BR112014010571A2 - Método para reciclagem de líquido residual proveniente de um processo para fabricação de placas para um precursor de placa de impressão planográfica - Google Patents

Método para reciclagem de líquido residual proveniente de um processo para fabricação de placas para um precursor de placa de impressão planográfica

Info

Publication number
BR112014010571A2
BR112014010571A2 BR112014010571-5A BR112014010571A BR112014010571A2 BR 112014010571 A2 BR112014010571 A2 BR 112014010571A2 BR 112014010571 A BR112014010571 A BR 112014010571A BR 112014010571 A2 BR112014010571 A2 BR 112014010571A2
Authority
BR
Brazil
Prior art keywords
liquid
developing
residual liquid
repository
making process
Prior art date
Application number
BR112014010571-5A
Other languages
English (en)
Japanese (ja)
Portuguese (pt)
Inventor
Kobayashi Fumikazu
Watanabe Toshihiro
Original Assignee
Fujifilm Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corporation filed Critical Fujifilm Corporation
Publication of BR112014010571A2 publication Critical patent/BR112014010571A2/pt

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3092—Recovery of material; Waste processing
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/02—Treatment of water, waste water, or sewage by heating
    • C02F1/04—Treatment of water, waste water, or sewage by heating by distillation or evaporation
    • C02F1/048—Purification of waste water by evaporation
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
    • C02F2103/34—Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32
    • C02F2103/40—Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32 from the manufacture or use of photosensitive materials
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2301/00—General aspects of water treatment
    • C02F2301/06—Pressure conditions
    • C02F2301/063—Underpressure, vacuum

Landscapes

  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Hydrology & Water Resources (AREA)
  • Water Supply & Treatment (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Heat Treatment Of Water, Waste Water Or Sewage (AREA)
BR112014010571-5A 2011-11-04 2012-11-02 Método para reciclagem de líquido residual proveniente de um processo para fabricação de placas para um precursor de placa de impressão planográfica BR112014010571A2 (pt)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2011-242463 2011-11-04
JP2011242463 2011-11-04
PCT/JP2012/078539 WO2013065853A1 (ja) 2011-11-04 2012-11-02 製版処理廃液のリサイクル方法

Publications (1)

Publication Number Publication Date
BR112014010571A2 true BR112014010571A2 (pt) 2017-06-13

Family

ID=48192190

Family Applications (1)

Application Number Title Priority Date Filing Date
BR112014010571-5A BR112014010571A2 (pt) 2011-11-04 2012-11-02 Método para reciclagem de líquido residual proveniente de um processo para fabricação de placas para um precursor de placa de impressão planográfica

Country Status (7)

Country Link
US (1) US20140234778A1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
EP (1) EP2762977B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JP (1) JP5819275B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
CN (1) CN103907062B (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
BR (1) BR112014010571A2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
IN (1) IN2014CN03280A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
WO (1) WO2013065853A1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2013125315A1 (ja) * 2012-02-20 2013-08-29 富士フイルム株式会社 製版処理廃液の濃縮方法およびリサイクル方法
WO2021171875A1 (ja) * 2020-02-28 2021-09-02 富士フイルム株式会社 インク組成物、インクセット及び画像記録方法
EP4293423A4 (en) * 2021-02-15 2024-10-16 Asahi Kasei Kabushiki Kaisha SEPARATION AND RECOVERY DEVICE, SEPARATION AND RECOVERY PROCESS, DEVELOPMENT SYSTEM AND DEVELOPER RECYCLING PROCESS

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