CN100416355C - Liquid crystal display device and its lower substrate - Google Patents

Liquid crystal display device and its lower substrate Download PDF

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Publication number
CN100416355C
CN100416355C CNB2006100012362A CN200610001236A CN100416355C CN 100416355 C CN100416355 C CN 100416355C CN B2006100012362 A CNB2006100012362 A CN B2006100012362A CN 200610001236 A CN200610001236 A CN 200610001236A CN 100416355 C CN100416355 C CN 100416355C
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groove
liquid crystal
infrabasal plate
chamber
insulation course
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CN1794047A (en
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王涌锋
余良彬
廖智良
陈建宏
何怡华
李奕纬
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AU Optronics Corp
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AU Optronics Corp
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Abstract

The present invention discloses a liquid crystal display device and a lower base board thereof. The liquid crystal display device comprises an upper base board, a liquid crystal layer and a lower base board, wherein a plurality of pixel electrodes, a plurality of metal conductors and a plurality of switch elements are arranged on the surface of the lower base board. Each of the switch elements comprises a source electrode, a drain electrode and a grid electrode, wherein a groove is formed between the surfaces of the source electrode and the drain electrode, an insulation layer is covered on the surfaces of the source electrode and the drain electrode, the insulation layer is respectively formed into inclined planes on one side of the source electrode and one side of the drain electrode, and the step of the side of the source electrode and the step of the side of the drain electrode are mutually opposite. The two insulation layer inclined planes are connected above the groove and form a notch or a chamber in the groove, and the included angle of the two insulation layer inclined planes is between 5 DGE and 50 DGE.

Description

Liquid crystal indicator and infrabasal plate thereof
Technical field
The invention relates to a kind of liquid crystal indicator and infrabasal plate thereof, refer to a kind of light-guiding mechanism that is applicable to liquid crystal indicator especially.
Background technology
Liquid crystal indicator is that the liquid crystal molecule rotation is controlled in the change that sees through electric field, regulates and control light polarization direction thus, and constitutes photoswitch.In technology,,, avoid this district's light leak to destroy the contrast of display often with black array (black matrix) shading for the zone (LCD alignment is Jia Qu not) of wayward its action of liquid crystal molecule.
In addition, the groove between source electrode and the drain electrode can make outer light shine amorphous silicon semiconductor layer (amorphous silicon, the α-Si) of thin film transistor (TFT) easily.When the irradiate light amorphous silicon semiconductor layer can produce electric current, increase the leakage current of thin film transistor (TFT) under nonconducting state, show in order to stablize GTG correct under each frame update, need above groove, form the black array cover outside light, to keep the nonconducting state between source electrode and the drain electrode.
The black array is based on metal or lighttight macromolecular material at present.Yet, no matter as making shading element its restriction and shortcoming are arranged all with metal or macromolecular material.Metal black array is based on chromium metal (Cr/CrOx), except that having heavy metal pollution problem, is subject to parasitic capacitance effect on during design.Resin material then need according to the difference of optical density (OD) (optical density) arrange in pairs or groups must thickness, even optical density (OD) (optical density) up to 4, it is a lot of that its thickness still exceeds metal black array.And thickness is healed high and be unfavorable for liquid crystal indicator, and the arrangement of liquid crystal molecule was all undesirable arround significantly the height fluctuating reached for orientation processing (rubbing).Exposure technology also can be difficult for making macromolecular material fully crosslinked because of the photochemical reaction generation too greatly because of material thickness in addition, and keeps required part in developing process, and technology difficulty promotes immediately.
Therefore, need a kind of liquid crystal indicator that can solve above-mentioned defective workmanship and black array problem simultaneously at present, so that better quality to be provided.
Summary of the invention
The purpose of this invention is to provide infrabasal plate that a liquid crystal indicator uses and the liquid crystal indicator that uses this infrabasal plate, it is a principle of utilizing light refraction, suppressing or to reduce direct transmitted light, reaches and hides the effect of removing or reducing direct transmitted light in the specific region.
For this reason, the invention provides the infrabasal plate that a kind of liquid crystal indicator is used, comprising: a substrate, and a plurality of on-off element that is positioned at this substrate.Each on-off element includes one source pole, a drain electrode and a grid, and the surface forms a groove between source electrode and drain electrode.Source electrode and drain surface are coated with an insulation course, and this insulation course forms the inclined-plane respectively at the side that the step of source electrode and drain electrode faces one another, utilize light refraction principle regulation and control incident light and form one in groove, with groove or the chamber that reduces direct transmitted light, and the angle of two these inclined-planes and substrate is between 5 to 50 degree.
Structure by groove or chamber, can utilize light refraction to control the light travel path of transmitted light, the position that makes the outer light that originally is transmitted through between on-off element source electrode and the drain electrode be imported into other is absorbed or is regulated and control, and hides the effect of removing or reducing the transmitted light of " between on-off element source electrode and the drain electrode " and reach.Therefore, can avoid outer illumination to be mapped to the amorphous silicon semiconductor layer (α-Si) and produce leakage current under the nonconducting state of thin film transistor (TFT).In addition, the present invention provides a kind of liquid crystal indicator again, includes a upper substrate, a liquid crystal layer and an infrabasal plate; The upper surface of this infrabasal plate is formed with a plurality of grooves, and the infrabasal plate surface coverage has an insulation course, this insulation course forms the inclined-plane respectively at the both sides that groove faces one another, and forms a groove or chamber in groove, and the angle on this insulation course inclined-plane and infrabasal plate surface is between 5 to 50 degree.
Same, structure by groove or chamber, can utilize light refraction to control the light direct of travel of transmitted light, make the transmitted light of backlight of LCD import the position of expectation or avoid the specific region, for example avoid LCD alignment not Jia Qu or plain conductor, hide the effect of removing or reducing the transmitted light of specific region and reach.
In comparison, though the employed black array of known LCD can hide the transmitted light except that the specific region, it has many shortcomings.When for example covering the transmitted light of on-off element or plain conductor with metal black array, the parasitic capacitance effect that is produced.And with the black array of resin, then can produce the too big and too big problem of height relief intensity of thickness as material, and cause orientation handle not good and arround Liquid Crystal Molecules Alignment undesirable.Review the present invention, the material of groove or chamber can adopt the insulating material of any light-permeable, and for example monox or silicon nitride are to reach the purpose of leaded light, so do not have the problem of stray capacitance and heavy metal pollution.And groove or chamber are the parts that is formed at ladder corner (groove), therefore, also can not produce the too big and too big problem of height relief intensity of thickness.
The present invention is in the utilization thin-film technique during with physical vapor deposition (PVD) or chemical vapor deposition (CVD) cover film, can cover bad because of ladder, part in the metal corner produces prominent outstanding (overhang), and two adjacent dashing forward are formed with an end apart from clearance groove or chamber greater than top mouthful distance between hanging, if too serious, then form a hole (voids).The position that utilizes this groove or chamber (or hole) incident light can be imported expectation is absorbed or is regulated and control, but whether elasticity is selected to arrange in pairs or groups light tight thin layer uses or adjusts film thickness, and this part theory is able to Geometric Optics Analysis (Law of Reflection, Snell ' s Law).In the present invention, each layer has different refraction angles according to refraction coefficient (refractive index) difference, and the best angle of the optical texture of its groove or chamber then is to determine with Snell ' s Law.
In brief, the present invention utilizes thin-film process defective originally, and the principle of utilization light refraction, form a light guide structure, absorbed or regulated and control in order to the position that incident light is imported expectation, and then be applied to the shading of LCD, and can improve the problem of metal black array and resin material black array.
The infrabasal plate of liquid crystal indicator of the present invention can optionally include a plurality of plain conductors.Therefore, liquid crystal indicator of the present invention can also form a groove on the surface of plain conductor, and one insulation course being arranged in the surface coverage of this plain conductor, this insulation course forms the inclined-plane respectively at the both sides that this groove faces one another, to form a groove or chamber in this groove.Perhaps, be formed with a groove or chamber at the infrabasal plate upper surface with respect to the position of plain conductor.Thus, with transmission toward the outer photoconduction of plain conductor to other position, to increase contrast of LCD and to prevent light leak.
Infrabasal plate of the present invention, wherein the material of insulation course can be any material that is known in the infrabasal plate insulation course, is preferably light transmissive material, is more preferred from monox or silicon nitride.Infrabasal plate of the present invention, its further groove or chamber can be sealing or open groove or chamber, are preferably the chamber of sealing.Infrabasal plate of the present invention, its further groove or chamber can be Any shape, are preferably the end apart from groove or chamber greater than top mouthful distance, and being more preferred from the transverse section is sharp cone distal or trapezoidal.Infrabasal plate of the present invention, wherein the refractive index of insulation course can be more preferred between 1.2 to 1.8 between 1.2 to 2.0.Infrabasal plate of the present invention, wherein the depth-to-width ratio of groove can be more preferred between 0.05 to 0.08 between 0.05 to 1.
Liquid crystal indicator of the present invention, wherein the groove of the upper surface of infrabasal plate can be positioned at any zone below that needs shading, is preferably the liquid crystal display below of Jia Qu not that is positioned at liquid crystal layer, perhaps is positioned at the below of plain conductor.Liquid crystal indicator of the present invention, wherein insulation course can be any known insulating layer material, is preferably light transmissive material and forms, and is more preferred from monox or silicon nitride.Liquid crystal indicator of the present invention, its further groove or chamber can be sealing or open groove or chamber, are preferably the chamber of sealing.Liquid crystal indicator of the present invention, its further groove or chamber can be Any shape, are preferably the end apart from groove or chamber greater than top mouthful distance, and being more preferred from the transverse section is sharp cone distal or trapezoidal.Liquid crystal indicator of the present invention, wherein the refractive index of insulation course can be more preferred between 1.2 to 1.8 between 1.2 to 2.0.Liquid crystal indicator of the present invention, wherein the depth-to-width ratio of groove can be more preferred between 0.05 to 0.08 between 0.05 to 1.Liquid crystal indicator of the present invention, wherein the refractive index of insulation course can be preferably between 1.2 to 1.8 between 1.2 to 2.0.Liquid crystal indicator of the present invention, wherein the depth-to-width ratio of this groove can be greater than 1, and is preferable greater than 4.
In sum, the present invention is the defective of utilization process film, and producing section is the list structure of taper.Because the refraction coefficient of interface is not simultaneously, light is by producing deviation.Therefore, see through process conditions and control its cone angle point degree in scope, not only can reflect the incident light in the extraneous certain angle scope, for the light of backlight also effectively deviation also controlled.Therefore, the present invention can in order to light-guide device with as shading element, and effectively improve the problem of metal black array and resin material black array.
Description of drawings
Fig. 1 is the structural representation of the liquid crystal indicator of one embodiment of the invention.
Fig. 2 is the sectional view of the thin film transistor (TFT) (TFT) of present embodiment.
Fig. 3 is the optical analysis synoptic diagram of the outer light chamber that is incident to thin film transistor (TFT).
Fig. 4 be present embodiment chamber optical texture angle theta v with and the graph of a relation of corresponding refraction angle θ t8.
Fig. 5 is the light of backlight is incident to liquid crystal layer via chamber an optical analysis synoptic diagram.
When Fig. 6 was v=25 ° of the optical texture angle theta of chamber, the incident angle θ of backlight light was for the graph of a relation of deviation angle θ t2.
During v=15 ° of the optical texture angle theta of Fig. 7 chamber, the incident angle θ of backlight light is for the graph of a relation of deviation angle θ t2.
Fig. 8 a to Fig. 8 c is that thin-film technique produces prominent outstanding synoptic diagram.
Description of reference numerals:
Upper substrate 1 liquid crystal layer 2 infrabasal plates 3
Air 10 flatness layers 11 transparency electrodes 12
Transparency electrode 13 chromatic photoresists 14 Polarizers 15
Insulation course 18 gate insulators 19 source electrodes 21
22 grids, 23 chambers 37 drain
Semiconductor layer 38 grooves 40 glass substrates 45
Groove 49 gate insulators 61 chambers 63
The not good district 73 of protective seam 64 flatness layers 65 LCD alignment
Ohmic contact layer 25 grooves 66 light 100
Light 200
Embodiment
Groove in the liquid crystal indicator, as the groove of source electrode and drain electrode place in thin film transistor (TFT) (TFT) element or the groove of making viewing area and non-display area interface etc., see through thin film deposition processes and all can form light guide structure of the present invention, absorbed or regulated and control in order to the position that incident light is imported expectation, to reach shaded effect.
In the present embodiment, each rete has different refraction angles according to refraction coefficient (refractive index) difference, and therefore, the best angle of the optical texture of groove or chamber then is to determine with Snell ' s Law.
Embodiment one: TFT (front leaded light)
In thin film transistor (TFT) (TFT), the groove between source electrode and the drain electrode can make outer light shine semiconductor layer (amorphous silicon, the α-Si) of thin film transistor (TFT) easily.Because the semiconductor layer α-Si of thin film transistor (TFT) has photoconductivity, in order to keep the nonconducting state between source electrode and the drain electrode, therefore need be with the groove of outer photoconduction between source electrode and drain electrode, to avoid leakage current.In the present embodiment, be be transmitted through source electrode and the drain electrode between outer photoconduction to special angle, make it total reflection, and then be able to shading.
See also Fig. 1, be the structural representation of the liquid crystal indicator of present embodiment, it mainly includes a upper substrate 1, an infrabasal plate 3 and is folded in the liquid crystal layer 2 between upper and lower base plate.Wherein, the upper surface of infrabasal plate includes a plurality of pixel electrodes, source electrode lead, grid lead and on-off element (not shown).In the present embodiment, on-off element is a thin film transistor (TFT).
See also Fig. 2, be the side view of the thin film transistor (TFT) of present embodiment.As shown in Figure 2, thin film transistor (TFT) mainly includes substrate 3, gate insulator 19, grid 23, semiconductor layer 38, ohmic contact layer 25, source electrode 21, drain electrode 22 and insulation course 18.In the thin-film technique, during with physical vapor deposition (PVD) or chemical vapor deposition (CVD) cover film, can be because of control of process condition, the part in the ladder corner produces the inclined-plane.Source electrode 21 and drain 22 and form a stepped groove 40 in the present embodiment, the depth-to-width ratio of this groove is between 0.05 to 1.Therefore, the side that insulation course 18 can face one another respectively at the step of source electrode 21 and drain electrode 22 forms the inclined-plane, can be formed with an end apart from groove or chamber greater than top mouthful distance, the cone-shaped chamber 37 of sealing as shown in Figure 2 between these two the adjacent insulation course inclined-planes.In the present embodiment, two inclined-planes of insulation course 18 are to intersect in the top of groove 40 (2 times of θ of angle v), to form a sharp cone distal chamber 37 that seals in groove 40 in.The position that utilizes this groove or chamber 37 incident light can be imported expectation is absorbed or regulate and control, but and elasticity select whether to arrange in pairs or groups that light tight thin layer uses or the adjustment film thickness.
Fig. 3 is incident to the optical analysis synoptic diagram of the chamber 37 of thin film transistor (TFT) by external environment for LCD light from outside 100.Please consult Fig. 2 and Fig. 3 simultaneously, on the insulation course 18 (refraction coefficient 1.87), be laminated with the flatness layer 11 of a refraction coefficient 1.5 in regular turn, the transparent electrode layer 13 of liquid crystal layer 2, one refraction coefficients 1.9 of transparent electrode layer 12, one refraction coefficients 1.5 of one refraction coefficient 1.9, the chromatic photoresist 14 of one refraction coefficient 1.6, the Polarizer 15 of upper substrate 1, one refraction coefficient 1.4 of one refraction coefficient 1.5, and the air refraction coefficient in LCD air outside 10 and the chamber 37 is 1.
In the present embodiment, each layer has different refraction angles according to refraction coefficient (refractive index) difference, and the best angle of the optical texture of its chamber 37 then is to determine with Snell ' s Law.
Among Fig. 3, θ i0~θ i8 is an incident angle, and θ t0~θ t8 is the refraction angle, and θ v is the optical texture angle of insulation course chamber 37.Analyze the travel path of light 100 according to Snell ' s Law.The rough value of each angle is θ v=25 ° among Fig. 3, θ i0>90 °, θ t0=46.14 °, θ i1=46.14 °, θ t1=42.3 °, θ i2=42.3 °, θ t2=39.12 °, θ i3=39.12 °, θ t3=32.09 °, θ i4=32.09 °, θ t4=42.3 °, θ i5=42.3 °, θ t5=30.29 °, θ i6=30.29 °, θ t6=42.3 °, θ i7=42.3 °, θ t7=32.67 °, last θ i8=32.33 ° and θ t8=90 °.
Therefore, (2 times of θ are v) the time, and the incident ray 100 of all external environments all can not enter chamber 37 smaller or equal to 50 ° for the angle that adjusting process makes insulation course chamber 37.That is to say: the light 100 that is entered liquid crystal panel inside by the outside will be by total reflection before entering chamber 37.Therefore, light 100 just can not contact (Fig. 2) with the semiconductor layer 38 of thin film transistor (TFT), and produces photocurrent.
Fig. 4 be present embodiment chamber 37 optical texture angle theta v with and the graph of a relation of corresponding refraction angle θ t8.As seen from the figure, after angle was smaller or equal to 25 degree, all incident lights of external environment all can be by total reflection.
From the above, the present invention can utilize the principle of light refraction, with the groove of outer photoconduction between source electrode and drain electrode, and avoids leakage current.In addition, among the present invention, the material of light guide structure (groove or chamber) can adopt the insulating material of any light-permeable, and for example monox or silicon nitride are to reach the purpose of leaded light, so do not have the problem of stray capacitance and heavy metal pollution.And groove or chamber are the parts that is formed at ladder corner (groove between source electrode and drain electrode), therefore, also can not cause the too big or too big problem of height relief intensity of thickness.
Embodiment two: glass substrate (back side leaded light)
Liquid crystal indicator regular meeting is because some defective workmanships, and causes the orientation of liquid crystal molecule bad.The backlight of liquid crystal indicator and not exclusively be parallel light inlet, if 75% concentration of energy is between ± 60 °, then when the light of backlight during by the not good position incident of LCD alignment, the picture that shows just has the problem of light leak.
Consult Fig. 5, for the light 200 of backlight is incident to the not synoptic diagram in good zone of LCD alignment by a glass substrate 45.As shown in Figure 5, glass substrate 45 etchings of present embodiment have a groove 49, and the depth-to-width ratio of this groove is greater than 1.Therefore, in the thin-film technique, with physical vapor deposition (PVD) or chemical vapor deposition (CVD) cover film when substrate 45 upper surfaces, can be because of control of process condition, the part in the ladder corner produces the inclined-plane.Glass substrate 45 surface coverage have a gate insulator 61, and the both sides that gate insulator 61 faces one another respectively at groove 49 form the inclined-plane, can be formed with an end between the insulation course inclined-plane of these groove both sides apart from (consulting Fig. 8 a~8c) greater than the groove 66 of top mouthful distance or chamber 63.In the present embodiment, two inclined-planes intersect in the top of groove 49 and form the sharp cone distal chamber 63 (consulting Fig. 5) of a sealing.In the present embodiment, gate insulator layer insulating 61 can chemical vapor deposition (CVD) or physical vapor deposition (PVD) formation.
In addition, present embodiment is laminated with the flatness layer 65 of protective seam 64, one refraction coefficients 1.5 of a refraction coefficient 1.87 in regular turn on gate insulator 61 (refraction coefficient 2.91), and the not good district 73 of LCD alignment.Wherein, the thickness of protective seam 64 and flatness layer 65 is 0.2 μ m and 3 μ m in regular turn.
Among Fig. 5, θ i0~θ i2 is an incident angle, and θ t0~θ t2 is the refraction angle, and θ v is the optical texture angle of insulation course chamber 63.With θ v=25 ° be example, analyze the travel path of light 200 according to Snell ' s Law.When incident angle approximately slightly θ i0=65 ° the time, θ t0=28.17 °, θ i1=36.83 °, θ t1=37.99 °, θ i2=37.99 ° (alternate interior angle of θ t1), last θ t2=50.12 °.Therefore, i0=65 ° of θ v=25 ° and incident angle θ during light 200 incidents, according to following formula:
Δ=∑dn×tanθn
Dn is each layer thickness, and θ n is light institute's deviation angle in each layer, and Δ is a displacement
The side-play amount of light 200 can be greater than 3 μ m, and light 200 diversion LCD alignment not good regional 73 can be avoided light leak.
When Fig. 6 and Fig. 7 were respectively v=25 ° of chamber optical texture angle theta and θ v=15 °, the incident angle θ of backlight light 200 was for the graph of a relation of deviation angle θ t2.Consult Fig. 6 and Fig. 7 simultaneously as seen, θ v=15 ° deviation angle is bigger than θ v=25 °, and expression θ v is littler, and deviation angle θ t2 is bigger, and side-play amount is also bigger.Therefore, present embodiment can use the optical texture of chamber 63, and the zone that light diversion LCD alignment is not good is to keep away the face light leak.And, can obtain better effect with the structure and the polarized light collocation of present embodiment.
Present embodiment utilizes thin-film process defective originally, and the principle of utilization light refraction, forms a light guide structure (groove or chamber), is absorbed or regulates and control in order to the position that incident light is imported expectation.Therefore, the light guide structure of present embodiment can be applicable to any place that needs shading of infrabasal plate, and not Jia Qu or plain conductor of LCD alignment for example is to avoid light leak and to increase contrast of LCD.In addition, because the material of the light guide structure of present embodiment can adopt the insulating material of any light-permeable, for example monox or silicon nitride be not so have the problem of stray capacitance and heavy metal pollution.And groove or chamber are the parts (in the groove) that is formed at the ladder corner, also can not cause the too big and too big problem of height relief intensity of thickness.Therefore, the present invention is applied to outside the shading of LCD, can also improve the problem of metal black array and resin material black array.
The foregoing description only is to give an example for convenience of description, and the interest field that the present invention advocated should be as the criterion so that claims are described certainly, but not only limits to the foregoing description.

Claims (23)

1. infrabasal plate that liquid crystal indicator is used comprises:
One substrate;
A plurality of on-off elements that are positioned at this substrate, each on-off element include one source pole, a drain electrode and a grid;
Wherein, form a groove between the step of this source electrode and this drain electrode, this source electrode and this drain surface are coated with an insulation course, and this insulation course forms the inclined-plane respectively at the side that the step of this source electrode and this drain electrode faces one another, form one in this groove and utilize light refraction principle regulation and control incident light, with groove or the chamber that reduces direct transmitted light.
2. infrabasal plate as claimed in claim 1 is characterized in that this insulation course is formed by light transmissive material.
3. infrabasal plate as claimed in claim 2 is characterized in that, this insulation course is monox or silicon nitride.
4. infrabasal plate as claimed in claim 1 is characterized in that, this groove or chamber are that the end is apart from groove or chamber greater than top mouthful distance.
5. infrabasal plate as claimed in claim 4 is characterized in that, this chamber is the chamber of sealing.
6. infrabasal plate as claimed in claim 5 is characterized in that, the transverse section of this chamber is a sharp cone distal.
7. infrabasal plate as claimed in claim 1 is characterized in that the refractive index of this insulation course is between 1.2 to 2.0.
8. infrabasal plate as claimed in claim 1 is characterized in that the depth-to-width ratio of this groove is between 0.05 to 1.
9. infrabasal plate as claimed in claim 1, it is characterized in that, this substrate more includes at least one plain conductor, the surface of this plain conductor forms a groove, and the surface coverage of this plain conductor has this insulation course, then this insulation course forms the inclined-plane respectively at the both sides that this groove faces one another, and forms a chamber or groove in this groove.
10. infrabasal plate as claimed in claim 1 is characterized in that, this insulation course is the protective seam of this infrabasal plate.
11. infrabasal plate as claimed in claim 1 is characterized in that, the angle of this two insulation courses inclined-plane and this substrate is between 5 to 50 degree.
12. a liquid crystal indicator comprises:
One upper substrate;
One liquid crystal layer; And
One infrabasal plate, the upper surface of this infrabasal plate is formed with a plurality of grooves, this infrabasal plate surface coverage has an insulation course, and this insulation course forms the inclined-plane respectively at the both sides that this groove faces one another, form one in this groove and utilize light refraction principle regulation and control incident light, with groove or the chamber that reduces direct transmitted light.
13. liquid crystal indicator as claimed in claim 12 is characterized in that, this groove of this infrabasal plate is the liquid crystal display below of Jia Qu not that is positioned at this liquid crystal layer.
14. liquid crystal indicator as claimed in claim 12 is characterized in that, this infrabasal plate more includes many strip metals lead, and this groove is positioned at the below of this plain conductor.
15. liquid crystal indicator as claimed in claim 12 is characterized in that, this insulation course is formed by light transmissive material.
16. liquid crystal indicator as claimed in claim 15 is characterized in that, this insulation course is monox or silicon nitride.
17. liquid crystal indicator as claimed in claim 12 is characterized in that, the refractive index of this insulation course is between 1.2 to 2.0.
18. liquid crystal indicator as claimed in claim 12 is characterized in that, the depth-to-width ratio of this groove is greater than 1.
19. liquid crystal indicator as claimed in claim 12 is characterized in that, this groove or chamber are that the end is apart from groove or chamber greater than top mouthful distance.
20. liquid crystal indicator as claimed in claim 19 is characterized in that, this chamber is the chamber of sealing.
21. liquid crystal indicator as claimed in claim 20 is characterized in that, the transverse section of this chamber is a sharp cone distal.
22. liquid crystal indicator as claimed in claim 12 is characterized in that, this insulation course is the gate insulator of infrabasal plate.
23. liquid crystal indicator as claimed in claim 12 is characterized in that, the angle on this two insulation courses inclined-plane and this infrabasal plate surface is between 5 to 50 degree.
CNB2006100012362A 2006-01-10 2006-01-10 Liquid crystal display device and its lower substrate Active CN100416355C (en)

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Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001177100A (en) * 1999-12-17 2001-06-29 Matsushita Electronics Industry Corp Thin-film transistor, liquid crystal display element using it, and its manufacturing method
CN1148600C (en) * 1996-11-26 2004-05-05 三星电子株式会社 Liquid crystal display using organic insulating material and manufacturing methods thereof
CN1190687C (en) * 2002-02-07 2005-02-23 台湾积体电路制造股份有限公司 Refective liquid crystal light gate with obstruction member

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1148600C (en) * 1996-11-26 2004-05-05 三星电子株式会社 Liquid crystal display using organic insulating material and manufacturing methods thereof
JP2001177100A (en) * 1999-12-17 2001-06-29 Matsushita Electronics Industry Corp Thin-film transistor, liquid crystal display element using it, and its manufacturing method
CN1190687C (en) * 2002-02-07 2005-02-23 台湾积体电路制造股份有限公司 Refective liquid crystal light gate with obstruction member

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