AU749808B2 - Photocurable and photopatternable hydrogel matrix based on azlactone copolymers - Google Patents
Photocurable and photopatternable hydrogel matrix based on azlactone copolymers Download PDFInfo
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- AU749808B2 AU749808B2 AU29021/99A AU2902199A AU749808B2 AU 749808 B2 AU749808 B2 AU 749808B2 AU 29021/99 A AU29021/99 A AU 29021/99A AU 2902199 A AU2902199 A AU 2902199A AU 749808 B2 AU749808 B2 AU 749808B2
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- azlactone
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Classifications
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- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/008—Azides
- G03F7/012—Macromolecular azides; Macromolecular additives, e.g. binders
- G03F7/0125—Macromolecular azides; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the macromolecular azides
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/12—Esters of monohydric alcohols or phenols
- C08F220/14—Methyl esters, e.g. methyl (meth)acrylate
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/249921—Web or sheet containing structurally defined element or component
- Y10T428/249953—Composite having voids in a component [e.g., porous, cellular, etc.]
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Structural Engineering (AREA)
- Architecture (AREA)
- Ceramic Engineering (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Apparatus Associated With Microorganisms And Enzymes (AREA)
- Immobilizing And Processing Of Enzymes And Microorganisms (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/183,197 US6156478A (en) | 1998-10-30 | 1998-10-30 | Photocurable and photopatternable hydrogel matrix based on azlactone copolymers |
| US09/183197 | 1998-10-30 | ||
| PCT/US1999/005143 WO2000026725A1 (en) | 1998-10-30 | 1999-03-08 | Photocurable and photopatternable hydrogel matrix based on azlactone copolymers |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| AU2902199A AU2902199A (en) | 2000-05-22 |
| AU749808B2 true AU749808B2 (en) | 2002-07-04 |
Family
ID=22671857
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AU29021/99A Ceased AU749808B2 (en) | 1998-10-30 | 1999-03-08 | Photocurable and photopatternable hydrogel matrix based on azlactone copolymers |
Country Status (8)
| Country | Link |
|---|---|
| US (2) | US6156478A (https=) |
| EP (1) | EP1127293B1 (https=) |
| JP (1) | JP4350906B2 (https=) |
| KR (1) | KR100554478B1 (https=) |
| CN (1) | CN1325505A (https=) |
| AU (1) | AU749808B2 (https=) |
| DE (1) | DE69912300T2 (https=) |
| WO (1) | WO2000026725A1 (https=) |
Families Citing this family (28)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7534543B2 (en) * | 1996-04-15 | 2009-05-19 | 3M Innovative Properties Company | Texture control of thin film layers prepared via laser induced thermal imaging |
| US6376619B1 (en) * | 1998-04-13 | 2002-04-23 | 3M Innovative Properties Company | High density, miniaturized arrays and methods of manufacturing same |
| US7638464B2 (en) | 1999-04-26 | 2009-12-29 | Biocept, Inc. | Three dimensional format biochips |
| US6482638B1 (en) * | 1999-12-09 | 2002-11-19 | 3M Innovative Properties Company | Heat-relaxable substrates and arrays |
| KR20020089315A (ko) * | 2000-10-26 | 2002-11-29 | 바이오셉트 인코포레이티드 | 3차원 포맷 바이오칩 |
| US6686431B2 (en) * | 2000-11-01 | 2004-02-03 | Avery Dennison Corporation | Optical coating having low refractive index |
| EP1245272A1 (en) * | 2001-03-30 | 2002-10-02 | Ucb S.A. | Substrates, preparation and use |
| US6794458B2 (en) * | 2001-05-18 | 2004-09-21 | 3M Innovative Properties Company | Azlactone-functional hydrophilic coatings and hydrogels |
| US20030040125A1 (en) * | 2001-08-21 | 2003-02-27 | 3M Innovative Properties Company | Methods for performing immunological assays |
| US7223350B2 (en) * | 2002-03-29 | 2007-05-29 | International Business Machines Corporation | Planarization in an encapsulation process for thin film surfaces |
| US20030052003A1 (en) * | 2002-10-15 | 2003-03-20 | Kelly Patrick | Cast analyte diffusion-limiting membranes using photopolymerizable hydrophylic monomers |
| US20070082019A1 (en) * | 2003-02-21 | 2007-04-12 | Ciphergen Biosystems Inc. | Photocrosslinked hydrogel surface coatings |
| US6762257B1 (en) * | 2003-05-05 | 2004-07-13 | 3M Innovative Properties Company | Azlactone chain transfer agents for radical polymerization |
| JP4373260B2 (ja) * | 2004-03-29 | 2009-11-25 | 一則 片岡 | 高分子複合体 |
| BRPI0608156A2 (pt) * | 2005-02-16 | 2017-05-23 | 3M Innovative Properties Co | método para um revestimento topograficamente padronizado |
| WO2006088804A1 (en) * | 2005-02-16 | 2006-08-24 | 3M Innovative Properties Company | Method of making morphologically patterned coatings |
| JP2006316010A (ja) * | 2005-05-13 | 2006-11-24 | Institute Of Physical & Chemical Research | 物質固定化剤、物質固定化方法および物質固定化基体 |
| US7396631B2 (en) * | 2005-10-07 | 2008-07-08 | 3M Innovative Properties Company | Radiation curable thermal transfer elements |
| US7678526B2 (en) * | 2005-10-07 | 2010-03-16 | 3M Innovative Properties Company | Radiation curable thermal transfer elements |
| US8513322B2 (en) * | 2007-05-31 | 2013-08-20 | 3M Innovative Properties Company | Polymeric beads and methods of making polymeric beads |
| JP5432175B2 (ja) * | 2007-12-12 | 2014-03-05 | スリーエム イノベイティブ プロパティズ カンパニー | 物品の製造方法及び物品 |
| JP5330404B2 (ja) * | 2007-12-12 | 2013-10-30 | スリーエム イノベイティブ プロパティズ カンパニー | 微小構造化された抗微生物フィルム |
| US8592493B2 (en) * | 2008-06-26 | 2013-11-26 | 3M Innovative Properties Company | Solid support with a grafted chain |
| US9296870B2 (en) * | 2009-07-27 | 2016-03-29 | The Trustees Of Columbia University In The City Of New York | Modification of surfaces with nanoparticles |
| EP3191016B1 (en) * | 2014-09-09 | 2021-10-27 | University of Washington | Functionalized zwitterionic and mixed charge polymers, related hydrogels, and methods for their use |
| TWI648271B (zh) | 2014-09-23 | 2019-01-21 | 日商住友電木股份有限公司 | 二氮環丙烯化合物及由其衍生之組成物 |
| EP3995828A1 (en) * | 2020-11-04 | 2022-05-11 | MicroCoat Biotechnologie GmbH | Novel functionalized hydrogel coatings of assay plates and uses thereof |
| CN114839835B (zh) * | 2022-03-18 | 2025-12-09 | 清华大学 | 量子点的无损光刻图案化方法和设备 |
Family Cites Families (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1745348A1 (de) * | 1967-12-01 | 1971-09-09 | Roehm Gmbh | Azlactongruppen enthaltende Mischpolymerisate |
| US4451619A (en) * | 1982-09-30 | 1984-05-29 | Minnesota Mining And Manufacturing Company | Method of hydrophilizing or hydrophobizing polymers |
| US5336742A (en) * | 1987-03-13 | 1994-08-09 | Minnesota Mining And Manufacturing Company | Polymeric supports |
| US4737560A (en) * | 1987-03-13 | 1988-04-12 | Minnesota Mining And Manufacturing Company | Polymer beads |
| US5292840A (en) * | 1987-03-13 | 1994-03-08 | Minnesota Mining And Manufacturing Company | Polymeric supports |
| US4871824A (en) * | 1987-03-13 | 1989-10-03 | Minnesota Mining And Manufacturing Company | Variably crosslinked polymeric supports |
| US5013795A (en) * | 1989-04-10 | 1991-05-07 | Minnesota Mining And Manufacturing Company | Azlactone graft copolymers |
| US5744101A (en) * | 1989-06-07 | 1998-04-28 | Affymax Technologies N.V. | Photolabile nucleoside protecting groups |
| US4981933A (en) * | 1989-06-23 | 1991-01-01 | Polaroid Corporation | Azlactone copolymers |
| JPH0450946A (ja) * | 1990-06-15 | 1992-02-19 | Fujitsu Ltd | 放射線レジストとパターン形成方法 |
| US5200471A (en) * | 1990-11-05 | 1993-04-06 | Minnesota Mining And Manufacturing Company | Biomolecules covalently immobilized with a high bound specific biological activity and method of preparing same |
| US5235015A (en) * | 1991-02-21 | 1993-08-10 | Minnesota Mining And Manufacturing Company | High speed aqueous solvent developable photopolymer compositions |
| RU1794088C (ru) * | 1991-03-18 | 1993-02-07 | Институт Молекулярной Биологии Ан@ Ссср | Способ определени нуклеотидной последовательности ДНК и устройство дл его осуществлени |
| US5352714A (en) * | 1991-11-05 | 1994-10-04 | Bausch & Lomb Incorporated | Wettable silicone hydrogel compositions and methods for their manufacture |
| US5632957A (en) * | 1993-11-01 | 1997-05-27 | Nanogen | Molecular biological diagnostic systems including electrodes |
| US5605662A (en) * | 1993-11-01 | 1997-02-25 | Nanogen, Inc. | Active programmable electronic devices for molecular biological analysis and diagnostics |
| US5344701A (en) * | 1992-06-09 | 1994-09-06 | Minnesota Mining And Manufacturing Company | Porous supports having azlactone-functional surfaces |
| JP3785599B2 (ja) * | 1995-02-03 | 2006-06-14 | ノバルティス アクチエンゲゼルシャフト | エステル又はアミド基を含む架橋ポリマー |
| WO1996024644A1 (en) * | 1995-02-10 | 1996-08-15 | Minnesota Mining And Manufacturing Company | Process for the production of an article coated with a crosslinked pressure sensitive adhesive |
| KR100206664B1 (ko) * | 1995-06-28 | 1999-07-01 | 세키사와 다다시 | 화학증폭형 레지스트 조성물 및 레지스트 패턴의 형성방법 |
| US5725989A (en) * | 1996-04-15 | 1998-03-10 | Chang; Jeffrey C. | Laser addressable thermal transfer imaging element with an interlayer |
-
1998
- 1998-10-30 US US09/183,197 patent/US6156478A/en not_active Expired - Lifetime
-
1999
- 1999-03-08 JP JP2000580047A patent/JP4350906B2/ja not_active Expired - Fee Related
- 1999-03-08 WO PCT/US1999/005143 patent/WO2000026725A1/en not_active Ceased
- 1999-03-08 CN CN99813055A patent/CN1325505A/zh active Pending
- 1999-03-08 EP EP99909939A patent/EP1127293B1/en not_active Expired - Lifetime
- 1999-03-08 KR KR1020017005395A patent/KR100554478B1/ko not_active Expired - Fee Related
- 1999-03-08 AU AU29021/99A patent/AU749808B2/en not_active Ceased
- 1999-03-08 DE DE1999612300 patent/DE69912300T2/de not_active Expired - Lifetime
-
2000
- 2000-11-10 US US09/710,186 patent/US6372407B1/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| DE69912300T2 (de) | 2004-07-29 |
| KR100554478B1 (ko) | 2006-03-03 |
| US6372407B1 (en) | 2002-04-16 |
| JP4350906B2 (ja) | 2009-10-28 |
| EP1127293A1 (en) | 2001-08-29 |
| KR20010089379A (ko) | 2001-10-06 |
| WO2000026725A1 (en) | 2000-05-11 |
| US6156478A (en) | 2000-12-05 |
| JP2002529543A (ja) | 2002-09-10 |
| CN1325505A (zh) | 2001-12-05 |
| EP1127293B1 (en) | 2003-10-22 |
| DE69912300D1 (de) | 2003-11-27 |
| AU2902199A (en) | 2000-05-22 |
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| FGA | Letters patent sealed or granted (standard patent) | ||
| MK14 | Patent ceased section 143(a) (annual fees not paid) or expired |