CA1032450A - Selective removal of material by sputter etching - Google Patents

Selective removal of material by sputter etching

Info

Publication number
CA1032450A
CA1032450A CA216,413A CA216413A CA1032450A CA 1032450 A CA1032450 A CA 1032450A CA 216413 A CA216413 A CA 216413A CA 1032450 A CA1032450 A CA 1032450A
Authority
CA
Canada
Prior art keywords
selective removal
sputter etching
sputter
etching
selective
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA216,413A
Other languages
English (en)
French (fr)
Other versions
CA216413S (en
Inventor
Paul D. Cruzan
Thomas C. Tisone
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AT&T Corp
Original Assignee
Western Electric Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Western Electric Co Inc filed Critical Western Electric Co Inc
Application granted granted Critical
Publication of CA1032450A publication Critical patent/CA1032450A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67063—Apparatus for fluid treatment for etching
    • H01L21/67069—Apparatus for fluid treatment for etching for drying etching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/26—Bombardment with radiation
    • H01L21/263—Bombardment with radiation with high-energy radiation
    • H01L21/2633—Bombardment with radiation with high-energy radiation for etching, e.g. sputteretching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
    • H01L21/3105—After-treatment
    • H01L21/311—Etching the insulating layers by chemical or physical means
    • H01L21/31105—Etching inorganic layers

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Power Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Inorganic Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Drying Of Semiconductors (AREA)
  • ing And Chemical Polishing (AREA)
CA216,413A 1974-05-10 1974-12-19 Selective removal of material by sputter etching Expired CA1032450A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/468,813 US3943047A (en) 1974-05-10 1974-05-10 Selective removal of material by sputter etching

Publications (1)

Publication Number Publication Date
CA1032450A true CA1032450A (en) 1978-06-06

Family

ID=23861343

Family Applications (1)

Application Number Title Priority Date Filing Date
CA216,413A Expired CA1032450A (en) 1974-05-10 1974-12-19 Selective removal of material by sputter etching

Country Status (8)

Country Link
US (1) US3943047A (US20110009641A1-20110113-C00185.png)
JP (1) JPS50152937A (US20110009641A1-20110113-C00185.png)
CA (1) CA1032450A (US20110009641A1-20110113-C00185.png)
DE (1) DE2520556A1 (US20110009641A1-20110113-C00185.png)
FR (1) FR2270678B1 (US20110009641A1-20110113-C00185.png)
GB (1) GB1499847A (US20110009641A1-20110113-C00185.png)
IT (1) IT1032833B (US20110009641A1-20110113-C00185.png)
NL (1) NL7505474A (US20110009641A1-20110113-C00185.png)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS604652Y2 (ja) * 1976-04-06 1985-02-12 株式会社島津製作所 イオンエツチング装置
US4238312A (en) * 1979-07-23 1980-12-09 International Business Machines Corporation Sputtering system for optimizing quartz deposition uniformity
US4278493A (en) * 1980-04-28 1981-07-14 International Business Machines Corporation Method for cleaning surfaces by ion milling
US4309267A (en) * 1980-07-21 1982-01-05 Bell Telephone Laboratories, Incorporated Reactive sputter etching apparatus
GB8319716D0 (en) * 1983-07-21 1983-08-24 Secr Defence Reactive ion etching
GB2148769A (en) * 1983-10-22 1985-06-05 Standard Telephones Cables Ltd Topographic feature formation by ion beam milling of a substrate
US5238532A (en) * 1992-02-27 1993-08-24 Hughes Aircraft Company Method and apparatus for removal of subsurface damage in semiconductor materials by plasma etching
US5376224A (en) * 1992-02-27 1994-12-27 Hughes Aircraft Company Method and apparatus for non-contact plasma polishing and smoothing of uniformly thinned substrates
JPH11508488A (ja) * 1995-06-30 1999-07-27 ポール・コーポレーション 分離システムおよび方法
US5656535A (en) * 1996-03-04 1997-08-12 Siemens Aktiengesellschaft Storage node process for deep trench-based DRAM
US7672090B2 (en) * 2005-03-31 2010-03-02 Hitachi Global Storage Technologies Netherlands B.V. Magnetic read sensor employing oblique etched underlayers for inducing uniaxial magnetic anisotropy in a hard magnetic pinning layer
US7457085B2 (en) 2005-03-31 2008-11-25 Hitachi Global Storage Technologies Netherlands B.V. Magnetic read sensor employing oblique etched underlayers for inducing uniaxial magnetic anisotropy in hard magnetic bias layers
US7360300B2 (en) * 2005-03-31 2008-04-22 Hitachi Global Storage Technologies Netherlands B.V. Method for manufacturing a magnetic read sensor employing oblique etched underlayers for inducing uniaxial magnetic anisotropy in a hard magnetic pinning layer
US7382586B2 (en) * 2005-03-31 2008-06-03 Hitachi Global Storage Technologies Netherlands B.V. Magnetic read sensor employing oblique etched underlayers for inducing uniaxial magnetic anisotropy in a self biased free layer
US7363699B2 (en) * 2005-03-31 2008-04-29 Hitachi Global Storage Technologies Netherlands B. V. Method for manufacturing a magnetic read sensor employing oblique etched underlayers for inducing uniaxial magnetic anisotropy in hard magnetic bias layers
US7460343B2 (en) * 2005-03-31 2008-12-02 Hitachi Global Storage Technologies Netherlands B.V. Magnetic read sensor employing oblique etched underlayers for inducing uniaxial magnetic anisotropy in a hard magnetic in-stack bias layer
US7360299B2 (en) * 2005-03-31 2008-04-22 Hitachi Global Storage Technologies Netherlands B. V. Method for manufacturing a magnetic read sensor employing oblique etched underlayers for inducing uniaxial magnetic anisotropy in a hard magnetic in-stack bias layer
US8084346B1 (en) * 2010-10-20 2011-12-27 International Business Machines Corporation Replacement metal gate method
US10002764B1 (en) 2016-12-16 2018-06-19 Varian Semiconductor Equipment Associates, Inc. Sputter etch material selectivity
US11053580B2 (en) 2018-02-21 2021-07-06 Varian Semiconductor Equipment Associates, Inc. Techniques for selective deposition using angled ions
CN113658855A (zh) * 2020-05-12 2021-11-16 江苏鲁汶仪器有限公司 一种侧壁金属的刻蚀方法及其应用

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3325393A (en) * 1964-05-28 1967-06-13 Gen Electric Electrical discharge cleaning and coating process
US3526584A (en) * 1964-09-25 1970-09-01 Western Electric Co Method of providing a field free region above a substrate during sputter-depositing thereon
US3410775A (en) * 1966-04-14 1968-11-12 Bell Telephone Labor Inc Electrostatic control of electron movement in cathode sputtering
US3361659A (en) * 1967-08-14 1968-01-02 Ibm Process of depositing thin films by cathode sputtering using a controlled grid
FR1594542A (US20110009641A1-20110113-C00185.png) * 1967-12-22 1970-06-08
US3558351A (en) * 1968-12-19 1971-01-26 Bell Telephone Labor Inc Thin semiconductor films
FR2082505A5 (US20110009641A1-20110113-C00185.png) * 1970-03-18 1971-12-10 Radiotechnique Compelec
US3699034A (en) * 1971-03-15 1972-10-17 Sperry Rand Corp Method for sputter depositing dielectric materials
US3820994A (en) * 1972-06-07 1974-06-28 Westinghouse Electric Corp Penetration of polyimide films

Also Published As

Publication number Publication date
NL7505474A (nl) 1975-11-12
GB1499847A (en) 1978-02-01
JPS50152937A (US20110009641A1-20110113-C00185.png) 1975-12-09
FR2270678A1 (US20110009641A1-20110113-C00185.png) 1975-12-05
IT1032833B (it) 1979-06-20
FR2270678B1 (US20110009641A1-20110113-C00185.png) 1978-03-17
DE2520556A1 (de) 1975-11-20
US3943047A (en) 1976-03-09

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