AU6341396A - Method for characterizing defects on semiconductor wafers - Google Patents
Method for characterizing defects on semiconductor wafersInfo
- Publication number
- AU6341396A AU6341396A AU63413/96A AU6341396A AU6341396A AU 6341396 A AU6341396 A AU 6341396A AU 63413/96 A AU63413/96 A AU 63413/96A AU 6341396 A AU6341396 A AU 6341396A AU 6341396 A AU6341396 A AU 6341396A
- Authority
- AU
- Australia
- Prior art keywords
- semiconductor wafers
- characterizing defects
- characterizing
- defects
- wafers
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/956—Inspecting patterns on the surface of objects
- G01N21/95607—Inspecting patterns on the surface of objects using a comparative method
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/9501—Semiconductor wafers
Landscapes
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US49716295A | 1995-06-30 | 1995-06-30 | |
US497162 | 1995-06-30 | ||
PCT/US1996/010962 WO1997002465A1 (en) | 1995-06-30 | 1996-06-28 | Method for characterizing defects on semiconductor wafers |
Publications (1)
Publication Number | Publication Date |
---|---|
AU6341396A true AU6341396A (en) | 1997-02-05 |
Family
ID=23975719
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU63413/96A Abandoned AU6341396A (en) | 1995-06-30 | 1996-06-28 | Method for characterizing defects on semiconductor wafers |
Country Status (2)
Country | Link |
---|---|
AU (1) | AU6341396A (en) |
WO (1) | WO1997002465A1 (en) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6453264B1 (en) * | 1997-04-30 | 2002-09-17 | Southwest Research Institute | Surface flaw detection using spatial raman-based imaging |
US6987873B1 (en) * | 1998-07-08 | 2006-01-17 | Applied Materials, Inc. | Automatic defect classification with invariant core classes |
US6407373B1 (en) * | 1999-06-15 | 2002-06-18 | Applied Materials, Inc. | Apparatus and method for reviewing defects on an object |
EP1519318A4 (en) * | 2002-06-28 | 2008-11-19 | Fujitsu Ltd | Three-dimensional image comparing program, three-dimensionalimage comparing method, and three-dimensional image comparing device |
CN114599934A (en) * | 2019-10-31 | 2022-06-07 | 卡尔蔡司Smt有限责任公司 | FIB-SEM 3D tomography for measuring shape deviation of HAR structures |
CN110927170B (en) * | 2019-12-04 | 2022-03-08 | 中国工程物理研究院激光聚变研究中心 | Defect determination method, device and system |
CN113295616A (en) * | 2021-03-30 | 2021-08-24 | 浙江大学杭州国际科创中心 | Comprehensive test method for SiC wafer and epitaxial layer structure thereof |
CN113655066A (en) * | 2021-08-13 | 2021-11-16 | 南方海洋科学与工程广东省实验室(湛江) | Device, system and method for detecting damage of net cage |
CN115711900A (en) * | 2022-11-30 | 2023-02-24 | 安测半导体技术(江苏)有限公司 | Wafer test detection method based on neural network |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5030008A (en) * | 1988-10-11 | 1991-07-09 | Kla Instruments, Corporation | Method and apparatus for the automated analysis of three-dimensional objects |
JPH02231510A (en) * | 1989-03-02 | 1990-09-13 | Omron Tateisi Electron Co | Substrate inspection device |
US5289267A (en) * | 1991-10-04 | 1994-02-22 | Kms Fusion, Inc. | Electro-optical system for gauging surface profile deviations |
US5355212A (en) * | 1993-07-19 | 1994-10-11 | Tencor Instruments | Process for inspecting patterned wafers |
-
1996
- 1996-06-28 AU AU63413/96A patent/AU6341396A/en not_active Abandoned
- 1996-06-28 WO PCT/US1996/010962 patent/WO1997002465A1/en active Application Filing
Also Published As
Publication number | Publication date |
---|---|
WO1997002465A1 (en) | 1997-01-23 |
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