AT313700B - Method for producing a relief image - Google Patents

Method for producing a relief image

Info

Publication number
AT313700B
AT313700B AT600170A AT600170A AT313700B AT 313700 B AT313700 B AT 313700B AT 600170 A AT600170 A AT 600170A AT 600170 A AT600170 A AT 600170A AT 313700 B AT313700 B AT 313700B
Authority
AT
Austria
Prior art keywords
producing
relief image
relief
image
Prior art date
Application number
AT600170A
Other languages
German (de)
Inventor
W Hallman Robert
W Kurtz Garry
Original Assignee
Teeg Res
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Teeg Res filed Critical Teeg Res
Application granted granted Critical
Publication of AT313700B publication Critical patent/AT313700B/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/02—Local etching
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F4/00—Processes for removing metallic material from surfaces, not provided for in group C23F1/00 or C23F3/00
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/705—Compositions containing chalcogenides, metals or alloys thereof, as photosensitive substances, e.g. photodope systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
    • G03F7/0044—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists involving an interaction between the metallic and non-metallic component, e.g. photodope systems

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Metallurgy (AREA)
  • Materials Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • ing And Chemical Polishing (AREA)
AT600170A 1966-09-22 1970-07-02 Method for producing a relief image AT313700B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
BE687248 1966-09-22
US83903869A 1969-07-03 1969-07-03

Publications (1)

Publication Number Publication Date
AT313700B true AT313700B (en) 1974-02-25

Family

ID=25656480

Family Applications (1)

Application Number Title Priority Date Filing Date
AT600170A AT313700B (en) 1966-09-22 1970-07-02 Method for producing a relief image

Country Status (7)

Country Link
US (1) US3637381A (en)
AT (1) AT313700B (en)
BE (1) BE687248A (en)
CH (1) CH539868A (en)
DE (1) DE2032429A1 (en)
GB (1) GB1317974A (en)
NL (1) NL7009162A (en)

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2119960C3 (en) * 1971-04-23 1978-06-01 Institut Kibernetiki Akademii Nauk Ukrainskoj Ssr Process for the production of adhesive thin-film structures
US3819377A (en) * 1971-08-12 1974-06-25 Energy Conversion Devices Inc Method of imaging and imaging material
US3996057A (en) * 1972-12-07 1976-12-07 Fuji Photo Film Co., Ltd. Heat development process for forming images utilizing a photographic material containing a metal layer and an inorganic material layer
DE2439848C2 (en) * 1973-08-20 1985-05-15 Canon K.K., Tokio/Tokyo Method of recording by means of a laser beam
US3999990A (en) * 1973-08-28 1976-12-28 Technion Research And Development Foundation, Ltd. Imaging by light-enhanced vaporization
US4318978A (en) * 1976-11-05 1982-03-09 Corning Glass Works Photosensitive film and methods
CA1092877A (en) * 1976-11-05 1981-01-06 Nicholas F. Borrelli Photosensitive film and methods
US4252891A (en) * 1977-07-29 1981-02-24 Kostyshin Maxim T Method of manufacturing embossed articles of preset configuration
US4234625A (en) * 1978-01-19 1980-11-18 Petrov Vyacheslav V Process for producing material sensitive to electromagnetic and corpuscular radiation
US4226666A (en) * 1978-08-21 1980-10-07 International Business Machines Corporation Etching method employing radiation and noble gas halide
US4314256A (en) * 1979-06-12 1982-02-02 Petrov Vyacheslav V Radiation-sensitive material and method for recording information on radiation-sensitive material
US4284711A (en) * 1979-08-21 1981-08-18 Birlain Noris Armando Presensitized planographic printing plates with cobalt adhesive layer
US4569124A (en) * 1984-05-22 1986-02-11 Hughes Aircraft Company Method for forming thin conducting lines by ion implantation and preferential etching
US4702994A (en) * 1984-10-01 1987-10-27 W. R. Grace & Co. Projection imaged relief printing plates
CA1308596C (en) * 1986-01-13 1992-10-13 Rohm And Haas Company Microplastic structures and method of manufacture
US4838989A (en) * 1987-08-25 1989-06-13 The United States Of America As Represented By The United States Department Of Energy Laser-driven fusion etching process
US5350484A (en) * 1992-09-08 1994-09-27 Intel Corporation Method for the anisotropic etching of metal films in the fabrication of interconnects
MX9305898A (en) * 1992-10-30 1995-01-31 Texas Instruments Inc ANISOTROPIC PHOTOCHEMICAL ENGRAVING METHOD FOR THE MANUFACTURE OF INTEGRATED CIRCUITS.
US5493971A (en) * 1994-04-13 1996-02-27 Presstek, Inc. Laser-imageable printing members and methods for wet lithographic printing
US7019819B2 (en) * 2002-11-13 2006-03-28 Molecular Imprints, Inc. Chucking system for modulating shapes of substrates
US7641840B2 (en) * 2002-11-13 2010-01-05 Molecular Imprints, Inc. Method for expelling gas positioned between a substrate and a mold
US20050077298A1 (en) * 2003-10-14 2005-04-14 Sonoco Development, Inc. Easy-opening container and closure with radiation-weakened bond and method therefor
US8215946B2 (en) 2006-05-18 2012-07-10 Molecular Imprints, Inc. Imprint lithography system and method
CN101889127B (en) * 2007-12-05 2013-06-05 山特维克知识产权股份有限公司 Breaking or excavating tool with cemented tungsten carbide insert and ring, material removing machine incorporating such a tool and method of manufacturing such a tool
CN102265341A (en) * 2008-11-03 2011-11-30 布莱阿姆青年大学 Data storage media containing magnesium metal layer
WO2014149805A1 (en) * 2013-03-19 2014-09-25 Eastman Kodak Company Method of sequestering metals using thiosulfate polymers

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB344354A (en) * 1929-11-29 1931-03-02 Gen Electric Co Ltd Improved process for the manufacture of photographically sensitive materials
US2912592A (en) * 1954-10-07 1959-11-10 Horizons Inc Memory device
US2844493A (en) * 1955-02-11 1958-07-22 Horizons Inc High resistance photoconductor
US2841477A (en) * 1957-03-04 1958-07-01 Pacific Semiconductors Inc Photochemically activated gaseous etching method
US2962376A (en) * 1958-05-14 1960-11-29 Haloid Xerox Inc Xerographic member
US3170790A (en) * 1959-01-08 1965-02-23 Xerox Corp Red sensitive xerographic plate and process therefor
US3082085A (en) * 1959-04-27 1963-03-19 Minnesota Mining & Mfg Electrical photography
GB968141A (en) * 1960-02-15 1964-08-26 Photoelectric Ltd Improvements in the production of etched surfaces
US3122463A (en) * 1961-03-07 1964-02-25 Bell Telephone Labor Inc Etching technique for fabricating semiconductor or ceramic devices
NL275192A (en) * 1961-06-30
DE1273082B (en) * 1962-04-03 1968-07-18 Jenaer Glaswerk Schott & Gen Use of glasses of the multi-component systems arsenic-sulfur-halogen for the light-sensitive parts of photo resistors
US3271180A (en) * 1962-06-19 1966-09-06 Ibm Photolytic processes for fabricating thin film patterns
US3317409A (en) * 1963-04-16 1967-05-02 Minnesota Mining & Mfg Electrolytic electrophotography
US3346384A (en) * 1963-04-25 1967-10-10 Gen Electric Metal image formation
DE1250737B (en) * 1963-07-08
US3386823A (en) * 1964-06-01 1968-06-04 Ibm Photothermic image producing process
US3377169A (en) * 1965-03-30 1968-04-09 Du Pont Copper thallium and lead halide and pseudohalides photosoluble crystals
FR1534597A (en) * 1966-12-31 1968-07-26 Inst Phisikochimia Pri Bulgars Process for the preparation of photographic materials based on photosensitive compounds free of silver

Also Published As

Publication number Publication date
BE687248A (en) 1967-03-22
NL7009162A (en) 1971-01-05
GB1317974A (en) 1973-05-23
CH539868A (en) 1973-09-14
DE2032429A1 (en) 1971-01-21
US3637381A (en) 1972-01-25

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Legal Events

Date Code Title Description
ELJ Ceased due to non-payment of the annual fee