CH390057A - Lichtempfindliche Schicht, insbesondere für den Siebdruck - Google Patents

Lichtempfindliche Schicht, insbesondere für den Siebdruck

Info

Publication number
CH390057A
CH390057A CH1098060A CH1098060A CH390057A CH 390057 A CH390057 A CH 390057A CH 1098060 A CH1098060 A CH 1098060A CH 1098060 A CH1098060 A CH 1098060A CH 390057 A CH390057 A CH 390057A
Authority
CH
Switzerland
Prior art keywords
screen printing
photosensitive layer
photosensitive
printing
screen
Prior art date
Application number
CH1098060A
Other languages
German (de)
English (en)
Inventor
Karl Dr Reichel Maximilian
Wilhelm Dr Neugebauer
Original Assignee
Kalle Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kalle Ag filed Critical Kalle Ag
Publication of CH390057A publication Critical patent/CH390057A/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/12—Production of screen printing forms or similar printing forms, e.g. stencils
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C247/00—Compounds containing azido groups
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D177/00—Coating compositions based on polyamides obtained by reactions forming a carboxylic amide link in the main chain; Coating compositions based on derivatives of such polymers
    • C09D177/06—Polyamides derived from polyamines and polycarboxylic acids
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0387—Polyamides or polyimides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Wood Science & Technology (AREA)
  • Materials Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Polyamides (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
CH1098060A 1959-10-02 1960-09-29 Lichtempfindliche Schicht, insbesondere für den Siebdruck CH390057A (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DEK0038815 1959-10-02

Publications (1)

Publication Number Publication Date
CH390057A true CH390057A (de) 1965-03-31

Family

ID=7221513

Family Applications (1)

Application Number Title Priority Date Filing Date
CH1098060A CH390057A (de) 1959-10-02 1960-09-29 Lichtempfindliche Schicht, insbesondere für den Siebdruck

Country Status (6)

Country Link
US (1) US3143416A (US07122603-20061017-C00294.png)
BE (1) BE595627A (US07122603-20061017-C00294.png)
CH (1) CH390057A (US07122603-20061017-C00294.png)
DE (1) DE1622764B1 (US07122603-20061017-C00294.png)
GB (1) GB942824A (US07122603-20061017-C00294.png)
NL (2) NL132072C (US07122603-20061017-C00294.png)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3420732A (en) * 1965-10-23 1969-01-07 Minnesota Mining & Mfg Transfer film and process of using same
US3507651A (en) * 1966-12-29 1970-04-21 Corning Glass Works Stencil screen and method
US3790382A (en) * 1971-04-16 1974-02-05 Minnesota Mining & Mfg Fluorinated polyamide-diazo resin coating composition
EP0353666A3 (en) * 1988-08-03 1990-05-23 Toyo Gosei Kogyo Co., Ltd. Photosensitive agent,photosensitive resin composition containing same, and method of image formation using the composition

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL56638C (US07122603-20061017-C00294.png) * 1939-09-25
US2412993A (en) * 1943-07-19 1946-12-24 Du Pont Polymeric materials
BE468087A (US07122603-20061017-C00294.png) * 1944-02-09
BE559609A (US07122603-20061017-C00294.png) * 1954-04-05
NL198070A (US07122603-20061017-C00294.png) * 1954-06-19
US2972540A (en) * 1958-08-05 1961-02-21 Du Pont Photopolymerizable compositions and elements

Also Published As

Publication number Publication date
GB942824A (en) 1963-11-27
BE595627A (US07122603-20061017-C00294.png)
DE1622764B1 (de) 1970-05-27
NL256407A (US07122603-20061017-C00294.png)
NL132072C (US07122603-20061017-C00294.png)
US3143416A (en) 1964-08-04

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