AT527579T - Systems and method for producing microstructures by imaging a radiation-sensitive layer turned between outer layers and microstructures made therefor - Google Patents

Systems and method for producing microstructures by imaging a radiation-sensitive layer turned between outer layers and microstructures made therefor

Info

Publication number
AT527579T
AT527579T AT04809596T AT04809596T AT527579T AT 527579 T AT527579 T AT 527579T AT 04809596 T AT04809596 T AT 04809596T AT 04809596 T AT04809596 T AT 04809596T AT 527579 T AT527579 T AT 527579T
Authority
AT
Austria
Prior art keywords
microstructures
imaging
radiation
systems
outer layers
Prior art date
Application number
AT04809596T
Other languages
German (de)
Inventor
Robert Freese
Thomas Rinehart
Robert Wood
Original Assignee
Bright View Technologies Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to US10/661,974 priority Critical patent/US7192692B2/en
Application filed by Bright View Technologies Corp filed Critical Bright View Technologies Corp
Priority to PCT/US2004/027071 priority patent/WO2005036271A2/en
Publication of AT527579T publication Critical patent/AT527579T/en

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0015Production of aperture devices, microporous systems or stamps
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
    • G02B3/00Simple or compound lenses
    • G02B3/0006Arrays
    • G02B3/0012Arrays characterised by the manufacturing method
    • G02B3/0025Machining, e.g. grinding, polishing, diamond turning, manufacturing of mould parts
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
    • G02B3/00Simple or compound lenses
    • G02B3/0006Arrays
    • G02B3/0012Arrays characterised by the manufacturing method
    • G02B3/0031Replication or moulding, e.g. hot embossing, UV-casting, injection moulding
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/18Diffraction gratings
    • G02B5/1847Manufacturing methods
    • G02B5/1852Manufacturing methods using mechanical means, e.g. ruling with diamond tool, moulding
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/18Diffraction gratings
    • G02B5/1847Manufacturing methods
    • G02B5/1857Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16Coating processes; Apparatus therefor
    • G03F7/161Coating processes; Apparatus therefor using a previously coated surface, e.g. by stamping or by transfer lamination
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/146Laser beam
AT04809596T 2003-09-11 2004-08-20 Systems and method for producing microstructures by imaging a radiation-sensitive layer turned between outer layers and microstructures made therefor AT527579T (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
US10/661,974 US7192692B2 (en) 2003-09-11 2003-09-11 Methods for fabricating microstructures by imaging a radiation sensitive layer sandwiched between outer layers
PCT/US2004/027071 WO2005036271A2 (en) 2003-09-11 2004-08-20 Systems and methods for fabricating microstructures by imaging a radiation sensitive layer sandwiched between outer layers, and microstructures fabricated thereby

Publications (1)

Publication Number Publication Date
AT527579T true AT527579T (en) 2011-10-15

Family

ID=34273989

Family Applications (1)

Application Number Title Priority Date Filing Date
AT04809596T AT527579T (en) 2003-09-11 2004-08-20 Systems and method for producing microstructures by imaging a radiation-sensitive layer turned between outer layers and microstructures made therefor

Country Status (6)

Country Link
US (3) US7192692B2 (en)
EP (1) EP1664929B1 (en)
JP (1) JP4989223B2 (en)
KR (1) KR101192624B1 (en)
AT (1) AT527579T (en)
WO (1) WO2005036271A2 (en)

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CN102608862A (en) * 2011-01-19 2012-07-25 中国科学院微电子研究所 Method for producing device in structure with large height-to-width ratio
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TW201325884A (en) * 2011-12-29 2013-07-01 Hon Hai Prec Ind Co Ltd Pressing roller for producing optical film and manufacturing method of the press roller
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Also Published As

Publication number Publication date
US7425407B1 (en) 2008-09-16
JP4989223B2 (en) 2012-08-01
KR101192624B1 (en) 2012-10-18
EP1664929A2 (en) 2006-06-07
US7192692B2 (en) 2007-03-20
US20050058949A1 (en) 2005-03-17
US20080233519A1 (en) 2008-09-25
JP2007507364A (en) 2007-03-29
WO2005036271A2 (en) 2005-04-21
US20070003868A1 (en) 2007-01-04
WO2005036271A3 (en) 2005-08-04
KR20070005910A (en) 2007-01-10
EP1664929B1 (en) 2011-10-05

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