AT529237T - Kapillarbedrucktechnik - Google Patents

Kapillarbedrucktechnik

Info

Publication number
AT529237T
AT529237T AT04781082T AT04781082T AT529237T AT 529237 T AT529237 T AT 529237T AT 04781082 T AT04781082 T AT 04781082T AT 04781082 T AT04781082 T AT 04781082T AT 529237 T AT529237 T AT 529237T
Authority
AT
Austria
Prior art keywords
kapillarbedrucktechnik
Prior art date
Application number
AT04781082T
Other languages
German (de)
Inventor
Byung-Lin Choi
Sidglata Sreenivasan
Michael Watts
Original Assignee
Molecular Imprints Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to US10/645,306 priority Critical patent/US7442336B2/en
Application filed by Molecular Imprints Inc filed Critical Molecular Imprints Inc
Priority to PCT/US2004/026337 priority patent/WO2005021156A2/en
Publication of AT529237T publication Critical patent/AT529237T/en

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00Manufacture or treatment of nanostructures
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23FNON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00Etching metallic material by chemical means
    • C23F1/08Apparatus, e.g. for photomechanical printing surfaces
AT04781082T 2003-08-21 2004-08-13 Kapillarbedrucktechnik AT529237T (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
US10/645,306 US7442336B2 (en) 2003-08-21 2003-08-21 Capillary imprinting technique
PCT/US2004/026337 WO2005021156A2 (en) 2003-08-21 2004-08-13 Capillary imprinting technique

Publications (1)

Publication Number Publication Date
AT529237T true AT529237T (en) 2011-11-15

Family

ID=34273282

Family Applications (1)

Application Number Title Priority Date Filing Date
AT04781082T AT529237T (en) 2003-08-21 2004-08-13 Kapillarbedrucktechnik

Country Status (9)

Country Link
US (4) US7442336B2 (en)
EP (1) EP1656242B1 (en)
JP (1) JP4514754B2 (en)
KR (2) KR101108496B1 (en)
CN (1) CN100532055C (en)
AT (1) AT529237T (en)
MY (1) MY138554A (en)
TW (1) TWI319746B (en)
WO (1) WO2005021156A2 (en)

Families Citing this family (50)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU7790701A (en) * 2000-07-17 2002-01-30 Univ Texas Method and system of automatic fluid dispensing for imprint lithography processes
US7077992B2 (en) * 2002-07-11 2006-07-18 Molecular Imprints, Inc. Step and repeat imprint lithography processes
US7019819B2 (en) 2002-11-13 2006-03-28 Molecular Imprints, Inc. Chucking system for modulating shapes of substrates
US8215946B2 (en) 2006-05-18 2012-07-10 Molecular Imprints, Inc. Imprint lithography system and method
US7641840B2 (en) * 2002-11-13 2010-01-05 Molecular Imprints, Inc. Method for expelling gas positioned between a substrate and a mold
US7442336B2 (en) * 2003-08-21 2008-10-28 Molecular Imprints, Inc. Capillary imprinting technique
ES2383689T3 (en) 2003-09-23 2012-06-25 California Institute Of Technology Photocurable perfluoropolyethers for use as novel materials in microfluidic devices
US8211214B2 (en) * 2003-10-02 2012-07-03 Molecular Imprints, Inc. Single phase fluid imprint lithography method
EP1542074A1 (en) * 2003-12-11 2005-06-15 Heptagon OY Manufacturing a replication tool, sub-master or replica
KR20140100980A (en) * 2003-12-19 2014-08-18 더 유니버시티 오브 노쓰 캐롤라이나 엣 채플 힐 Methods for fabricating isolated micro- and nano- structures using soft or imprint lithography
US9040090B2 (en) * 2003-12-19 2015-05-26 The University Of North Carolina At Chapel Hill Isolated and fixed micro and nano structures and methods thereof
US8142703B2 (en) * 2005-10-05 2012-03-27 Molecular Imprints, Inc. Imprint lithography method
EP1737574A4 (en) * 2004-02-13 2009-09-16 Univ North Carolina Functional materials and novel methods for the fabrication of microfluidic devices
US20060005657A1 (en) * 2004-06-01 2006-01-12 Molecular Imprints, Inc. Method and system to control movement of a body for nano-scale manufacturing
US20060062922A1 (en) 2004-09-23 2006-03-23 Molecular Imprints, Inc. Polymerization technique to attenuate oxygen inhibition of solidification of liquids and composition therefor
JP2008529102A (en) * 2005-02-03 2008-07-31 ザ ユニバーシティ オブ ノース カロライナ アット チャペル ヒルThe University Of North Carolina At Chapel Hill Low surface energy polymeric material used for a liquid crystal display
US20080181958A1 (en) * 2006-06-19 2008-07-31 Rothrock Ginger D Nanoparticle fabrication methods, systems, and materials
WO2007133235A2 (en) * 2005-08-08 2007-11-22 Liquidia Technologies, Inc. Micro and nano-structure metrology
WO2007021762A2 (en) 2005-08-09 2007-02-22 The University Of North Carolina At Chapel Hill Methods and materials for fabricating microfluidic devices
JP4533358B2 (en) * 2005-10-18 2010-09-01 キヤノン株式会社 METHOD imprint, the imprint apparatus and chip fabrication process of
US7906058B2 (en) * 2005-12-01 2011-03-15 Molecular Imprints, Inc. Bifurcated contact printing technique
US7670530B2 (en) * 2006-01-20 2010-03-02 Molecular Imprints, Inc. Patterning substrates employing multiple chucks
EP1957249B1 (en) * 2005-12-08 2014-11-12 Canon Nanotechnologies, Inc. Method and system for double-sided patterning of substrates
US7943080B2 (en) * 2005-12-23 2011-05-17 Asml Netherlands B.V. Alignment for imprint lithography
US7459669B2 (en) * 2005-12-30 2008-12-02 Asml Netherlands B.V. Sensor and lithographic apparatus
JP4814682B2 (en) * 2006-04-18 2011-11-16 株式会社日立ハイテクノロジーズ Transfer method and transfer apparatus of microstructured pattern
US8012395B2 (en) * 2006-04-18 2011-09-06 Molecular Imprints, Inc. Template having alignment marks formed of contrast material
WO2008097278A2 (en) 2006-09-19 2008-08-14 Molecular Imprints, Inc. Etch-enhanced technique for lift-off patterning
TW200842934A (en) * 2006-12-29 2008-11-01 Molecular Imprints Inc Imprint fluid control
US20100151031A1 (en) * 2007-03-23 2010-06-17 Desimone Joseph M Discrete size and shape specific organic nanoparticles designed to elicit an immune response
US8142702B2 (en) * 2007-06-18 2012-03-27 Molecular Imprints, Inc. Solvent-assisted layer formation for imprint lithography
US8119052B2 (en) * 2007-11-02 2012-02-21 Molecular Imprints, Inc. Drop pattern generation for imprint lithography
US20090014917A1 (en) * 2007-07-10 2009-01-15 Molecular Imprints, Inc. Drop Pattern Generation for Imprint Lithography
US8945444B2 (en) * 2007-12-04 2015-02-03 Canon Nanotechnologies, Inc. High throughput imprint based on contact line motion tracking control
US20090148619A1 (en) * 2007-12-05 2009-06-11 Molecular Imprints, Inc. Controlling Thickness of Residual Layer
US8361371B2 (en) * 2008-02-08 2013-01-29 Molecular Imprints, Inc. Extrusion reduction in imprint lithography
US8187515B2 (en) * 2008-04-01 2012-05-29 Molecular Imprints, Inc. Large area roll-to-roll imprint lithography
US20100096764A1 (en) * 2008-10-20 2010-04-22 Molecular Imprints, Inc. Gas Environment for Imprint Lithography
US8586126B2 (en) 2008-10-21 2013-11-19 Molecular Imprints, Inc. Robust optimization to generate drop patterns in imprint lithography which are tolerant of variations in drop volume and drop placement
US8512797B2 (en) * 2008-10-21 2013-08-20 Molecular Imprints, Inc. Drop pattern generation with edge weighting
US8652393B2 (en) * 2008-10-24 2014-02-18 Molecular Imprints, Inc. Strain and kinetics control during separation phase of imprint process
US20100112220A1 (en) * 2008-11-03 2010-05-06 Molecular Imprints, Inc. Dispense system set-up and characterization
US8464838B2 (en) * 2009-01-26 2013-06-18 Kenneth C. Brooks System and method for generating mechanical movement
US20100187834A1 (en) * 2009-01-27 2010-07-29 Brooks Kenneth C System and method for generating electrical energy
NL2003875A (en) * 2009-02-04 2010-08-05 Asml Netherlands Bv Imprint lithography method and apparatus.
JP2012522327A (en) * 2009-03-23 2012-09-20 インテバック・インコーポレイテッドIntevac Incorporated Methods for optimization of the ratio of the groove and the island of the patterned medium
US20110030770A1 (en) 2009-08-04 2011-02-10 Molecular Imprints, Inc. Nanostructured organic solar cells
US20110084417A1 (en) * 2009-10-08 2011-04-14 Molecular Imprints, Inc. Large area linear array nanoimprinting
JP5520270B2 (en) * 2011-09-30 2014-06-11 富士フイルム株式会社 Mold and its manufacturing method for nanoimprint and manufacturing method of a nanoimprint method and patterned substrate using the mold
JP2015088667A (en) * 2013-10-31 2015-05-07 株式会社東芝 Microfabrication system, microfabrication device, and microfabrication method

Family Cites Families (140)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US588650A (en) * 1897-08-24 Island
DE2800476A1 (en) 1977-01-07 1978-07-13 Instruments Sa Mass prodn. method for grids, graticules etc. - using revolving drum, belt carrying resin and UV light source for polymerisation process
JPS6053675B2 (en) * 1978-09-20 1985-11-27 Fuji Photo Film Co Ltd
US4512848A (en) * 1984-02-06 1985-04-23 Exxon Research And Engineering Co. Procedure for fabrication of microstructures over large areas using physical replication
DE3614191C2 (en) 1985-06-27 1988-03-10 Man Technologie Gmbh, 8000 Muenchen, De
DE3622540A1 (en) * 1986-07-04 1988-01-07 Bayer Ag A process for producing low-stress molded parts
US5132069A (en) * 1987-07-10 1992-07-21 Newton John R Method of injection molding composite articles
FR2604553A1 (en) * 1986-09-29 1988-04-01 Rhone Poulenc Chimie Rigid polymer substrate for optical disc and optical discs obtained from the substrate
US4731155A (en) * 1987-04-15 1988-03-15 General Electric Company Process for forming a lithographic mask
US5028366A (en) * 1988-01-12 1991-07-02 Air Products And Chemicals, Inc. Water based mold release compositions for making molded polyurethane foam
JPH01196749A (en) 1988-01-30 1989-08-08 Hoya Corp Manufacture of substrate for optical information recording medium
JPH0224848A (en) 1988-07-14 1990-01-26 Canon Inc Production of substrate for optical recording medium
JPH0292603A (en) 1988-09-30 1990-04-03 Hoya Corp Manufacture of data recording board with guide groove
US5110514A (en) * 1989-05-01 1992-05-05 Soane Technologies, Inc. Controlled casting of a shrinkable material
DE4029912A1 (en) * 1990-09-21 1992-03-26 Philips Patentverwaltung A method of forming at least one trench in a substrate layer
US5206983A (en) * 1991-06-24 1993-05-04 Wisconsin Alumni Research Foundation Method of manufacturing micromechanical devices
JPH0553289A (en) * 1991-08-22 1993-03-05 Nec Corp Production of phase shift reticle
JPH0577260A (en) * 1991-09-20 1993-03-30 Fujitsu Ltd Resin layer duplicating device
JPH0580530A (en) * 1991-09-24 1993-04-02 Hitachi Ltd Production of thin film pattern
US5545367A (en) * 1992-04-15 1996-08-13 Soane Technologies, Inc. Rapid prototype three dimensional stereolithography
US5601641A (en) * 1992-07-21 1997-02-11 Tse Industries, Inc. Mold release composition with polybutadiene and method of coating a mold core
DE69405451T2 (en) * 1993-03-16 1998-03-12 Koninkl Philips Electronics Nv Method and apparatus for forming a patterned relief image of cross-linked photoresist on a flat substrate surface
JP2837063B2 (en) * 1993-06-04 1998-12-14 シャープ株式会社 The method of forming a resist pattern
US6776094B1 (en) * 1993-10-04 2004-08-17 President & Fellows Of Harvard College Kit For Microcontact Printing
US5776748A (en) * 1993-10-04 1998-07-07 President And Fellows Of Harvard College Method of formation of microstamped patterns on plates for adhesion of cells and other biological materials, devices and uses therefor
US5900160A (en) * 1993-10-04 1999-05-04 President And Fellows Of Harvard College Methods of etching articles via microcontact printing
US5512131A (en) * 1993-10-04 1996-04-30 President And Fellows Of Harvard College Formation of microstamped patterns on surfaces and derivative articles
US6180239B1 (en) * 1993-10-04 2001-01-30 President And Fellows Of Harvard College Microcontact printing on surfaces and derivative articles
NL9401260A (en) * 1993-11-12 1995-06-01 Cornelis Johannes Maria Van Ri Membrane for microfiltration, ultra-filtration, gas separation and catalysis, method of manufacturing such a membrane, mold for the manufacture of such a membrane, as well as a variety of separation systems comprising such a membrane.
US5534101A (en) * 1994-03-02 1996-07-09 Telecommunication Research Laboratories Method and apparatus for making optical components by direct dispensing of curable liquid
US5849209A (en) * 1995-03-31 1998-12-15 Johnson & Johnson Vision Products, Inc. Mold material made with additives
GB9509487D0 (en) * 1995-05-10 1995-07-05 Ici Plc Micro relief element & preparation thereof
US5820769A (en) * 1995-05-24 1998-10-13 Regents Of The University Of Minnesota Method for making magnetic storage having discrete elements with quantized magnetic moments
AU6774996A (en) * 1995-08-18 1997-03-12 President And Fellows Of Harvard College Self-assembled monolayer directed patterning of surfaces
US5849222A (en) * 1995-09-29 1998-12-15 Johnson & Johnson Vision Products, Inc. Method for reducing lens hole defects in production of contact lens blanks
US5772905A (en) * 1995-11-15 1998-06-30 Regents Of The University Of Minnesota Nanoimprint lithography
US20040137734A1 (en) * 1995-11-15 2004-07-15 Princeton University Compositions and processes for nanoimprinting
US6518189B1 (en) * 1995-11-15 2003-02-11 Regents Of The University Of Minnesota Method and apparatus for high density nanostructures
US6309580B1 (en) * 1995-11-15 2001-10-30 Regents Of The University Of Minnesota Release surfaces, particularly for use in nanoimprint lithography
US5669303A (en) * 1996-03-04 1997-09-23 Motorola Apparatus and method for stamping a surface
US6355198B1 (en) * 1996-03-15 2002-03-12 President And Fellows Of Harvard College Method of forming articles including waveguides via capillary micromolding and microtransfer molding
AT207798T (en) * 1996-03-15 2001-11-15 Harvard College A process for molding articles and for micro-structuring of surfaces by molding with capillary
US5888650A (en) 1996-06-03 1999-03-30 Minnesota Mining And Manufacturing Company Temperature-responsive adhesive article
US5942443A (en) * 1996-06-28 1999-08-24 Caliper Technologies Corporation High throughput screening assay systems in microscale fluidic devices
US6753131B1 (en) * 1996-07-22 2004-06-22 President And Fellows Of Harvard College Transparent elastomeric, contact-mode photolithography mask, sensor, and wavefront engineering element
US6074827A (en) * 1996-07-30 2000-06-13 Aclara Biosciences, Inc. Microfluidic method for nucleic acid purification and processing
US6039897A (en) * 1996-08-28 2000-03-21 University Of Washington Multiple patterned structures on a single substrate fabricated by elastomeric micro-molding techniques
US5948470A (en) * 1997-04-28 1999-09-07 Harrison; Christopher Method of nanoscale patterning and products made thereby
US5912049A (en) * 1997-08-12 1999-06-15 Micron Technology, Inc. Process liquid dispense method and apparatus
US5991022A (en) * 1997-12-09 1999-11-23 N&K Technology, Inc. Reflectance spectrophotometric apparatus with toroidal mirrors
US6117708A (en) * 1998-02-05 2000-09-12 Micron Technology, Inc. Use of residual organic compounds to facilitate gate break on a carrier substrate for a semiconductor device
JP3780700B2 (en) * 1998-05-26 2006-05-31 セイコーエプソン株式会社 Pattern forming method, a pattern forming apparatus, the pattern forming plate, a method of manufacturing pattern-forming plate, a method of manufacturing a color filter, a manufacturing method of preparation and the liquid crystal panel of the conductive film
US20040036201A1 (en) * 2000-07-18 2004-02-26 Princeton University Methods and apparatus of field-induced pressure imprint lithography
US20050037143A1 (en) * 2000-07-18 2005-02-17 Chou Stephen Y. Imprint lithography with improved monitoring and control and apparatus therefor
US7635262B2 (en) * 2000-07-18 2009-12-22 Princeton University Lithographic apparatus for fluid pressure imprint lithography
US20030080472A1 (en) * 2001-10-29 2003-05-01 Chou Stephen Y. Lithographic method with bonded release layer for molding small patterns
US7211214B2 (en) * 2000-07-18 2007-05-01 Princeton University Laser assisted direct imprint lithography
US7758794B2 (en) * 2001-10-29 2010-07-20 Princeton University Method of making an article comprising nanoscale patterns with reduced edge roughness
US6713238B1 (en) * 1998-10-09 2004-03-30 Stephen Y. Chou Microscale patterning and articles formed thereby
US6218316B1 (en) * 1998-10-22 2001-04-17 Micron Technology, Inc. Planarization of non-planar surfaces in device fabrication
US6168845B1 (en) * 1999-01-19 2001-01-02 International Business Machines Corporation Patterned magnetic media and method of making the same using selective oxidation
US6274294B1 (en) * 1999-02-03 2001-08-14 Electroformed Stents, Inc. Cylindrical photolithography exposure process and apparatus
US6334960B1 (en) 1999-03-11 2002-01-01 Board Of Regents, The University Of Texas System Step and flash imprint lithography
AT467277T (en) 1999-07-02 2010-05-15 Steven J Shattil Method and apparatus for separating signals in wireless communication by frequency diversity
EP1072954A3 (en) 1999-07-28 2002-05-22 Lucent Technologies Inc. Lithographic process for device fabrication
US6517995B1 (en) * 1999-09-14 2003-02-11 Massachusetts Institute Of Technology Fabrication of finely featured devices by liquid embossing
US6873087B1 (en) 1999-10-29 2005-03-29 Board Of Regents, The University Of Texas System High precision orientation alignment and gap control stages for imprint lithography processes
AU779699B2 (en) * 1999-12-23 2005-02-10 Universitat Konstanz Methods and apparatus for forming submicron patterns on films
US6234379B1 (en) * 2000-02-28 2001-05-22 Nordson Corporation No-flow flux and underfill dispensing methods
SG142150A1 (en) 2000-07-16 2008-05-28 Univ Texas High-resolution overlay alignment systems for imprint lithography
AU7790701A (en) * 2000-07-17 2002-01-30 Univ Texas Method and system of automatic fluid dispensing for imprint lithography processes
US6482742B1 (en) * 2000-07-18 2002-11-19 Stephen Y. Chou Fluid pressure imprint lithography
CN1696826A (en) 2000-08-01 2005-11-16 得克萨斯州大学系统董事会 Method for forming pattern on substrate by mould board transparent to exciting light and semiconductor apparatus therefor
US6326627B1 (en) * 2000-08-02 2001-12-04 Archimedes Technology Group, Inc. Mass filtering sputtered ion source
AU2001297642A1 (en) * 2000-10-12 2002-09-04 Board Of Regents, The University Of Texas System Template for room temperature, low pressure micro- and nano-imprint lithography
US6790763B2 (en) 2000-12-04 2004-09-14 Ebara Corporation Substrate processing method
US6387787B1 (en) * 2001-03-02 2002-05-14 Motorola, Inc. Lithographic template and method of formation and use
US6517977B2 (en) * 2001-03-28 2003-02-11 Motorola, Inc. Lithographic template and method of formation and use
JP2005505754A (en) * 2001-07-25 2005-02-24 ザ トラスティーズ オブ プリンストン ユニバーシテイ Nanochannel array and preparation and use thereof for macromolecular analysis of the high-throughput
WO2003035932A1 (en) * 2001-09-25 2003-05-01 Minuta Technology Co., Ltd. Method for forming a micro-pattern on a substrate by using capillary force
US6849558B2 (en) * 2002-05-22 2005-02-01 The Board Of Trustees Of The Leland Stanford Junior University Replication and transfer of microstructures and nanostructures
US20030235787A1 (en) 2002-06-24 2003-12-25 Watts Michael P.C. Low viscosity high resolution patterning material
US6926929B2 (en) 2002-07-09 2005-08-09 Molecular Imprints, Inc. System and method for dispensing liquids
US6900881B2 (en) * 2002-07-11 2005-05-31 Molecular Imprints, Inc. Step and repeat imprint lithography systems
US6932934B2 (en) * 2002-07-11 2005-08-23 Molecular Imprints, Inc. Formation of discontinuous films during an imprint lithography process
US7077992B2 (en) * 2002-07-11 2006-07-18 Molecular Imprints, Inc. Step and repeat imprint lithography processes
MY144124A (en) * 2002-07-11 2011-08-15 Molecular Imprints Inc Step and repeat imprint lithography systems
US6908861B2 (en) * 2002-07-11 2005-06-21 Molecular Imprints, Inc. Method for imprint lithography using an electric field
US6916584B2 (en) * 2002-08-01 2005-07-12 Molecular Imprints, Inc. Alignment methods for imprint lithography
AU2003261317A1 (en) * 2002-08-01 2004-02-23 Molecular Imprints, Inc. Scatterometry alignment for imprint lithography
US7070405B2 (en) * 2002-08-01 2006-07-04 Molecular Imprints, Inc. Alignment systems for imprint lithography
US7027156B2 (en) * 2002-08-01 2006-04-11 Molecular Imprints, Inc. Scatterometry alignment for imprint lithography
US7071088B2 (en) 2002-08-23 2006-07-04 Molecular Imprints, Inc. Method for fabricating bulbous-shaped vias
US8349241B2 (en) 2002-10-04 2013-01-08 Molecular Imprints, Inc. Method to arrange features on a substrate to replicate features having minimal dimensional variability
US6929762B2 (en) 2002-11-13 2005-08-16 Molecular Imprints, Inc. Method of reducing pattern distortions during imprint lithography processes
US7019819B2 (en) 2002-11-13 2006-03-28 Molecular Imprints, Inc. Chucking system for modulating shapes of substrates
US7641840B2 (en) 2002-11-13 2010-01-05 Molecular Imprints, Inc. Method for expelling gas positioned between a substrate and a mold
EP2099066B1 (en) 2002-11-13 2012-01-04 Molecular Imprints, Inc. Method for modulating shapes of substrates
US7750059B2 (en) * 2002-12-04 2010-07-06 Hewlett-Packard Development Company, L.P. Polymer solution for nanoimprint lithography to reduce imprint temperature and pressure
US6980282B2 (en) 2002-12-11 2005-12-27 Molecular Imprints, Inc. Method for modulating shapes of substrates
US6871558B2 (en) 2002-12-12 2005-03-29 Molecular Imprints, Inc. Method for determining characteristics of substrate employing fluid geometries
US7365103B2 (en) 2002-12-12 2008-04-29 Board Of Regents, The University Of Texas System Compositions for dark-field polymerization and method of using the same for imprint lithography processes
US20040168613A1 (en) 2003-02-27 2004-09-02 Molecular Imprints, Inc. Composition and method to form a release layer
US7452574B2 (en) 2003-02-27 2008-11-18 Molecular Imprints, Inc. Method to reduce adhesion between a polymerizable layer and a substrate employing a fluorine-containing layer
US6943117B2 (en) * 2003-03-27 2005-09-13 Korea Institute Of Machinery & Materials UV nanoimprint lithography process using elementwise embossed stamp and selectively additive pressurization
TWI228638B (en) * 2003-06-10 2005-03-01 Ind Tech Res Inst Method for and apparatus for bonding patterned imprint to a substrate by adhering means
US7684008B2 (en) 2003-06-11 2010-03-23 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7442336B2 (en) * 2003-08-21 2008-10-28 Molecular Imprints, Inc. Capillary imprinting technique
JP2005068181A (en) 2003-08-22 2005-03-17 Three M Innovative Properties Co Precursor paste of microstructure, microstructure and method for producing the same
US8211214B2 (en) 2003-10-02 2012-07-03 Molecular Imprints, Inc. Single phase fluid imprint lithography method
US7090716B2 (en) 2003-10-02 2006-08-15 Molecular Imprints, Inc. Single phase fluid imprint lithography method
US20050106321A1 (en) 2003-11-14 2005-05-19 Molecular Imprints, Inc. Dispense geometery to achieve high-speed filling and throughput
US20050158419A1 (en) 2004-01-15 2005-07-21 Watts Michael P. Thermal processing system for imprint lithography
US20050156353A1 (en) 2004-01-15 2005-07-21 Watts Michael P. Method to improve the flow rate of imprinting material
US8076386B2 (en) 2004-02-23 2011-12-13 Molecular Imprints, Inc. Materials for imprint lithography
US20050189676A1 (en) 2004-02-27 2005-09-01 Molecular Imprints, Inc. Full-wafer or large area imprinting with multiple separated sub-fields for high throughput lithography
US20050276919A1 (en) 2004-06-01 2005-12-15 Molecular Imprints, Inc. Method for dispensing a fluid on a substrate
CN100570445C (en) 2004-06-03 2009-12-16 分子制模股份有限公司 Fluid dispensing and drop-on-demand dispensing for nano-scale manufacturing
US20050270516A1 (en) 2004-06-03 2005-12-08 Molecular Imprints, Inc. System for magnification and distortion correction during nano-scale manufacturing
NL1027053C2 (en) * 2004-09-16 2006-03-20 Robert Oosterling Retractable heating.
US7547504B2 (en) 2004-09-21 2009-06-16 Molecular Imprints, Inc. Pattern reversal employing thick residual layers
US20060062922A1 (en) 2004-09-23 2006-03-23 Molecular Imprints, Inc. Polymerization technique to attenuate oxygen inhibition of solidification of liquids and composition therefor
US7244386B2 (en) 2004-09-27 2007-07-17 Molecular Imprints, Inc. Method of compensating for a volumetric shrinkage of a material disposed upon a substrate to form a substantially planar structure therefrom
WO2006060758A2 (en) 2004-12-01 2006-06-08 Molecular Imprints, Inc. Methods of exposure for the purpose of thermal management for imprint lithography processes
US7811505B2 (en) 2004-12-07 2010-10-12 Molecular Imprints, Inc. Method for fast filling of templates for imprint lithography using on template dispense
US20060177535A1 (en) 2005-02-04 2006-08-10 Molecular Imprints, Inc. Imprint lithography template to facilitate control of liquid movement
US20060177532A1 (en) 2005-02-04 2006-08-10 Molecular Imprints, Inc. Imprint lithography method to control extrusion of a liquid from a desired region on a substrate
US7692771B2 (en) 2005-05-27 2010-04-06 Asml Netherlands B.V. Imprint lithography
US7670534B2 (en) 2005-09-21 2010-03-02 Molecular Imprints, Inc. Method to control an atmosphere between a body and a substrate
US7259102B2 (en) 2005-09-30 2007-08-21 Molecular Imprints, Inc. Etching technique to planarize a multi-layer structure
US7906058B2 (en) 2005-12-01 2011-03-15 Molecular Imprints, Inc. Bifurcated contact printing technique
US7670530B2 (en) 2006-01-20 2010-03-02 Molecular Imprints, Inc. Patterning substrates employing multiple chucks
EP1957249B1 (en) 2005-12-08 2014-11-12 Canon Nanotechnologies, Inc. Method and system for double-sided patterning of substrates
US8142850B2 (en) 2006-04-03 2012-03-27 Molecular Imprints, Inc. Patterning a plurality of fields on a substrate to compensate for differing evaporation times
US20070228593A1 (en) 2006-04-03 2007-10-04 Molecular Imprints, Inc. Residual Layer Thickness Measurement and Correction
JP5306989B2 (en) 2006-04-03 2013-10-02 モレキュラー・インプリンツ・インコーポレーテッド How to simultaneously patterning a substrate having a plurality of fields and alignment marks
US20070228608A1 (en) 2006-04-03 2007-10-04 Molecular Imprints, Inc. Preserving Filled Features when Vacuum Wiping
WO2007123805A2 (en) 2006-04-03 2007-11-01 Molecular Imprints, Inc. Lithography imprinting system
TW200842934A (en) 2006-12-29 2008-11-01 Molecular Imprints Inc Imprint fluid control
DE102008051973A1 (en) 2008-10-16 2010-04-22 Vmi - Az Extrusion Gmbh Extrusion conveyor

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US20110140302A1 (en) 2011-06-16
US7910042B2 (en) 2011-03-22
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US7708926B2 (en) 2010-05-04
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EP1656242B1 (en) 2011-10-19
US7442336B2 (en) 2008-10-28
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TWI319746B (en) 2010-01-21
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JP4514754B2 (en) 2010-07-28
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US20100140841A1 (en) 2010-06-10
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US8057725B2 (en) 2011-11-15

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