AT548679T - Lithographic immersion device, drying device, immersion metrology apparatus and process for manufacturing a device - Google Patents

Lithographic immersion device, drying device, immersion metrology apparatus and process for manufacturing a device

Info

Publication number
AT548679T
AT548679T AT09159532T AT09159532T AT548679T AT 548679 T AT548679 T AT 548679T AT 09159532 T AT09159532 T AT 09159532T AT 09159532 T AT09159532 T AT 09159532T AT 548679 T AT548679 T AT 548679T
Authority
AT
Austria
Prior art keywords
device
immersion
manufacturing
process
lithographic
Prior art date
Application number
AT09159532T
Other languages
German (de)
Inventor
Michel Riepen
Nicolaas Kemper
Johannes Vermeulen
Daniel Direcks
Danny Philips
Putten Arnold Van
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to US7162008P priority Critical
Priority to US7187608P priority
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of AT548679T publication Critical patent/AT548679T/en

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03BAPPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00Photographic printing apparatus
    • G03B27/32Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/52Details
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70216Systems for imaging mask onto workpiece
    • G03F7/70341Immersion
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/708Construction of apparatus, e.g. environment, hygiene aspects or materials
    • G03F7/70908Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution, removing pollutants from apparatus; electromagnetic and electrostatic-charge pollution
    • G03F7/70916Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
AT09159532T 2008-05-08 2009-05-06 Lithographic immersion device, drying device, immersion metrology apparatus and process for manufacturing a device AT548679T (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
US7162008P true 2008-05-08 2008-05-08
US7187608P true 2008-05-22 2008-05-22

Publications (1)

Publication Number Publication Date
AT548679T true AT548679T (en) 2012-03-15

Family

ID=41266591

Family Applications (1)

Application Number Title Priority Date Filing Date
AT09159532T AT548679T (en) 2008-05-08 2009-05-06 Lithographic immersion device, drying device, immersion metrology apparatus and process for manufacturing a device

Country Status (8)

Country Link
US (1) US8345218B2 (en)
EP (1) EP2249205B1 (en)
JP (1) JP5063641B2 (en)
KR (2) KR101043017B1 (en)
CN (1) CN101576718B (en)
AT (1) AT548679T (en)
SG (1) SG157300A1 (en)
TW (1) TWI408512B (en)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SG172638A1 (en) * 2008-05-08 2011-07-28 Asml Netherlands B V Nl Fluid handling structure, lithographic apparatus and device manufacturing method
NL2005951A (en) * 2010-02-02 2011-08-03 Asml Netherlands Bv Lithographic apparatus and a device manufacturing method.
NL2005974A (en) * 2010-02-12 2011-08-15 Asml Netherlands Bv Lithographic apparatus and a device manufacturing method.
NL2006076A (en) * 2010-03-04 2011-09-06 Asml Netherlands Bv A lithographic apparatus and a method of manufacturing a device using a lithographic apparatus.
NL2007182A (en) * 2010-08-23 2012-02-27 Asml Netherlands Bv Fluid handling structure, module for an immersion lithographic apparatus, lithographic apparatus and device manufacturing method.
US20120162619A1 (en) * 2010-12-27 2012-06-28 Nikon Corporation Liquid immersion member, immersion exposure apparatus, exposing method, device fabricating method, program, and storage medium
NL2008980A (en) * 2011-07-11 2013-01-14 Asml Netherlands Bv A fluid handling structure, a lithographic apparatus and a device manufacturing method.
NL2008979A (en) * 2011-07-11 2013-01-14 Asml Netherlands Bv A fluid handling structure, a lithographic apparatus and a device manufacturing method.
NL2009139A (en) 2011-08-05 2013-02-06 Asml Netherlands Bv A fluid handling structure, a lithographic apparatus and a device manufacturing method.
NL2009472A (en) * 2011-10-24 2013-04-25 Asml Netherlands Bv A fluid handling structure, a lithographic apparatus and a device manufacturing method.
CN104238277B (en) * 2013-06-19 2016-12-28 上海微电子装备有限公司 Flow Field an immersion lithography method for maintaining
WO2015028202A1 (en) 2013-08-30 2015-03-05 Asml Netherlands B.V. Immersion lithographic apparatus
KR101941596B1 (en) * 2014-06-16 2019-01-23 에이에스엠엘 네델란즈 비.브이. Lithographic apparatus, method of transferring a substrate and device manufacturing method

Family Cites Families (35)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4509852A (en) 1980-10-06 1985-04-09 Werner Tabarelli Apparatus for the photolithographic manufacture of integrated circuit elements
AU2747999A (en) 1998-03-26 1999-10-18 Nikon Corporation Projection exposure method and system
KR100585476B1 (en) 2002-11-12 2006-06-07 에이에스엠엘 네델란즈 비.브이. Lithographic Apparatus and Device Manufacturing Method
EP1420300B1 (en) 2002-11-12 2015-07-29 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
EP1420298B1 (en) 2002-11-12 2013-02-20 ASML Netherlands B.V. Lithographic apparatus
SG121822A1 (en) 2002-11-12 2006-05-26 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
KR101036114B1 (en) * 2002-12-10 2011-05-23 가부시키가이샤 니콘 Exposure apparatus, exposure method and method for manufacturing device
JP4604452B2 (en) * 2003-02-26 2011-01-05 株式会社ニコン Exposure apparatus, exposure method, and device manufacturing method
JP4582089B2 (en) * 2003-04-11 2010-11-17 株式会社ニコン Liquid injection and recovery system for immersion lithography
TWI474380B (en) * 2003-05-23 2015-02-21 尼康股份有限公司
JP3862678B2 (en) * 2003-06-27 2006-12-27 キヤノン株式会社 Exposure apparatus and device manufacturing method
KR101094114B1 (en) * 2003-08-26 2011-12-15 가부시키가이샤 니콘 Optical element and exposure device
TW200513809A (en) * 2003-09-29 2005-04-16 Nippon Kogaku Kk Liquid-soaked lens system and projecting exposure apparatus as well as component manufacturing method
US6977461B2 (en) * 2003-12-15 2005-12-20 Asml Netherlands B.V. System and method for moving an object employing piezo actuators
US7394521B2 (en) 2003-12-23 2008-07-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP4954444B2 (en) 2003-12-26 2012-06-13 株式会社ニコン The flow path forming member, an exposure apparatus and device manufacturing method
JP4797984B2 (en) 2004-02-19 2011-10-19 株式会社ニコン Exposure apparatus and device manufacturing method
JP4510494B2 (en) * 2004-03-29 2010-07-21 キヤノン株式会社 Exposure apparatus
SG188877A1 (en) * 2004-06-10 2013-04-30 Nikon Corp Exposure equipment, exposure method and device manufacturing method
US7701550B2 (en) 2004-08-19 2010-04-20 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7423720B2 (en) 2004-11-12 2008-09-09 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7397533B2 (en) 2004-12-07 2008-07-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US20060147821A1 (en) * 2004-12-30 2006-07-06 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8018573B2 (en) * 2005-02-22 2011-09-13 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP5040646B2 (en) 2005-03-23 2012-10-03 株式会社ニコン Exposure apparatus and an exposure method, and device manufacturing method
WO2006137440A1 (en) 2005-06-22 2006-12-28 Nikon Corporation Measuring apparatus, exposure apparatus, and device manufacturing method
US7924416B2 (en) * 2005-06-22 2011-04-12 Nikon Corporation Measurement apparatus, exposure apparatus, and device manufacturing method
US7834974B2 (en) * 2005-06-28 2010-11-16 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7411658B2 (en) * 2005-10-06 2008-08-12 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7839483B2 (en) 2005-12-28 2010-11-23 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method and a control system
US8144305B2 (en) * 2006-05-18 2012-03-27 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7675201B2 (en) * 2006-07-25 2010-03-09 Asml Netherlands B.V. Lithographic apparatus with planar motor driven support
US8634053B2 (en) * 2006-12-07 2014-01-21 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8421993B2 (en) * 2008-05-08 2013-04-16 Asml Netherlands B.V. Fluid handling structure, lithographic apparatus and device manufacturing method
US20110134400A1 (en) * 2009-12-04 2011-06-09 Nikon Corporation Exposure apparatus, liquid immersion member, and device manufacturing method

Also Published As

Publication number Publication date
US20090279063A1 (en) 2009-11-12
KR101043017B1 (en) 2011-06-21
EP2249205B1 (en) 2012-03-07
KR20090117664A (en) 2009-11-12
KR20110055499A (en) 2011-05-25
JP2009272636A (en) 2009-11-19
JP5063641B2 (en) 2012-10-31
SG157300A1 (en) 2009-12-29
KR101527502B1 (en) 2015-06-09
EP2249205A1 (en) 2010-11-10
TW200951642A (en) 2009-12-16
TWI408512B (en) 2013-09-11
US8345218B2 (en) 2013-01-01
CN101576718A (en) 2009-11-11
CN101576718B (en) 2013-11-06

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