AT365962T - Method and device for irradiating a layer by means of a light spot - Google Patents

Method and device for irradiating a layer by means of a light spot

Info

Publication number
AT365962T
AT365962T AT03786179T AT03786179T AT365962T AT 365962 T AT365962 T AT 365962T AT 03786179 T AT03786179 T AT 03786179T AT 03786179 T AT03786179 T AT 03786179T AT 365962 T AT365962 T AT 365962T
Authority
AT
Austria
Prior art keywords
irradiating
layer
means
device
method
Prior art date
Application number
AT03786179T
Other languages
German (de)
Inventor
Jacobus Neijzen
Santen Helmar Van
Original Assignee
Koninkl Philips Electronics Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to EP02080392 priority Critical
Application filed by Koninkl Philips Electronics Nv filed Critical Koninkl Philips Electronics Nv
Publication of AT365962T publication Critical patent/AT365962T/en

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70216Systems for imaging mask onto workpiece
    • G03F7/70341Immersion
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/12Heads, e.g. forming of the optical beam spot or modulation of the optical beam
    • G11B7/122Flying-type heads, e.g. analogous to Winchester type in magnetic recording
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/12Heads, e.g. forming of the optical beam spot or modulation of the optical beam
    • G11B7/135Means for guiding the beam from the source to the record carrier or from the record carrier to the detector
    • G11B7/1372Lenses
    • G11B7/1374Objective lenses
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/26Apparatus or processes specially adapted for the manufacture of record carriers
    • G11B7/261Preparing a master, e.g. exposing photoresist, electroforming
AT03786179T 2002-12-19 2003-11-20 Method and device for irradiating a layer by means of a light spot AT365962T (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
EP02080392 2002-12-19

Publications (1)

Publication Number Publication Date
AT365962T true AT365962T (en) 2007-07-15

Family

ID=32668769

Family Applications (1)

Application Number Title Priority Date Filing Date
AT03786179T AT365962T (en) 2002-12-19 2003-11-20 Method and device for irradiating a layer by means of a light spot

Country Status (10)

Country Link
US (2) US7514699B2 (en)
EP (1) EP1579435B1 (en)
JP (1) JP4364805B2 (en)
KR (1) KR100971440B1 (en)
CN (1) CN1316482C (en)
AT (1) AT365962T (en)
AU (1) AU2003295177A1 (en)
DE (1) DE60314668T2 (en)
TW (1) TWI288404B (en)
WO (1) WO2004057589A1 (en)

Families Citing this family (202)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100965330B1 (en) 2003-12-15 2010-06-22 칼 짜이스 에스엠티 아게 Objective as a microlithography projection objective with at least one liquid lens
KR100585476B1 (en) 2002-11-12 2006-06-07 에이에스엠엘 네델란즈 비.브이. Lithographic Apparatus and Device Manufacturing Method
CN100568101C (en) 2002-11-12 2009-12-09 Asml荷兰有限公司 Lithographic apparatus and device manufacturing method
US7213963B2 (en) 2003-06-09 2007-05-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
DE60335595D1 (en) 2002-11-12 2011-02-17 Asml Netherlands Bv Lithographic apparatus with immersion and method for manufacturing a device
US9482966B2 (en) 2002-11-12 2016-11-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
SG121822A1 (en) 2002-11-12 2006-05-26 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
CN101349876B (en) 2002-11-12 2010-12-01 Asml荷兰有限公司 Immersion lithographic apparatus and device manufacturing method
US7110081B2 (en) 2002-11-12 2006-09-19 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
SG131766A1 (en) 2002-11-18 2007-05-28 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
SG121829A1 (en) 2002-11-29 2006-05-26 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
WO2004053955A1 (en) * 2002-12-10 2004-06-24 Nikon Corporation Exposure system and device producing method
SG158745A1 (en) 2002-12-10 2010-02-26 Nikon Corp Exposure apparatus and method for producing device
US7948604B2 (en) 2002-12-10 2011-05-24 Nikon Corporation Exposure apparatus and method for producing device
US7242455B2 (en) 2002-12-10 2007-07-10 Nikon Corporation Exposure apparatus and method for producing device
JP4352874B2 (en) 2002-12-10 2009-10-28 株式会社ニコン Exposure apparatus and device manufacturing method
KR101036114B1 (en) 2002-12-10 2011-05-23 가부시키가이샤 니콘 Exposure apparatus, exposure method and method for manufacturing device
KR101085372B1 (en) 2002-12-10 2011-11-21 가부시키가이샤 니콘 Exposure apparatus and method for manufacturing device
DE10261775A1 (en) 2002-12-20 2004-07-01 Carl Zeiss Smt Ag Device for optical measurement of an imaging system
EP2466625B1 (en) 2003-02-26 2015-04-22 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
KR101181688B1 (en) 2003-03-25 2012-09-19 가부시키가이샤 니콘 Exposure system and device production method
EP1612850B1 (en) 2003-04-07 2009-03-25 Nikon Corporation Exposure apparatus and method for manufacturing a device
JP4488004B2 (en) 2003-04-09 2010-06-23 株式会社ニコン Immersion lithography fluid control system
EP3232271A1 (en) 2003-04-10 2017-10-18 Nikon Corporation Environmental system including vacuum scavenge for an immersion lithography apparatus
EP3352010A1 (en) 2003-04-10 2018-07-25 Nikon Corporation Run-off path to collect liquid for an immersion lithography apparatus
KR20170064003A (en) 2003-04-10 2017-06-08 가부시키가이샤 니콘 Environmental system including a transport region for an immersion lithography apparatus
JP4582089B2 (en) 2003-04-11 2010-11-17 株式会社ニコン Liquid injection and recovery system for immersion lithography
KR101597475B1 (en) 2003-04-11 2016-02-24 가부시키가이샤 니콘 Cleanup method for optics in immersion lithography
EP1616220B1 (en) 2003-04-11 2013-05-01 Nikon Corporation Apparatus and method for maintaining immersion fluid under a lithographic projection lens
AT542167T (en) 2003-04-17 2012-02-15 Nikon Corp Lithographic immersion device
TWI295414B (en) 2003-05-13 2008-04-01 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
TWI474380B (en) 2003-05-23 2015-02-21 尼康股份有限公司
TWI511181B (en) 2003-05-23 2015-12-01 尼康股份有限公司
EP1628330A4 (en) 2003-05-28 2009-09-16 Nikon Corp Exposure method, exposure device, and device manufacturing method
TWI347741B (en) 2003-05-30 2011-08-21 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
US7684008B2 (en) 2003-06-11 2010-03-23 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
KR101528016B1 (en) 2003-06-13 2015-06-12 가부시키가이샤 니콘 Exposure method, substrate stage, exposure apparatus and method for manufacturing device
KR101146962B1 (en) 2003-06-19 2012-05-22 가부시키가이샤 니콘 Exposure device and device producing method
US6867844B2 (en) 2003-06-19 2005-03-15 Asml Holding N.V. Immersion photolithography system and method using microchannel nozzles
US6809794B1 (en) 2003-06-27 2004-10-26 Asml Holding N.V. Immersion photolithography system and method using inverted wafer-projection optics interface
DE60308161T2 (en) 2003-06-27 2007-08-09 Asml Netherlands B.V. A lithographic apparatus and method for producing an article
EP1498778A1 (en) 2003-06-27 2005-01-19 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
EP1494074A1 (en) 2003-06-30 2005-01-05 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
EP1975721A1 (en) 2003-06-30 2008-10-01 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
EP2853943B1 (en) 2003-07-08 2016-11-16 Nikon Corporation Wafer table for immersion lithography
EP2264532B1 (en) 2003-07-09 2012-10-31 Nikon Corporation Exposure apparatus and device manufacturing method
CN102944981A (en) 2003-07-09 2013-02-27 株式会社尼康 Exposure apparatus, and device fabricating method
KR101296501B1 (en) 2003-07-09 2013-08-13 가부시키가이샤 니콘 Exposure apparatus and method for manufacturing device
SG109000A1 (en) 2003-07-16 2005-02-28 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
EP1500982A1 (en) 2003-07-24 2005-01-26 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
WO2005010960A1 (en) 2003-07-25 2005-02-03 Nikon Corporation Inspection method and inspection device for projection optical system, and production method for projection optical system
EP2264533B1 (en) 2003-07-28 2012-09-19 Nikon Corporation Exposure apparatus, method for producing device, and exposure method
US7175968B2 (en) 2003-07-28 2007-02-13 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method and a substrate
EP1503244A1 (en) 2003-07-28 2005-02-02 ASML Netherlands B.V. Lithographic projection apparatus and device manufacturing method
US7779781B2 (en) 2003-07-31 2010-08-24 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8149381B2 (en) 2003-08-26 2012-04-03 Nikon Corporation Optical element and exposure apparatus
KR101094114B1 (en) 2003-08-26 2011-12-15 가부시키가이샤 니콘 Optical element and exposure device
TWI263859B (en) 2003-08-29 2006-10-11 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
EP2261740B1 (en) 2003-08-29 2014-07-09 ASML Netherlands BV Lithographic apparatus
US6954256B2 (en) 2003-08-29 2005-10-11 Asml Netherlands B.V. Gradient immersion lithography
TWI245163B (en) 2003-08-29 2005-12-11 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
JP4325622B2 (en) 2003-08-29 2009-09-02 株式会社ニコン Exposure apparatus and device manufacturing method
US8054448B2 (en) 2004-05-04 2011-11-08 Nikon Corporation Apparatus and method for providing fluid for immersion lithography
KR101238114B1 (en) 2003-09-03 2013-02-27 가부시키가이샤 니콘 Apparatus and method for providing fluid for immersion lithography
WO2005029559A1 (en) 2003-09-19 2005-03-31 Nikon Corporation Exposure apparatus and device producing method
DE60302897T2 (en) 2003-09-29 2006-08-03 Asml Netherlands B.V. A lithographic apparatus and method for manufacturing a device
US7158211B2 (en) 2003-09-29 2007-01-02 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
EP1519230A1 (en) 2003-09-29 2005-03-30 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
EP2312395B1 (en) 2003-09-29 2015-05-13 Nikon Corporation Exposure apparatus, exposure method, and method for producing a device
KR101111364B1 (en) 2003-10-08 2012-02-27 가부시키가이샤 니콘 Substrate carrying apparatus, substrate carrying method, exposure apparatus, exposure method, and method for producing device
WO2005036623A1 (en) 2003-10-08 2005-04-21 Zao Nikon Co., Ltd. Substrate transporting apparatus and method, exposure apparatus and method, and device producing method
TWI376724B (en) 2003-10-09 2012-11-11 Nikon Corp
EP1524558A1 (en) 2003-10-15 2005-04-20 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
EP1524557A1 (en) 2003-10-15 2005-04-20 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
US7352433B2 (en) 2003-10-28 2008-04-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
WO2005041276A1 (en) 2003-10-28 2005-05-06 Nikon Corporation Exposure apparatus, exposure method, and device producing method
US7411653B2 (en) 2003-10-28 2008-08-12 Asml Netherlands B.V. Lithographic apparatus
US7528929B2 (en) 2003-11-14 2009-05-05 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7545481B2 (en) 2003-11-24 2009-06-09 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
EP3139214B1 (en) 2003-12-03 2019-01-30 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
KR101499405B1 (en) 2003-12-15 2015-03-05 가부시키가이샤 니콘 Stage system, exposure apparatus and exposure method
US7589818B2 (en) 2003-12-23 2009-09-15 Asml Netherlands B.V. Lithographic apparatus, alignment apparatus, device manufacturing method, and a method of converting an apparatus
US7394521B2 (en) 2003-12-23 2008-07-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
KR101135232B1 (en) 2004-01-20 2012-04-12 칼 짜이스 에스엠테 게엠베하 Microlithographic projection exposure apparatus
US7589822B2 (en) * 2004-02-02 2009-09-15 Nikon Corporation Stage drive method and stage unit, exposure apparatus, and device manufacturing method
US7990516B2 (en) 2004-02-03 2011-08-02 Nikon Corporation Immersion exposure apparatus and device manufacturing method with liquid detection apparatus
US7050146B2 (en) 2004-02-09 2006-05-23 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US20070165198A1 (en) * 2004-02-13 2007-07-19 Carl Zeiss Smt Ag Projection objective for a microlithographic projection exposure apparatus
CN100592210C (en) * 2004-02-13 2010-02-24 卡尔蔡司Smt股份公司 Projection objective for a microlithographic projection exposure apparatus
WO2005093791A1 (en) 2004-03-25 2005-10-06 Nikon Corporation Exposure apparatus and method for manufacturing device
US7034917B2 (en) 2004-04-01 2006-04-25 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method and device manufactured thereby
US7227619B2 (en) 2004-04-01 2007-06-05 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7295283B2 (en) 2004-04-02 2007-11-13 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7898642B2 (en) 2004-04-14 2011-03-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
KR101330370B1 (en) 2004-04-19 2013-11-15 가부시키가이샤 니콘 Exposure apparatus and device producing method
US7379159B2 (en) 2004-05-03 2008-05-27 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
WO2005106589A1 (en) * 2004-05-04 2005-11-10 Carl Zeiss Smt Ag Microlithographic projection exposure apparatus and immersion liquid therefore
US7616383B2 (en) 2004-05-18 2009-11-10 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7486381B2 (en) 2004-05-21 2009-02-03 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
EP1774405B1 (en) 2004-06-04 2014-08-06 Carl Zeiss SMT GmbH System for measuring the image quality of an optical imaging system
EP3203498A1 (en) 2004-06-09 2017-08-09 Nikon Corporation Exposure apparatus and device manufacturing method
KR101556454B1 (en) 2004-06-10 2015-10-13 가부시키가이샤 니콘 Exposure equipment, exposure method and device manufacturing method
US8717533B2 (en) 2004-06-10 2014-05-06 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
US8373843B2 (en) 2004-06-10 2013-02-12 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
US8508713B2 (en) 2004-06-10 2013-08-13 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
KR101577515B1 (en) 2004-06-10 2015-12-14 가부시키가이샤 니콘 Exposure apparatus, exposure method, and device producing method
US7481867B2 (en) 2004-06-16 2009-01-27 Edwards Limited Vacuum system for immersion photolithography
US7463330B2 (en) 2004-07-07 2008-12-09 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
WO2006006565A1 (en) 2004-07-12 2006-01-19 Nikon Corporation Exposure equipment and device manufacturing method
US7161663B2 (en) 2004-07-22 2007-01-09 Asml Netherlands B.V. Lithographic apparatus
US7304715B2 (en) 2004-08-13 2007-12-04 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
EP1801853A4 (en) 2004-08-18 2008-06-04 Nikon Corp Exposure apparatus and device manufacturing method
US7701550B2 (en) 2004-08-19 2010-04-20 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
TWI610340B (en) 2004-09-17 2018-01-01 Nikon Corp
US7133114B2 (en) 2004-09-20 2006-11-07 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7522261B2 (en) 2004-09-24 2009-04-21 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7355674B2 (en) 2004-09-28 2008-04-08 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method and computer program product
US7894040B2 (en) 2004-10-05 2011-02-22 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7209213B2 (en) 2004-10-07 2007-04-24 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7119876B2 (en) 2004-10-18 2006-10-10 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7379155B2 (en) 2004-10-18 2008-05-27 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
KR101285951B1 (en) 2004-10-26 2013-07-12 가부시키가이샤 니콘 Substrate processing method, exposure apparatus and method for manufacturing device
US7414699B2 (en) 2004-11-12 2008-08-19 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7423720B2 (en) 2004-11-12 2008-09-09 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7251013B2 (en) 2004-11-12 2007-07-31 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7583357B2 (en) 2004-11-12 2009-09-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7411657B2 (en) 2004-11-17 2008-08-12 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7145630B2 (en) 2004-11-23 2006-12-05 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7161654B2 (en) 2004-12-02 2007-01-09 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7446850B2 (en) 2004-12-03 2008-11-04 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7196770B2 (en) 2004-12-07 2007-03-27 Asml Netherlands B.V. Prewetting of substrate before immersion exposure
US7248334B2 (en) 2004-12-07 2007-07-24 Asml Netherlands B.V. Sensor shield
US7397533B2 (en) 2004-12-07 2008-07-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7365827B2 (en) 2004-12-08 2008-04-29 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP4752473B2 (en) 2004-12-09 2011-08-17 株式会社ニコン Exposure apparatus, exposure method and device manufacturing method
US7352440B2 (en) 2004-12-10 2008-04-01 Asml Netherlands B.V. Substrate placement in immersion lithography
US7403261B2 (en) 2004-12-15 2008-07-22 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7880860B2 (en) 2004-12-20 2011-02-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7528931B2 (en) 2004-12-20 2009-05-05 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7491661B2 (en) 2004-12-28 2009-02-17 Asml Netherlands B.V. Device manufacturing method, top coat material and substrate
US7405805B2 (en) 2004-12-28 2008-07-29 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US20060147821A1 (en) 2004-12-30 2006-07-06 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
EP1681597B1 (en) 2005-01-14 2010-03-10 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
SG124351A1 (en) 2005-01-14 2006-08-30 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
KR101942138B1 (en) 2005-01-31 2019-01-24 가부시키가이샤 니콘 Exposure apparatus and method for manufacturing device
US8692973B2 (en) 2005-01-31 2014-04-08 Nikon Corporation Exposure apparatus and method for producing device
CN101128775B (en) 2005-02-10 2012-07-25 Asml荷兰有限公司 Immersion liquid, exposure apparatus, and exposure process
US7378025B2 (en) 2005-02-22 2008-05-27 Asml Netherlands B.V. Fluid filtration method, fluid filtered thereby, lithographic apparatus and device manufacturing method
US8018573B2 (en) 2005-02-22 2011-09-13 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7224431B2 (en) 2005-02-22 2007-05-29 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7282701B2 (en) 2005-02-28 2007-10-16 Asml Netherlands B.V. Sensor for use in a lithographic apparatus
US7428038B2 (en) 2005-02-28 2008-09-23 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method and apparatus for de-gassing a liquid
US7324185B2 (en) 2005-03-04 2008-01-29 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7684010B2 (en) 2005-03-09 2010-03-23 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method, seal structure, method of removing an object and a method of sealing
US7330238B2 (en) 2005-03-28 2008-02-12 Asml Netherlands, B.V. Lithographic apparatus, immersion projection apparatus and device manufacturing method
US7411654B2 (en) 2005-04-05 2008-08-12 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
USRE43576E1 (en) 2005-04-08 2012-08-14 Asml Netherlands B.V. Dual stage lithographic apparatus and device manufacturing method
US7291850B2 (en) 2005-04-08 2007-11-06 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US20060232753A1 (en) 2005-04-19 2006-10-19 Asml Holding N.V. Liquid immersion lithography system with tilted liquid flow
CN100555568C (en) 2005-04-28 2009-10-28 株式会社尼康 Exposure method, exposure apparatus and device manufacturing method
US7317507B2 (en) 2005-05-03 2008-01-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7433016B2 (en) 2005-05-03 2008-10-07 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8248577B2 (en) 2005-05-03 2012-08-21 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7652746B2 (en) 2005-06-21 2010-01-26 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7751027B2 (en) 2005-06-21 2010-07-06 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7474379B2 (en) 2005-06-28 2009-01-06 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7468779B2 (en) 2005-06-28 2008-12-23 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7834974B2 (en) 2005-06-28 2010-11-16 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7535644B2 (en) 2005-08-12 2009-05-19 Asml Netherlands B.V. Lens element, lithographic apparatus, device manufacturing method, and device manufactured thereby
US8054445B2 (en) 2005-08-16 2011-11-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7411658B2 (en) 2005-10-06 2008-08-12 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US20070127135A1 (en) * 2005-11-01 2007-06-07 Nikon Corporation Exposure apparatus, exposure method and device manufacturing method
US7804577B2 (en) 2005-11-16 2010-09-28 Asml Netherlands B.V. Lithographic apparatus
US7656501B2 (en) 2005-11-16 2010-02-02 Asml Netherlands B.V. Lithographic apparatus
US7864292B2 (en) 2005-11-16 2011-01-04 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7633073B2 (en) 2005-11-23 2009-12-15 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7773195B2 (en) 2005-11-29 2010-08-10 Asml Holding N.V. System and method to increase surface tension and contact angle in immersion lithography
US7420194B2 (en) 2005-12-27 2008-09-02 Asml Netherlands B.V. Lithographic apparatus and substrate edge seal
US7839483B2 (en) 2005-12-28 2010-11-23 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method and a control system
US7649611B2 (en) 2005-12-30 2010-01-19 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8045134B2 (en) 2006-03-13 2011-10-25 Asml Netherlands B.V. Lithographic apparatus, control system and device manufacturing method
KR20080114691A (en) 2006-03-13 2008-12-31 가부시키가이샤 니콘 Exposure apparatus, maintenance method, exposure method and device manufacturing method
US9477158B2 (en) 2006-04-14 2016-10-25 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
DE102006021797A1 (en) 2006-05-09 2007-11-15 Carl Zeiss Smt Ag Optical imaging device with thermal attenuation
WO2007135990A1 (en) 2006-05-18 2007-11-29 Nikon Corporation Exposure method and apparatus, maintenance method and device manufacturing method
KR20090023335A (en) 2006-05-22 2009-03-04 가부시키가이샤 니콘 Exposure method and apparatus, maintenance method, and device manufacturing method
US7969548B2 (en) 2006-05-22 2011-06-28 Asml Netherlands B.V. Lithographic apparatus and lithographic apparatus cleaning method
WO2007136089A1 (en) 2006-05-23 2007-11-29 Nikon Corporation Maintenance method, exposure method and apparatus, and device manufacturing method
JP5245825B2 (en) 2006-06-30 2013-07-24 株式会社ニコン Maintenance method, exposure method and apparatus, and device manufacturing method
US8045135B2 (en) 2006-11-22 2011-10-25 Asml Netherlands B.V. Lithographic apparatus with a fluid combining unit and related device manufacturing method
US9632425B2 (en) 2006-12-07 2017-04-25 Asml Holding N.V. Lithographic apparatus, a dryer and a method of removing liquid from a surface
US8634053B2 (en) 2006-12-07 2014-01-21 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7791709B2 (en) 2006-12-08 2010-09-07 Asml Netherlands B.V. Substrate support and lithographic process
US8237911B2 (en) 2007-03-15 2012-08-07 Nikon Corporation Apparatus and methods for keeping immersion fluid adjacent to an optical assembly during wafer exchange in an immersion lithography machine
US7866330B2 (en) 2007-05-04 2011-01-11 Asml Netherlands B.V. Cleaning device, a lithographic apparatus and a lithographic apparatus cleaning method
US8947629B2 (en) 2007-05-04 2015-02-03 Asml Netherlands B.V. Cleaning device, a lithographic apparatus and a lithographic apparatus cleaning method
US7900641B2 (en) 2007-05-04 2011-03-08 Asml Netherlands B.V. Cleaning device and a lithographic apparatus cleaning method
US8164736B2 (en) 2007-05-29 2012-04-24 Nikon Corporation Exposure method, exposure apparatus, and method for producing device
NL1036253A1 (en) * 2007-12-10 2009-06-11 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
EP2128703A1 (en) 2008-05-28 2009-12-02 ASML Netherlands BV Lithographic Apparatus and a Method of Operating the Apparatus
NL2005207A (en) 2009-09-28 2011-03-29 Asml Netherlands Bv Heat pipe, lithographic apparatus and device manufacturing method.
EP2381310B1 (en) 2010-04-22 2015-05-06 ASML Netherlands BV Fluid handling structure and lithographic apparatus

Family Cites Families (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1242527A (en) * 1967-10-20 1971-08-11 Kodak Ltd Optical instruments
JPS6349893B2 (en) * 1981-03-18 1988-10-06 Hitachi Ltd
DD160756A3 (en) * 1981-04-24 1984-02-29 Gudrun Dietz Arrangement for improving photochemical conversion processes in photoresist layers
DD206607A1 (en) 1982-06-16 1984-02-01 Mikroelektronik Zt Forsch Tech A method and device for eliminating interference effects
JPS5919912A (en) 1982-07-26 1984-02-01 Hitachi Ltd Immersion distance holding device
DD221563A1 (en) * 1983-09-14 1985-04-24 Mikroelektronik Zt Forsch Tech Immersion objective for stepwise projection imaging of a mask pattern
JPH06124873A (en) 1992-10-09 1994-05-06 Canon Inc Liquid-soaking type projection exposure apparatus
JP2753930B2 (en) * 1992-11-27 1998-05-20 キヤノン株式会社 Immersion-type projection exposure apparatus
US6104687A (en) * 1996-08-26 2000-08-15 Digital Papyrus Corporation Method and apparatus for coupling an optical lens to a disk through a coupling medium having a relatively high index of refraction
US5825043A (en) * 1996-10-07 1998-10-20 Nikon Precision Inc. Focusing and tilting adjustment system for lithography aligner, manufacturing apparatus or inspection apparatus
JP3454658B2 (en) 1997-02-03 2003-10-06 大日本スクリーン製造株式会社 Polishing process monitoring device
JPH1133506A (en) 1997-07-24 1999-02-09 Furontetsuku:Kk Fluid treatment device and cleaning treatment system
AU2747999A (en) 1998-03-26 1999-10-18 Nikon Corporation Projection exposure method and system
JP2000058436A (en) 1998-08-11 2000-02-25 Nikon Corp Projection aligner and exposure method
US6970228B1 (en) * 1999-07-16 2005-11-29 Nikon Corporation Exposure method and system
US7234477B2 (en) * 2000-06-30 2007-06-26 Lam Research Corporation Method and apparatus for drying semiconductor wafer surfaces using a plurality of inlets and outlets held in close proximity to the wafer surfaces
TW591653B (en) 2000-08-08 2004-06-11 Koninkl Philips Electronics Nv Method of manufacturing an optically scannable information carrier
DE60326962D1 (en) * 2002-08-06 2009-05-14 Ricoh Kk By a semiconductor manufacturing process formed electrostatic actuator
US6788477B2 (en) * 2002-10-22 2004-09-07 Taiwan Semiconductor Manufacturing Co., Ltd. Apparatus for method for immersion lithography
SG121822A1 (en) * 2002-11-12 2006-05-26 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
CN100568101C (en) * 2002-11-12 2009-12-09 Asml荷兰有限公司 Lithographic apparatus and device manufacturing method
CN101349876B (en) * 2002-11-12 2010-12-01 Asml荷兰有限公司 Immersion lithographic apparatus and device manufacturing method
DE60335595D1 (en) * 2002-11-12 2011-02-17 Asml Netherlands Bv Lithographic apparatus with immersion and method for manufacturing a device
KR100585476B1 (en) * 2002-11-12 2006-06-07 에이에스엠엘 네델란즈 비.브이. Lithographic Apparatus and Device Manufacturing Method
SG131766A1 (en) * 2002-11-18 2007-05-28 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
WO2004053955A1 (en) * 2002-12-10 2004-06-24 Nikon Corporation Exposure system and device producing method
CN100370533C (en) * 2002-12-13 2008-02-20 皇家飞利浦电子股份有限公司 Liquid removal in a method and device for irradiating spots on a layer
US6867844B2 (en) * 2003-06-19 2005-03-15 Asml Holding N.V. Immersion photolithography system and method using microchannel nozzles
US7061578B2 (en) * 2003-08-11 2006-06-13 Advanced Micro Devices, Inc. Method and apparatus for monitoring and controlling imaging in immersion lithography systems
US6954256B2 (en) * 2003-08-29 2005-10-11 Asml Netherlands B.V. Gradient immersion lithography

Also Published As

Publication number Publication date
WO2004057589A1 (en) 2004-07-08
DE60314668D1 (en) 2007-08-09
CN1729521A (en) 2006-02-01
USRE46433E1 (en) 2017-06-13
TW200421297A (en) 2004-10-16
TWI288404B (en) 2007-10-11
JP4364805B2 (en) 2009-11-18
EP1579435A1 (en) 2005-09-28
US7514699B2 (en) 2009-04-07
KR20050088127A (en) 2005-09-01
DE60314668T2 (en) 2008-03-06
CN1316482C (en) 2007-05-16
KR100971440B1 (en) 2010-07-21
EP1579435B1 (en) 2007-06-27
AU2003295177A1 (en) 2004-07-14
US20070052936A1 (en) 2007-03-08
JP2006511011A (en) 2006-03-30

Similar Documents

Publication Publication Date Title
DE502006006836D1 (en) Apparatus and method for producing a three-dimensional object
DE602005007091D1 (en) A method of using a power driver
DE60325350D1 (en) A method for masking cooling holes of a gas turbine component
AT537681T (en) A method and apparatus for implementing and / or using a dedicated control channel
DE60322690D1 (en) A method for masking cooling holes of a gas turbine component
DE60217644D1 (en) Method and apparatus for friction stir welding
DE602005010861D1 (en) A method for deriving a treatment plan for maxillofacial surgery and devices therefor
DE602005008854D1 (en) Method and device for braking a motor
DE60333828D1 (en) A method and apparatus for detecting and transmitting a characteristic of a body hosts
AT424026T (en) process fluid removal in one and a device for irradiating spots on a layer
AT440376T (en) Processing system and method for thermally treating a substrate
DE60301808D1 (en) Apparatus and method for selectively releasing a subterranean cementing
AT516754T (en) Apparatus and method for X-ray apparatus to adjust the imaging parameters of a
DE602004010365D1 (en) A method and apparatus for recording tool positioning parameters of a locating device
DE50212768D1 (en) Method and device for making holes in workpieces by means of laser beams
DE602005024340D1 (en) Apparatus and method for transferring a pattern
DE602004028871D1 (en) A method and apparatus for cleaning a turbofan gas turbine engine
AT545887T (en) Positive radiation-sensitive composition and method for forming a pattern using the radiation-sensitive composition
AT285483T (en) Method and apparatus for high-speed flame spraying
DE60321471D1 (en) Method and apparatus for radiation-assisted rotating friction welding
DE602005010783D1 (en) Apparatus and method for assessment of a borehole
AT513279T (en) A method and apparatus for determining position and orientation of an image-receiving means
DE10393558D2 (en) Method and device for stabilizing a vehicle combination
DE602004019951D1 (en) Climbing apparatus and method for traversing a surface
AT491579T (en) Method and apparatus for manufacturing a component with a surface appearance predetermined

Legal Events

Date Code Title Description
RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties