CA1052164A - Photosensitive composition - Google Patents
Photosensitive compositionInfo
- Publication number
- CA1052164A CA1052164A CA201,325A CA201325A CA1052164A CA 1052164 A CA1052164 A CA 1052164A CA 201325 A CA201325 A CA 201325A CA 1052164 A CA1052164 A CA 1052164A
- Authority
- CA
- Canada
- Prior art keywords
- composition
- sensitizer
- chlorobenzanthrone
- photosensitive
- halogen
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C49/00—Ketones; Ketenes; Dimeric ketenes; Ketonic chelates
- C07C49/587—Unsaturated compounds containing a keto groups being part of a ring
- C07C49/687—Unsaturated compounds containing a keto groups being part of a ring containing halogen
- C07C49/697—Unsaturated compounds containing a keto groups being part of a ring containing halogen containing six-membered aromatic rings
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Materials For Photolithography (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Epoxy Resins (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP48062144A JPS5146697B2 (it) | 1973-06-02 | 1973-06-02 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CA1052164A true CA1052164A (en) | 1979-04-10 |
Family
ID=13191595
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA201,325A Expired CA1052164A (en) | 1973-06-02 | 1974-05-31 | Photosensitive composition |
Country Status (7)
| Country | Link |
|---|---|
| JP (1) | JPS5146697B2 (it) |
| CA (1) | CA1052164A (it) |
| DE (1) | DE2426645C3 (it) |
| FR (1) | FR2231985A1 (it) |
| GB (1) | GB1450630A (it) |
| IT (1) | IT1014637B (it) |
| NL (1) | NL7407156A (it) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| AU4946697A (en) * | 1996-10-28 | 1998-05-22 | Merck Patent Gmbh | Dihydrobenzoanthracenone, -pyrimidinone or dihydronaphtoquinolinone |
-
1973
- 1973-06-02 JP JP48062144A patent/JPS5146697B2/ja not_active Expired
-
1974
- 1974-05-29 NL NL7407156A patent/NL7407156A/xx not_active Application Discontinuation
- 1974-05-30 FR FR7418752A patent/FR2231985A1/fr not_active Withdrawn
- 1974-05-31 CA CA201,325A patent/CA1052164A/en not_active Expired
- 1974-05-31 GB GB2422474A patent/GB1450630A/en not_active Expired
- 1974-05-31 IT IT2342874A patent/IT1014637B/it active
- 1974-06-01 DE DE19742426645 patent/DE2426645C3/de not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5011418A (it) | 1975-02-05 |
| FR2231985A1 (it) | 1974-12-27 |
| DE2426645B2 (de) | 1978-03-23 |
| JPS5146697B2 (it) | 1976-12-10 |
| DE2426645C3 (de) | 1978-11-23 |
| GB1450630A (en) | 1976-09-22 |
| IT1014637B (it) | 1977-04-30 |
| NL7407156A (it) | 1974-12-04 |
| DE2426645A1 (de) | 1974-12-12 |
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