CA965336A - Fabrication of thin film devices - Google Patents

Fabrication of thin film devices

Info

Publication number
CA965336A
CA965336A CA153,877A CA153877A CA965336A CA 965336 A CA965336 A CA 965336A CA 153877 A CA153877 A CA 153877A CA 965336 A CA965336 A CA 965336A
Authority
CA
Canada
Prior art keywords
fabrication
thin film
film devices
devices
thin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA153,877A
Other languages
English (en)
Inventor
Edwin A. Chandross
Theodore A. Shankoff
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AT&T Corp
Original Assignee
Western Electric Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Western Electric Co Inc filed Critical Western Electric Co Inc
Application granted granted Critical
Publication of CA965336A publication Critical patent/CA965336A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/10—Etching compositions
    • C23F1/14—Aqueous compositions
    • C23F1/32—Alkaline compositions
    • C23F1/38—Alkaline compositions for etching refractory metals
    • H10P95/00—

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Weting (AREA)
  • ing And Chemical Polishing (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
CA153,877A 1972-03-30 1972-10-13 Fabrication of thin film devices Expired CA965336A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US23949772A 1972-03-30 1972-03-30

Publications (1)

Publication Number Publication Date
CA965336A true CA965336A (en) 1975-04-01

Family

ID=22902418

Family Applications (1)

Application Number Title Priority Date Filing Date
CA153,877A Expired CA965336A (en) 1972-03-30 1972-10-13 Fabrication of thin film devices

Country Status (8)

Country Link
US (1) US3772104A (OSRAM)
JP (1) JPS4915646A (OSRAM)
BE (1) BE797382A (OSRAM)
CA (1) CA965336A (OSRAM)
DE (1) DE2315372A1 (OSRAM)
FR (1) FR2178036A1 (OSRAM)
IT (1) IT976348B (OSRAM)
NL (1) NL7304188A (OSRAM)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5036126B1 (OSRAM) * 1970-12-18 1975-11-21
JPS513529A (en) * 1974-06-27 1976-01-13 Matsushita Electric Industrial Co Ltd Netsugatasatsuzodebaisuyotaagetsuto
JPS5915394B2 (ja) * 1978-08-31 1984-04-09 富士通株式会社 厚膜微細パタ−ン生成方法
JPS5879246A (ja) * 1981-11-05 1983-05-13 Toyobo Co Ltd 金属系画像形成方法および金属系画像減力方法
US4443295A (en) * 1983-06-13 1984-04-17 Fairchild Camera & Instrument Corp. Method of etching refractory metal film on semiconductor structures utilizing triethylamine and H2 O2
US4799993A (en) * 1988-05-10 1989-01-24 E. I. Du Pont De Nemours And Company Rotary developer and method for its use
US4995942A (en) * 1990-04-30 1991-02-26 International Business Machines Corporation Effective near neutral pH etching solution for molybdenum or tungsten
US5486234A (en) * 1993-07-16 1996-01-23 The United States Of America As Represented By The United States Department Of Energy Removal of field and embedded metal by spin spray etching
US6231676B1 (en) * 1998-01-27 2001-05-15 Seagate Technology Llc Cleaning process for disc drive components
US6464893B1 (en) * 2000-05-09 2002-10-15 Pace University Process for preparation of thin metallic foils and organic thin-film-metal structures
EP2071591A4 (en) * 2006-09-29 2010-03-31 Tsurumi Soda Kk LIQUID FLUID FOR A CONDUCTIVE POLYMER AND METHOD FOR STRUCTURING A CONDUCTIVE POLYMER
JP4406845B2 (ja) * 2007-02-20 2010-02-03 トヨタ自動車株式会社 二次電池電極材の剥離剤及び該剥離剤を用いた二次電池の処理方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2566615A (en) * 1947-03-21 1951-09-04 Sylvania Electric Prod Etching tungsten coils

Also Published As

Publication number Publication date
JPS4915646A (OSRAM) 1974-02-12
IT976348B (it) 1974-08-20
US3772104A (en) 1973-11-13
DE2315372A1 (de) 1973-10-18
BE797382A (fr) 1973-07-16
FR2178036A1 (OSRAM) 1973-11-09
NL7304188A (OSRAM) 1973-10-02

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