AU6243798A - Methods and apparatus for integrating optical and interferometric lithography toproduce complex patterns - Google Patents

Methods and apparatus for integrating optical and interferometric lithography toproduce complex patterns

Info

Publication number
AU6243798A
AU6243798A AU62437/98A AU6243798A AU6243798A AU 6243798 A AU6243798 A AU 6243798A AU 62437/98 A AU62437/98 A AU 62437/98A AU 6243798 A AU6243798 A AU 6243798A AU 6243798 A AU6243798 A AU 6243798A
Authority
AU
Australia
Prior art keywords
toproduce
methods
apparatus
complex patterns
integrating optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU62437/98A
Inventor
S. R. J. Brueck
Xiaolan Chen
Andrew Frauenglass
Saleem H. Zaidi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
University of New Mexico
Original Assignee
University of New Mexico
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to US78606697A priority Critical
Priority to US08786066 priority
Application filed by University of New Mexico filed Critical University of New Mexico
Priority to PCT/US1998/000992 priority patent/WO1998032054A1/en
Publication of AU6243798A publication Critical patent/AU6243798A/en
Application status is Abandoned legal-status Critical

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70058Mask illumination systems
    • G03F7/70125Use of illumination settings tailored to particular mask patterns
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20Exposure; Apparatus therefor
    • G03F7/2022Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70216Systems for imaging mask onto workpiece
    • G03F7/70241Optical aspects of refractive systems
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70375Imaging systems not otherwise provided for, e.g. multiphoton lithography; Imaging systems comprising means for converting one type of radiation into another type of radiation, systems comprising mask with photo-cathode
    • G03F7/70408Interferometric lithography; Holographic lithography; Self-imaging lithography
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70425Imaging strategies, e.g. for increasing throughput, printing product fields larger than the image field, compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching, double patterning
    • G03F7/7045Hybrid exposure, i.e. combining different types of exposure, e.g. projection, proximity, direct write, interferometric, uv, x-ray, particle beam
AU62437/98A 1997-01-21 1998-01-21 Methods and apparatus for integrating optical and interferometric lithography toproduce complex patterns Abandoned AU6243798A (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
US78606697A true 1997-01-21 1997-01-21
US08786066 1997-01-21
PCT/US1998/000992 WO1998032054A1 (en) 1997-01-21 1998-01-21 Methods and apparatus for integrating optical and interferometric lithography to produce complex patterns

Publications (1)

Publication Number Publication Date
AU6243798A true AU6243798A (en) 1998-08-07

Family

ID=25137493

Family Applications (1)

Application Number Title Priority Date Filing Date
AU62437/98A Abandoned AU6243798A (en) 1997-01-21 1998-01-21 Methods and apparatus for integrating optical and interferometric lithography toproduce complex patterns

Country Status (5)

Country Link
EP (1) EP0960356A1 (en)
JP (3) JP2001507870A (en)
AU (1) AU6243798A (en)
TW (1) TW440925B (en)
WO (1) WO1998032054A1 (en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6140660A (en) 1999-03-23 2000-10-31 Massachusetts Institute Of Technology Optical synthetic aperture array
EP1255162A1 (en) * 2001-05-04 2002-11-06 ASML Netherlands B.V. Lithographic apparatus
US20050073671A1 (en) * 2003-10-07 2005-04-07 Intel Corporation Composite optical lithography method for patterning lines of substantially equal width
US7142282B2 (en) 2003-10-17 2006-11-28 Intel Corporation Device including contacts
US7532403B2 (en) 2006-02-06 2009-05-12 Asml Holding N.V. Optical system for transforming numerical aperture
KR101229786B1 (en) 2011-08-23 2013-02-05 한국과학기술원 Heterodyne interference lithography apparatus, method for drawing pattern using the same device, wafer, and semiconductor device
JP2013145863A (en) 2011-11-29 2013-07-25 Gigaphoton Inc Two-beam interference apparatus and two-beam interference exposure system
TWI654478B (en) 2012-03-28 2019-03-21 日商Hoya股份有限公司

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3164815B2 (en) * 1990-09-19 2001-05-14 株式会社日立製作所 A method of manufacturing a semiconductor device
US5415835A (en) * 1992-09-16 1995-05-16 University Of New Mexico Method for fine-line interferometric lithography
JPH07326573A (en) * 1994-04-06 1995-12-12 Hitachi Ltd Pattern forming method and projection aligner
US5759744A (en) * 1995-02-24 1998-06-02 University Of New Mexico Methods and apparatus for lithography of sparse arrays of sub-micrometer features

Also Published As

Publication number Publication date
JP5048801B2 (en) 2012-10-17
WO1998032054A1 (en) 1998-07-23
JP2010177687A (en) 2010-08-12
TW440925B (en) 2001-06-16
JP2010199594A (en) 2010-09-09
JP2001507870A (en) 2001-06-12
EP0960356A1 (en) 1999-12-01

Similar Documents

Publication Publication Date Title
AU690828B2 (en) Patella clamp apparatus
GB2298073B (en) Apparatus for producing an optical effect
AU688605B2 (en) Patellar alignment device
GB2299867B (en) Exposure apparatus
AU4111597A (en) Method for increasing the significance of tridimensional measuring of objects
AU2213799A (en) Anti-aliasing apparatus and methods for optical imaging
AU6036796A (en) Optical filter for spectroscopic measurement and method of producing the optical filter
EP0743619A3 (en) Sign language editing apparatus
AU1486101A (en) Image metrology methods and apparatus
EP0761170A3 (en) Apparatus for removing tissue
IL152383A (en) 5-amino-3-cyano-4-ethylsulfinyl-1-phenyl-pyrazole derivatives
IL117177D0 (en) Benzopyran-containing compounds and method for their use
SG50747A1 (en) Comptothecin derivatives
AU5067898A (en) Aligner and method for exposure
AU8737391A (en) Laser engraving apparatus
AU7010691A (en) Method and instruments for acl reconstruction
AU5410394A (en) Improved laser pattern generation apparatus
AU4179296A (en) Device for mutually moving two bodies
EP0795775A3 (en) Display apparatus and method for forming hologram suitable for the display apparatus
AU7223996A (en) Operating apparatus with payment for usage
EP0747771A3 (en) Photopolymerizable composition
AU5844696A (en) N-benzyldioxothiazolidylbenzamide derivatives and processes for preparing the same
AU5375696A (en) Inspection of optical components
AUPN238795A0 (en) Improved process for knee reconstruction
AUPN520195A0 (en) Filtering apparatus