AU6015200A - Exposure method and device therefor - Google Patents

Exposure method and device therefor

Info

Publication number
AU6015200A
AU6015200A AU60152/00A AU6015200A AU6015200A AU 6015200 A AU6015200 A AU 6015200A AU 60152/00 A AU60152/00 A AU 60152/00A AU 6015200 A AU6015200 A AU 6015200A AU 6015200 A AU6015200 A AU 6015200A
Authority
AU
Australia
Prior art keywords
exposure method
device therefor
therefor
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU60152/00A
Inventor
Motokatsu Imai
Yukio Kakizaki
Nobutaka Magome
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of AU6015200A publication Critical patent/AU6015200A/en
Abandoned legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3175—Lithography
    • H01J2237/31776—Shaped beam

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Theoretical Computer Science (AREA)
  • Mathematical Physics (AREA)
  • Analytical Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Electron Beam Exposure (AREA)
AU60152/00A 1999-07-19 2000-07-13 Exposure method and device therefor Abandoned AU6015200A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP11/204195 1999-07-19
JP20419599 1999-07-19
PCT/JP2000/004707 WO2001006549A1 (en) 1999-07-19 2000-07-13 Exposure method and device therefor

Publications (1)

Publication Number Publication Date
AU6015200A true AU6015200A (en) 2001-02-05

Family

ID=16486417

Family Applications (1)

Application Number Title Priority Date Filing Date
AU60152/00A Abandoned AU6015200A (en) 1999-07-19 2000-07-13 Exposure method and device therefor

Country Status (3)

Country Link
AU (1) AU6015200A (en)
TW (1) TW460933B (en)
WO (1) WO2001006549A1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4112472B2 (en) 2003-10-21 2008-07-02 株式会社東芝 Semiconductor device manufacturing method and semiconductor device manufacturing apparatus
JP5175713B2 (en) * 2007-03-02 2013-04-03 株式会社アドバンテスト Multi-column electron beam exposure mask, electron beam exposure apparatus and exposure method using multi-column electron beam exposure mask

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06151289A (en) * 1992-10-30 1994-05-31 Nec Corp Magnetic field type electron lens alignment mechanism
JPH10255706A (en) * 1997-03-14 1998-09-25 Nikon Corp Adjusting method of axis moving type electro magnetic lens
JPH1126371A (en) * 1997-07-08 1999-01-29 Nikon Corp Electron beam transfer apparatus
JP3993334B2 (en) * 1998-04-27 2007-10-17 株式会社東芝 Charged beam lithography system

Also Published As

Publication number Publication date
TW460933B (en) 2001-10-21
WO2001006549A1 (en) 2001-01-25

Similar Documents

Publication Publication Date Title
AU1179200A (en) Exposure method and device
AU2076099A (en) Exposure method and device
AU6875100A (en) Laser device and exposure method
AU4653999A (en) Exposure method and system
AU1078700A (en) Exposure method and exposure apparatus
AU1160801A (en) Apparatus and method
AUPP962599A0 (en) Application apparatus and method
AU7484500A (en) Cargo-transfer apparatus and method
AU1555001A (en) Exposure method and apparatus
AU4143000A (en) Exposure method and apparatus
AU4949900A (en) Exposure method and apparatus
AU1554901A (en) Exposure method and exposure apparatus
AU2327800A (en) Exposure method and apparatus
AUPP855599A0 (en) Apparatus and method
AU3672600A (en) Stage device and exposure device
AU4395099A (en) Exposure method and device
AU5876000A (en) Dosimeter apparatus and method
AU4629000A (en) Curing device and method
AU4061099A (en) Exposure method and exposure apparatus
AU3729999A (en) Exposure method and apparatus
AU2940600A (en) Exposure method and apparatus
AU2944500A (en) Exposure method and apparatus
AU6021800A (en) Exposing method and apparatus
AU2001280175A1 (en) Exposure method and device
AU4318100A (en) Method and apparatus for exposure

Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase