CA718583A - Method for surface treatment of semiconductor devices of the junction type - Google Patents

Method for surface treatment of semiconductor devices of the junction type

Info

Publication number
CA718583A
CA718583A CA718583A CA718583DA CA718583A CA 718583 A CA718583 A CA 718583A CA 718583 A CA718583 A CA 718583A CA 718583D A CA718583D A CA 718583DA CA 718583 A CA718583 A CA 718583A
Authority
CA
Canada
Prior art keywords
surface treatment
semiconductor devices
junction type
junction
type
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA718583A
Inventor
Emeis Reimer
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siemens Schuckertwerke AG
Original Assignee
Siemens Schuckertwerke AG
Publication date
Application granted granted Critical
Publication of CA718583A publication Critical patent/CA718583A/en
Expired legal-status Critical Current

Links

CA718583A Method for surface treatment of semiconductor devices of the junction type Expired CA718583A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CA718583T

Publications (1)

Publication Number Publication Date
CA718583A true CA718583A (en) 1965-09-21

Family

ID=36054157

Family Applications (1)

Application Number Title Priority Date Filing Date
CA718583A Expired CA718583A (en) Method for surface treatment of semiconductor devices of the junction type

Country Status (1)

Country Link
CA (1) CA718583A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3518132A (en) * 1966-07-12 1970-06-30 Us Army Corrosive vapor etching process for semiconductors using combined vapors of hydrogen fluoride and nitrous oxide
US3523842A (en) * 1967-03-31 1970-08-11 Us Army Manufacturing in-process control and measuring techniques for semiconductors surface etching

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3518132A (en) * 1966-07-12 1970-06-30 Us Army Corrosive vapor etching process for semiconductors using combined vapors of hydrogen fluoride and nitrous oxide
US3523842A (en) * 1967-03-31 1970-08-11 Us Army Manufacturing in-process control and measuring techniques for semiconductors surface etching

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