AT549294T - Device and method for transfering patterns with intermediate stamp - Google Patents

Device and method for transfering patterns with intermediate stamp


Publication number
AT549294T AT05111920T AT05111920T AT549294T AT 549294 T AT549294 T AT 549294T AT 05111920 T AT05111920 T AT 05111920T AT 05111920 T AT05111920 T AT 05111920T AT 549294 T AT549294 T AT 549294T
Prior art keywords
intermediate stamp
Prior art date
Application number
Other languages
German (de)
Babak Heidari
Original Assignee
Obducat Ab
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Obducat Ab filed Critical Obducat Ab
Priority to EP05111920A priority Critical patent/EP1795497B1/en
Publication of AT549294T publication Critical patent/AT549294T/en



    • B44B5/00Machines or apparatus for embossing decorations or marks, e.g. embossing coins
    • B44B5/009Machines or apparatus for embossing decorations or marks, e.g. embossing coins by multi-step processes
AT05111920T 2005-12-09 2005-12-09 Device and method for transfering patterns with intermediate stamp AT549294T (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
EP05111920A EP1795497B1 (en) 2005-12-09 2005-12-09 Apparatus and method for transferring a pattern with intermediate stamp

Publications (1)

Publication Number Publication Date
AT549294T true AT549294T (en) 2012-03-15



Family Applications (1)

Application Number Title Priority Date Filing Date
AT05111920T AT549294T (en) 2005-12-09 2005-12-09 Device and method for transfering patterns with intermediate stamp

Country Status (9)

Country Link
US (1) US7670127B2 (en)
EP (1) EP1795497B1 (en)
JP (1) JP4942994B2 (en)
CN (1) CN1979336B (en)
AT (1) AT549294T (en)
HK (1) HK1107804A1 (en)
MY (1) MY149332A (en)
SG (1) SG133485A1 (en)
TW (1) TWI392592B (en)

Families Citing this family (59)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7686606B2 (en) * 2004-01-20 2010-03-30 Wd Media, Inc. Imprint embossing alignment system
FR2894515B1 (en) * 2005-12-08 2008-02-15 Essilor Int Method of transferring a micronic pattern to an optical article and optical article thus obtained
KR101324549B1 (en) * 2005-12-08 2013-11-01 몰레큘러 임프린츠 인코퍼레이티드 Method and system for double-sided patterning of substrates
US7500431B2 (en) * 2006-01-12 2009-03-10 Tsai-Wei Wu System, method, and apparatus for membrane, pad, and stamper architecture for uniform base layer and nanoimprinting pressure
US7998651B2 (en) * 2006-05-15 2011-08-16 Asml Netherlands B.V. Imprint lithography
US8262381B2 (en) * 2006-06-22 2012-09-11 Sabic Innovative Plastics Ip B.V. Mastering tools and systems and methods for forming a cell on the mastering tools
US7807938B2 (en) * 2006-06-22 2010-10-05 Sabic Innovative Plastics Ip B.V. Mastering tools and systems and methods for forming a plurality of cells on the mastering tools
KR101319325B1 (en) * 2006-12-29 2013-10-16 엘지디스플레이 주식회사 Method for Forming Pattern
JP5408848B2 (en) * 2007-07-11 2014-02-05 株式会社ジャパンディスプレイ Manufacturing method of semiconductor device
US20090056575A1 (en) * 2007-08-31 2009-03-05 Bartman Jon A Pattern transfer apparatus
TWI481496B (en) * 2007-12-19 2015-04-21 Heptagon Micro Optics Pte Ltd Manufacturing optical elements
JP2009176352A (en) * 2008-01-23 2009-08-06 Showa Denko Kk Method of manufacturing magnetic recording medium, and magnetic recording and reproducing device
US20110014499A1 (en) * 2008-03-07 2011-01-20 Showa Denko K.K. Uv nanoimprint method, resin replica mold and method for producing the same, magnetic recording medium and method for producing the same, and magnetic recording/reproducing apparatus
JP5004027B2 (en) * 2008-04-22 2012-08-22 富士電機株式会社 Imprint method and apparatus
WO2009148138A1 (en) 2008-06-05 2009-12-10 旭硝子株式会社 Mold for nanoimprinting, process for producing the same, and processes for producing molded resin having fine rugged structure on surface and for producing wire-grid polarizer
EP2138896B1 (en) * 2008-06-25 2014-08-13 Obducat AB Nano imprinting method and apparatus
US7927976B2 (en) * 2008-07-23 2011-04-19 Semprius, Inc. Reinforced composite stamp for dry transfer printing of semiconductor elements
JP2010080680A (en) * 2008-09-26 2010-04-08 Bridgestone Corp Rugged pattern forming method and rugged pattern manufacturing device
SG162633A1 (en) * 2008-12-22 2010-07-29 Helios Applied Systems Pte Ltd Integrated system for manufacture of sub-micron 3d structures using 2-d photon lithography and nanoimprinting and process thereof
JP5052534B2 (en) 2009-01-08 2012-10-17 株式会社ブリヂストン Photocurable transfer sheet and method for forming uneven pattern using the same
JP2010207902A (en) * 2009-03-12 2010-09-24 Kitagawa Elaborate Mach Co Ltd Vacuum press apparatus and vacuum press method
WO2010105091A2 (en) 2009-03-12 2010-09-16 Applied Materials, Inc. Large area dissolvable template lithography
JP5173944B2 (en) * 2009-06-16 2013-04-03 キヤノン株式会社 Imprint apparatus and article manufacturing method
JP5060517B2 (en) * 2009-06-24 2012-10-31 東京エレクトロン株式会社 Imprint system
JP2011009362A (en) * 2009-06-24 2011-01-13 Tokyo Electron Ltd Imprint system, imprinting method, program, and computer storage medium
JP2011066100A (en) * 2009-09-16 2011-03-31 Bridgestone Corp Photocurable transfer sheet and method for forming recessed and projected pattern using same
US9330685B1 (en) 2009-11-06 2016-05-03 WD Media, LLC Press system for nano-imprinting of recording media with a two step pressing method
US8402638B1 (en) 2009-11-06 2013-03-26 Wd Media, Inc. Press system with embossing foil free to expand for nano-imprinting of recording media
US8496466B1 (en) 2009-11-06 2013-07-30 WD Media, LLC Press system with interleaved embossing foil holders for nano-imprinting of recording media
JP5593092B2 (en) * 2010-02-26 2014-09-17 東芝機械株式会社 Transfer system and transfer method
JP5603621B2 (en) * 2010-03-08 2014-10-08 東芝機械株式会社 Sheet mold position detection device, transfer device, and transfer method
JP2013110135A (en) * 2010-03-12 2013-06-06 Bridgestone Corp Uneven pattern formation method using photocurable transfer sheet and apparatus for use in the method
JP5520642B2 (en) 2010-03-15 2014-06-11 東芝機械株式会社 Transfer device
JP5597420B2 (en) 2010-03-16 2014-10-01 東芝機械株式会社 Sheet mold transfer positioning device
JP2011216808A (en) * 2010-04-02 2011-10-27 Toshiba Mach Co Ltd Transfer device, transfer system, and transfer method
EP2563453B1 (en) 2010-04-28 2017-02-08 Kimberly-Clark Worldwide, Inc. Nanopatterned medical device with enhanced cellular interaction and method for its forming
WO2011141996A1 (en) * 2010-05-11 2011-11-17 パイオニア株式会社 Transfer device and method, and computer program
JP2011240643A (en) * 2010-05-20 2011-12-01 Bridgestone Corp Method for forming uneven pattern using resin film, and device for use in the method
JP5395757B2 (en) * 2010-07-08 2014-01-22 株式会社東芝 Pattern formation method
CN102442143B (en) * 2010-10-11 2015-03-18 晟铭电子科技股份有限公司 Isostactic pressing method and isostactic pressing system
JP5871627B2 (en) * 2011-03-04 2016-03-01 キヤノン株式会社 Imprint system and imprint method
JP2012190986A (en) * 2011-03-10 2012-10-04 Fujifilm Corp Mold for nanoimprint
TW201330053A (en) * 2011-11-14 2013-07-16 Orthogonal Inc Process for imprint patterning materials in thin-film devices
JP2013131629A (en) * 2011-12-21 2013-07-04 Towa Corp Resin sealing method and apparatus of led chip
WO2013122109A1 (en) * 2012-02-14 2013-08-22 Scivax株式会社 Imprint device and imprint method
JP6000656B2 (en) * 2012-05-30 2016-10-05 株式会社日立ハイテクノロジーズ Resin stamper manufacturing apparatus and resin stamper manufacturing method
US10343312B2 (en) 2012-08-27 2019-07-09 Scivax Corporation Imprint device and imprint method
JP5940940B2 (en) * 2012-08-31 2016-06-29 東芝機械株式会社 Transfer apparatus and transfer method
CN102866582B (en) * 2012-09-29 2014-09-10 兰红波 Nanometer impression device and nanometer impression method for high-brightness light-emitting diode (LED) graphics
JP6092561B2 (en) * 2012-10-01 2017-03-08 東芝機械株式会社 Molded object assembly, molded object assembly manufacturing apparatus, and molded object assembly manufacturing method
CN102929100B (en) * 2012-11-22 2014-11-19 南昌欧菲光纳米科技有限公司 Device and method for implementing alignment reel-to-reel UV (ultraviolet) forming
KR102056902B1 (en) 2013-05-29 2019-12-18 삼성전자주식회사 Wire grid polarizer and liquid crystal display panel and liquid crystal display device having the same
KR102089661B1 (en) 2013-08-27 2020-03-17 삼성전자주식회사 Wire grid polarizer and liquid crystal display panel and liquid crystal display device having the same
US10682789B2 (en) 2014-08-29 2020-06-16 Bio-Rad Laboratories, Inc. Epoxy mold making and micromilling for microfluidics
ES2659208T3 (en) 2014-12-22 2018-03-14 Obducat Ab Release and assembly device
EP3162535B1 (en) 2015-10-30 2019-09-11 DingZing Advanced Materials Inc. Method for surface treatment of a thermoplastic polyurethane texture with laminated deep and shallow impressions
JP2018534623A (en) * 2015-11-20 2018-11-22 エーエスエムエル ネザーランズ ビー.ブイ. Imprint device
JP2017118054A (en) * 2015-12-25 2017-06-29 キヤノン株式会社 Imprint device, imprint method, and method of manufacturing article
CN105911815B (en) * 2016-05-24 2019-07-05 京东方科技集团股份有限公司 The manufacturing system and method for nano-imprint stamp

Family Cites Families (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2603888C3 (en) * 1975-02-24 1978-08-10 Mca Disco-Vision, Inc., Universal City, Calif. (V.St.A.)
US4211617A (en) 1975-02-24 1980-07-08 Mca Disco-Vision, Inc. Process for producing a stamper for videodisc purposes
JPS6262450A (en) * 1985-09-13 1987-03-19 Fujitsu Ltd Manufacture of stamper
JP2970147B2 (en) * 1991-12-09 1999-11-02 凸版印刷株式会社 Master mold for Fresnel lens electroforming and method for manufacturing mold using the same
JPH0963130A (en) * 1995-08-25 1997-03-07 Dainippon Printing Co Ltd Stamper for manufacturing optical recording carrier and its production
JP3490279B2 (en) * 1998-01-16 2004-01-26 東京エレクトロン株式会社 Substrate processing equipment
US6679864B2 (en) * 1998-04-17 2004-01-20 Becton Dickinson And Company Safety shield system for prefilled syringes
US6334960B1 (en) 1999-03-11 2002-01-01 Board Of Regents, The University Of Texas System Step and flash imprint lithography
DE19920941A1 (en) * 1999-05-07 2000-11-16 Krauss Maffei Kunststofftech Method for producing plastic parts with an embossed structure and device for carrying out the method
SE515607C2 (en) * 1999-12-10 2001-09-10 Obducat Ab Apparatus and method for the production of structures
JP4192414B2 (en) * 2000-09-14 2008-12-10 凸版印刷株式会社 Lens sheet manufacturing method
WO2002067055A2 (en) * 2000-10-12 2002-08-29 Board Of Regents, The University Of Texas System Template for room temperature, low pressure micro- and nano-imprint lithography
US6705853B1 (en) * 2000-10-20 2004-03-16 Durakon Industries, Inc. Six station rotary thermoforming machine
US20030071016A1 (en) * 2001-10-11 2003-04-17 Wu-Sheng Shih Patterned structure reproduction using nonsticking mold
JP4667684B2 (en) * 2001-10-23 2011-04-13 リンテック株式会社 Manufacturing method of optical disc
EP1353229A1 (en) * 2002-04-09 2003-10-15 ASML Netherlands B.V. Lithographic apparatus, device manufacturing method and device manufactured thereby
EP1513689A1 (en) * 2002-06-20 2005-03-16 Obducat AB Method and device for transferring a pattern
JP2004186469A (en) * 2002-12-04 2004-07-02 Nippon Telegr & Teleph Corp <Ntt> Strip-shaped continuous substrate, semiconductor device using the same, and method for manufacturing the same
DE10311855B4 (en) * 2003-03-17 2005-04-28 Infineon Technologies Ag Arrangement for transferring information / structures to wafers using a stamp
US20050191419A1 (en) 2003-04-11 2005-09-01 Helt James M. Fabrication of nanostructures
TW568349U (en) * 2003-05-02 2003-12-21 Ind Tech Res Inst Parallelism adjusting device for nano-transferring
GB0325748D0 (en) * 2003-11-05 2003-12-10 Koninkl Philips Electronics Nv A method of forming a patterned layer on a substrate
EP1538482B1 (en) * 2003-12-05 2016-02-17 Obducat AB Device and method for large area lithography
JP2005243690A (en) * 2004-02-24 2005-09-08 Dainippon Screen Mfg Co Ltd Substrate processing apparatus
JP2006156735A (en) * 2004-11-30 2006-06-15 Nippon Telegr & Teleph Corp <Ntt> Pattern formation method and mold
KR101366505B1 (en) * 2005-06-10 2014-02-24 오브듀캇 아베 Imprint stamp comprising cyclic olefin copolymer
EP1731962B1 (en) * 2005-06-10 2008-12-31 Obducat AB Pattern replication with intermediate stamp
JP2007042213A (en) * 2005-08-03 2007-02-15 Canon Inc Method for manufacturing optical recording medium, and optical recording medium manufactured by using the same
JP2007073696A (en) * 2005-09-06 2007-03-22 Hyogo Prefecture Pattern forming method, pattern forming apparatus and pattern-formed film
US7878791B2 (en) * 2005-11-04 2011-02-01 Asml Netherlands B.V. Imprint lithography

Also Published As

Publication number Publication date
EP1795497A1 (en) 2007-06-13
US20070134362A1 (en) 2007-06-14
CN1979336A (en) 2007-06-13
EP1795497B1 (en) 2012-03-14
CN1979336B (en) 2012-08-29
MY149332A (en) 2013-08-30
JP2007165812A (en) 2007-06-28
TWI392592B (en) 2013-04-11
JP4942994B2 (en) 2012-05-30
TW200722288A (en) 2007-06-16
SG133485A1 (en) 2007-07-30
HK1107804A1 (en) 2012-10-26
US7670127B2 (en) 2010-03-02

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