CA978013A - Positive-acting photosensitive composition - Google Patents

Positive-acting photosensitive composition

Info

Publication number
CA978013A
CA978013A CA136,774A CA136774A CA978013A CA 978013 A CA978013 A CA 978013A CA 136774 A CA136774 A CA 136774A CA 978013 A CA978013 A CA 978013A
Authority
CA
Canada
Prior art keywords
positive
photosensitive composition
acting photosensitive
acting
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA136,774A
Other languages
English (en)
Other versions
CA136774S (en
Inventor
Arnoldus J.M. Van Den Broek
Rinse Dijkstra
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koninklijke Philips NV
Original Assignee
Philips Gloeilampenfabrieken NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Gloeilampenfabrieken NV filed Critical Philips Gloeilampenfabrieken NV
Application granted granted Critical
Publication of CA978013A publication Critical patent/CA978013A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Epoxy Resins (AREA)
CA136,774A 1971-03-13 1972-03-10 Positive-acting photosensitive composition Expired CA978013A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL7103379A NL7103379A (it) 1971-03-13 1971-03-13

Publications (1)

Publication Number Publication Date
CA978013A true CA978013A (en) 1975-11-18

Family

ID=19812677

Family Applications (1)

Application Number Title Priority Date Filing Date
CA136,774A Expired CA978013A (en) 1971-03-13 1972-03-10 Positive-acting photosensitive composition

Country Status (8)

Country Link
JP (1) JPS5423572B1 (it)
BE (1) BE780621A (it)
CA (1) CA978013A (it)
DE (1) DE2208421A1 (it)
FR (1) FR2130167B1 (it)
GB (1) GB1334811A (it)
IT (1) IT952955B (it)
NL (1) NL7103379A (it)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2594088B2 (ja) * 1987-02-02 1997-03-26 日本ペイント株式会社 ポジ型感光性樹脂組成物ならびにその製法
JP7381566B2 (ja) * 2018-09-05 2023-11-15 メルク パテント ゲゼルシャフト ミット ベシュレンクテル ハフツング ポジ作動型感光性材料

Also Published As

Publication number Publication date
JPS5423572B1 (it) 1979-08-15
BE780621A (fr) 1972-09-13
DE2208421A1 (de) 1972-09-21
NL7103379A (it) 1972-09-15
IT952955B (it) 1973-07-30
FR2130167A1 (it) 1972-11-03
FR2130167B1 (it) 1977-01-14
GB1334811A (en) 1973-10-24

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