BRPI0417172A - irradiation apparatus and irradiation system - Google Patents

irradiation apparatus and irradiation system

Info

Publication number
BRPI0417172A
BRPI0417172A BRPI0417172A BRPI0417172A BR PI0417172 A BRPI0417172 A BR PI0417172A BR PI0417172 A BRPI0417172 A BR PI0417172A BR PI0417172 A BRPI0417172 A BR PI0417172A
Authority
BR
Brazil
Prior art keywords
radiation
solid state
irradiation
arranged
array pattern
Prior art date
Application number
Other languages
Portuguese (pt)
Inventor
Francis M Aguirre
Michele A Craton
Jack W Lai
David L Phillips
Peter T Benson
Original Assignee
3M Innovative Properties Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to US10/726,257 priority Critical patent/US7250611B2/en
Priority to US10/869,235 priority patent/US7202489B2/en
Priority to US10/869,236 priority patent/US7202490B2/en
Priority to US10/869,237 priority patent/US7189983B2/en
Application filed by 3M Innovative Properties Co filed Critical 3M Innovative Properties Co
Priority to PCT/US2004/040201 priority patent/WO2005057671A2/en
Publication of BRPI0417172A publication Critical patent/BRPI0417172A/en

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
    • G02B6/00Light guides
    • G02B6/24Coupling light guides
    • G02B6/42Coupling light guides with opto-electronic elements
    • G02B6/4201Packages, e.g. shape, construction, internal or external details
    • G02B6/4249Packages, e.g. shape, construction, internal or external details comprising arrays of active devices and fibres
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21LIGHTING
    • F21VFUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
    • F21V29/00Protecting lighting devices from thermal damage; Cooling or heating arrangements specially adapted for lighting devices or systems
    • F21V29/50Cooling arrangements
    • F21V29/70Cooling arrangements characterised by passive heat-dissipating elements, e.g. heat-sinks
    • F21V29/80Cooling arrangements characterised by passive heat-dissipating elements, e.g. heat-sinks with pins or wires
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
    • G02B6/00Light guides
    • G02B6/04Light guides formed by bundles of fibres
    • G02B6/06Light guides formed by bundles of fibres the relative position of the fibres being the same at both ends, e.g. for transporting images
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70375Imaging systems not otherwise provided for, e.g. multiphoton lithography; Imaging systems comprising means for converting one type of radiation into another type of radiation, systems comprising mask with photo-cathode
    • G03F7/70383Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G03F7/70391Addressable array sources specially adapted to produce patterns, e.g. addressable LED arrays
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61CDENTISTRY; APPARATUS OR METHODS FOR ORAL OR DENTAL HYGIENE
    • A61C19/00Dental auxiliary appliances
    • A61C19/003Apparatus for curing resins by radiation
    • A61C19/004Hand-held apparatus, e.g. guns
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
    • G02B6/00Light guides
    • G02B6/24Coupling light guides
    • G02B6/36Mechanical coupling means
    • G02B6/3628Mechanical coupling means for mounting fibres to supporting carriers
    • G02B6/3632Mechanical coupling means for mounting fibres to supporting carriers characterised by the cross-sectional shape of the mechanical coupling means
    • G02B6/3644Mechanical coupling means for mounting fibres to supporting carriers characterised by the cross-sectional shape of the mechanical coupling means the coupling means being through-holes or wall apertures
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
    • G02B6/00Light guides
    • G02B6/24Coupling light guides
    • G02B6/36Mechanical coupling means
    • G02B6/3628Mechanical coupling means for mounting fibres to supporting carriers
    • G02B6/36642D cross sectional arrangements of the fibres
    • G02B6/36682D cross sectional arrangements of the fibres with conversion in geometry of the cross section
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
    • G02B6/00Light guides
    • G02B6/24Coupling light guides
    • G02B6/36Mechanical coupling means
    • G02B6/3628Mechanical coupling means for mounting fibres to supporting carriers
    • G02B6/36642D cross sectional arrangements of the fibres
    • G02B6/36722D cross sectional arrangements of the fibres with fibres arranged in a regular matrix array
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
    • G02B6/00Light guides
    • G02B6/24Coupling light guides
    • G02B6/36Mechanical coupling means
    • G02B6/3628Mechanical coupling means for mounting fibres to supporting carriers
    • G02B6/368Mechanical coupling means for mounting fibres to supporting carriers with pitch conversion between input and output plane, e.g. for increasing packing density
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
    • G02B6/00Light guides
    • G02B6/24Coupling light guides
    • G02B6/36Mechanical coupling means
    • G02B6/38Mechanical coupling means having fibre to fibre mating means
    • G02B6/3807Dismountable connectors, i.e. comprising plugs
    • G02B6/3873Connectors using guide surfaces for aligning ferrule ends, e.g. tubes, sleeves, V-grooves, rods, pins, balls
    • G02B6/3885Multicore or multichannel optical connectors, i.e. one single ferrule containing more than one fibre, e.g. ribbon type
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
    • G02B6/00Light guides
    • G02B6/24Coupling light guides
    • G02B6/42Coupling light guides with opto-electronic elements
    • G02B6/4201Packages, e.g. shape, construction, internal or external details
    • G02B6/4204Packages, e.g. shape, construction, internal or external details the coupling comprising intermediate optical elements, e.g. lenses, holograms
    • G02B6/4206Optical features
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
    • G02B6/00Light guides
    • G02B6/24Coupling light guides
    • G02B6/42Coupling light guides with opto-electronic elements
    • G02B6/4201Packages, e.g. shape, construction, internal or external details
    • G02B6/4219Mechanical fixtures for holding or positioning the elements relative to each other in the couplings; Alignment methods for the elements, e.g. measuring or observing methods especially used therefor

Abstract

"IRRADIATION APPARATUS AND IRRADIATION SYSTEM". An irradiation apparatus (400) comprises a plurality of solid state radiation sources (104) for generating radiation that modifies a first material (650), such as by curing or creating alignment by polarization. The solid state radiation sources 104 may be arranged in an array pattern. Optical concentrators (120) arranged in a corresponding array pattern receive radiation from corresponding solid state radiation sources (104). Concentrated radiation is received by a plurality of optical waveguides (130), also arranged in a corresponding array pattern. Each optical waveguide includes a first end (132) for receiving radiation and a second end (133) for transmitting radiation. A controller (304) in electrical communication with the solid state radiation sources (104) causes them to generate pulsed radiation. The radiation modification apparatus may be used for continuous substrate, sheet, part part, point and / or 3D radiation curing processes.
BRPI0417172 2003-12-02 2004-12-01 irradiation apparatus and irradiation system BRPI0417172A (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
US10/726,257 US7250611B2 (en) 2003-12-02 2003-12-02 LED curing apparatus and method
US10/869,235 US7202489B2 (en) 2003-12-02 2004-06-16 LED modifying apparatus and method
US10/869,236 US7202490B2 (en) 2003-12-02 2004-06-16 LED modifying apparatus and method
US10/869,237 US7189983B2 (en) 2003-12-02 2004-06-16 LED modifying apparatus and method
PCT/US2004/040201 WO2005057671A2 (en) 2003-12-02 2004-12-01 Irradiation systems

Publications (1)

Publication Number Publication Date
BRPI0417172A true BRPI0417172A (en) 2007-03-06

Family

ID=34682359

Family Applications (3)

Application Number Title Priority Date Filing Date
BRPI0417172 BRPI0417172A (en) 2003-12-02 2004-12-01 irradiation apparatus and irradiation system
BRPI0417183 BRPI0417183A (en) 2003-12-02 2004-12-01 irradiation apparatus, irradiation system and system
BRPI0417190 BRPI0417190A (en) 2003-12-02 2004-12-01 irradiation apparatus and system

Family Applications After (2)

Application Number Title Priority Date Filing Date
BRPI0417183 BRPI0417183A (en) 2003-12-02 2004-12-01 irradiation apparatus, irradiation system and system
BRPI0417190 BRPI0417190A (en) 2003-12-02 2004-12-01 irradiation apparatus and system

Country Status (6)

Country Link
EP (3) EP1697681A2 (en)
JP (3) JP2007512954A (en)
KR (3) KR20060115911A (en)
BR (3) BRPI0417172A (en)
MX (3) MXPA06006279A (en)
WO (3) WO2005057669A2 (en)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102005019386B4 (en) * 2005-04-26 2010-07-29 Ivoclar Vivadent Ag Apparatus for polymerizing polymerizable dental material and method for determining the degree of polymerization
US8016470B2 (en) 2007-10-05 2011-09-13 Dental Equipment, Llc LED-based dental exam lamp with variable chromaticity
US8459852B2 (en) 2007-10-05 2013-06-11 Dental Equipment, Llc LED-based dental exam lamp
FR2909276A1 (en) * 2006-12-04 2008-06-06 Satelec Sa Photopolymerization device for e.g. filling material, in dental field, has unit measuring intensity of light reflected by material, and control circuit to automatically control power and lighting duration of source based on measurement
JP5248903B2 (en) * 2008-04-18 2013-07-31 リコー光学株式会社 Line illumination device, line illumination method, optical inspection device, and optical processing device
JP2011041879A (en) * 2009-08-19 2011-03-03 Panasonic Electric Works Co Ltd Ultraviolet irradiation device
JP5258715B2 (en) * 2009-09-14 2013-08-07 株式会社フジクラ Irradiation device and light source unit
DE102009049057B4 (en) * 2009-10-12 2018-10-25 Osram Gmbh LED module, method of operating this LED module and lighting device with this LED module
KR101742678B1 (en) * 2010-09-17 2017-06-01 엘지이노텍 주식회사 Lamp apparatus
KR101752421B1 (en) * 2010-09-17 2017-06-29 엘지이노텍 주식회사 Lamp apparatus
US9816677B2 (en) 2010-10-29 2017-11-14 Sharp Kabushiki Kaisha Light emitting device, vehicle headlamp, illumination device, and laser element
CA2832721C (en) 2011-04-08 2016-12-20 Brite Shot, Inc. Led array lighting assembly
RU2014147055A (en) * 2012-04-24 2016-06-10 Конинклейке Филипс Н.В. Autosteroscopic display device and control method
JP6413570B2 (en) * 2014-09-30 2018-10-31 東芝ライテック株式会社 Light source device
WO2018001747A1 (en) * 2016-07-01 2018-01-04 Asml Netherlands B.V. Illumination system for a lithographic or inspection apparatus
KR101877421B1 (en) * 2017-03-09 2018-07-11 한국광기술원 Light curing apparatus for dental clini

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6019564A (en) * 1983-07-13 1985-01-31 Fuji Photo Film Co Ltd Side printer
CA1254261A (en) * 1984-11-08 1989-05-16 James M. Forsyth Long life x-ray source target
JPH02142695A (en) * 1988-07-13 1990-05-31 Sony Corp Laser beam machine
US5212710A (en) * 1990-07-19 1993-05-18 Sony Corporation Laser light beam synthesizing apparatus
DE4301716C2 (en) * 1992-02-04 1999-08-12 Hitachi Ltd Projection exposure apparatus and method
WO1995020811A1 (en) * 1994-01-31 1995-08-03 Sdl, Inc. Laser illuminated display system
US5580471A (en) * 1994-03-30 1996-12-03 Panasonic Technologies, Inc. Apparatus and method for material treatment and inspection using fiber-coupled laser diode
DE4429913C1 (en) * 1994-08-23 1996-03-21 Fraunhofer Ges Forschung Apparatus and method for plating
DE19626176A1 (en) * 1996-06-29 1998-01-08 Deutsche Forsch Luft Raumfahrt Lithography exposure device and lithography process
US6200134B1 (en) * 1998-01-20 2001-03-13 Kerr Corporation Apparatus and method for curing materials with radiation
AU6875200A (en) * 1999-09-10 2001-04-17 Nikon Corporation Exposure device with laser device
US6625351B2 (en) * 2000-02-17 2003-09-23 Microfab Technologies, Inc. Ink-jet printing of collimating microlenses onto optical fibers
US6224216B1 (en) * 2000-02-18 2001-05-01 Infocus Corporation System and method employing LED light sources for a projection display
US20020126479A1 (en) * 2001-03-08 2002-09-12 Ball Semiconductor, Inc. High power incoherent light source with laser array
EP1241869B1 (en) * 2001-03-14 2010-08-11 Ricoh Company, Ltd. Light-emission modulation having effective scheme of creating gray scale on image
US20020171047A1 (en) * 2001-03-28 2002-11-21 Chan Kin Foeng Integrated laser diode array and applications
US20030068113A1 (en) * 2001-09-12 2003-04-10 Siegfried Janz Method for polarization birefringence compensation in a waveguide demultiplexer using a compensator with a high refractive index capping layer.
US20030091277A1 (en) * 2001-11-15 2003-05-15 Wenhui Mei Flattened laser scanning system
US6928226B2 (en) * 2002-03-14 2005-08-09 Corning Incorporated Fiber and lens grippers, optical devices and methods of manufacture
US7095922B2 (en) * 2002-03-26 2006-08-22 Ngk Insulators, Ltd. Lensed fiber array and production method thereof
WO2003085457A1 (en) * 2002-04-10 2003-10-16 Fuji Photo Film Co., Ltd. Exposure head, exposure apparatus, and its application
US20030231843A1 (en) * 2002-06-13 2003-12-18 Colombo Joseph G. Fiber optic light compressor for a curing instrument

Also Published As

Publication number Publication date
EP1690302A2 (en) 2006-08-16
MXPA06006281A (en) 2006-08-25
MXPA06006279A (en) 2006-08-25
EP1697682A2 (en) 2006-09-06
BRPI0417190A (en) 2007-03-06
WO2005057670A3 (en) 2005-11-03
KR20060115911A (en) 2006-11-10
EP1697681A2 (en) 2006-09-06
BRPI0417183A (en) 2007-03-06
JP2007521622A (en) 2007-08-02
WO2005057670A2 (en) 2005-06-23
WO2005057671A2 (en) 2005-06-23
JP2007512954A (en) 2007-05-24
WO2005057671A3 (en) 2005-12-01
MXPA06006280A (en) 2006-08-25
JP2007515270A (en) 2007-06-14
KR20060115910A (en) 2006-11-10
KR20060121264A (en) 2006-11-28
WO2005057669A3 (en) 2007-02-08
WO2005057669A2 (en) 2005-06-23

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Legal Events

Date Code Title Description
B11A Dismissal acc. art.33 of ipl - examination not requested within 36 months of filing
B11Y Definitive dismissal acc. article 33 of ipl - extension of time limit for request of examination expired
B15K Others concerning applications: alteration of classification

Ipc: G02B 6/42 (2006.01), F21V 29/80 (2015.01), G02B 6/