AT441202T - Exposure system with a loaded particle beam - Google Patents

Exposure system with a loaded particle beam

Info

Publication number
AT441202T
AT441202T AT05740699T AT05740699T AT441202T AT 441202 T AT441202 T AT 441202T AT 05740699 T AT05740699 T AT 05740699T AT 05740699 T AT05740699 T AT 05740699T AT 441202 T AT441202 T AT 441202T
Authority
AT
Austria
Prior art keywords
exposure
loaded particle
loaded
particle
Prior art date
Application number
AT05740699T
Other languages
German (de)
Inventor
Pieter Kruit
Original Assignee
Mapper Lithography Ip Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to US57228704P priority Critical
Application filed by Mapper Lithography Ip Bv filed Critical Mapper Lithography Ip Bv
Priority to PCT/NL2005/000329 priority patent/WO2005112073A1/en
Publication of AT441202T publication Critical patent/AT441202T/en

Links

Classifications

    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/06Electron sources; Electron guns
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00Manufacture or treatment of nanostructures
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/147Arrangements for directing or deflecting the discharge along a desired path
    • H01J37/1472Deflecting along given lines
    • H01J37/1474Scanning means
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174Particle-beam lithography, e.g. electron beam lithography
    • H01J37/3177Multi-beam, e.g. fly's eye, comb probe
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06Sources
    • H01J2237/063Electron sources
    • H01J2237/06308Thermionic sources
    • H01J2237/06316Schottky emission
AT05740699T 2004-05-17 2005-04-29 Exposure system with a loaded particle beam AT441202T (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
US57228704P true 2004-05-17 2004-05-17
PCT/NL2005/000329 WO2005112073A1 (en) 2004-05-17 2005-04-29 Charged particle beam exposure system

Publications (1)

Publication Number Publication Date
AT441202T true AT441202T (en) 2009-09-15

Family

ID=34967361

Family Applications (1)

Application Number Title Priority Date Filing Date
AT05740699T AT441202T (en) 2004-05-17 2005-04-29 Exposure system with a loaded particle beam

Country Status (8)

Country Link
US (2) US7453075B2 (en)
EP (1) EP1766653B1 (en)
JP (1) JP4856073B2 (en)
KR (1) KR101099487B1 (en)
CN (2) CN102005358B (en)
AT (1) AT441202T (en)
DE (1) DE602005016256D1 (en)
WO (1) WO2005112073A1 (en)

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US8445869B2 (en) 2008-04-15 2013-05-21 Mapper Lithography Ip B.V. Projection lens arrangement
JP5743886B2 (en) 2008-06-04 2015-07-01 マッパー・リソグラフィー・アイピー・ビー.ブイ. Method and system for exposing a target
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US8450699B2 (en) * 2008-12-16 2013-05-28 Hitachi High-Technologies Corporation Electron beam device and electron beam application device using the same
WO2010134017A1 (en) * 2009-05-20 2010-11-25 Mapper Lithography Ip B.V. Method of generating a two-level pattern for lithographic processing and pattern generator using the same
US8294125B2 (en) * 2009-11-18 2012-10-23 Kla-Tencor Corporation High-sensitivity and high-throughput electron beam inspection column enabled by adjustable beam-limiting aperture
JP5988570B2 (en) * 2010-12-31 2016-09-07 エフ・イ−・アイ・カンパニー Charged particle source comprising a plurality of selectable particle emitters
NL2006868C2 (en) * 2011-05-30 2012-12-03 Mapper Lithography Ip Bv Charged particle multi-beamlet apparatus.
WO2014156170A1 (en) * 2013-03-29 2014-10-02 国立大学法人東北大学 Electron beam irradiation device
KR101722617B1 (en) * 2013-11-14 2017-04-03 마퍼 리쏘그라피 아이피 비.브이. Electrode cooling arrangement
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US10056228B2 (en) 2014-07-29 2018-08-21 Applied Materials Israel Ltd. Charged particle beam specimen inspection system and method for operation thereof
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US10242839B2 (en) * 2017-05-05 2019-03-26 Kla-Tencor Corporation Reduced Coulomb interactions in a multi-beam column

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Also Published As

Publication number Publication date
US20050269528A1 (en) 2005-12-08
CN102005358B (en) 2012-09-12
EP1766653A1 (en) 2007-03-28
JP2007538398A (en) 2007-12-27
DE602005016256D1 (en) 2009-10-08
US7453075B2 (en) 2008-11-18
EP1766653B1 (en) 2009-08-26
JP4856073B2 (en) 2012-01-18
KR101099487B1 (en) 2011-12-28
CN101019203A (en) 2007-08-15
WO2005112073A1 (en) 2005-11-24
US20090065711A1 (en) 2009-03-12
US7868307B2 (en) 2011-01-11
CN102005358A (en) 2011-04-06
CN101019203B (en) 2010-12-22
KR20070021262A (en) 2007-02-22

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