完成硅片曝光的作业台执行下片及上新片工序,而后在其对应的对准测量位上进行曝光前的对准和测量才喿作。 When a work table during the exposure step of exposing the bit line # 1, the other work station may simultaneously process topsheet, the backsheet, or step alignment measurement step, when the operation of the two stage operation completed, exposed position at work straight out exposure station position, while the measurement is completed, and the alignment of the work table to move the exposure position, the wafer is completed before the exposure station to perform operations on the new film and the backsheet step, exposure is carried out at the position corresponding alignment measurement alignment and measuring only for Qiao. 如>七往复循环,完成所有需光刻硅片的光刻。 The> cyclical seven complete all required lithography wafer lithography.

上述双台结构,简单可靠,两作业台移动时互不干涉,并且运行路径短, 交换速度快。 The double-stage structure is simple, reliable, interfere with each other when the two work station moves, path and runs short, exchange speed. 克服了专利WO98/40791双台技术的一些不足,但是却多出了一套对准测量装置和上下片装置,成本显著增加。 Overcome Patent WO98 / 40791 dual stage technology, some problems, but a multi-down means and a sheet alignment measurement apparatus, a significant increase in cost.

专利号为(IS6788385的美国专利也提出了一种双作业台专利,该专利与专利号为WO98/40791的欧洲专利所提出的双作业台类似,整个双台系统包含一个曝光位和一个对准测量位。但与专利号为WO98/40791的欧洲专利所不同的是, 其两作业台的承片台以悬臂的方式设置在x向驱动单元上,同时,承片台的底部高出x向驱动单元顶部平面。通过该种布局方式,能够实现两作业台从对准测量位到曝光位的相互换位。 U.S. Pat. Pat. No. (IS6788385 also proposed a two stage operation patent, this patent and patent No. similar dual work table in European Patent WO98 / 40791 is proposed, the entire exposure system includes a dual-stage and a bit aligned measuring site. However, in Patent No. WO98 / 40791 European patent except that a wafer stage two work stations disposed in a cantilever manner on the driving unit x, at the same time, to the bottom of the wafer stage x higher top planar drive unit. by this kind of arrangement, it is possible to realize two operating units each transposition from the alignment position to the exposure position measurement.

与专利号为W098/40791的欧洲专利相比,专利号为US6788385的美国专利的双台直接换位,无需耦合联结座装置和复杂的作业台的换位过程,筒化了系统,提高了双台换位的效率。 Compared to European Patent W098 / 40791 and Patent Nos., U.S. patent No. US6788385 dual stage direct transposition, the transposition process without coupling means coupling the seat and complex work stations, the barrel of the system to improve the bis Taiwan transposition efficiency. 与专利号为US66541 00的美国专利相比,该专利号为.US6788385的美国专利只需一套对准测量才莫块和一套上下片才莫块,系统成本和复杂性有所降低。 Compared with U.S. Pat. No. US66541 00, which is U.S. Patent No. .US6788385 alignment measurement only a single set of blocks and a set of upper and lower wings Mo Mo block only, system cost and reduced complexity. 但是,该双台技术也存在一个问题,就是以悬臂方式设置的承片台在调平调焦过程中时出现的振动问题需要克服,同时需要特别设计硅片顶起和压紧装置。 However, this dual-stage technique is also a problem, the wafer stage is disposed in a cantilever manner leveling vibration problems when the focusing process is to be overcome, and require specialized silicon jacking and pressing means.

综上所述,如何提供一种节约成本、定位精确以及安全简便高效的旋转交换的双台系统,即成为半导体行业内亟待解决的问题。 In summary, how to provide a cost-effective, safe and easy positioning accuracy and efficient dual-stage exchange system of rotation, it becomes a problem to be solved within the semiconductor industry.

发明内容 SUMMARY

本发明的目的在于提供一种旋转交换的双台系统,通过所述旋转交换的双台系统可提高效率、P争低成本和提高安全性。 Object of the present invention to provide a system for dual stage switching rotation by the rotating dual switching stage system may improve efficiency, P contention cost and improve safety.

本发明的目的是这样实现的: 一种旋转交换的双台系统,用于一具有主框架且具有两作业位的电子设备中,该旋转交换的双台系统包括设置在主框架上的基台、对应该两作业位且对称设置在该基台上的第一及第二作业台、用于驱动基台沿该基台中心转动的基台驱动装置以及用于控制基台驱动装置驱动基台转动以实现第一作业台与第二作业台换位的控制模块, Object of the present invention is implemented as follows: A rotating dual switching stage system for a main frame having a base and having a two-bit operation in the electronic device, the dual-stage system includes a rotating exchanged on a main frame , the first and the second work station should work position and two symmetrically disposed in the base table for driving the base along the base of the base drive means for controlling the rotation center of the base driving means of the base the control module is rotated to effect a first and a second work station transposition work table,

其中该主框架包括U型支架、平均分布在U型支架底部的多个减震结构以及设置在减震结构上用于支撑基台的支撑台, Wherein the main frame includes a U-shaped bracket, evenly distributed in the bottom of the U-shaped support base bracket and a plurality of shock absorbing structure disposed on the shock absorbing structure for supporting abutment,

该旋转交换的双台系统还包括设置在支撑台上且用于将基台锁固在该支撑台上的基台锁固单元,该控制模块还控制基台锁固单元将基台锁固在支撑台上。 The dual stage system further comprises a rotary switching support base and disposed in the base for locking the locking means in the base of the support table, the control module controls the base station further locking means in the locking base support table.

在上述的旋转交换的双台系统中,该第一及第二作业台均包括平行排布在基台一侧的两X向导轨、跨设在该两X向导轨间的Y向导轨、设置在该Y向导轨上且用于承载硅片的承片台、分别驱动该承片台沿X方向以及Y方向运动的X 向驱动单元以及Y向驱动单元。 In the dual stage system according to the rotation of the exchange, the first and second work stations each comprise a base arranged in parallel to one side of the two X-direction guide, disposed across between the two X-direction Y to the guide rail, is provided in the Y-direction of the wafer stage for carrying the guide rail and silicon, respectively, for driving the wafer stage in the X and Y directions of movement to the driving unit X and Y to the driving unit.

在上述的旋转交换的双台系统中,该X向驱动单元以及Y向驱动单元驱动承片台的运动满足质心驱动原则。 In the dual stage system according to the rotation of the exchange, the centroid X satisfies the principle of driving the drive unit and Y-direction movement of the drive unit drives the wafer stage.

在上述的旋转交换的双台系统中,该X向驱动单元及Y向驱动单元均为直线电才几。 In the dual stage system according to the rotation of the exchange, the X linear motor are only a few and Y to the driving unit to the driving unit.

在上述的旋转交换的双台系统中,该控制模块包括一设置在基台上且用于检测基台转动角度的检测单元以及一用于控制基台驱动装置驱动基台转动的控制单元。 In the dual stage system according to the rotation of the exchange, which comprises a control module arranged on a base and the base for detecting the rotational angle detecting unit, and a control unit for controlling the base drive means to rotate the base.

在上述的旋转交换的双台系统中,该支撑台为气浮支撑台。 In the dual stage system according to the rotation of the exchange, the support for the air bearing table support table. 在上述的旋转交换的双台系统中,该基台驱动装置设置在该支撑台的底部。 In the dual stage system according to the rotation of the exchange, the drive base provided at the bottom of the support table. 在上述的旋转交换的双台系统中,该基台锁固单元为电磁耦合装置。 In the dual stage system according to the rotation of the exchange, the base unit is an electromagnetic coupling locking means. 在上述的旋转交换的双台系统中,该U型支架末端还设置有用于驱动基台 In the dual stage system according to the rotation of the exchange, the U-shaped ends of the stent is also provided for driving the base

减速的减速才莫块。 Mo was deceleration deceleration block.

在上述的旋转交换的双台系统中,该基台驱动装置为伺服电机。 In the dual stage system according to the rotation of the exchange, the base driving means is a servo motor. 在上述的旋转交换的双台系统中,该基台驱动装置包括一伺服电机以及一 In the dual stage system according to the rotation of the exchange, the base station comprises a drive means and a servo motor

与伺服电机相连的变速装置。 Transmission means connected to the servo motor.

在上述的旋转交换的双台系统中,该电子设备为光刻机。 In the dual stage system according to the rotation of the exchange, the electronic apparatus is a lithography machine.

在上述的旋转交换的双台系统中,该光刻机具有一上片模块和一下片模块。 In the dual stage system according to the rotation of the exchange, the lithography having a topsheet and a lower module plate modules. 在上述的旋转交换的双台系统中,该两作业位分别为对准测量位和曝光位。 In the dual stage system according to the rotation of the exchange, the two are aligned work position and the exposure position measuring site. 与现有技术中的双作业台系统存在结构复杂、成本过高以及存有安全隐患等问题相比,本发明的旋转交换的双台系统的两作业台共用一套上片及下片模块,大大节约了成本,再者本发明的旋转交换的双台系统通过基台驱动装置驱动基台转动,即可完成设置在基台上的两作业台的换位,两作业台无运动重叠区域,避免了两作业台碰撞的安全隐患,再者,旋转交换的双台系统的结构也得到了简化。 Compared complex structure, high costs, and there are security risks and other problems with the prior art dual-stage system operating in two working dual-stage rotary switching system of the present invention the topsheet and backsheet of a common module, significant cost savings. Furthermore dual rotary stage system of the present invention by the exchange of the base drive means rotates the base, to complete the conversion table is provided in two groups working table, the work table no motion two overlapping area, to avoid security problems workbench two collision Moreover, the rotation of the dual-stage exchange system structure is simplified.

附图说明 BRIEF DESCRIPTION

本发明的旋转交换的双台系统由以下的实施例及附图给出。 Rotation of the exchange of the present invention and a dual stage system is given by the embodiment of FIG.

图1为本发明的旋转交换的双台系统的第一实施例的结构示意图; Schematic structural diagram of a first embodiment of the dual stage rotary switching system of the present invention in FIG. 1;

图2为本发明的旋转交换的双台系统中第一及第二作业台的主视图; Rotating dual switching stage system FIG. 2 is a front view of the first invention and the second work station;

图3为第一作业台处于上片位的示意图; FIG 3 is a schematic view of a first bit topsheet work table;

图4为第一作业台处于对准测量位的示意图; FIG 4 is a schematic view of a first bit alignment measurement work table;

图5为第一作业台处于停泊位的示意图; FIG 5 is a schematic view of a first parking position to the work table;

图6为第一作业台处于曝光位的示意图; FIG 6 is a schematic view of the first working station in an exposure position;

图7为第一作业台处于下片位的示意图; 7 is a schematic view of a first work station in position backsheet;

图8为装设有本发明的旋转交换的双台系统的光刻机光刻硅片Wl、 W2和W3 的流禾呈图;图9为本发明的旋转交换的双台系统的第二实施例的结构示意图。 8 is a dual stage lithography machine mounted with rotation of the exchange system of the present invention photolithography wafer Wl, W2, and W3 flows Wo FIG form; dual stage system the second embodiment of the rotary exchanger of the present invention FIG 9 schematic structural diagram of the. 具体实施方式 Detailed ways

以下将对本发明的旋转交换的双台系统作进一步的详细描述。 The following will exchange rotating twin-stage system of the present invention will be further described in detail. 参见图1,其显示了本发明的旋转交换的双台系统的第一实施例的结构示意图,如图所示,所述旋转交换的双台系统用于一光刻机中,所述的旋转交换的双台系统包括基台10、基台驱动装置11、基台锁固革元12、第一作业台13、 第二作业台14、控制模块15、减速模块16,其中,所述光刻机包括主框架20、 对准测量模块21、曝光模块22、上片模块(未图示)、下片模块(未图示)。 Referring to Figure 1, which shows a schematic structure of a first embodiment of the dual stage rotary switching system of the present invention, as shown, dual-stage system for the exchange of the rotation of a lithography machine, the rotation dual stage exchange system 10 comprises a base, the base drive 11, the locking leather base unit 12, a first work station 13, a second work station 14, the control module 15, the deceleration module 16, wherein the photolithography machine includes a main frame 20, alignment measurement module 21, the exposure module 22, topsheet module (not shown), the lower piece module (not shown).

主框架20包括U型支架2Ga、平均分布在U型支架底部的多个减震结构2 0b 和设置在减震结构上的支撑台20c。 The main frame 20 includes a U-shaped bracket 2Ga, evenly distributed in a plurality of U-shaped bottom structure of the damper bracket 2 0b and 20c disposed on the support base of the shock absorbing structure. 在本实施例中,所述支撑台20c为气浮支撑台,所述减震结构20b的数量为3个,所述减震结构20b除具有被动减震的弹簧部分外,还设置有主动减震的主动减震机构,用于主动抵消掉基台IO所产生的叶氐频l展动。 In the present embodiment, the support base for the air bearing support table 20c, 20b of the shock absorbing structure is the number 3, the shock absorbing structure having a spring portion 20b in addition to a passive damping, provided with active Save active shock damper mechanism for actively offset IO base frequency generated Di l show moving leaf.

对准测量模块21经主动减震隔震系统(未图示)悬设在主框架20上且用于对待光刻硅片进行曝光前的对准测量工序。 Alignment measurement module 21 via the active damping isolation system (not shown) suspended on the main frame 20 is provided and is used to treat silicon wafers for photolithographic alignment measurements before the exposure step.

曝光模块22经主动减震隔震系统(未图示)悬设在主框架20上且用于依据对准测量模块21的测量结果对待光刻硅片进行曝光工序。 Exposure module 22 via the active damping isolation system (not shown) suspended on the main frame 20 is provided and is used to treat silicon wafers for photolithographic exposure step according to the alignment measurement result of the measurement module 21.

所述上片模块及下片模块均设置在U型支架20a的外侧,所述上片模块用于将待光刻硅片载送到旋转交换的双台系统上以进行光刻,所述下片模块用于将完成曝光的硅片从基台IO上卸载。 The topsheet and backsheet modules are modules disposed outside of the U-shaped bracket 20a, the topsheet module is configured to be carried to the wafer lithography system rotating dual switching stage to perform photolithography, the lower chip module for the exposure is completed is unloaded from the wafer base IO. 在本实施例中,所述上片模块及下片模块分别设置在基台IO左侧的U型支架2Ga的外侧。 In the present embodiment, the topsheet and backsheet modules outside the module are respectively disposed on the left side of the base IO 2Ga the U-bracket.

以下对本发明旋转交换的双台系统的上述构成要件进行详细说明: The following detailed description of the above-described constituent elements of the system of the present invention dual stage rotary exchanged:

基台IO设置在支撑台20c上。 IO base disposed on the support table 20c. 在本实施例中,所述气浮支撑台可緩冲基台IO转动时的转动动量,另外也可避免外部的震动通过支撑台20c传到基台上而影响对准测量模块21或曝光模块22对硅片的对准测量精度或曝光精度。 In the present embodiment, the air bearing supporting the rotatable table rotatably momentum IO buffer when the base, the other can be avoided external vibration or impact alignment measurement module 21 is supported by the exposure module 20c spread on a base station 22 or the alignment precision of the exposure measuring precision silicon wafer.

基台驱动装置11设置在所述支撑台20c的底部且用于驱动基台10沿其中心转动。 Base drive means 11 is provided in the bottom of the support table 20c for driving the base 10 and rotated in its center. 在本实施例中,所述基台驱动装置11包括直流伺服电机lla以及将直流伺服电机lla固定在支撑台20c上的固定架lib 。 In the present embodiment, the drive means 11 comprises a base DC servo motor lla and lib mount the DC servo motor lla fixed to the support table 20c. 基台锁固单元12设置在支撑台20c边缘且用于将基台锁定在主框架20上在本实施例中,所述基台锁固单元12为电磁耦合装置。 Locking the base unit 12 is provided at the edge of the support table 20c for the base and locked to the main frame 20 in the present embodiment, the base unit 12 is an electromagnetic locking coupling device.

第一及第二作业台13及14对应对准测量模块21和曝光模块22且对称i殳置在所述基台10上,第一及第二作业台13及14均可通过对准测量模块n进行测量或通过曝光模块22进行曝光,但两作业台同时进行作业时只能有一者进行测量(或曝光),另一者进行曝光(或测量)。 The first and second work table 13 and 14 corresponding to the exposure and alignment measurement module 21 and the module 22 i Shu symmetrically arranged on said base 10, first and second work stations 13 and 14 can be measured by the alignment module n is measured by the exposure or the exposure module 22, but only one measurement (or exposure) when the two operations at the same time the work table, and the other exposure (or measurement).

参见图2,显示了第一及第二作业台13及14的详细结构,如图所示,所述第一作业台13包括平行排布在基台10左侧的两X向导轨13a及13b、跨设在所述两X向导轨13a及13b间的Y向导轨13c、设置在所述Y向导轨上用于承载硅片的第一承片台13d、驱动所述第一承片台13d沿X方向运动的X向驱动单元13e以及驱动第一承片台13d沿Y方向运动的Y向驱动单元13f。 Referring to Figure 2, shows the detailed structure of the first and second work stations 13 and 14, as shown, the first work station 13 comprises a parallel arrangement of the base 10 on the left side of the two guide rails 13a and 13b X , disposed across the two X between the Y-direction guide rails 13a and 13b. 13C, in the Y direction is provided first wafer stage for carrying a wafer 13d of the upper rail, the first drive wafer stage 13d in the X direction of the drive unit 13f X to Y driving unit 13e, and 13d drive the first movement of the wafer stage in the Y direction. 所述第一作业台13的X向及Y向驱动单元13e和13f驱动第一承片台13d的运动满足质心驱动原则。 X and Y to the first work station 13 of the first wafer stage drive movement of the drive unit 13d 13e and 13f satisfy centroid driving principle.

第二作业台14包括平行排布在基台10右侧的两X向导轨Ma及Mb、跨设在所述两X向导轨14a及14b间的Y向导轨14c、设置在所述Y向导轨上用于承载硅片的第二承片台14d、驱动所述第二承片台14d沿X方向运动的X向驱动单元14e以及驱动第二承片台14d沿Y方向运动的Y向驱动单元14f 。 The second work station 14 includes a guide rail arranged in parallel to the Ma and Mb, disposed across two of the base 10 to the right of X in the X direction Y between the two guide rails 14a and 14b to 14c, provided in the Y-direction guide 14d on the second wafer stage for carrying the wafer, the second wafer stage drive in the X direction 14d to the X and Y driving unit 14e drives the second movement of the wafer stage 14d in the Y direction to the drive unit 14f. 所述第二作业台14的X向及Y向驱动单元14e和14f驱动第二承片台14d的运动也满足质心驱动原则。 The second work station X and Y 14 to drive the drive unit 14e and 14f of the second motion wafer stage 14d also satisfies the centroid driving principle.

上述X向驱动单元13e和14e及Y向驱动单元13f和14f均为直线电机, 相应的上述第一作业台13的X向导轨13a及13b、第二作业台14的X向导轨14a及14b均可为直线电机的定子,也可为单独设置的导轨,而直线电机的定子设置在所述导轨上。 To the drive unit of the X and Y 13f 13e and 14e and 14f to the driving means are linear motors, said first operation corresponding X-table 13 and the guide 13a to 13b, the second work station X 14 to the guide rails 14a and 14b are the stator may be a linear motor, the guide rail may also be provided separately, and the stator of a linear motor provided on the guide rail.

所述第一及第二作业台13及14在靠近基台10的中心位置处设置有锁固件(未图示),当基台驱动装置11驱动基台IO转动前,或第一及第二作业台13 及14在不使用时,均通过X向驱动单元及Y向驱动单元将作业台驱动到锁固件附近,然后通过所述锁固件将所述承片台锁固,如此'有利于减小基台IO旋转时的转动惯量。 Said first and second work stations 13 and 14 near the base 10 at a central location is provided with a locking member (not shown), when the front base drive means 11 drives the rotation of the base IO, or the first and second 13 and work table 14 when not in use, to each drive unit by operating the driving unit X and the Y stage driving the lock near the firmware, then the locking by the locking of the wafer stage, so 'Save facilitate when a small moment of inertia of the rotating base IO.

控制模块15包括检测单元15a以及控制单元15b,其中,所述侦检测单元15a设置在基台IO上且用于检测基台10的转动角度,所述控制单元15b用于依据对准测量模块21及曝光模块22的对应工序完成状况控制驱动装置驱动基台10转动,所述控制单元15b还依据检测单元15a的检测结果控制基台锁固单元12将基台10锁固在主框架20上。 The control module 15 includes a detection unit 15a and a control unit 15b, wherein the detect detection unit 15a provided on the base for detecting the rotation angle IO and the base 10, the control unit 15b according to the alignment measurement module 21 and a step of exposure module 22 corresponding to the completion status of the control drive means 10 rotates the base station, the control unit 15b also controls based on the detection result of the detection unit 15a of the base unit 12 locking the locking base 10 on the main frame 20. 在本实施例中,所述检测单元15a为一圓弧光栅尺。 In the present embodiment, the detecting unit 15a is an arcuate scale.

减速模块16设置在所述U型支架20a的末端且用于驱动基台10减速。 Reduction module 16 is disposed at an end of the U-shaped bracket 20a and the base 10 for driving the deceleration. 在本实施例中,所述控制单元15b还依据纟全测单元15a的检测结果控制减速模块16驱动基台10减速。 In the present embodiment, the control unit 15b is also based on the detection result of the sensing unit 15a of the Si full deceleration control module 16 drives the base 10 is decelerated.

使用装设有本发明的旋转交换的双台系统的光刻机进行光刻主要包括上片工序、对准测量工序、停泊工序、作业台换位工序、曝光工序和下片工序,其中,对准测量工序和曝光工序为光刻机的主要工序,其他工序为辅助工序。 Use mounted rotating exchange system of the present invention is dual stage lithography machine including topsheet photolithography step, an alignment measurement step, step berth, workbench transposition step, an exposure step and a step lower sheet, wherein, on Motion measurement step and the exposure step of the main lithography step, another step for the secondary step.

所述第一作业台13及第二作业台14均包括对应上述工序且分别配合上片模块进行硅片载进的上片位、配合对准测量模块21 ^"待光刻硅片进行测量的对准测量位、配合锁固件锁固承片台的停泊位、配合曝光模块2 2对硅片进行曝光的曝光位以及配合下片模块进行下片的下片位,其中,对准测量位和曝光位为光刻机的主要作业位,其他工序为辅助作业位。 The first job and the second job table 13 includes a table 14 corresponding to the above-described steps and each wafer carrier module fitted into the topsheet topsheet position, aligned with the measurement module 21 ^ "silicon wafer to be measured lithography measuring the alignment position, with the locking member locking the wafer stage of parking spaces, with the exposure module 22 silicon wafers with an exposure position and the backsheet module backsheet backsheet position, wherein the alignment measurement position and bit main exposure lithography machine work position, the auxiliary working bits for the other processes.

参见图3至图7,配合参见图1和图2,图3至图7分别显示了第一作业台13处于上片位、对准测量位、停泊位、曝光位、下片位时第一作业台13上各部件在基台IO上的排布状态。 When Referring to FIGS. 3 to 7, with reference to Figure 1 and 2, Figures 3 to 7 show the topsheet 13 is in a first position the work table, the alignment measurement position, parking spaces, the exposure position, a first position backsheet the arrangement state of each member on the base table 13 IO operations. 第二作业台14各作业位与第一作业台13相同,故在it匕不再i羊述。 Each 14-bit operation and a second work table the same as the first work station 13, it is no longer in it i dagger sheep later.

以下以在本发明的旋转交换的双台系统上光刻三片涂覆有光阻的待光刻硅片Wl、 W2和W3来说明本发明的特点及功效,需说明的是,为简化说明,此处的光刻为仅光刻一图形的简化光刻(即无需更换曝光模块22中的掩模版),在未进行光刻作业时,所述第一和第二作业台13和14分别设置在基台IO的左右两侧且均处于停泊位,光刻硅片Wl、 W2和W3的流程图如图8所示,参见图8, 光刻任务开始后,首先第一作业台13先进行上片工序(S10),详细过程为: 第一承片台13d从停泊位运动到上片位,并通过上片模块将待光刻硅片Wl装载在第一承片台13d上。 The following on a dual stage lithography system of the present invention, the rotary switching three photolithographic wafer to be coated with a photoresist Wl, W2 and W3 to illustrate the characteristics and effects of the present invention, should be noted that, to simplify the description when the lithographic here is only a simplified lithographic lithographic pattern (i.e., no need to replace a reticle exposure module 22), is not performed by lithography, said first and second work stations 13 and 14, respectively left and right sides of the base is provided and IO are in parking spaces, photolithography wafer Wl, W2 and W3 of the flowchart shown in FIG. 8, see FIG. 8, after the task start photolithography, a first work station 13 to first for topsheet step (SlO), the detailed process is: a first wafer stage 13d from the berth is moved to place the topsheet, the topsheet and by photolithography wafer Wl module to be loaded on the first wafer stage 13d.

所述第一作业台13继续进行对准测量工序(S11),详细过程为:第一承片台13d运动到对准测量位,通过对准测量模块21对待光刻硅片Wl的表面形貌进行测量,其中,所述对准测量模块21在完成硅片Wl的测量后发送一测量完成触发信号至控制单元15b。 The first work station 13 continue alignment measurement step (S11), the detailed process is: a first wafer stage moves to the alignment measurement position 13d, the alignment treatment by photolithography Wl wafer surface topography measuring module 21 measurement, wherein said alignment measurement after completion of the measurement module 21 transmits a measurement wafer Wl completion trigger signal to the control unit 15b.

所述第一作业台13继续进行停泊工序(S12),详细过程为:完成测量的第一承片台13d运动到停泊位,并通过锁固件锁固在停泊位。 The first work station 13 moored to proceed step (S12), the detailed process is: the completion of a first measurement of the wafer stage is moved to the parking spaces 13d, and locking by the locking berth.

之后本发明的旋转交换的双台系统继续进行作业台换位工序(S20),详细过程为:控制单元15b接收到对准测量模块21发送的触发信号后控制基台驱动装置ll驱动基台10沿其中心轴线旋转18Q度完成第一作业台13与第二作业台14的换位。 After the rotation of the dual-stage switching system of the present invention continued work table transposition step (S20), the detailed process is: the trigger signal transmitted from the control unit 15b receives the alignment measurement module 21 controls the base drive means to drive the base station 10 ll 18Q rotation of the completion of the first job and the second job table 13 indexing table 14 along a central axis thereof. 此步骤中,设置在基台10上的检测单元检测基台1Q转动的角度, 控制单元15b依据检测到的转动角度驱动减速模块16以使基台10减速,并在基台IO转动了180度时控制基台锁固单元12将基台IO锁固在支撑台20c上。 In this step, disposed on the base 10 of the detecting unit detects the base station 1Q angle of rotation, the control unit 15b according to the rotation angle detected by the drive reduction module 16 so that the base 10 decelerated and rotated 180 degrees in the base IO base station control unit 12 locking the locking base IO on the support table 20c.

此后第一作业台13与第二作业台14并行运行。 After the first work station 13 running parallel with the second work station 14. 所述第一作业台13继续进行曝光工序(S13),详细过程为:第一承片台13d从停泊位运动到曝光位,并通过曝光模块22对硅片Wl进行曝光工序,其中,所述曝光模块22在完成硅片Wl的曝光工序后发送一曝光完成触发信号至控制单元15b。 The first work station 13 to continue exposure step (S13), the detailed process is: a first wafer stage 13d from the berth is moved to the exposure position, and exposing step by an exposure module 22 Wl of the silicon wafer, wherein, the exposure module 22 sends a silicon wafer after completion of an exposure step of exposing Wl completion trigger signal to the control unit 15b.

.所述第一作业台13继续进行停泊工序(S14),详细过程为:第一承片台13d从曝光位运动到停泊位,并通过锁固件锁固在停泊位。 The first work station 13 moored to proceed step (S14), the detailed process is: a first wafer stage 13d from the exposure position is moved to the parking position, by locking the locking berth.

而所述第二作业台14先进行上片工序(S30),详细过程为:第二承片台14d从停泊位运动到上片位,并通过上片模块将待光刻硅片W2装载在第二承片台14d上。 And said second work station 14 for the first topsheet step (S30), the detailed process is: the second wafer stage 14d from the berth is moved to place the topsheet, the topsheet and through the module to be mounted on the lithographic wafer W2 a second wafer stage 14d.

所述第二作业台14继续进行对准测量工序(S31),详细过程为:第二承片台14d运动到对准测量位,通过对准测量模块21对待光刻硅片W2的表面形貌进行测量,其中,所述对准测量模块21在完成硅片W2的测量后发送一测量 The second work station 14 continue alignment measurement step (S31), the detailed process is: the second wafer stage moves to the alignment measurement position 14d, treated wafer W2 photolithography alignment measurement module 21 by the surface topography measurement, wherein said alignment measurement module 21 transmits a measurement after completion of the measurement of the silicon wafer W2

所述第二作业台14继续进行停泊工序(S32),详细过程为:完成测量的第二承片台14d运动到停泊位,并通过锁固件锁固在停泊位。 The second work station 14 moored to proceed step (S32), the detailed process is: the completion of the wafer stage measured by the second motion to the parking spaces 14d, and locking by the locking berth.

为:控制单元15b接收到对准测量模块21发送的测量完成触发信号及曝光模块22发送的曝光完成触发信号后,控制基台驱动装置11驱动基台IO沿其中心轴 As follows: After the control unit 15b receives the measurement module 21 transmits the exposure is completed alignment measurement trigger signal transmitted from the exposure module 22 and a completion trigger signal, the control means 11 drives the base drive IO base along the central axis

晚的双台系统进行作业台换位工序(S21),详细过程线旋转180度完成第一作业台13与第二作业台14的换位。 The dual stage system night work table transposition step (S21), the detailed process line rotated by 180 degrees to complete the conversion of the first work table 13 and the second work station 14. 之后第一作业台13及第二作业台14并行工作。 After the first work station 13 and the second work station 14 to work in parallel.

所述第一作业台13继续进行下片工序(S15),详细过程为:第一承片台13d从停泊位运动到下片位,并通过下片模块将已完成光刻的硅片Wl从承片台上卸下。 The first work station 13 continue backsheet step (S15), the detailed process is: a first wafer stage 13d is moved to the parking position backsheet bits, and the module has been completed by the backsheet photolithography from wafers Wl Remove bearing substrate stage.

第一作业台13继续进行上片工序(S16),详细过程为:第一承片台13d 从下片位运动到上片位,并通过上片模块将待光刻硅片W3装载在第一承片台13d 上。 The first work station 13 continue topsheet step (S16), the detailed process is: a first wafer stage 13d is moved to the topsheet from the backsheet bit position, and by a photolithography topsheet module to be loaded in a first wafer W3 the wafer stage 13d.

第一作业台13继续进行对准测量工序(S17),详细过程为:第一承片台13d运动到对准测量位,通过对准测量模块21对待光刻硅片W3的表面形貌进行测量,其中,所述对准测量模块21在完成硅片W3的测量后发送一测量完成触发信号至控制单元15b。 The first work station 13 continue alignment measurement step (S17), the detailed process is: a first wafer stage 13d is moved to the alignment position measurements, surface topography treated wafer W3 by photolithography alignment measurement module 21 measure wherein the alignment measurement module 21 in the wafer W3 after completion of the measurement of a measurement completion trigger signal transmitted to the control unit 15b.

所述第一作业台13继续进行停泊工序(S18),详细过程为:第一承片台13d ^i、对准测量位运动到停泊位,并通过锁固件锁固在停泊位。 The first work station 13 moored to proceed step (S18), the detailed process is: a first wafer stage 13d ^ i, alignment measurement position is moved to the parking position, by locking the locking berth.

而所述第二作业台14继续进行曝光工序(S33),详细过程为:第二承片台14d从停泊位运动到曝光位,并通过曝光模块22对硅片W2进行曝光,其中, 所述曝光模块22在完成硅片W2的曝光后发送一曝光完成触发信号至控制单元15b。 And said second work station 14 continues exposure step (S33), the detailed process is: the second wafer stage 14d is moved to the exposure position from the parking position, and exposed by the exposure module 22 W2 of the silicon wafer, wherein, the exposure module 22 sends a completion exposed wafer W2 after completion of the exposure trigger signal to the control unit 15b.

所述第二作业台14继续进行停泊工序(S34) ,•详细过程为:第二承片台14d从曝光位运动到停泊位,并通过锁固件锁固在停泊位。 The second work station 14 moored to proceed step (S34), • detailed process is: the second wafer stage 14d from the exposure position is moved to the parking position, by locking the locking berth.

之后本发明的旋转交换的双台系统进行作业台换位工序(S22),详细过程为:控制单元15b接收到对准测量模块21发送的测量完成触发信号及曝光模块22发送的曝光完成触发信号后,控制基台驱动装置11驱动基台10沿其中心轴线旋转180度完成第一作业台13与第二作业台14的换位。 After rotating twin-stage switching system of the present invention work station transposition step (S22), the detailed process is: the measurement control unit 15b receives the transmission module 21 of the exposure is completed alignment measurement trigger signal transmitted and the exposure module 22 signals completion trigger , the control unit 11 drives the base drive base 10 is rotated to complete 180 degrees along the central axis 13 and the second work station table 14 of the first job transposition.

之后第一作业台13及第二作业台14并行工作。 After the first work station 13 and the second work station 14 to work in parallel.

所述第一作业台13继续进行曝光工序(S19),详细过程为:第一承片台13d从停泊位运动到曝光位,并通过曝光模块22对硅片W3进行曝光工序,其中, 所述曝光模块22在完成硅片W3的曝光工序后发送一曝光完成触发信号至控制单元15b。 The first work station 13 to continue exposure step (S19), the detailed process is: a first wafer stage 13d from the berth is moved to the exposure position, and an exposure step of exposing the module 22 by W3 of the silicon wafer, wherein, the exposure module 22 sends a silicon wafer after completion of the exposure step W3 a complete exposure trigger signal to the control unit 15b. 所述第一作业台13继续进行停泊工序(S110),详细过程为:第一承片台13d从曝光位运动到停泊位,并通过锁固件锁固在停泊位。 The first work station 13 moored to proceed step (S110), the detailed process is: a first wafer stage 13d from the exposure position is moved to the parking position, by locking the locking berth.

所述第二作业台14继续进行下片工序(S35),.详细过程为:第二承片台14d从停泊位运动到下片位,并通过下片模块将完成光刻的硅片W2从承片台上卸下。 The second work station 14 continue backsheet step (S35) ,. detailed process is: the second wafer stage 14d is moved to the parking position backsheet bits, and the complete module backsheet by photolithography from wafers W2 Remove bearing substrate stage.

所述第二作业台14继续进行停泊工序(S36),详细过程为:第二承片台14d从下片位运动到停泊位,并通过锁固件锁固在停泊位。 The second work station 14 moored to proceed step (S36), the detailed process is: the second wafer stage motion to position 14d from the backsheet parking spaces, and by locking the locking berth.

之后本发明的旋转交换的双台系统进行作业台换位工序(S23),详细过程为:控制单元15b接收到曝光模块22发送的曝光完成触发信号后,控制基台驱动装置ll驱动基台10沿其中心轴线旋转180度完成第一作业台13与第二作业台14的换位。 After rotating twin-stage switching system of the present invention work station transposition step (S23), the detailed process is: the exposure control unit 15b receives the exposure module 22 completes the transmission of the trigger signal, the base station apparatus controls driving base 10 ll rotated 180 degrees to complete the first work station 13 and the second transposition work table 14 along a central axis thereof.

所述第一作业台13继续进行下片工序(S111) ,•详细过程为:第一承片台13d从停泊位运动到下片位,并通过上片^t块将完成光刻的硅片W3从承片台上卸下。 The first work station 13 continue backsheet step (S111), • detailed process is: a first wafer stage 13d from the berth is moved to place the backsheet, the topsheet and through the completed wafer blocks ^ t lithography W3 is removed from the supporting substrate stage.

所述第一作业台13继续进行停泊工序(S112),详细过程为:第一承片台13d从下片位运动到停泊位,并通过锁固件锁固在停泊位。 The first work station 13 moored to proceed step (S112), the detailed process is: a first wafer stage is moved to position 13d from the backsheet parking spaces, and by locking the locking berth.

至此为止,发明的旋转交换的双台系统完成了覆盖有光阻的硅片Wl、 W2和W3的光刻。 Thus far, the inventive rotating twin-stage switching system to complete the wafer covered with photoresist Wl, W2 and W3 photolithography.

当使用本发明的旋转交换的双台系统对大批量的硅片进行光刻时,在对准测量模块21侧,有序地进行上片工序、下片工序、对准测量工序和停泊工序, 而在曝光模块22侧,有序地进行曝光工序和停泊工序,同时旋转交换的双台系统有序地进行作业台换位工序供完成曝光工序的硅片进行下片工序,并供完成对准测量工序的硅片进行曝光工序,于是批量硅片的光刻在本发明的旋转交换的双台系统上高效安全的进行。 When the present invention using a rotary-exchange system for dual stage lithography bulk wafer, alignment measurement module 21 side, step orderly topsheet, backsheet step, alignment measurement step and the step of parking, in the side of the exposure module 22, an exposure step and orderly parking step, while rotating dual stage system is orderly exchange work station for complete conversion step exposure process step backsheet silicon wafer, and the alignment is completed for measured wafer exposure process step is performed, then bulk silicon lithography safe and efficient on a dual stage system of the present invention the exchange rotation.

需说明的是,基台驱动装置1.1驱动基台1G沿其中心轴线旋转180度时, 可顺时针旋转也可逆时针旋转。 It is noted that, when the base drive base drive apparatus 1G 1.1 rotated 180 degrees along its central axis, clockwise rotation may also be rotated counterclockwise.

参见图8,其显示了本发明的旋转交换的双台系统的第二实施例的结构示意图,本发明的第二实施例主要是针对高加速度起停的大质量作业台,本实施例中的旋转交换的双台系统用于一光刻机中,本发明的旋转交换的双台系统包括基台30、基台驱动装置31、基台锁固单元32、第一作业台33、第二作业台34、控制模块35、减速模块36、连接单元37,其中,所述控制模块35包括检测单元35a和控制单元35b,其中,所述光刻机包括主框架40、对准测量模块U、 曝光模块42、上片模块(未图示)、下片模块(未图示)。 Referring to Figure 8, which shows a schematic view of a second embodiment of the dual stage rotary switching system of the present invention, a second embodiment of the present invention is primarily for high acceleration from stop massive work table, the present embodiment dual rotary stage system for the exchange of a lithography machine, the rotation of the exchange of the present invention comprises a dual stage system the base station 30, the base drive means 31, locking the base unit 32, a first work station 33, a second operation stage 34, the control module 35, the deceleration module 36, connected to unit 37, wherein, the control module 35 includes a detection unit 35a and control unit 35b, wherein the lithography machine includes a main frame 40, alignment measurement module U, exposure module 42, the topsheet module (not shown), the lower piece module (not shown).

主框架40实施为一具有緩沖减震功能的气浮支撑台,所述气浮支撑台通过气浮结构40a来实现緩冲减震功能,所述主框架为n型框架。 A main frame 40 having a flotation embodiment is a function of shock absorption support table, said support table to achieve flotation shock absorption function by flotation structure 40a, the n-type main frame is a frame.

所述基台30为一可将作业台13、 14的运动反力转化为内力而消除的平4軒 The base 30 may be a 13, 14 counter-movement force into the work table to eliminate the internal force level 4 Hin

质量体。 Mass.

所述基台驱动装置31包括伺服电机31a以及与伺服电机31a相连的变速装置31b。 The base station 31 includes a servo motor drive means and the transmission means 31a and 31b is connected to the servo motor 31a. 在本实施例中,可通过伺服电机31a与变速装置31b的共同运作驱动基台30的转动。 In the present embodiment, the base 30 may be rotatably driven by a common servo motor 31a and the transmission operating device 31b.

第一作业台33和第二作业台34与基台30间设置有缓冲减震结构(未图示)。 The first work station 33 and the second work station 34 and the base 30 is provided with a shock absorption structure (not shown). 所述第一作业台33与第二作业台34在进行作业时,所产生的运动反力可通过 The first work station 33 and work table 34 when the second operation is performed, the movement reaction force generated by

平衡质量体及緩冲减震结构化解为内力而抵消。 Balancing mass and shock absorption structure to resolve internal forces and offset.

连接单元37与变速装置31b相连,用于基台驱动装置31驱动基台30转动时连接基台30和基台驱动装置31。 Connection unit 37 is connected to the transmission means 31b, a base connected to drive means 31 drives the base 30 upon rotation of the base 30 and the base drive 31. 在本实施例中,所述连接单元为电磁耦合装置。 In the present embodiment, the connecting means is an electromagnetic coupling device.

为减少基台驱动装置31的震动对基台30造成影响,可将变速装置31b的输出轴31c设置为升降轴,在需驱动基台转动时,启动升降轴使连接单元37与基台30接触,形成基台30与基台驱动装置31的连接,若基台转动完成时,可将升降轴放下,使连接单元37不与基台30相接触,如此可避免基台驱动装置31的震动影响基台30。 In order to reduce the base drive vibration 31 from adversely affecting the base station 30, may be the transmission device 31b of the output shaft 31c to lift shaft, the need to drive the base is rotated, to start lifting spindle the connecting unit 37 in contact with the base station 30 forming the base 30 and the base drive connection device 31, if the base is rotated complete, the lifting shaft down, the connecting unit 37 is not 30 in contact with the base, thus can avoid the influence of the base drive 31 vibration base station 30.

上述第二实施例中的旋转交换的双台系统避免了大质量作业台换位所造成的震动问题,大大提高了旋转换位的稳定性。 Dual stage system the second embodiment according to the rotation of the exchange to avoid the problem of massive work table vibration caused by transposition, greatly improving the stability of rotation of transposition. . .

综上所述,本发明的旋转交换的双台系统的两作业台共用一套上片及下片模块,大大节约了成本,再者本发明的旋转交换的双台系统通过基台驱动装置驱动基台转动,即可完成设置在基台上的两作业台的换位,两作业台无运动重叠区域,避免了两作业台碰撞的隐患,再者,旋转交换的双台系统的结构也得到了简化。 In summary, two dual-stage system operating rotational exchanged common set of the present invention the topsheet and backsheet module, significant cost savings, dual-stage system for a rotating Moreover the present invention by the exchange of the base driving means the base is rotated, two operations to complete the conversion table is provided on a base, the two work table no motion overlapping area, two workbench could avoid the collision, moreover, the rotational structure of the double stage system also exchange simplified.

Claims (14)

1、一种旋转交换的双台系统,用于一具有主框架且具有两作业位的电子设备中,其特征在于,该旋转交换的双台系统包括设置在主框架上的基台、对应该两作业位且对称设置在该基台上的第一及第二作业台、用于驱动基台沿该基台中心转动的基台驱动装置以及用于控制基台驱动装置驱动基台转动以实现第一作业台与第二作业台换位的控制模块,其中该主框架包括U型支架、平均分布在U型支架底部的多个减震结构以及设置在减震结构上用于支撑基台的支撑台,该旋转交换的双台系统还包括设置在支撑台上且用于将基台锁固在该支撑台上的基台锁固单元,该控制模块还控制基台锁固单元将基台锁固在支撑台上。 1, a system for dual stage switching rotation, having a main frame and having a work position of the two electronic devices, wherein the double-stage system comprises a rotating base exchanged disposed on the main frame, to be the first and second working table work position and two symmetrically disposed in the base table for driving the base along the base of the base drive means for controlling the rotation center of the base drive means to effect rotation of the base the first work station and a second work station transposition control module, wherein the main frame includes a U-shaped bracket, a plurality of evenly distributed in the shock absorbing structure and the bottom of the U-shaped bracket is provided on a structure for supporting the damper base station support table, rotating the dual stage system further comprises switching on a support table and the base for locking the locking means in the base of the support table, the control module also controls the locking unit to the base station group locking the support table.
2、 如权利要求1所述的旋转交换的双台系统,其特征在于,该第一及第二作业台均包括平行排布在基台一侧的两X向导轨、跨设在该两X向导轨间的Y向导轨、设置在该Y向导轨上且用于承载硅片的承片台、分别驱动该承片台沿X方向以及Y方向运动的X向驱动单元以及Y向驱动单元。 2. The rotary switching dual stage system according to claim 1, wherein the first and second work stations each comprise a base arranged in parallel to one side of the two X-direction guide, disposed across the two X between the Y direction guide rails disposed at the wafer stage and the Y-direction on the guide rails for carrying the silicon, respectively, for driving the wafer stage in the X and Y directions of movement to the driving unit X and Y to the driving unit.
3、 如权利要求2所述的旋转交换的双台系统,其特征在于,该则。 3, dual stage system as claimed in rotation exchange claim 2, wherein, if the.
4、 如权利要求2所述的旋转交换的双台系统,其特征在于,该X向驱动单元及Y向驱动单元均为直线电机。 4, dual stage system as claimed in claim rotating exchanged in claim 2, wherein the X linear motors are the driving unit to the driving unit and a Y.
5、 如权利要求1所述的旋转交换的双台系统,其特征在于,该控制模块包括一设置在基台上且用于检测基台转动角度的检测单元以及一用于控制基台驱动装置驱动基台转动的控制单元。 5. The rotary exchanged dual stage system as recited in claim 1, wherein the control module comprises a control means drives a base disposed on a base and detecting means for detecting the rotation angle of the base station and for a rotation drive control unit of the base.
6、 如权利要求1所述的旋转交换的双台系统,其特征在于,该支撑台为气浮支撑台。 6, dual stage system as claimed in rotation exchanged in claim 1, wherein the supporting table is the air bearing support table.
7、 如权利要求1所述的旋转交换的双台系统,其特征在于,该基台驱动装置设置在该支撑台的底部。 7, as claimed in the dual stage rotary switching system according to claim 1, characterized in that the drive means provided at the base bottom of the support table.
8、 如权利要求1所述的旋转交换的双台系统,其特征在于,该基台锁固单元为电f兹耦合装置。 8, as claimed in the dual stage rotary switching system according to claim 1, characterized in that the base unit is a locking device electrically coupled hereby f.
9、 如权利要求1所述的旋转交换的双台系统,其特征在于,该U型支架末端还^L置有用于驱动基台减速的减速才莫块。 9, dual stage systems according to the rotation of the exchange to claim 1, characterized in that the end of the U-shaped bracket further ^ L set only for the base drive blocks Mo deceleration deceleration.
10、 如权利要求1所述的旋转交换的双台系统,其特征在于,该基台驱动装置为伺服电机。 10, dual stage system as claimed in rotation exchanged in claim 1, characterized in that the abutment means is a servo motor drive.
11、 如权利要求l所述的旋转交换的双台系统,其特征在于,该基台驱动装置包括一伺服电机以及一与伺服电机相连的变速装置。 11, dual stage system rotating exchange according to claim l, wherein the base station comprises a servo motor drive means and transmission means connected to a servo motor.
12、 如权利要求l所述的旋转交换的双台系统,其特征在于,该电子设备为光刻才几。 12, dual stage system rotating exchanged according to claim l, wherein the electronic apparatus is a lithography only a few.
13、 如权利要求12所述的旋转交换的双台系统,其特征在于, 该光刻机具有一上片模块和一下片模块。 13, dual stage system as claimed in rotation exchanged in claim 12, characterized in that, the lithography machine having an upper sheet and a lower sheet module modules.
14、 如权利要求12所述的旋转交换的双台系统,其特征在于, 该两作业位分别为对准测量位和曝光位。 14, dual stage system as claimed in rotation exchanged in claim 12, characterized in that the two job bits are bit alignment measurement and exposure position.
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