AT518122T - for measuring or analyzing of systemn rehearse with vuv-light - Google Patents

for measuring or analyzing of systemn rehearse with vuv-light

Info

Publication number
AT518122T
AT518122T AT05751944T AT05751944T AT518122T AT 518122 T AT518122 T AT 518122T AT 05751944 T AT05751944 T AT 05751944T AT 05751944 T AT05751944 T AT 05751944T AT 518122 T AT518122 T AT 518122T
Authority
AT
Austria
Prior art keywords
systemn
rehearse
vuv
analyzing
measuring
Prior art date
Application number
AT05751944T
Other languages
German (de)
Inventor
John Fielden
Gary Janik
Shing Lee
Qiang Zhao
Torsten Kaack
Sungchul Yoo
Zhengquan Tan
Original Assignee
Kla Tencor Tech Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to US10/845,958 priority Critical patent/US7564552B2/en
Priority to US10/846,053 priority patent/US7359052B2/en
Priority to US10/846,170 priority patent/US7067819B2/en
Priority to US10/845,982 priority patent/US7349079B2/en
Application filed by Kla Tencor Tech Corp filed Critical Kla Tencor Tech Corp
Priority to PCT/US2005/016843 priority patent/WO2005114148A2/en
Publication of AT518122T publication Critical patent/AT518122T/en

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED, VISIBLE OR ULTRA-VIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/02Details
    • G01J3/10Arrangements of light sources specially adapted for spectrometry or colorimetry
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using infra-red, visible or ultra-violet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21Polarisation-affecting properties
    • G01N21/211Ellipsometry
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using infra-red, visible or ultra-violet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/55Specular reflectivity
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED, VISIBLE OR ULTRA-VIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/02Details
    • G01J3/0286Constructional arrangements for compensating for fluctuations caused by temperature, humidity or pressure, or using cooling or temperature stabilization of parts of the device; Controlling the atmosphere inside a spectrometer, e.g. vacuum
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED, VISIBLE OR ULTRA-VIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/28Investigating the spectrum
    • G01J3/30Measuring the intensity of spectral lines directly on the spectrum itself
    • G01J3/36Investigating two or more bands of a spectrum by separate detectors
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using infra-red, visible or ultra-violet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21Polarisation-affecting properties
    • G01N21/211Ellipsometry
    • G01N2021/213Spectrometric ellipsometry
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using infra-red, visible or ultra-violet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/31Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
    • G01N21/33Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using ultra-violet light
    • G01N2021/335Vacuum UV
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using infra-red, visible or ultra-violet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/31Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
    • G01N21/33Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using ultra-violet light
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using infra-red, visible or ultra-violet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/95Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501Semiconductor wafers
AT05751944T 2004-05-14 2005-05-13 for measuring or analyzing of systemn rehearse with vuv-light AT518122T (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
US10/845,958 US7564552B2 (en) 2004-05-14 2004-05-14 Systems and methods for measurement of a specimen with vacuum ultraviolet light
US10/846,053 US7359052B2 (en) 2004-05-14 2004-05-14 Systems and methods for measurement of a specimen with vacuum ultraviolet light
US10/846,170 US7067819B2 (en) 2004-05-14 2004-05-14 Systems and methods for measurement or analysis of a specimen using separated spectral peaks in light
US10/845,982 US7349079B2 (en) 2004-05-14 2004-05-14 Methods for measurement or analysis of a nitrogen concentration of a specimen
PCT/US2005/016843 WO2005114148A2 (en) 2004-05-14 2005-05-13 Systems and methods for measurement or analysis of a specimen

Publications (1)

Publication Number Publication Date
AT518122T true AT518122T (en) 2011-08-15

Family

ID=35428991

Family Applications (1)

Application Number Title Priority Date Filing Date
AT05751944T AT518122T (en) 2004-05-14 2005-05-13 for measuring or analyzing of systemn rehearse with vuv-light

Country Status (4)

Country Link
EP (1) EP1747434B1 (en)
JP (6) JP2007537455A (en)
AT (1) AT518122T (en)
WO (1) WO2005114148A2 (en)

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WO2008081374A2 (en) * 2006-12-28 2008-07-10 Koninklijke Philips Electronics N.V. Reflection or single scattering spectroscopy and imaging
FR2948192B1 (en) * 2009-07-20 2011-07-22 Commissariat Energie Atomique Process for optical characterization
JP2012098272A (en) * 2010-08-23 2012-05-24 Nsk Ltd Target concentration measuring device and target concentration measuring method
US8830486B2 (en) * 2011-07-04 2014-09-09 Kla-Tencor Corporation Atmospheric molecular contamination control with local purging
JP6066582B2 (en) * 2012-04-27 2017-01-25 積水化学工業株式会社 Detecting device
JP2014163712A (en) * 2013-02-22 2014-09-08 Hitachi High-Technologies Corp Inspection device
US9558858B2 (en) * 2013-08-14 2017-01-31 Kla-Tencor Corporation System and method for imaging a sample with a laser sustained plasma illumination output
US9658150B2 (en) * 2015-01-12 2017-05-23 Kla-Tencor Corporation System and method for semiconductor wafer inspection and metrology
JP6278917B2 (en) * 2015-03-10 2018-02-14 日本電信電話株式会社 Constituent concentration measuring apparatus and constituent concentration measuring method
US10139358B2 (en) 2016-01-11 2018-11-27 International Business Machines Corporation Method for characterization of a layered structure
RU2638092C1 (en) * 2016-08-23 2017-12-11 Общество с ограниченной ответственностью "Поларлайт" Ellipsometer
JP2018065209A (en) * 2016-10-18 2018-04-26 株式会社荏原製作所 Surface-quality measuring device of polishing pad

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JPH0677301A (en) * 1992-08-27 1994-03-18 Kawasaki Steel Corp Surface treatment apparatus
JP3266691B2 (en) * 1993-03-17 2002-03-18 東ソ−・エスジ−エム株式会社 Inspection method of the excimer laser for optical material
JP3471485B2 (en) * 1994-05-30 2003-12-02 株式会社半導体エネルギー研究所 Optical processing apparatus and optical processing method
JP3360097B2 (en) * 1994-07-06 2002-12-24 株式会社ニコン Optical device in the vacuum ultraviolet region
US5608526A (en) * 1995-01-19 1997-03-04 Tencor Instruments Focused beam spectroscopic ellipsometry method and system
JPH1038856A (en) * 1996-07-22 1998-02-13 Nikon Corp Light absorptance measuring instrument and measuring method
US5771094A (en) * 1997-01-29 1998-06-23 Kla-Tencor Corporation Film measurement system with improved calibration
JPH10335288A (en) * 1997-06-05 1998-12-18 Sony Corp Substrate-polishing apparatus and polishing final point detection method
WO1999002970A1 (en) * 1997-07-11 1999-01-21 Therma-Wave, Inc. An apparatus for analyzing multi-layer thin film stacks on semiconductors
US6483580B1 (en) * 1998-03-06 2002-11-19 Kla-Tencor Technologies Corporation Spectroscopic scatterometer system
US6714300B1 (en) * 1998-09-28 2004-03-30 Therma-Wave, Inc. Optical inspection equipment for semiconductor wafers with precleaning
JP2000205966A (en) * 1999-01-20 2000-07-28 Komatsu Ltd Wavelength measuring apparatus of vacuum ultraviolet laser
US6184984B1 (en) * 1999-02-09 2001-02-06 Kla-Tencor Corporation System for measuring polarimetric spectrum and other properties of a sample
JP2001068400A (en) * 1999-08-27 2001-03-16 Nikon Corp Light absorbing substance detecting method, and exposure method and apparatus
KR20020080482A (en) * 2000-03-31 2002-10-23 가부시키가이샤 니콘 Method and apparatus for measurement, and method and apparatus for exposure
FR2810108B1 (en) * 2000-06-09 2004-04-02 France Telecom Spectroscopic ellipsometer has low noise
JP2002083766A (en) * 2000-06-19 2002-03-22 Nikon Corp Projectoin optical system, method of manufacturing the optical system, and projection exposure system equipped with the optical system
US6917433B2 (en) * 2000-09-20 2005-07-12 Kla-Tencor Technologies Corp. Methods and systems for determining a property of a specimen prior to, during, or subsequent to an etch process
JP2002093871A (en) * 2000-09-20 2002-03-29 Hitachi Ltd Semiconductor manufacturing apparatus and method for manufacturing semiconductor
WO2002080185A1 (en) * 2001-03-28 2002-10-10 Nikon Corporation Stage device, exposure device, and method of manufacturing device
US6813026B2 (en) * 2001-04-11 2004-11-02 Therma-Wave, Inc. Purge system for optical metrology tool
US6583876B2 (en) * 2001-05-24 2003-06-24 Therma-Wave, Inc. Apparatus for optical measurements of nitrogen concentration in thin films
JP3742319B2 (en) * 2001-07-24 2006-02-01 松下電器産業株式会社 The film thickness measuring apparatus and thickness measuring method
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US6710354B1 (en) * 2001-12-11 2004-03-23 Kla-Tencor Corporation Scanning electron microscope architecture and related material handling system
US6986280B2 (en) * 2002-01-22 2006-01-17 Fei Company Integrated measuring instrument
US7253901B2 (en) * 2002-01-23 2007-08-07 Kla-Tencor Technologies Corporation Laser-based cleaning device for film analysis tool
US7369233B2 (en) * 2002-11-26 2008-05-06 Kla-Tencor Technologies Corporation Optical system for measuring samples using short wavelength radiation

Also Published As

Publication number Publication date
EP1747434B1 (en) 2011-07-27
JP2017175147A (en) 2017-09-28
JP5785571B2 (en) 2015-09-30
EP1747434A2 (en) 2007-01-31
JP2015127708A (en) 2015-07-09
WO2005114148A2 (en) 2005-12-01
JP5745899B2 (en) 2015-07-08
WO2005114148A3 (en) 2006-03-09
JP2018160676A (en) 2018-10-11
WO2005114148B1 (en) 2006-06-22
EP1747434A4 (en) 2008-05-14
JP2011133492A (en) 2011-07-07
JP2007537455A (en) 2007-12-20
JP2013102223A (en) 2013-05-23

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