BE843755A - Couche barriere protegeant de l'oxygene pour planches d'impression lithographique - Google Patents
Couche barriere protegeant de l'oxygene pour planches d'impression lithographiqueInfo
- Publication number
- BE843755A BE843755A BE168618A BE168618A BE843755A BE 843755 A BE843755 A BE 843755A BE 168618 A BE168618 A BE 168618A BE 168618 A BE168618 A BE 168618A BE 843755 A BE843755 A BE 843755A
- Authority
- BE
- Belgium
- Prior art keywords
- barrier layer
- lithographic printing
- oxygen protecting
- protecting barrier
- printing boards
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/092—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB2809275A GB1553823A (en) | 1975-07-03 | 1975-07-03 | Photographic material |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| BE843755A true BE843755A (fr) | 1977-01-03 |
Family
ID=10270134
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| BE168618A BE843755A (fr) | 1975-07-03 | 1976-07-02 | Couche barriere protegeant de l'oxygene pour planches d'impression lithographique |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JPS5224703A (xx) |
| BE (1) | BE843755A (xx) |
| DE (1) | DE2629883A1 (xx) |
| FR (1) | FR2316626A1 (xx) |
| GB (1) | GB1553823A (xx) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5515155A (en) * | 1978-07-19 | 1980-02-02 | Kansai Paint Co Ltd | Production of screen printing plate |
| JPS5515178A (en) * | 1978-07-20 | 1980-02-02 | Kansai Paint Co Ltd | Production of screen printing plate |
| JPS59177544A (ja) * | 1983-03-29 | 1984-10-08 | Nippon Synthetic Chem Ind Co Ltd:The | 画像形成方法 |
| JPS6127547A (ja) * | 1984-07-17 | 1986-02-07 | Fuji Photo Film Co Ltd | 湿し水不要感光性平版印刷版 |
| JPH0389349A (ja) * | 1989-09-01 | 1991-04-15 | Riso Kagaku Corp | 凹凸画像の形成方法 |
| US5248583A (en) * | 1991-08-30 | 1993-09-28 | Minnesota Mining And Manufacturing Company | Negative single sheet color proofing system based on aqueous developable photo-oligomers |
| US5786127A (en) * | 1996-08-15 | 1998-07-28 | Western Litho Plate & Supply Co. | Photosensitive element having an overcoat which increases photo-speed and is substantially impermeable to oxygen |
-
1975
- 1975-07-03 GB GB2809275A patent/GB1553823A/en not_active Expired
-
1976
- 1976-06-30 FR FR7619854A patent/FR2316626A1/fr not_active Withdrawn
- 1976-07-02 DE DE19762629883 patent/DE2629883A1/de active Pending
- 1976-07-02 BE BE168618A patent/BE843755A/xx unknown
- 1976-07-03 JP JP7940976A patent/JPS5224703A/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| FR2316626A1 (fr) | 1977-01-28 |
| JPS5224703A (en) | 1977-02-24 |
| GB1553823A (en) | 1979-10-10 |
| DE2629883A1 (de) | 1977-01-13 |
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