AT296482T - Hochtetraedrische amorphous carbon films as well as process and ion beam source for manufacturing the same - Google Patents

Hochtetraedrische amorphous carbon films as well as process and ion beam source for manufacturing the same

Info

Publication number
AT296482T
AT296482T AT97927892T AT97927892T AT296482T AT 296482 T AT296482 T AT 296482T AT 97927892 T AT97927892 T AT 97927892T AT 97927892 T AT97927892 T AT 97927892T AT 296482 T AT296482 T AT 296482T
Authority
AT
Austria
Prior art keywords
hochtetraedrische
manufacturing
well
process
same
Prior art date
Application number
AT97927892T
Other languages
German (de)
Inventor
Vijayen Veerasamy
Manfred Weiler
Eric Li
Original Assignee
Akashic Memories Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to US1879396P priority Critical
Priority to US1874696P priority
Priority to US76133896A priority
Priority to US08/761,336 priority patent/US5858477A/en
Application filed by Akashic Memories Corp filed Critical Akashic Memories Corp
Priority to PCT/US1997/009393 priority patent/WO1997045855A1/en
Publication of AT296482T publication Critical patent/AT296482T/en

Links

Classifications

    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes, e.g. for surface treatment of objects such as coating, plating, etching, sterilising or bringing about chemical reactions
    • H01J37/32009Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32357Generation remote from the workpiece, e.g. down-stream
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/62Record carriers characterised by the selection of the material
    • G11B5/72Protective coatings, e.g. antistatic, antifriction
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/8408Processes or apparatus specially adapted for manufacturing record carriers protecting the magnetic layer
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00Ion beam tubes
    • H01J27/02Ion sources; Ion guns
    • H01J27/16Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation
    • H01J27/18Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation with an applied axial magnetic field
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/08Ion sources; Ion guns
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00Coatings on glass
    • C03C2217/20Materials for coating a single layer on glass
    • C03C2217/28Other inorganic materials
    • C03C2217/282Carbides, silicides
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00Methods for coating glass
    • C03C2218/10Deposition methods
    • C03C2218/15Deposition methods from the vapour phase
    • C03C2218/151Deposition methods from the vapour phase by vacuum evaporation
AT97927892T 1996-05-31 1997-05-29 Hochtetraedrische amorphous carbon films as well as process and ion beam source for manufacturing the same AT296482T (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
US1879396P true 1996-05-31 1996-05-31
US1874696P true 1996-05-31 1996-05-31
US76133896A true 1996-12-10 1996-12-10
US08/761,336 US5858477A (en) 1996-12-10 1996-12-10 Method for producing recording media having protective overcoats of highly tetrahedral amorphous carbon
PCT/US1997/009393 WO1997045855A1 (en) 1996-05-31 1997-05-29 Highly tetrahedral amorphous carbon films and methods for their production

Publications (1)

Publication Number Publication Date
AT296482T true AT296482T (en) 2005-06-15

Family

ID=27486777

Family Applications (1)

Application Number Title Priority Date Filing Date
AT97927892T AT296482T (en) 1996-05-31 1997-05-29 Hochtetraedrische amorphous carbon films as well as process and ion beam source for manufacturing the same

Country Status (6)

Country Link
EP (2) EP0906636B1 (en)
JP (6) JP2000512053A (en)
AT (1) AT296482T (en)
AU (2) AU3224297A (en)
DE (2) DE69733350T2 (en)
WO (2) WO1997045834A1 (en)

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AUPO613797A0 (en) * 1997-04-09 1997-05-08 University Of Sydney, The Digital information storage
US6086730A (en) * 1999-04-22 2000-07-11 Komag, Incorporated Method of sputtering a carbon protective film on a magnetic disk with high sp3 content
US6261693B1 (en) * 1999-05-03 2001-07-17 Guardian Industries Corporation Highly tetrahedral amorphous carbon coating on glass
US6338901B1 (en) * 1999-05-03 2002-01-15 Guardian Industries Corporation Hydrophobic coating including DLC on substrate
US6303225B1 (en) * 2000-05-24 2001-10-16 Guardian Industries Corporation Hydrophilic coating including DLC on substrate
US6565719B1 (en) * 2000-06-27 2003-05-20 Komag, Inc. Magnetic disk comprising a first carbon overcoat having a high SP3 content and a second carbon overcoat having a low SP3 content
US6602371B2 (en) * 2001-02-27 2003-08-05 Guardian Industries Corp. Method of making a curved vehicle windshield
US6872909B2 (en) * 2003-04-16 2005-03-29 Applied Science And Technology, Inc. Toroidal low-field reactive gas and plasma source having a dielectric vacuum vessel
JP2006036611A (en) * 2004-07-29 2006-02-09 Sumitomo Electric Ind Ltd Hydrogen-containing carbon film
DE102004041235A1 (en) * 2004-08-26 2006-03-02 Ina-Schaeffler Kg Wear resistant coating and method of making same
GB2417490A (en) * 2004-08-27 2006-03-01 Nanofilm Technologies Int Tetrahedral amorphous carbon coating with pre-determined resistivity
DE102006028977B4 (en) * 2006-06-23 2012-04-12 Qimonda Ag Sputterdepositions device
KR101113145B1 (en) 2007-04-05 2012-03-13 후지쯔 세미컨덕터 가부시키가이샤 Surface morphology sensor and method for manufacture thereof
US7961427B2 (en) * 2007-05-22 2011-06-14 Galleon International Corporation High performance computer hard disk drive with a carbon overcoat and method of improving hard disk performance
US8427925B2 (en) 2010-02-23 2013-04-23 Seagate Technology Llc HAMR NFT materials with improved thermal stability
JP5679423B2 (en) 2010-11-02 2015-03-04 富士電機株式会社 DLC thin film manufacturing method and apparatus
JP2013037731A (en) 2011-08-04 2013-02-21 Fuji Electric Co Ltd Recording medium
EP2810298A1 (en) 2012-02-03 2014-12-10 Seagate Technology LLC Methods of forming layers
US9224416B2 (en) 2012-04-24 2015-12-29 Seagate Technology Llc Near field transducers including nitride materials
US9251837B2 (en) 2012-04-25 2016-02-02 Seagate Technology Llc HAMR NFT materials with improved thermal stability
WO2014120233A1 (en) * 2013-02-01 2014-08-07 Seagate Technology Llc Methods of forming layers
US9280989B2 (en) 2013-06-21 2016-03-08 Seagate Technology Llc Magnetic devices including near field transducer
US8830800B1 (en) 2013-06-21 2014-09-09 Seagate Technology Llc Magnetic devices including film structures
JP6038843B2 (en) 2013-06-24 2016-12-07 シーゲイト テクノロジー エルエルシーSeagate Technology LLC Device comprising at least one intermixing layer
US9245573B2 (en) 2013-06-24 2016-01-26 Seagate Technology Llc Methods of forming materials for at least a portion of a NFT and NFTs formed using the same
US9058824B2 (en) 2013-06-24 2015-06-16 Seagate Technology Llc Devices including a gas barrier layer
US9502070B2 (en) 2013-06-24 2016-11-22 Seagate Technology Llc Materials for near field transducers, near field tranducers containing same, and methods of forming
CN103342573B (en) * 2013-07-10 2014-07-02 航天材料及工艺研究所 Method for increasing thermal conductivity of carbon/carbon composite material of diamond film
JP5627148B1 (en) * 2013-07-24 2014-11-19 株式会社リケン Piston ring and manufacturing method thereof
JP6186500B2 (en) * 2013-11-14 2017-08-23 フジ エレクトリック (マレーシア) エスディーエヌ ビーエイチディー Method for producing carbon-based protective film
US9697856B2 (en) 2013-12-06 2017-07-04 Seagate Techology LLC Methods of forming near field transducers and near field transducers formed thereby
US9570098B2 (en) 2013-12-06 2017-02-14 Seagate Technology Llc Methods of forming near field transducers and near field transducers formed thereby
US9305572B2 (en) 2014-05-01 2016-04-05 Seagate Technology Llc Methods of forming portions of near field transducers (NFTS) and articles formed thereby
US9552833B2 (en) 2014-11-11 2017-01-24 Seagate Technology Llc Devices including a multilayer gas barrier layer
US9620150B2 (en) 2014-11-11 2017-04-11 Seagate Technology Llc Devices including an amorphous gas barrier layer
US9822444B2 (en) 2014-11-11 2017-11-21 Seagate Technology Llc Near-field transducer having secondary atom higher concentration at bottom of the peg
US10192573B2 (en) 2015-03-22 2019-01-29 Seagate Technology Llc Devices including metal layer
WO2016191707A1 (en) 2015-05-28 2016-12-01 Seagate Technology Llc Multipiece near field transducers (nfts)
WO2016191666A1 (en) 2015-05-28 2016-12-01 Seagate Technology Llc Near field transducers (nfts) including barrier layer and methods of forming
US9852748B1 (en) 2015-12-08 2017-12-26 Seagate Technology Llc Devices including a NFT having at least one amorphous alloy layer
KR101701440B1 (en) * 2016-06-07 2017-02-01 (주)디쉬뱅크 A method for production of Plasma Hybrid Deposition System
WO2019013157A1 (en) * 2017-07-10 2019-01-17 新日鐵住金株式会社 Raceway member, bearing, and device

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DE3708716C2 (en) * 1987-03-18 1993-11-04 Hans Prof Dr Rer Nat Oechsner High-frequency ion source
DE3708717C2 (en) * 1987-03-18 1990-12-20 Hans Prof. Dr.Rer.Nat. 6750 Kaiserslautern De Oechsner
US4822466A (en) * 1987-06-25 1989-04-18 University Of Houston - University Park Chemically bonded diamond films and method for producing same
JPH02168540A (en) * 1988-12-20 1990-06-28 Mitsubishi Electric Corp Plasma processing device
US5091049A (en) * 1989-06-13 1992-02-25 Plasma & Materials Technologies, Inc. High density plasma deposition and etching apparatus
US5352493A (en) * 1991-05-03 1994-10-04 Veniamin Dorfman Method for forming diamond-like nanocomposite or doped-diamond-like nanocomposite films
DE69226253D1 (en) * 1992-01-24 1998-08-20 Applied Materials Inc Plasma etch reactor and plasma processing
JPH06349054A (en) * 1993-06-08 1994-12-22 Fuji Electric Co Ltd Magnetic recording medium and its production

Also Published As

Publication number Publication date
EP0906636A1 (en) 1999-04-07
WO1997045834A1 (en) 1997-12-04
AU3293097A (en) 1998-01-05
JP2000512053A (en) 2000-09-12
DE69733350T2 (en) 2006-04-27
WO1997045855A1 (en) 1997-12-04
EP0906636B1 (en) 2005-05-25
AU3224297A (en) 1998-01-05
JP2008077833A (en) 2008-04-03
JP2008123671A (en) 2008-05-29
EP0909445A1 (en) 1999-04-21
DE69733350D1 (en) 2005-06-30
JP2008117521A (en) 2008-05-22
JP2008120676A (en) 2008-05-29
JP2008091022A (en) 2008-04-17

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