CN100486929C - Method for preparing polymerized boron silazane precursor - Google Patents
Method for preparing polymerized boron silazane precursor Download PDFInfo
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- CN100486929C CN100486929C CNB2007100357339A CN200710035733A CN100486929C CN 100486929 C CN100486929 C CN 100486929C CN B2007100357339 A CNB2007100357339 A CN B2007100357339A CN 200710035733 A CN200710035733 A CN 200710035733A CN 100486929 C CN100486929 C CN 100486929C
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Abstract
The process of preparing polyborosilazane precursor with boroalkyl halide, silane halide and alkyl amine as initial material includes the following steps: mixing boroalkyl halide and silane halide in the molar ratio of 0.1-10 and alkyl amine in excessive amount to react; filtering the product to obtain filtrate as low molecular borosilazane; heating the low molecular borosilazane to polymerize and cooling to obtain polyborosilazane precursor. The polyborosilazane precursor has cheap material, simple reaction process, high yield, homogeneous element distribution in atom level, and effectively controlled machining performance and physical performance.
Description
Technical field
The present invention relates to a kind of preparation method of polymerized boron silazane precursor.
Background technology
The polynary pottery that contains elements such as Si, B, N, C has excellent hot strength, high-modulus and excellent high-temperature oxidation and high-temperature creep resistance, therefore, Si-B-N-C system pottery has important application prospects in Aeronautics and Astronautics, weapons, naval vessels etc. need the field of high strength, high-modulus, high temperature resistant, anti-oxidant, heat-shock resistance, high temperature and creep resistance material.
The precursor conversion method is the effective ways of this class stupalith of preparation.At present, the preparation method of Si-B-N-C ceramic precursor mainly contains polymkeric substance route and monomer route.
The polymkeric substance route is meant that the polymkeric substance that polysilazane etc. is contained the Si-N key with boron-containing compound carries out modification and obtains side group is the Si-B-N-C precursor that contains the B group.Modification obtains the Si-B-N-C ceramic fiber precursor to the hydrogenation polysilazane with the derivative of borine or borazine as Sneddon etc.Owing to be that polymkeric substance is carried out modification, therefore, the precursor that obtains by this approach generally has higher molecular weight and certain processing characteristics, but be difficult to that element is distributed and reach the even of atom, molecular level, like this, when resulting pottery at high temperature was on active service, easily generation separated and workpiece was lost efficacy.
The monomer route is meant the synthetic earlier monomer that contains Si, B, N, four kinds of elements of C, this monomer often is called as single source precursor (Single Source Precursor), make the precursor polymerization of single source then by rights, obtain the poly-borosilicate azane of Si-B-N-C ceramic precursor.The The Nomenclature Composition and Structure of Complexes feature that the precursor that this approach obtains has often can remain in the target ceramic product.Is starting raw material as Jansen etc. with hexamethyldisilazane, silicon tetrachloride, boron trichloride etc., at low temperatures through polystep reaction, and at first synthetic single source precursor Cl
3Si-NH-BCl
2(TADB), separate by ammonia again or aminolysis obtains N-methyl polymerized boron silazane precursor.This synthesis path process very complicated, the cost height is unfavorable for applying.
Summary of the invention
The objective of the invention is to overcome the above-mentioned defective of prior art, provide a kind of technology simple, the preparation method of the polymerized boron silazane precursor that cost is low.
The objective of the invention is to be achieved through the following technical solutions: it comprises the high molecular of the synthetic and low molecule borosilicate azane of low molecule borosilicate azane, with boron alkyl halide, halosilanes, alkyl ammonium compounds is starting raw material, mix according to a certain ratio, after reaction is finished product is filtered, filtrate is low molecule borosilicate azane; To hang down molecule borosilicate azane high molecular under the condition of heating then, promptly obtain polymerized boron silazane precursor after the cooling.
Concrete preparation process comprises the steps:
(1) will vacuumize repeatedly with the reactor of whipping appts, fills drying nitrogen at least three times, getting rid of air and moisture wherein, and reactor is chilled to subzero 8-12 ℃ (preferred subzero 10 ℃) in advance.
(2) with raw material boron alkyl halide, halosilanes and alkylamine by the boron alkyl halide: the mol ratio of halosilanes is 1:10-10:1, proportioning (the preferred 1:3-3:1 that alkylamine is excessive; More preferably 1:2-2:1), add in the reactor;
The molecular formula of described boron alkyl halide is as follows:
BX
aR
1 3-a
Wherein, halogen X=Cl, Br (preferred X=Cl); R
1Organic groups such as=H, methyl, ethyl, propyl group, butyl or phenyl (preferred R
1=H, methyl); A=1,2,3 (preferred a=2,3); The mixture of the boron alkyl halide that described boron alkyl halide can also be above-mentioned different substituents;
Described halosilanes is an alkyl halogen silanes, and its general molecular formula is:
R
2 mR
3 nSiR
4 (4-m-n)
Alkyl R wherein
2And R
3Organic groups such as=H, methyl, ethyl, propyl group, butyl or phenyl (preferred R
2And R
3=H, methyl); R
2And R
3Can be identical also can be different; Halogen R
4=Cl, Br (preferred R
4=Cl); M and n=0,1,2,3,4, m+n<4 (preferred m+n=2) and m, n are not 0 simultaneously; Described halosilanes can also be the mixture of the halosilanes of above-mentioned different substituents;
The general molecular formula of described alkyl ammonium compounds is:
R
5 pR
6 qN
R wherein
5And R
6Organic groups such as=H, methyl, ethyl, propyl group, butyl or phenyl (preferred R
5And R
6=H, methyl, and one of them is H), R
5And R
6Can be the same or different; P and q=0,1,2,3, p+q=3;
Described boron alkyl halide, halosilanes are added in the reactor of the band whipping appts that is chilled to subzero 8-12 ℃ in advance in the mode of injection, stir on one side then, add the third monomer alkylamine on one side, be swift in response and carry out, heat release raises system temperature and produces precipitation, when system temperature no longer raises, stop the adding of the third monomer alkylamine;
When (3) treating that system temperature is reduced to room temperature, (2) step products therefrom is filtered under the protection of drying nitrogen;
(4) (3) step gained filtrate is placed the reactor of band prolong and cracking post, reflux, slowly common thermal polycondensation is carried out in heating, the end reaction temperature is 200-500 ℃ (preferred 250-400 ℃), the cracking column temperature is 300-500 ℃ (preferred 350-470 ℃), and insulation 1-10 hour (preferred 2-5 hour) under this temperature;
(5) system temperature is reduced to 100-350 ℃ (preferred 180-300 ℃), underpressure distillation 0.3-4 hours (preferred 0.5-2 hour) removes and desolvates, behind the small molecules, reduces to room temperature, promptly obtains the poly-borosilicate azane of water white precursor;
The polymerized boron silazane precursor that the present invention makes is elementary composition by Si, B, N, C, H etc., wherein, Si exists with Si-N, Si-C form, B mainly exists with the BN form, according to the boron alkyl halide raw material difference of using, also can have chemical bonds such as C-B, H-B, N exists with N-Si, N-B form, and C is with Si-CH
3Form exists.
The raw materials cost that the present invention selects for use is cheap, and is from the horse's mouth, and reaction process is simple, and higher synthetic yield is arranged; Adopt the preparation method of small molecules halosilanes, small molecules boron alkyl halide and alkyl ammonium compounds copyrolysis, can realize the uniform distribution of each atoms of elements level level, avoided the preparation of follow-up stupalith and the detrimentally affect in the use; By control, can regulate and control the processing characteristics and the physicals of precursor better to low molecule borosilicate azane synthesis condition (proportioning and the wherein halogen-containing quantity that comprise boron alkyl halide, halosilanes) and high molecular condition (comprising temperature of reaction and reaction times) thereof.
Description of drawings
Fig. 1 is the typical infrared spectrogram of embodiment 1 gained polymerized boron silazane precursor;
Fig. 2 is the typical Raman spectrogram of embodiment 1 gained polymerized boron silazane precursor;
Fig. 3 is the full spectrogram of XPS of embodiment 1 gained polymerized boron silazane precursor;
Fig. 4 is embodiment 1 a gained polymerized boron silazane precursor
1H-NMR spectrogram;
Fig. 5 is embodiment 1 a gained polymerized boron silazane precursor
11B-NMR spectrogram.
Embodiment
The invention will be further described below in conjunction with embodiment.
Embodiment 1:
(1) with the 250ml there-necked flask of the electronic whipping appts of reactor band, vacuumize, fill drying nitrogen repeatedly three times, get rid of wherein air and moisture, then reactor is chilled in advance subzero 10 degree; (2) get methyl hydrogen dichlorosilane 0.3mol (34.5g) with syringe, boron trichloride 0.15mol (17.6g) successively is injected in the there-necked flask of drying nitrogen protection, stir on one side, feed purity on one side and be 99.999% ammonia to reaction system, system heats up rapidly, and produces a large amount of precipitations; When temperature no longer raises, stop the feeding of ammonia; (3) when system temperature is reduced to room temperature, the system product is filtered in glove box; (4) (3) step gained filtrate is placed the reactor of band prolong and cracking post, reflux, under the protection of drying nitrogen, slowly common thermal polycondensation is carried out in heating, and temperature of reactor is 320 ℃, and the cracking column temperature is 450 ℃, is incubated 3 hours; (5) system temperature is reduced to 260 ℃, underpressure distillation 50 minutes removes and to desolvate, behind the small molecules, reduce to room temperature, obtains water white solid state precusor 24.1g, and productive rate is 90.8% of a theoretical yield.Fusing point is 145-151 ℃, can be dissolved in anaerobic solvents such as chloroform, toluene.
Its infrared spectrogram, Raman spectrogram, the full spectrogram of XPS,
1H-NMR spectrogram,
11B-NMR spectrogram is respectively as Fig. 1, Fig. 2, Fig. 3, Fig. 4, shown in Figure 5.
By Fig. 1 and Fig. 2 as seen, contain Si-N, B-N, Si-CH in the precursor PBSZ structure
3, chemical bonds such as N-H, Si-H.
As seen from Figure 3, the target precursor mainly is made up of Si, B, N, C, H and a spot of O.
From Fig. 4 as seen, the H among the precursor PBSZ presents complicated structure, and wherein the multiplet between δ=0-0.41ppm is CH
3On the proton resonance peak, the multiple broad peak of δ=4.8-5.2ppm is the proton peak of Si-H key correspondence.By
1The heavy water exchange test that relents of H-NMR can be judged the vibration peak that is mainly reactive hydrogen among N-H between δ=0.42-4.5ppm, wherein, proton resonance peak on the corresponding boron azo-cycle of the broad peak of δ=3.4ppm on N-H, multiple broad peak between δ=1.5-1.8ppm corresponds to the proton resonance peak on B-N-H-Si, and the broad peak of δ=0.45ppm is the proton resonance peak on Si-N-H.
From Fig. 5 as seen, polymerized boron silazane precursor
11B-NMR spectrum is unimodal form, and chemical shift δ=27.8ppm judges that thus the B element has only a kind of structure to exist, and can be judged as BN by the δ value in precursor
3Structure.
Embodiment 2:
(1) with embodiment 1; (2) getting dichloro hydrogen silicon 0.3mol (30.3g), methyl dichloro boron 0.3mol (29.0g) priority with syringe is injected in the there-necked flask of drying nitrogen protection, stir on one side, feed on one side purity and be 99.999% ammonia to reaction system, system heats up rapidly, and produces a large amount of precipitations; When temperature no longer raises, stop the feeding of ammonia; (3) when system temperature is reduced to room temperature, the system product is filtered in the nitrogen bag; (4) (3) step gained filtrate is placed the reactor of band prolong and cracking post, reflux, under the protection of drying nitrogen, slowly common thermal polycondensation is carried out in heating, and temperature of reactor is 270 ℃, and the cracking column temperature is 420 ℃, is incubated 2 hours; (5) system temperature is reduced to 200 ℃, underpressure distillation 70 minutes, remove desolvate, behind the small molecules, reduce to room temperature, promptly obtain the poly-borosilicate azane 30.3g of water white solid state precusor, productive rate is 82.6% of a theoretical yield, fusing point is 126-137 ℃, can be dissolved in anaerobic solvents such as chloroform, toluene.
Embodiment 3:
(1) with embodiment 1; (2) get dimethyl dichloro hydrogen silicon 0.3mol (38.7g) with syringe, dichloro boron hydrogen alkane 0.2mol (16.5g) successively is injected in the there-necked flask of drying nitrogen protection, stir on one side, feed on one side purity and be 99.999% methylamine to reaction system, system heats up rapidly, and produce a large amount of precipitations, when temperature no longer raises, stop the feeding of methylamine; (3) when system temperature is reduced to room temperature, the system product is filtered in the nitrogen bag; (4) (3) step gained filtrate is placed the reactor of band prolong and cracking post, reflux, under the protection of drying nitrogen, slowly common thermal polycondensation is carried out in heating, and temperature of reactor is 270 ℃, and the cracking column temperature is 440 ℃, is incubated 2 hours; (5) system temperature is reduced to 300 ℃, underpressure distillation 30 minutes, remove desolvate, behind the small molecules, reduce to room temperature, promptly obtain water white solid state precusor 22.9g, productive rate is 85.1% of a theoretical yield, fusing point is 128-135 ℃, can be dissolved in anaerobic solvents such as chloroform, toluene.
Embodiment 4:
(1) with embodiment 1; (2) getting phenyl-trichloro-silicane 0.1mol (21.8g), boron trichloride 0.1mol (11.7g) priority with syringe is injected in the there-necked flask of drying nitrogen protection, stir on one side, add on one side purity and be 99.999% ethamine to reaction system, system heats up rapidly, and a large amount of precipitations of generation, when temperature no longer raises, stop the adding of ethamine; (3) when system temperature is reduced to room temperature, the system product is filtered in the nitrogen bag; (4) (3) step gained filtrate is placed the reactor of band prolong and cracking post, reflux, under the protection of drying nitrogen, slowly common thermal polycondensation is carried out in heating, and temperature of reactor is 310 ℃, and the cracking column temperature is 420 ℃, is incubated 2 hours; (5) system temperature is reduced to 180 ℃, underpressure distillation 90 minutes removes and to desolvate, behind the small molecules, reduce to room temperature, promptly obtains water white solid state precusor 28.6g after the cooling, and productive rate is 85.9% of a theoretical yield.Fusing point is 123-130 ℃, can be dissolved in anaerobic solvents such as chloroform, toluene.
Embodiment 5:
(1) with embodiment 1; (2) getting trichlorosilane alkane 0.1mol (13.5g), ethyl two chloroborane 0.2mol (22.2g) priority with syringe is injected in the there-necked flask of drying nitrogen protection, stir on one side, add on one side purity and be 99.99% aniline to reaction system, system heats up rapidly, and a large amount of precipitations of generation, when temperature no longer raises, stop the adding of aniline; (3) when system temperature is reduced to room temperature, the system product is filtered in the nitrogen bag; (4) (3) step gained filtrate is placed the reactor of band prolong and cracking post, reflux, under the protection of drying nitrogen, slowly common thermal polycondensation is carried out in heating, and temperature of reactor is 260 ℃, and the cracking column temperature is 400 ℃, is incubated 2 hours; (5) system temperature is reduced to 180 ℃, underpressure distillation 90 minutes removes and to desolvate, behind the small molecules, reduce to room temperature, promptly obtains water white solid state precusor 56.8g after the cooling, and productive rate is 87.8% of a theoretical yield.Fusing point is 132-148 ℃, can be dissolved in anaerobic solvents such as chloroform, toluene.
Embodiment 6:
(1) with embodiment 1; (2) getting ethyl dichloro hydrogen silane 0.3mol (38.7g), boron trichloride 0.1mol (11.7g) priority with syringe is injected in the there-necked flask of drying nitrogen protection, stir on one side, add on one side purity and be 99.99% Tri N-Propyl Amine to reaction system, system heats up rapidly, and a large amount of precipitations of generation, when temperature no longer raises, stop the adding of Tri N-Propyl Amine; (3) when system temperature is reduced to room temperature, the system product is filtered in the nitrogen bag; (4) (3) step gained filtrate is placed the reactor of band prolong and cracking post, reflux, under the protection of drying nitrogen, slowly common thermal polycondensation is carried out in heating, and temperature of reactor is 310 ℃, and the cracking column temperature is 420 ℃, is incubated 2 hours; (5) system temperature is reduced to 180 ℃, underpressure distillation 90 minutes removes and to desolvate, behind the small molecules, reduce to room temperature, promptly obtains water white solid state precusor 48.8g after the cooling, and productive rate is 92.1% of a theoretical yield.Fusing point is 113-126 ℃, can be dissolved in anaerobic solvents such as chloroform, toluene.
Embodiment 7:
(1) with embodiment 1; (2) getting methyl hydrogen two bromo-silicane 0.1mol (20.4g), boron tribromide 0.2mol (50.1g) priority with syringe is injected in the there-necked flask of drying nitrogen protection, stir on one side, feed on one side purity and be 99.99% methylamine to reaction system, system heats up rapidly, and a large amount of precipitations of generation, when temperature no longer raises, stop the feeding of methylamine; (3) when system temperature is reduced to room temperature, the system product is filtered in the nitrogen bag; (4) (3) step gained filtrate is placed the reactor of band prolong and cracking post, reflux, under the protection of drying nitrogen, slowly common thermal polycondensation is carried out in heating, and temperature of reactor is 270 ℃, and the cracking column temperature is 390 ℃, is incubated 2 hours; (5) system temperature is reduced to 180 ℃, underpressure distillation 90 minutes removes and to desolvate, behind the small molecules, reduce to room temperature, promptly obtains water white solid state precusor 24.5g after the cooling, and productive rate is 89.4% of a theoretical yield.Fusing point is 126-138 ℃, can be dissolved in anaerobic solvents such as chloroform, toluene.
Embodiment 8:
(1) with embodiment 1; (2) get in the there-necked flask that methyl hydrogen dichlorosilane 0.1mol (11.5g) and dimethyldichlorosilane(DMCS) mixture 0.2mol (25.8g), boron trichloride 0.1mol (11.7g) successively be injected into the drying nitrogen protection with syringe, stir on one side, add on one side purity and be 99.99% n-Butyl Amine 99 to reaction system, system heats up rapidly, and a large amount of precipitations of generation, when temperature no longer raises, stop the adding of n-Butyl Amine 99; (3) when system temperature is reduced to room temperature, the system product is filtered in the nitrogen bag; (4) (3) step gained filtrate is placed the reactor of band prolong and cracking post, reflux, under the protection of drying nitrogen, slowly common thermal polycondensation is carried out in heating, and temperature of reactor is 310 ℃, and the cracking column temperature is 420 ℃, is incubated 2 hours; (5) system temperature is reduced to 180 ℃, underpressure distillation 90 minutes removes and to desolvate, behind the small molecules, reduce to room temperature, promptly obtains water white solid state precusor 54.1g after the cooling, and productive rate is 90.6% of a theoretical yield.Fusing point is 143-152 ℃, can be dissolved in anaerobic solvents such as chloroform, toluene.
Embodiment 9:
(1) with embodiment 1; (2) getting propyl group dichloro hydrogen silane 0.2mol (28.6g), boron trichloride 0.1mol (11.7g) priority with syringe is injected in the there-necked flask of drying nitrogen protection, stir on one side, add on one side purity and be 99.99% Isopropylamine to reaction system, system heats up rapidly, and a large amount of precipitations of generation, when temperature no longer raises, stop the adding of Isopropylamine; (3) when system temperature is reduced to room temperature, the system product is filtered in the nitrogen bag; (4) (3) step gained filtrate is placed the reactor of band prolong and cracking post, reflux, under the protection of drying nitrogen, slowly common thermal polycondensation is carried out in heating, and temperature of reactor is 300 ℃, and the cracking column temperature is 410 ℃, is incubated 2 hours; (5) system temperature is reduced to 180 ℃, underpressure distillation 90 minutes removes and to desolvate, behind the small molecules, reduce to room temperature, promptly obtains water white solid state precusor 39.1g after the cooling, and productive rate is 88.2% of a theoretical yield.Fusing point is 129-142 ℃, can be dissolved in anaerobic solvents such as chloroform, toluene.
Claims (5)
1, a kind of preparation method of polymerized boron silazane precursor is characterized in that, comprises the steps:
(1) will vacuumize repeatedly with the reactor of whipping appts, fills drying nitrogen at least three times, getting rid of air and moisture wherein, and reactor is chilled to subzero 8-12 degree in advance;
(2) with raw material boron alkyl halide, halosilanes and alkylamine by the boron alkyl halide: the mol ratio of halosilanes is 1:10-10:1, and the excessive proportioning of alkylamine adds in the reactor;
The molecular formula of described boron alkyl halide is as follows:
BX
aR
1 3-a
Wherein, halogen X=Cl, Br; R
1=H, methyl, ethyl, propyl group, butyl or phenyl; A=1,2,3;
Described halosilanes is an alkyl halogen silanes, and its general molecular formula is:
R
2 mR
3 nSiR
4 (4-m-n)
Alkyl R wherein
2And R
3=H, methyl, ethyl, propyl group, butyl or phenyl; R
2And R
3Identical or different; Halogen R
4=Cl, Br; M and n=0,1,2,3,4, m+n<4, and m, n are not 0 simultaneously;
The general molecular formula of described alkylamine is:
R
5 pR
6 qN
R wherein
5And R
6=H, methyl, ethyl, propyl group, butyl or phenyl, R
5And R
6Identical or different; P and q=0,1,2,3, p+q=3;
Described boron alkyl halide, halosilanes are added in the reactor of band whipping appts in the mode of injection, stir on one side then, add the third monomer alkylamine on one side, be swift in response and carry out, heat release raises system temperature and produces precipitation, when system temperature no longer raises, stop the adding of the third monomer alkylamine;
When (3) treating that system temperature is reduced to room temperature, (2) step products therefrom is filtered under the protection of drying nitrogen;
(4) (3) step gained filtrate is placed the reactor of band prolong and cracking post, reflux, slowly common thermal polycondensation is carried out in heating, and the end reaction temperature is 200-500 ℃, and the cracking column temperature is 300-500 ℃, and insulation 1-10 hour under this temperature;
(5) system temperature is reduced to 100-350 ℃, underpressure distillation 0.3-4 hours removes and to desolvate, behind the small molecules, reduce to room temperature, promptly obtains the poly-borosilicate azane of water white precursor.
2, the preparation method of polymerized boron silazane precursor according to claim 1 is characterized in that, the mol ratio of described raw material boron alkyl halide, halosilanes is 1:3-3:1.
3, the preparation method of polymerized boron silazane precursor according to claim 2 is characterized in that, the mol ratio of described raw material boron alkyl halide, halosilanes is 1:2-2:1.
4, the preparation method of polymerized boron silazane precursor according to claim 1 and 2 is characterized in that, in described (4) step, the end reaction temperature is 250-400 ℃, and the cracking column temperature is 350-470 ℃, and is incubated 2-5 hour under this temperature.
5, the preparation method of polymerized boron silazane precursor according to claim 1 and 2 is characterized in that, in described (5) step, system temperature is reduced to 180-300 ℃, underpressure distillation 0.5-2 hour.
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Si-C-N陶瓷前驱体聚硅氮烷合成的研究进展. 孟凡君等.有机硅材料,第17卷第3期. 2003 |
Si-C-N陶瓷前驱体聚硅氮烷合成的研究进展. 孟凡君等.有机硅材料,第17卷第3期. 2003 * |
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