CN100492068C - Manufacturing method of color filter - Google Patents
Manufacturing method of color filter Download PDFInfo
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- CN100492068C CN100492068C CNB2007101010778A CN200710101077A CN100492068C CN 100492068 C CN100492068 C CN 100492068C CN B2007101010778 A CNB2007101010778 A CN B2007101010778A CN 200710101077 A CN200710101077 A CN 200710101077A CN 100492068 C CN100492068 C CN 100492068C
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- impedance material
- black matrix
- colorant
- substrate
- ink
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Abstract
This invention discloses a method of forming colour filter, it involves following steps: offer a baseplate; form a black matrix on the baseplate for defining one pixel district at least; drop impedance material into one pixel district at least; make a plasma processing, change the top surface of the black matrix with inkphobic nature; remove the impedance material to expose the baseplate; drop pigments into one pixel district at least; as well as solidify the pigments to emerge smooth film. According to the method of this invention, when we making the plasma processing, we can avoid the depression of inkphile of the bottom effectively through Dropping impedance material into pixel district; and improve the fill status of the pigments in the pixel district, make pigments overlay wholly and uniformity.
Description
Technical field
The present invention relates to a kind of manufacture method of optical filter, it avoids pixel region bottom to reduce the ink affinity of bottom when the ink-resistant plasma treatment by impedance material, and then improves the flatness of colorant film.
Background technology
Development along with various Information technologies, most signal of video signal has been changed into the mode of digital transmission all by simulation at present, make traditional cathode-ray tube be replaced by the flat-panel screens of a new generation, for example LCD, plasma display, light emitting diode indicator etc.LCD is because the every advantage on the Cost And Performance, and becomes considerable product in the middle of the flat-panel screens.And use colored filter to realize the display effect of colorize in the middle of the LCD usually.The common framework of colored filter on a transparent glass substrate, mainly dispose on this transparent glass substrate black matrix in order to shading (Black Matrix, BM), and the colored light-filtering units of arranging corresponding to each pixel.Then colorant is sprayed in the pixel region, form the colorant film again via drying process by shower nozzle.
Because must the suitable colorant amount of control in the process that sprays into of colorant, stride across black matrix and flow to situation in the contiguous pixel region otherwise may produce colorant.Therefore in known technology, can have high ink-resistant so that deceive matrix by for example black matrix being carried out plasma treatment usually.Yet at this moment, the substrate in the pixel region also can be exposed to the environment of plasma treatment simultaneously, makes that the ink affinity of the interior substrate of pixel region can be destroyed.This is difficult for being attached to substrate surface after making colorant be splashed into pixel region, and is easy to generate the shortcoming that colorant can't completely fill up pixel region, and then can influence the color representation of optical filter.
In view of this, just need provide a kind of new filter production method, improve the quality of optical filter in mode simply and cheaply.
Summary of the invention
One aspect of the present invention is to provide a kind of manufacturing method of color filters, to improve the flatness of colorant film.
Another aspect of the present invention is to provide a kind of manufacturing method of color filters, it avoids the bottom to reduce the ink affinity of bottom when the ink-resistant plasma treatment by splash into impedance material in pixel region, and then improves the fill up situation of colorant at pixel region.
One aspect of the present invention discloses a kind of method that forms colored filter, and this method comprises the following step: a substrate is provided; Formation one black matrix on this substrate (Black Matrix, BM), to define at least one pixel (pixel) zone; In at least one pixel region, splash into impedance material; Carry out plasma treatment, the top surface of black matrix is changed into had ink-resistant character (lyophobic); Remove this impedance material, to expose substrate; In at least one pixel region, splash into colorant (coloring agent); And the curing colorant, to produce smooth colorant film (color film).
In another embodiment of the present invention, also comprise the following step: the impedance material that splashes into is controlled in a scheduled volume, makes impedance material can cover the substrate in the pixel region fully.
In another embodiment of the present invention, black matrix has a sidewall, and the scheduled volume of impedance material also further makes impedance material can cover at least a portion of the sidewall of black matrix.
In another embodiment of the present invention, ink-resistant character makes colorant be difficult for being attached to the top surface of black matrix.And impedance material is not subjected to the influence of plasma treatment in order to the substrate in the protection pixel region, and keeps ink-receptive character, makes colorant be easy to be attached to the substrate in the pixel region.
In an embodiment more of the present invention, the step of plasma treatment also comprises: the top surface at black matrix forms skim, and this thin layer has ink-resistant character.
Useful technique effect of the present invention is: by splash into impedance material in pixel region, can effectively avoid when the ink-resistant plasma treatment, reducing the ink affinity of bottom, and then improve the fill up situation of colorant at pixel region, and it is complete, even to make that colorant covers.
Description of drawings
Figure 1A is the vertical view that shows according to the substrate of the embodiment of the invention;
Figure 1B is the lateral sectional view of substrate among Figure 1A;
Fig. 2 shows the pixel region that impedance material is splashed into substrate shown in Figure 1B;
Fig. 3 A is the synoptic diagram that shows according to the plasma treatment of the embodiment of the invention;
Fig. 3 B is the synoptic diagram that shows according to another plasma treatment of the embodiment of the invention;
Fig. 4 is the synoptic diagram that the substrate that shows Fig. 3 A is finished plasma treatment;
Fig. 5 shows the pixel region that colorant is splashed into substrate shown in Figure 4;
Fig. 6 is the distribution plan of colorant in substrate; And
Fig. 7 shows to solidify the synoptic diagram that colorant forms the colorant film.
Wherein, description of reference numerals is as follows:
100 substrates, 102,104,106 substrate surfaces
120 black matrix 122,124,126 pixel regions
The sidewall of the top surface 129 black matrixes of 128 black matrixes
140 shower nozzles, 142 impedance materials
152,154,156 impedance material films, 153,155,157 impedance material films
160 plasma treatment appts, 170 ink-resistant character thin layers
182,184,186 shower nozzles, 183,185,187 colorants
192,194,196 colorants distribution, 202,204,206 colorant films
Embodiment
Below explanation at first provides substrate 100 and form black matrix 120 on this substrate 100 according to wherein a kind of embodiment of the present invention, is the vertical view of the substrate 100 of present embodiment shown in Figure 1A.Figure 1B then be among Figure 1A substrate 100 along the lateral sectional view of A-A ' line.In accompanying drawing of the present invention, black matrix 120 defines three pixel regions 122,124 and 126, is respectively three kinds of color pixel zones as colored filter.Yet must be noted that at this, only show in the accompanying drawing that three pixel regions are for convenience of explanation, those skilled in the art should know that black matrix 120 of the present invention can have the pixel region of a greater number or lesser amt, and can't influence enforcement of the present invention.Black matrix 120 has top surface 128 and sidewall 129, and black matrix 120 defined pixel regions 122,124 and 126 then expose the surface 102,104 and 106 of substrate 100 respectively.
Then impedance material 142 is splashed in the pixel region 122,124 and 126 of substrate shown in Figure 1B 100, as shown in Figure 2 by shower nozzle 140.Only illustrate among Fig. 2 splash into an impedance material 142 to pixel region 122 so that describe, and the present invention does not impose any restrictions aspect the impedance material 142 splashing into, for example can impedance material 142 be splashed into respectively in pixel region 122,124 and 126 any order, or the program that also can use a plurality of shower nozzles 140 to quicken to splash in another embodiment, perhaps in another embodiment, do not splash into impedance material 142 to several pixel regions wherein according to the actual design situation is also alternative.In the present embodiment, impedance material 142 comprises ink-receptive material and spraying agent, and in other embodiments, impedance material 142 also can use other to have the material of similarity.Employed ink-receptive material can comprise titanium dioxide or silicon dioxide or other analog in the impedance material 142, and employed spraying agent then can comprise water or ethanol or other analog in the impedance material 142.
Fig. 3 A is the synoptic diagram that shows according to the plasma treatment of the embodiment of the invention.As shown in Figure 3A, the impedance material 142 that is splashed among Fig. 2 forms impedance material film 152,154 and 156 respectively in pixel region 122,124 and 126, and covers the substrate surface 102,104 and 106 in pixel region 122,124 and 126 fully.Plasma treatment appts 160 is used for substrate 100 is carried out plasma treatment, and plasma treatment is a kind of ink-resistant modification technology, only is signal square and a not shown detailed assembly in the accompanying drawings, and so it does not influence enforcement of the present invention.By this plasma treatment; the top surface 128 of black matrix 120 can be changed to having ink-resistant character; yet, can protect script exposed substrate surface 102,104 and 106 in pixel region 122,124 and 126 respectively simultaneously by impedance material film 152,154 and 156.Therefore, the top surface that will deceive matrix 120 change to have ink-resistant character in, by the protection of impedance material film 152,154 and 156, can keep the ink-receptive character of substrate surface 102,104 and 106 again.
In fact the present invention can have many different embodiments, but not the specific implementations that is defined in herein to be narrated.For example Fig. 3 B is the synoptic diagram that shows according to another plasma treatment of the embodiment of the invention.The difference of Fig. 3 B and Fig. 3 A is that the impedance material 142 that control is splashed into is in suitable amount, makes impedance material film 153,155 and 157 can cover the sidewall 129 of black matrix 120.Therefore, impedance material film 153,155 and 157 is except protective substrate surface 102,104 and 106, and further the sidewall 129 of matrix 120 is deceived in protection.Certainly, implement different situations when of the present invention according to reality, the amount of impedance material 142 can be done appropriateness adjustment, and only covers the part of the sidewall 129 of black matrix 120.
Fig. 4 is the synoptic diagram that the substrate 100 that shows Fig. 3 A is finished plasma treatment.Can at top surface 128 places of black matrix 120 form ink-resistant character thin layer 170 by plasma treatment this moment.Must be noted that at this accompanying drawing of the present invention only is a synoptic diagram,, that is to say that each assembly in the accompanying drawing is not proportionally drawn so that the present invention is described easily and clearly.Then, remove impedance material film 152,154 and 156, to expose substrate surface 102,104 and 106.This step can make water or other solvent that impedance material film 152,154 and 156 is removed, and makes the present invention easily to implement and need not use complicated technology or additional expensive equipment.
Remove impedance material film 152,154 and 156 and expose substrate surface 102,104 and 106 after, by shower nozzle 182,184 and 186 colorant 183,185 and 187 is splashed into to the pixel region 122,124 and 126 of substrate 100 shown in Figure 4, as shown in Figure 5.Pixel region 122,124,126 is divided at least three group color regions (for example being blue, green and red), and colorant 183,185 and 187 uses one of them of corresponding three primary colors colorant, inserts corresponding color region respectively, to form colored filter.Ink-resistant character thin layer 170 makes colorant be difficult for being attached to the top surface 128 of black matrix 120, substrate surface 102,104 and 106 is still keeping ink-receptive character simultaneously, make colorant 183,185 and 187 be easy to be attached to substrate surface 102,104 and 106, do not cover incomplete or uneven problem and can not produce colorant, colorant as shown in Figure 6 distributes 192,194 and 196.
At last, solidify colorant 183,185 and 187, to produce smooth colorant film 202,204 and 206, as shown in Figure 7.As previously mentioned, colorant is covered substrate surface 102,104 and 106 fully, makes that the colorant film 202,204 and 206 after solidifying can have smooth and uniformly good character.In the present embodiment, curing schedule is to use drying process, and it is solid-state to make that colorant is converted into by liquid state, and in other embodiments, curing schedule also can use different modes according to the difference of colorant character.
The above embodiments are in order to description the present invention, yet technology of the present invention still can have many modifications and variation.Therefore, the present invention is not limited to the description of above specific embodiment, and protection scope of the present invention should comprise all, and this type of is revised and variation, so that can real spirit according to the invention and scope.
Claims (16)
1. method that forms optical filter comprises:
Substrate is provided;
Form black matrix on this substrate, this black defined matrix goes out at least one pixel region;
Impedance material is splashed in described at least one pixel region;
Carry out plasma treatment, the top surface of this black matrix is changed into had ink-resistant character;
Remove this impedance material, to expose this substrate;
Colorant is splashed in described at least one pixel region; And
Solidify this colorant, to produce smooth colorant film.
2. the method for claim 1, the step that wherein splashes into this impedance material also comprises: this impedance material that will splash into is controlled in a scheduled volume, makes this impedance material can cover the substrate in the described pixel region fully.
3. method as claimed in claim 2 wherein should have a sidewall by black matrix, and this impedance material makes further also that when being controlled in this scheduled volume this impedance material can cover at least a portion of the sidewall of this black matrix.
4. the method for claim 1, wherein the step of this plasma treatment also comprises: the top surface at this black matrix forms skim, and this thin layer has ink-resistant character.
5. the method for claim 1, wherein this curing schedule uses drying process, and it is solid-state to make that colorant is converted into by liquid state.
6. the method for claim 1, wherein this impedance material comprises ink-receptive material and spraying agent.
7. method as claimed in claim 6, wherein this ink-receptive material comprises titanium dioxide or silicon dioxide.
8. method as claimed in claim 6, wherein this spraying agent comprises water or ethanol.
9. method that forms colored filter comprises:
One substrate is provided;
Form a black matrix on this substrate, this black defined matrix goes out a plurality of pixel regions, and described pixel region is divided at least three group color regions;
Impedance material is splashed in the described pixel region;
Carry out plasma treatment, make the top surface of this black matrix have ink-resistant character;
Remove this impedance material, to expose this substrate;
Each group of described pixel region splash in color region trichromatic at least colorant one of them; And
Solidify described colorant, to produce a smooth colorant film.
10. method as claimed in claim 9, the step that wherein splashes into this impedance material also comprises: this impedance material that will splash into is controlled in a scheduled volume, makes this impedance material can cover the substrate in the described pixel region fully.
11. method as claimed in claim 10 wherein should have a sidewall by black matrix, and this impedance material makes further also that when being controlled in this scheduled volume this impedance material can cover at least a portion of the sidewall of this black matrix.
12. method as claimed in claim 9, wherein the step of this plasma treatment also comprises: the top surface at this black matrix forms skim, and this thin layer has this ink-resistant character.
13. method as claimed in claim 9, wherein this curing schedule uses drying process, and it is solid-state to make that colorant is converted into by liquid state.
14. method as claimed in claim 9, wherein this impedance material comprises ink-receptive material and spraying agent.
15. method as claimed in claim 14, wherein this ink-receptive material comprises titanium dioxide or silicon dioxide.
16. method as claimed in claim 14, wherein this spraying agent comprises water or ethanol.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2007101010778A CN100492068C (en) | 2007-04-26 | 2007-04-26 | Manufacturing method of color filter |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2007101010778A CN100492068C (en) | 2007-04-26 | 2007-04-26 | Manufacturing method of color filter |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN101034177A CN101034177A (en) | 2007-09-12 |
| CN100492068C true CN100492068C (en) | 2009-05-27 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB2007101010778A Expired - Fee Related CN100492068C (en) | 2007-04-26 | 2007-04-26 | Manufacturing method of color filter |
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Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104090419A (en) * | 2014-07-11 | 2014-10-08 | 京东方科技集团股份有限公司 | Color filter, manufacturing method thereof and display device |
| CN110928025A (en) * | 2019-11-26 | 2020-03-27 | Tcl华星光电技术有限公司 | Color film substrate, manufacturing method thereof and display device |
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- 2007-04-26 CN CNB2007101010778A patent/CN100492068C/en not_active Expired - Fee Related
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| Publication number | Publication date |
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| CN101034177A (en) | 2007-09-12 |
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Granted publication date: 20090527 Termination date: 20210426 |