BE627164A - - Google Patents

Info

Publication number
BE627164A
BE627164A BE627164DA BE627164A BE 627164 A BE627164 A BE 627164A BE 627164D A BE627164D A BE 627164DA BE 627164 A BE627164 A BE 627164A
Authority
BE
Belgium
Prior art keywords
bodies
contacts
directions
resistance
edge
Prior art date
Application number
Other languages
English (en)
French (fr)
Publication of BE627164A publication Critical patent/BE627164A/fr

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/26Testing of individual semiconductor devices
    • G01R31/2607Circuits therefor
    • G01R31/2637Circuits therefor for testing other individual devices

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Investigating Or Analyzing Materials By The Use Of Electric Means (AREA)
BE627164D BE627164A (cs)

Publications (1)

Publication Number Publication Date
BE627164A true BE627164A (cs)

Family

ID=197628

Family Applications (1)

Application Number Title Priority Date Filing Date
BE627164D BE627164A (cs)

Country Status (1)

Country Link
BE (1) BE627164A (cs)

Similar Documents

Publication Publication Date Title
JPH04298058A (ja) 集積回路を製造するための方法
FR2985812A1 (fr) Procede et dispositif de test de substrats semi-conducteurs pour applications radiofrequences
FR2964193A1 (fr) Procede de mesure d'une energie d'adhesion, et substrats associes
BE627164A (cs)
FR3130036A1 (fr) Véhicule de test et méthode de test pour des dispositifs microélectroniques
JPWO2018042971A1 (ja) 固体のスピン特性からトポロジカル絶縁性を評価する方法及び装置
EP0908944B1 (fr) Caractérisation électrique d'une couche isolante recouvrant un substrat conducteur ou semiconducteur
Kuntzsch et al. Characterization of Slurries Used for Chemical‐Mechanical Polishing (CMP) in the Semiconductor Industry
JPWO2007135753A1 (ja) ウエハのシリコン層の探傷装置及び探傷方法
Zheng et al. Effectively tuning phonon transport across Al/nonmetal interfaces through controlling interfacial bonding strength without modifying thermal conductivity
Xu et al. Raman spectroscopy characterization of ion implanted 4H-SiC
JP2008232906A (ja) 圧電体特性測定方法
US20050287684A1 (en) Apparatus and method for detecting soft breakdown of a dielectric layer of a semiconductor wafer
JP2861423B2 (ja) 半導体装置の検査方法
JPH0129062B2 (cs)
JPS63124437A (ja) 半導体素子用絶縁体薄膜の評価装置
EP3627103B1 (fr) Dispositif de mesure comportant un fil semiconducteur suspendu
CN100501959C (zh) 应用面探衍射仪检测异质外延膜晶格取向的方法
CN114093786B (zh) 一种fdsoi器件的接触孔连接位置检测方法
Aota et al. A new method for precise evaluation of dynamic recovery of negative bias temperature instability
JP4179003B2 (ja) 半導体基板の評価方法
JPH0288976A (ja) 導体膜の膜質試験方法
JPS62503052A (ja) 硬度測定
Barlow et al. Note on the design of electrical contacts for the Callendar and Griffiths' bridge and other resistance boxes
RU2117956C1 (ru) СПОСОБ ОПРЕДЕЛЕНИЯ ПОВЕРХНОСТНОГО ИЗГИБА ЗОН ПОЛУПРОВОДНИКА ψs В МДП-СТРУКТУРЕ