BR112015016653A2 - método de fabricação de uma chapa de impressão litográfica - Google Patents
método de fabricação de uma chapa de impressão litográficaInfo
- Publication number
- BR112015016653A2 BR112015016653A2 BR112015016653A BR112015016653A BR112015016653A2 BR 112015016653 A2 BR112015016653 A2 BR 112015016653A2 BR 112015016653 A BR112015016653 A BR 112015016653A BR 112015016653 A BR112015016653 A BR 112015016653A BR 112015016653 A2 BR112015016653 A2 BR 112015016653A2
- Authority
- BR
- Brazil
- Prior art keywords
- manufacturing
- printing plate
- lithographic printing
- lithographic
- plate
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/3042—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/3042—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations
- G03F7/3064—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations characterised by the transport means or means for confining the different units, e.g. to avoid the overflow
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/3042—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations
- G03F7/3071—Process control means, e.g. for replenishing
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Automation & Control Theory (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Printing Plates And Materials Therefor (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP13150972.1A EP2755088B1 (en) | 2013-01-11 | 2013-01-11 | Method of making a lithographic printing plate |
US201361752462P | 2013-01-15 | 2013-01-15 | |
PCT/EP2014/050122 WO2014108385A1 (en) | 2013-01-11 | 2014-01-07 | Method of making a lithographic printing plate |
Publications (1)
Publication Number | Publication Date |
---|---|
BR112015016653A2 true BR112015016653A2 (pt) | 2017-07-11 |
Family
ID=47552892
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BR112015016653A BR112015016653A2 (pt) | 2013-01-11 | 2014-01-07 | método de fabricação de uma chapa de impressão litográfica |
Country Status (7)
Country | Link |
---|---|
US (1) | US9354520B2 (pt) |
EP (1) | EP2755088B1 (pt) |
CN (1) | CN104981738B (pt) |
BR (1) | BR112015016653A2 (pt) |
ES (1) | ES2588075T3 (pt) |
PL (1) | PL2755088T3 (pt) |
WO (1) | WO2014108385A1 (pt) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
PL2755088T3 (pl) * | 2013-01-11 | 2016-12-30 | Sposób wytwarzania litograficznej płyty drukowej | |
AU2017235147A1 (en) * | 2016-03-16 | 2018-07-12 | Agfa Nv | Method for processing a lithographic printing plate |
WO2019206911A1 (en) * | 2018-04-26 | 2019-10-31 | Xeikon Prepress N.V. | Apparatus and method for treating a relief plate precursor having a transport system |
EP3587113B1 (en) * | 2018-06-21 | 2023-01-04 | Agfa Offset Bv | A lithographic printing plate precursor |
US11633948B2 (en) | 2020-01-22 | 2023-04-25 | Eastman Kodak Company | Method for making lithographic printing plates |
Family Cites Families (30)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CH613059A5 (en) | 1975-06-30 | 1979-08-31 | Hoechst Ag | Method for producing a flat-bed printing forme |
DE3410522A1 (de) | 1984-03-22 | 1985-10-03 | Hoechst Ag, 6230 Frankfurt | Einbrenngummierung fuer offsetdruckplatten und verfahren zur herstellung einer offsetdruckform |
DE3539992A1 (de) | 1985-11-12 | 1987-05-14 | Hoechst Ag | Einbrenngummierung fuer offsetdruckplatten |
DE3832032A1 (de) | 1988-09-21 | 1990-03-22 | Hoechst Ag | Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial |
EP0851299B1 (en) | 1996-12-26 | 2000-10-25 | Mitsubishi Chemical Corporation | Photosensitive lithographic printing plate |
EP1025992B1 (en) | 1999-02-02 | 2003-07-23 | Agfa-Gevaert | A method for making positive printing plates |
DE19940921A1 (de) | 1999-08-27 | 2001-03-01 | Agfa Gevaert Ag | Photopolymerisierbares Gemisch und damit hergestelltes Aufzeichnungsmaterial |
DE19944073A1 (de) | 1999-09-14 | 2001-03-15 | Agfa Gevaert Ag | Strahlungsempfindliches Aufzeichnungsmaterial mit Deckschicht |
US6558873B1 (en) | 1999-10-05 | 2003-05-06 | Fuji Photo Film Co., Ltd. | Lithographic printing plate precursor |
JP4098483B2 (ja) | 2001-03-12 | 2008-06-11 | 富士フイルム株式会社 | 平版印刷版原版 |
US6893797B2 (en) | 2001-11-09 | 2005-05-17 | Kodak Polychrome Graphics Llc | High speed negative-working thermal printing plates |
ATE544095T1 (de) | 2001-08-29 | 2012-02-15 | Fujifilm Corp | Verfahren zur herstellung einer druckplatte |
JP2003252939A (ja) | 2002-03-01 | 2003-09-10 | Fuji Photo Film Co Ltd | 光重合性組成物 |
JP2004012706A (ja) | 2002-06-05 | 2004-01-15 | Fuji Photo Film Co Ltd | 平版印刷版原版 |
US20040009426A1 (en) | 2002-06-05 | 2004-01-15 | Fuji Photo Film Co., Ltd. | Infrared photosensitive composition and image recording material for infrared exposure |
JP4418714B2 (ja) | 2003-07-10 | 2010-02-24 | 富士フイルム株式会社 | 平版印刷版原版及び平版印刷方法 |
US8409785B2 (en) | 2003-07-17 | 2013-04-02 | Kodak Graphic Communications Gmbh | Apparatus and method for treating imaging materials |
ATE491968T1 (de) | 2003-07-22 | 2011-01-15 | Fujifilm Corp | Flachdruckplattenvorläufer und lithographisches druckverfahren |
EP1506854B1 (en) | 2003-08-13 | 2008-04-23 | Agfa Graphics N.V. | Method for postbaking a lithographic printing plate |
JP4644458B2 (ja) | 2003-09-30 | 2011-03-02 | 富士フイルム株式会社 | 平版印刷版原版および平版印刷方法 |
US20050153239A1 (en) * | 2004-01-09 | 2005-07-14 | Fuji Photo Film Co., Ltd. | Lithographic printing plate precursor and lithographic printing method using the same |
US7153045B2 (en) * | 2005-01-07 | 2006-12-26 | Eastman Kodak Company | Electro-mechanical system and method for mixing replenishment for plate precursor developers |
EP1696274A3 (en) * | 2005-02-23 | 2010-12-29 | FUJIFILM Corporation | Method for controlling development in automatic developing machine for photosensitive lithographic printing plate precursor and automatic developing machine therefor |
JP4815270B2 (ja) * | 2005-08-18 | 2011-11-16 | 富士フイルム株式会社 | 平版印刷版の作製方法及び作製装置 |
ATE497192T1 (de) * | 2005-11-18 | 2011-02-15 | Agfa Graphics Nv | Verfahren zur herstellung einer lithografiedruckform |
ATE481240T1 (de) * | 2008-02-28 | 2010-10-15 | Agfa Graphics Nv | Verfahren zur herstellung einer lithografiedruckplatte |
EP2105799B1 (en) * | 2008-03-26 | 2012-02-22 | Agfa Graphics N.V. | A method for preparing lithographic printing plates |
JP2010197620A (ja) | 2009-02-24 | 2010-09-09 | Fujifilm Corp | 平版印刷版原版の自動現像装置及び処理方法 |
US9156529B2 (en) * | 2011-09-08 | 2015-10-13 | Agfa Graphics Nv | Method of making a lithographic printing plate |
PL2755088T3 (pl) * | 2013-01-11 | 2016-12-30 | Sposób wytwarzania litograficznej płyty drukowej |
-
2013
- 2013-01-11 PL PL13150972.1T patent/PL2755088T3/pl unknown
- 2013-01-11 EP EP13150972.1A patent/EP2755088B1/en active Active
- 2013-01-11 ES ES13150972.1T patent/ES2588075T3/es active Active
-
2014
- 2014-01-07 BR BR112015016653A patent/BR112015016653A2/pt not_active IP Right Cessation
- 2014-01-07 CN CN201480004489.8A patent/CN104981738B/zh active Active
- 2014-01-07 US US14/654,598 patent/US9354520B2/en active Active
- 2014-01-07 WO PCT/EP2014/050122 patent/WO2014108385A1/en active Application Filing
Also Published As
Publication number | Publication date |
---|---|
CN104981738A (zh) | 2015-10-14 |
ES2588075T3 (es) | 2016-10-28 |
US9354520B2 (en) | 2016-05-31 |
US20150355548A1 (en) | 2015-12-10 |
EP2755088A1 (en) | 2014-07-16 |
WO2014108385A1 (en) | 2014-07-17 |
PL2755088T3 (pl) | 2016-12-30 |
CN104981738B (zh) | 2019-11-15 |
EP2755088B1 (en) | 2016-07-27 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
B25D | Requested change of name of applicant approved |
Owner name: AGFA NV (BE) |
|
B06F | Objections, documents and/or translations needed after an examination request according [chapter 6.6 patent gazette] | ||
B06U | Preliminary requirement: requests with searches performed by other patent offices: procedure suspended [chapter 6.21 patent gazette] | ||
B08F | Application dismissed because of non-payment of annual fees [chapter 8.6 patent gazette] |
Free format text: REFERENTE A 8A ANUIDADE. |
|
B08K | Patent lapsed as no evidence of payment of the annual fee has been furnished to inpi [chapter 8.11 patent gazette] |
Free format text: EM VIRTUDE DO ARQUIVAMENTO PUBLICADO NA RPI 2652 DE 03-11-2021 E CONSIDERANDO AUSENCIA DE MANIFESTACAO DENTRO DOS PRAZOS LEGAIS, INFORMO QUE CABE SER MANTIDO O ARQUIVAMENTO DO PEDIDO DE PATENTE, CONFORME O DISPOSTO NO ARTIGO 12, DA RESOLUCAO 113/2013. |