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Ion source device for low-energy ion beam material preparing method

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CN100481306C
CN100481306C CN 200310121178 CN200310121178A CN100481306C CN 100481306 C CN100481306 C CN 100481306C CN 200310121178 CN200310121178 CN 200310121178 CN 200310121178 A CN200310121178 A CN 200310121178A CN 100481306 C CN100481306 C CN 100481306C
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ion
source
method
device
preparing
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CN 200310121178
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Chinese (zh)
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CN1632906A (en )
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刘志凯
杨少延
柴春林
蒋渭生
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中国科学院半导体研究所
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Abstract

本发明涉及离子束技术,是一种可在低能离子束材料制备方法中应用的离子源装置,包括弧室体和坩埚两部分,每部分配有辅助加热装置。 The present invention relates to ion beam, the ion source is a device that can be applied in the manufacture of low energy ion beam method, a material, comprising an arc chamber body and the crucible in two parts, each part is assigned auxiliary heating means. 弧室体与坩埚成一体且前后分离,之间有排进气孔连通;弧室体内装有上下双螺旋状灯丝,增大了弧室热功率和发射的电子密度,灯丝位于上下两端,减小了离子直接溅射,灯丝后有反射板;坩埚为立式,内筒有两种,反应器型可盛装与工作气体反应的固体源材料,工作气体自上而下通过源材料并与之充分反应,蒸发器型可盛装能蒸发出材料气氛的源材料,可调整辅助加热及灯丝电流来控制源的工作温度。 The arc chamber body and integral crucible and separating the front and rear, there is communication between the exhaust inlet hole; arc chamber body with upper and lower double helical filament, increases the arc chamber and the electron density of the thermal power emitted by the filament is located in upper and lower ends, direct reduced ion sputtering, a reflective sheet after the filament; crucible is vertical, the inner tube there are two, the reactor type can be reacted with a working gas containing solid source material, source material downwardly through the working gas and with the sufficient reaction, an evaporator-type source containing material may be a material capable of vaporizing the atmosphere, and adjust the auxiliary heating filament current sources to control the operating temperature. 本发明结构简单实用,工作性能稳定、束流品质好、离化效率高、源材料选择范围广、产生离子种类多。 The present invention is simple and practical structure, stable performance, good beam quality, high ionization efficiency, wide selection range of the source material, generate multiple ion species. 可用于其他离子束相关技术。 The ion beam can be used other related art.

Description

一种用于低能离子束材料制备方法的离子源装置 The ion source apparatus for preparing a low energy ion beam method for materials

技术领域 FIELD

本发明涉及离子束技术,是一种可在低能离子束材料制备方法中应用的离子源装置,具有结构简单、工作性能稳定、束流品质好、离化效率高、 可选择利用的源材料范围广等特点,该装置也适用于其他相关离子束技术。 The present invention relates to ion beam, the ion source is a device that can be applied in the manufacture of low energy ion beam method, materials, it has a simple structure, stable performance, good beam quality, high ionization efficiency, selectability of range of the source material utilization and wide feature, the device is also applicable to other ion beam technology.

背景技术 Background technique

质量分离的低能离子束材料制备方法是一种处于发展中的材料制备新技术,也可简称低能离子束材料制备方法。 Preparation of low energy ion beam mass separation material is a material in the preparation of the new technology, the preparation of low energy ion beam method may be referred to as materials. 与己经成熟的其他离子束材料制备方法,如离子溅射、离子注入、离子刻蚀、等离子体沉积等不同, 该方法是采用经质量分离的低能材料离子进行材料的生长与制备。 And already sophisticated method of preparing an ion beam of other materials, such as ion sputtering, ion implantation, plasma etching, plasma deposition and the like differ, this method is the use of a material by low energy ion mass separation of material was prepared and growth. 可用于难提纯、高熔点及特种功能材料的生长,也可用于材料的高浓度掺杂、浅结杂质注入及溅射刻蚀等。 Can be used for the purification difficult, the growth of high-melting materials and special functions, can also be used for high concentration of the material doped, the impurity implanted shallow junction sputter etching and the like. 因可选择制备材料范围广,该方法是探索制备新材料的一种强有力的工艺手段。 Alternatively a wide range of materials prepared by this method is a powerful tool to explore the process of preparation of new materials.

用于低能离子束材料制备方法的设备系统目前有两种, 一是单离子束设备系统,只可用单一离子进行材料的生长或制备,另一种是双离子束设 Equipment system for preparing low energy ion beam method there are two materials, one single ion beam apparatus system, only a single ion can be used or prepared material is grown, dual ion beam and the other is provided

备系统,可利用两种离子进行材料的生长或制备,比如附图2所示中的低能双离子束系统可制备合成双元素的化合物薄膜。 Standby systems may be utilized both ions prepared or grown material, such as low energy drawings dual ion beam system shown in FIG. 2 Synthesis of double element compound thin film can be prepared. 无论哪种设备,其离子 Whatever the device, its ion

束装置部分都由如下五部分构成:离子源、磁分析器、电(磁)四极透镜、 静电偏转板、减速透镜(详见附图2)。 Beam apparatus section by the following five parts: an ion source, an analyzer magnet, electric (magnetic) quadrupole lens, electrostatic deflection plates, the deceleration of the lens (see Fig. 2). 而离子源是低能离子束材料制备系统中最重要的组成部分,用来制备材料的离子由该装置产生,其离化效率、 束流品质、产生离子种类以及工作的稳定性决定着低能离子束材料制备系统的工作性能。 The ion source is the most important component of low energy ion beam preparation system material, the material used for the preparation of ion generated by the device, ionization efficiency, beam quality, and stability of the generated ion species work determines the low energy ion beam material preparation system performance. 目前用于低能离子束材料制备系统的离子源主要有两种类 An ion source for the present low energy ion beam preparation system there are two main categories of materials

型:弗瑞曼(Freeman)型和伯纳斯(B园s)型。 Type: Freeman (Freeman) Berners type and (B Park s) type. 在该技术发展的初期, 多采用弗瑞曼(Freeman)型离子源,该型离子源热功率高,可产生离子的种类多,虽可利用高工作温度的固体源材料作为工作物质,但因其阴极灯丝工作时易受离子的直接溅射而很快的消耗变细,灯丝的使用寿命短, 因而影响了其工作稳定性,束流品质及离化效率不是很好,也限制了其在 In the early development of this technology, the use of Freeman (Freeman) type ion source, the ion source high heating power, can produce multiple ion species, although the solid source material can be used as the high operating temperatures of the working substance, but cathode filament which is susceptible to work directly sputtered ions consumed rapidly thinner, the shorter the life of the filament, thereby affecting the stability of their work, and beam quality is not very good ionization efficiency, but also limit its

低能离子束材料制备技术中的广泛使用。 Preparation of Low Energy Ion Beam Technology material widely used. 伯纳斯(Bermis)型离子源是另一类型在低能离子束材料制备技术中使用的离子源,其束流品质和工作稳定性优于弗瑞曼(Freeman)型离子源,但原有的伯纳斯(Bernus)型离子源阴极灯丝位于弧室体上端,热功率较小,虽对气体工作物质离化效率很高,但不适宜采用高工作温度的固体源材料作为工作物质,因而可产生的离子种类有限,这制约了其在低能离子束材料制备技术中的广泛使用。 Berners (Bermis) type ion source is an ion source used in the preparation of another type of low energy ion beam technology material, their working beam quality and stability than Freeman (Freeman) type ion source, but the original Berners (Bernus) cathode filament type ion source arc chamber at the upper end thereof, a small thermal power, although very efficient ionization of the gaseous working substance, but not suitable for high operating temperatures of solid source material as the working substance, thus ion species generated is limited, which restricts their widespread use in the manufacture of low energy ion beam technology material. 如何提高离子源的工作稳定性、离化效率与束流品质,扩展可选择利用的源材料范围,增加可产生的离子种类,仍是目前低能离子束材料制备技术发展所要解决的技术问题。 How to improve the operational stability of the ion source, ionization efficiency and beam quality, extended range of the source material utilization Alternatively, the ion species generated may increase, is still low energy ion beam technology material prepared technical problem to be solved.

发明内容 SUMMARY

本发明的目的是为了克服低能离子束材料制备系统原使用的离子源装置的技术不足,提供一种适于低能离子束材料制备方法用的新型离子源装置。 Object of the present invention is to overcome the low energy ion beam preparation system insufficient material Ion source apparatus originally used, to provide a novel ion source device suitable for the preparation of low energy ion beam method used material.

本发明的再一目的是所提供的新型离子源装置,能产生元素周期表中大部分元素的离子,特别是能得到用其他材料制备方法难以制备的高熔点、难提纯材料的离子。 A further object of the present invention is a novel ion source is provided, most of the ion generating element in the periodic table can be, in particular high melting point can be obtained by the preparation method it is difficult to prepare other materials, difficult to purify ionic material.

本发明解决技术问题所采用的技术方案是- Solving the problem of the present invention is employed -

1、 改进原有的伯纳斯(Bermjs)型离子源弧室体的结构设计-改进后的弧室体内上下两端装有两根螺旋状阴极灯丝,两侧有辅助加 1, to improve the structural design of the original Berners (Bermjs) type ion source arc chamber body - both ends of the arc chamber body vertically improved with two helical cathode filament, both plus auxiliary

热装置,灯丝后面还装有反射板。 Thermal device, further provided with a reflective plate behind the filament. 其特点是: Its characteristics are:

1) 阴极灯丝位于弧室体内上下两端,可增加放电室的空间,减少工作时灯丝受离子直接溅射,提高灯丝使用寿命和保持工作状态的稳定; 1) located at upper and lower ends of the filament cathode arc chamber body, a discharge chamber space may be increased, while reducing the work directly filament by ion sputtering, improve the service life of the filament and maintain a stable operating condition;

2) 螺旋状双灯丝可增加热阴极发射的原初电子密度,再加上灯丝的后面反射板对电子的反射作用,可以提高离化效率; Primary electron density) double helical filament may increase hot cathode emission, coupled with reflex reflector behind the filament plate of electrons can be improved ionization efficiency;

3) 双灯丝是并联到灯丝加热电源上的,在弧室体内上下两端加热, 再加上两侧的辅助加热装置,可使弧室体内工作时的温度场分布均匀,提高了离子源的热功率。 A uniform temperature distribution at 3) parallel to the dual filament is the filament heating power supply, heating the upper and lower ends of the arc chamber in the body, together with both sides of the auxiliary heating means, working inside the arc chamber can improve ion source thermal power.

2、 改进原有离子源的坩埚结构设计-坩埚与弧室体设计成一体且分置于前后部,弧室体后壁有排进气孔与弧相通。 2, improving the original ion source crucible design - the crucible and the arc chamber body is designed integrally and placed before and after the division portion, back wall with a discharge arc chamber inlet hole communicating with the arc. 坩埚釆用立式设计,由外壁、内筒、辅助加热装置和测温热偶等几部分构成。 Crucible preclude the use of vertical design, made of several parts of the outer wall, the inner tube, the auxiliary heating means and temperature measuring thermocouple and the like. 坩埚内筒设计成两种形式: Cylindrical crucible designed in two forms:

1) 反应器型: 1) Reactor type:

该结构内筒上盖有进气孔,下端有筛形气孔与外壁间的空腔相通,可装与反应气体发生化学反应的小碎快固体源材料,比如氧化物或单质金属源材料。 The inner cylinder cover inlet hole configuration, the lower end of the cavity has a mesh-shaped hole communicating the outer walls, small pieces can be installed faster solid source material chemically react with the reaction gas, such as elemental metal or an oxide source material. 工作时,反应气体可从坩埚上盖的进气孔进入,进气孔上有带进气嘴的导管与离子源外装反应气体的容器相通,靠针形阀控制进气的流量,反应气体自上而下通过固体源材料,并携带反应生成的工作气氛,由坩埚内筒底部进入内筒与外壁间的空腔,然后再经坩埚前外壁与弧室体后壁间的一排进气孔进入弧室体内离化出离子;此种设计可保证反应气体与源材料充分反应,提高源材料的利用率。 In operation, the reaction gas may enter from the inlet port of the crucible cover, outer air nozzle into the ion source conduit means communicating the vessel a reaction gas inlet holes, the flow rate of intake air controlled by the needle valve, the reaction gases from down through the solid source material, and carrying the working atmosphere generated by the reaction, and the outer cylinder into the inner cavity walls of the inner tube from the bottom of the crucible, and then after the crucible enclosure before the arc chamber body and the wall of a row of inlet holes into the arc chamber of an ion from the body; this design ensures that the reaction gas sufficiently react with the source material, to improve the utilization of the source material.

2) 蒸发器型: 2) Evaporator Type:

该内筒下端封死,上部靠近内筒盖处开有小的出气孔,可蒸发的固体源材料工作物质(如氯化物)装在内筒里。 The sealed lower end of the inner cylinder, the inner cylinder is close to the upper cover at a small vent opening, it may be vaporized solid source material working substance (such as chloride) is mounted in the barrel. 通过调节辅助加热(坩埚加热、 By adjusting the auxiliary heating (heating the crucible,

弧室加热)及灯丝加热电源的电流,来控制加热温度,温度范围为150~850 'c。 Heating current arc chamber) and a filament heating power, heating temperature is controlled to a temperature range of 150 ~ 850 'c. 蒸发出来的源材料工作气氛由上部的小孔进入内筒与外壁间空腔,然 Vaporized source material into the atmosphere of the working cylinder and the outer walls of the cavity is defined by an upper orifice, and then

后再经坩埚前外壁与弧室体后壁间的进气孔进入弧室体内离化。 And then through an inlet of the rear body walls and the outer wall of the crucible before the arc extinguishing chamber into the ionization chamber body.

坩埚的多功能设计拓展了可利用的源材料工作物质的选择范围,气体、氧化物、氯化物、单质金属或其他固体工作物质都可能在该离子源中产生出离子。 Crucible functional design may be utilized to expand the selection range of the working substance of the source material, the gas, oxides, chlorides, elemental metal or other solid materials could work to produce a plasma in the ion source.

具体说,为达到上述目的,本发明的技术解决方案是提供一种用于低能离子束材料制备方法的离子源装置,包括弧室体与坩埚两部分,每部分配有辅助加热装置,其弧室体与坩埚成一体且分置于前后部,弧室体后壁 Specifically, to achieve the above object, the technical solution of the invention is to provide a method of preparing an ion source apparatus of low energy ion beam material comprising an arc chamber body and the crucible in two parts, each part is assigned auxiliary heating device, which arc chamber body and the crucible was placed points and integral front and rear portions, the arc chamber back wall

有排进气孔与坩埚连通;弧室体内上下两端各装有一根螺旋状灯丝,两灯丝外侧各有一反射板,弧室体前壁的前盖板上有离子引出狭缝;坩埚采用立式,由外壁、内筒和测温热偶构成,外壁与内筒间有空腔,外壁位于内部的部分与弧室体后壁为一体,相连通的排进气孔设于其上。 With an exhaust inlet port in communication with the crucible; lower ends of the arc chamber body each equipped with a helical filament, two outer filaments have a reflective plate, slit arc ion extraction chamber front wall of the front cover; the crucible by vertical type, by the outer wall, the inner and temperature thermocouple configuration, between the outer and inner cylindrical cavity, and an outer wall portion located on the rear wall of the arc chamber inside the body as a whole, an exhaust inlet port communicating provided thereon.

所述的离子源装置,其螺旋状灯丝由弧室体侧面上下两端的灯丝座安装孔装入弧室体,然后与灯丝座连接固定;灯丝座有上下两套,每套包括长短两支座体,长支座体上安装有反射板,灯丝座与弧室体之间有绝缘陶瓷套。 Said ion source means, which helical filament from the filament mount seat mounting holes at both ends of the arc chamber of the upper and lower sides of the arc chamber body member, and the seat is fixedly connected to the filament; filament sets of upper and lower seats, each seat comprising two length body, mounted on a long body with a reflecting plate holder, with an insulating ceramic sleeve between the holder and the arc chamber filament body.

所述的离子源装置,其所述坩埚内筒,为反应器型坩埚内筒或蒸发器型坩埚内筒。 Said ion source means that the crucible inner tube, the reactor tube type in a crucible or evaporator tube type crucible.

所述的离子源装置,其所述反应器型坩埚内筒,内筒上盖有进气孔, 底部有筛形出气孔,可盛装与工作气体反应的固体源材料,工作气体是自上而下通过源材料并与之充分反应。 Said ion source means, which said crucible-type reactor tube, the inner tube covered with inlet hole, a hole-shaped sieve bottom, containing solid source material may react with the working gas, the working gas to be top and with the source material by sufficient reaction.

所述的离子源装置,其所述蒸发器型柑埚内筒,内筒上部有出气孔, 可盛装能蒸发出材料气氛的源材料。 Said ion source means that the evaporator crucible citrus type inner cylinder, the upper inner cylinder outlet holes can be dressed evaporated source material as the atmosphere.

所述的离子源装置,其所述弧室体内的两灯丝是并联接到灯丝加热电源的,弧室体两侧的辅助加热装置的左右两套加热丝是串联接到弧室加热电源上的,坩埚两侧的辅助加热装置的左右两套加热丝也是串联接到坩埚加热电源上的。 Said ion source means, two said arc chamber within which a filament is the filament heating power supply and coupled to the left and right sides of the two sets of heating the arc chamber filament auxiliary heating means are connected in series on the power supply to the arc heating chamber , auxiliary heating means around the crucible sides is a series of two sets of heating wire on the power supply to the heating of the crucible.

所述的离子源装置,可通过调整辅助加热装置的弧室加热电源、坩埚加热电源及灯丝加热电源的电流来控制该离子源装置的工作温度,其工作 The ion source apparatus, the power supply may be heated by adjusting the arc chamber auxiliary heating means, and a filament heating current of the power supply to control the crucible is heated to operating temperature of the ion source device, its operating

温度范围为150〜85(TC。 Temperature range is 150~85 (TC.

所述的离子源装置,其所述源材料,为气体、氧化物、氯化物、单质金属的固体工作物质。 Said ion source means that the source material is a gas, oxides, chlorides, solid elemental metal working substance.

本发明的有益效果是:1)离子源的弧室体与坩埚设计成一体且前后分离,结构简单实用;2)工作性能稳定、束流品质好、离化效率高、可产生的离子种类多;3)源材料选择范围广且利用率高,降低了材料制备的成本。 Advantageous effects of the present invention are: 1) the arc chamber body and the crucible of the ion source is designed in one piece and longitudinal separation, simple and practical structure; 2) performance and stability, good beam quality, high ionization efficiency of the ion species can be produced more ; 3) wide selection range of source material and a high efficiency, reduces the cost of preparation of the material. 4)该发明适用于低能离子束材料制备方法及其他相关离子束技术。 4) This invention is applicable to the preparation of low energy ion beam method, and other related materials ion beam technology.

本发明具有结构简单、工作性能稳定、束流品质好、离化效率高、可选择利用的源材料范围广等特点。 The present invention has a simple structure, stable performance, good beam quality, high efficiency from a wide range of selectively using a source material characteristics. 可产生元素周期表中大部分元素的离子,特别是能得到用其他材料制备方法难以制备的高熔点、难提纯材料的离子。 Ions may be generated most elements in the periodic table, in particular high melting point can be obtained by the preparation method it is difficult to prepare other materials, difficult to purify ionic material. 离子源产生的离子种类多,利于发挥低能离子束材料制备方法可广泛探索制备新材料的工艺特点。 An ion source generating the ion species and more conducive to play low energy ion beam material can be prepared extensively explored process features the preparation of new materials.

附图说明 BRIEF DESCRIPTION

图1. 1本发明离子源装置结构的侧向剖面图; 图1. 2本发明离子源装置结构的纵向前剖面图;图1. 3本发明离子源装置结构的横向剖面图; 图1.4本发明离子源装置的埘埚内筒剖面图; 图1. 5本发明离子源装置的电路示意图; 图2低能双离子束材料制备系统示意图。 FIG side sectional view of the device structure 1.1 ion source to the invention; FIG 1. FIG 2 a longitudinal front sectional view of the structure of the ion source apparatus invention; transverse cross-sectional view of the structure of 1.3 ion source apparatus invention; FIG. 1.4 Shí crucible inner cylindrical cross-sectional view of an ion source device of the invention; a circuit diagram of an ion source device according to the invention 1.5; FIG. 2 was prepared by dual ion beam of low energy material is a schematic view of the system.

具体实施方式 detailed description

本发明的离子源装置结构和电路原理图如图1所示。 The ion source apparatus and the circuit diagram of the structure of the present invention is shown in FIG.

该离子源装置,包括弧室体1和坩埚11两部分,每部分配有辅助加热装置:弧室加热装置2、坩埚加热装置12。 The ion source apparatus 11 comprising two arc chamber portion 1 and the crucible, each unit is assigned an auxiliary heating device: the arc chamber 2 a heating means, the heating means 12 of the crucible. 弧室体1与坩埚11设计成 Extinguishing chamber 1 and the crucible 11 is designed to

一体且前后分离,之间有排进气孔9连通。 Integrally and separated forward and backward, there is communication between the exhaust inlet hole 9. 弧室体1的内腔也称弧室或真空放电室,弧室内有上下双螺旋状灯丝3 (直热式阴极)和反射板4。 The lumen of the arc chamber body 1 is also called a vacuum arc discharge chamber or a chamber, upper and lower double spiral arc chamber filament 3 (directly heated cathode) and a reflective plate 4. 弧室壁处于阳极电位,也称阳极壁,后壁有排进气孔9与坩埚11相通,前壁的前盖板7上有离子引出狭缝8。 Arc chamber wall is the anode potential, also known as the anode wall, a rear wall with a discharge hole 9 into communication with the crucible 11, ion extraction slit 8 on the front wall of the front cover 7. 双螺旋状灯丝3可由弧室体1侧面上下两端的灯丝座安装孔装入,然后装上灯丝座5固定,灯丝座5有上下两套,每套设计成有长短两支座体,长支座体5-l可安装反射板4,灯丝座5与弧室体1之间有绝缘陶瓷套5-3绝缘。 Filament filament seat mounting hole 3 may be double spiral arc chamber body 1 side ends of the upper and lower load, then loaded seat 5 is fixed to the filament, the filament has a vertical base 5 sets, each designed with two seat length, long branch 5-l seat can reflecting plate 4, 5 and the seat heater body having an insulating ceramic arc chamber the insulating sheath between 1 5-3. 坩埚11位于弧室体1的后面, 采用立式设计,由外壁、内筒13、辅助坩埚加热装置12和测温热偶18 等几部分构成。 Crucible 11 is located behind the arc chamber body 1, with vertical design, by the outer wall, the inner cylinder 13, the auxiliary heating means 12 and the crucible temperature thermocouple 18 composed of several parts. 坩埚内筒13有两种形式,反应器型坩埚内筒13-1,其上盖有进气孔13-la,底部有筛形出气孔13-lb,可盛装需与工作气体反应的固体源材料,工作气体是自上而下通过源材料并与之充分反应;蒸发器型坩埚内筒13-2上部有出气孔13-2b,可盛装可蒸发出材料气氛的源材料。 Crucible inner cylinder 13 in two forms, a crucible-type reactor tube 13-1, which is covered with intake holes 13-la, the hole-shaped sieve bottom 13-lb, the reaction may be a solid source containing the required working gas material, the working gas is a source material, and downwardly through the reactor with sufficient; type evaporator crucible has a cylindrical upper hole 13-2b 13-2, can be dressed vaporizable material as a source of atmosphere. 通过调整辅助加热电源26、 25及灯丝加热电源23的电流来控制离子源的工作温度。 By adjusting the auxiliary heating power supply 26, filament current power supply 25 and 23 to control operation of the heating temperature of the ion source.

本发明的离子源电源参数见表1,其工作原理与通常的伯纳斯Bernus 型离子源工作原理相同。 The ion source power supply parameters of the invention are shown in Table 1, it works with a conventional Bernas type ion source Bernus same principle. 工作时,先通工作气体或调整辅助加热电源26、 25及灯丝加热电源23的电流蒸发出材料气氛,工作气体、反应生成或蒸发出的材料气氛由坩埚ll进入到弧室(真空放电室)体内,控制进入弧室的进气量,应使离子源弧室外的真空度不大于5x10—5Torr;然后加源正高压21、弧压24、源附加磁铁电流27,调整灯丝加热电源23、弧室加热电源25、柑埚加热电源26的电流使弧室和坩埚11处于额定的工作温度(该温度因源材料类别不同而不同);热阴极3(双螺旋状灯丝)内部的自由电子获得足够能量飞出金属表面,发射出的电子称为原初电子,原初电子在源磁场中作加速螺旋渐进运动并获得更大的动量,高能的电子与材料气氛碰撞使其放电离化出带正电的离子,并在弧室(放电室)内形成稳定的等 In operation, the first pass of the working gas, or adjusting the auxiliary heating power source 26, 25, and filament current power supply 23 is heated to evaporate materials atmosphere, the working gas, reaction material atmosphere or vapor emitted into the crucible ll into the arc chamber (vacuum discharge chamber) in vivo, control proceeds to the arc chamber, the intake air amount, should the degree of vacuum arc ion source is not greater than the outside 5x10-5Torr; positive high voltage source 21 was then added, the arc voltage 24, an additional magnet current source 27, to adjust the filament heating power supply 23, an arc chamber heating power supply 25, a current supply 26 citrus crucible heating the arc chamber and the crucible 11 at nominal operating temperature (the temperature due to different source material categories different); free electron inside (double helical filament) hot cathode 3 sufficient flying metal surface energy, electrons emitted primary electron is called, for the primary electron accelerating field in the source coil progressive movement and greater momentum, high energy electrons collide with a material discharging it from the atmosphere of a positively charged ions, and form a stable arc within the chamber (discharge chamber), and the like

离子体状态;源附加磁铁27的磁场作用可有效地增长电子运动的路径, 增加电子和气体原子或分子的碰撞次数。 Plasma state; additional magnetic field source magnets 27 may effectively increase the movement path of the electrons, increasing the number of collisions of electrons and gas atoms or molecules. 另外,离化产生的离子在磁场中沿着磁力线作螺旋渐进运动,增加了离子在弧室(放电室)内的停留时间, 大大增大了等离子体的密度;最后调整聚焦引出极电压22,使离子加速成形,由弧室前盖板7的离子引出狭缝8引出离子束28。 Further, the ion ionization generation coil in a magnetic field as a progressive movement along the magnetic field lines, increases the residence time of ions in the arc chamber (discharge chamber), the plasma density is increased greatly; final adjustment of the focus voltage extraction electrode 22, accelerate ions forming the plasma arc chamber leads from the front cover 7 of the slit 28 8 ion beam is extracted. 本发明离子源装置的工作温度范围为15(TC到850°C。 Operating temperature range of the ion source apparatus of the present invention is 15 (TC to 850 ° C.

利用低能离子束材料制备方法进行材料的生长与制备过程如下(可参见附图2):由离子源产生的离子束28是高能的,其能量通常为几十千电子伏特(KeV);高能离子束经低能离子束材料制备系统的磁分析器(也称质量分析器)的磁场选择分析后,获得所要材料的同位素纯的高能离子束; 同位素纯的高能离子束经电(或磁)四极透镜的二次聚焦后,再由静电偏转板的电场偏转进入生长室;生长室内有一减速透镜装置,可使同位素纯的高能离子的能量降低至几十到几百电子伏特(eV),变成低能离子;最后,利用得到的同位素纯的低能离子在衬底上进行材料的生长与制备。 Grown material preparation process is as follows (see FIG. 2) was prepared using a low energy ion beam Material: ions generated by an ion beam source 28 is a high-energy, which energy is normally several tens of keV (of KeV); energetic ion magnetic beam low energy ion beam analyzer through the magnetic material preparation system (also called analyzer) is selected after analysis to obtain the material to be isotopically pure beam of energetic ions; isotopically pure ion beam of high energy by electric (or magnetic) quadrupole after the second focus lens, and then the electrostatic deflection field deflection plate into the growth chamber; growth chamber with a deceleration lens means can isotopically pure energy of energetic ions is reduced to tens to hundreds of electron volts (eV), becomes low energy ion; Finally, the resulting low energy ion isotopically pure materials prepared and grown on a substrate. 表2列举了本发明的一些实施例。 Table 2 lists some embodiments of the present invention.

表l:新型离子源电源参数表 Table l: New Ion Source Power Parameters

<table>table see original document page 8</column></row> <table>注:1) xl0-2稳定度要求的电源均由交流稳压器供电,并通过调压器实现连续可调2)线路要有防打火措施,正商压与聚焦联锁,真空、冷却水与源工作状态联锁 <Table> table see original document page 8 </ column> </ row> <table> Note: AC power supply by the power supply regulator) xl0-2 stability requirements, and the regulator is achieved by continuously adjustable 2 ) line have ignition prevention measures, the positive pressure and the focus interlocking supplier, vacuum, cooling water source interlocking operation state

表2:新型离子源产生的离子举例 Table 2: Novel ion source generates an ion Examples

<table>table see original document page 9</column></row> <table> <Table> table see original document page 9 </ column> </ row> <table>

Claims (9)

1. 一种用于低能离子束材料制备方法的离子源装置,包括弧室体与坩埚两部分,每部分配有辅助加热装置,其特征是:弧室体与坩埚成一体且分置于前后部,弧室体后壁有排进气孔与坩埚连通;弧室体内上下两端各装有一根螺旋状灯丝,两灯丝外侧各有一反射板,弧室体前壁的前盖板上有离子引出狭缝;坩埚采用立式,由外壁、内筒和测温热偶构成,外壁与内筒间有空腔,所述排进气孔在坩埚外壁前侧面与弧室体相连通。 The ion source apparatus for the preparation method of the material for the low energy ion beams, comprising an arc chamber body and the crucible in two parts, each part is assigned auxiliary heating device, characterized in that: the arc chamber body and the crucible was placed points and integral front and back section, rear wall with a discharge arc chamber inlet port in communication with the crucible; lower ends of the arc chamber body each equipped with a helical filament, two outer filaments have a reflecting plate, the arc chamber has a front wall of the front cover ions lead-out slit; crucible with vertical, by the outer wall, the inner and temperature thermocouple configuration, a cavity between the outer wall and the inner cylinder, said exhaust inlet hole in the front side of the outer wall of the crucible body chamber communicating with the arc.
2. 如权利要求1所述的离子源装置,其特征是:所述螺旋状灯丝由弧室体侧面上下两端的灯丝座安装孔装到弧室体内,然后与灯丝座连接固定;灯丝座有上下两套,每套包括长短两支座体,长支座体上安装有反射板,灯丝座与弧室体之间有绝缘陶瓷套。 2. The ion source apparatus according to claim 1, characterized in that: the helical filament means a filament both ends of the seat mounting hole down into the arc chamber side face of the arc chamber body and the seat is fixedly connected to the filament; filament has a seat down two sets, each set comprising two base body length, the reflecting plate is attached to the long support body, with an insulating ceramic sleeve between the holder and the arc chamber filament body.
3. 如权利要求1所述的离子源装置,其特征是:所述坩埚内筒,为反应器型坩埚内筒或蒸发器型坩埚内筒。 The ion source apparatus according to claim 1, characterized in that: the crucible inner tube, the reactor tube type in a crucible or evaporator tube type crucible.
4. 如权利要求3所述的离子源装置,其特征是:所述反应器型柑埚内筒,内筒上盖有进气孔,底部有筛形出气孔,可盛装与工作气体反应的固体源材料,工作气体是自上而下通过源材料并与之充分反应。 4. The ion source apparatus according to claim 3, characterized in that: said reactor citrus type crucible inner cylinder, the inner cylinder covered with inlet hole, a hole-shaped sieve bottom, the reaction can be dressed with a working gas solid source material, the working gas is a source material to and downwardly through the reaction sufficiently.
5. 如权利要求3所述的离子源装置,其特征是:所述蒸发器型坩埚内筒,内筒上,有出气孔,可盛装能蒸发出材料气氛的源材料。 5. The ion source apparatus according to claim 3, wherein: said evaporator crucible type cylinder, the inner cylinder, there is a hole, the source material can be evaporated containing material in the atmosphere.
6. 如权禾f要求1所述的离子源装置,其特征是:所述弧室体内的两灯丝是并联接到灯丝加热电源的,弧室体两侧的辅助加热装置的左右两套加热丝是串联接到弧室加热电源上的,坩埚两侧的辅助加热装置的左右两套加热丝是串联接到坩埚加热电源上的。 6. Right f He ion source according to claim 1, characterized in that: said two filaments within the arc chamber and coupled to the filament heating power, heating means around the auxiliary body on both sides of the arc chamber was heated two filaments are connected in series to the arc chamber on the heating power, the left and right auxiliary heating means heating the crucible sides of the two wires are connected in series on the power supply to the heating of the crucible.
7. 如权利要求6所述的离子源装置,其特征是:通过调整辅助加热装置的弧室加热电源、坩埚加热电源及灯丝加热电源的电流来控制该离子源装置的工作温度,其工作温度范围为150〜85(TC。 Its operating temperature by adjusting the heating power of the arc chamber of the auxiliary heating means, and a filament heating current of the power supply to control the crucible is heated to the working temperature of the ion source device: an ion source apparatus as claimed in claim 6, characterized in that range 150~85 (TC.
8. 如权利要求5所述的离子源装置,其特征是:所述蒸发器型坩埚内筒内的源材料为作为固体源材料的氯化物。 The ion source apparatus according to claim 8, wherein: the evaporator cylinder-type crucible as a solid source material is a chloride source material.
9. 如权利要求4所述的离子源装置,其特征是:反应器型坩埚内筒内的固体源材料为氧化物或单质金属。 9. The ion source apparatus according to claim 4, characterized in that: the reactor crucible barrel type solid source material is an oxide or elemental metal.
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